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1. 发明授权

US11311903B2 Coating method and coating device with compensation for asymmetries of the spray jet 有权
公开(公告)号：US11311903B2
公开(公告)日：2022-04-26
申请号：US14345706
申请日：2012-09-05
申请人： Andreas Fischer , Ralph Glaser , Carmen Goltz
发明人： Andreas Fischer , Ralph Glaser , Carmen Goltz
IPC分类号： B05D1/04 , B05D1/02 , B05B12/08 , B05B13/04 , B05B12/16 , B05B5/04
摘要： The invention relates to a coating method for coating a component surface (4) with a coating agent, in particular for painting a motor vehicle body component with a paint, having the following steps: ⋅ emitting a spray jet (1) of the coating agent onto the component surface (4) of the component to be coated by means of an atomizer (2), said spray jet (1) having a main axis (5) and having an asymmetry with respect to the main axis (5) such that the spray jet (1) generates a spray pattern with a corresponding asymmetry on the component surface (4), and ⋅ at least partially compensating for the asymmetry of the spray jet (1) such that the asymmetry of the resulting spray pattern on the component surface (4) is reduced. The invention further relates to a corresponding coating device.

2. 发明授权

US09299541B2 Methods and apparatuses for effectively reducing gas residence time in a plasma processing chamber 有权
标题翻译：有效减少等离子体处理室中气体停留时间的方法和装置
公开(公告)号：US09299541B2
公开(公告)日：2016-03-29
申请号：US13436728
申请日：2012-03-30
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： H01J37/32
CPC分类号： H01J37/32972
摘要： Methods and apparatuses for controlling plasma generation in a plasma processing chamber to reduce an effective residence time of by-product gases or to control in real time the concentration of certain polymer pre-cursors or reaction by-products in the plasma processing chamber are disclosed. The gas residence time is “effectively” reduced by reducing the plasma reaction for at least a portion of the process time. Thresholds can be provided to control when the plasma reaction is permitted to proceed at the full rate and when the plasma reaction is permitted to proceed at the reduced rate. By reducing the rate of plasma by-product generation at least for a portion of the process time, the by-product gas residence time may be effectively reduced to improve process results.
摘要翻译：公开了用于控制等离子体处理室中的等离子体产生以减少副产物气体的有效停留时间或实时控制等离子体处理室中某些聚合物前体或反应副产物的浓度的方法和装置。通过在处理时间的至少一部分减少等离子体反应，“有效地”减少气体停留时间。可以提供阈值以控制何时允许血浆反应以全速进行，并且允许血浆反应以降低的速率进行。通过至少在一部分处理时间内降低等离子体副产物产生速率，可以有效地减少副产物气体停留时间以改善工艺结果。

3. 发明授权

US09251999B2 Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate 有权
标题翻译：具有用于处理衬底的等离子体处理室的电容耦合等离子体处理系统
公开(公告)号：US09251999B2
公开(公告)日：2016-02-02
申请号：US13526391
申请日：2012-06-18
申请人： Rajinder Dhindsa , Eric Hudson , Alexei Marakhtanov , Andreas Fischer
发明人： Rajinder Dhindsa , Eric Hudson , Alexei Marakhtanov , Andreas Fischer
IPC分类号： H01J37/32 , H01L21/306 , G03F7/42 , H01L21/311
CPC分类号： H01J37/32174 , G03F7/427 , H01J37/32091 , H01J37/32128 , H01J37/32165 , H01J37/32532 , H01L21/306 , H01L21/31138
摘要： A capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate is provided. The plasma processing system includes at least an upper electrode and a lower electrode for processing the substrate, the substrate being disposed on the lower electrode during plasma processing. The plasma processing system further includes means for providing at least a first RF signal to the lower electrode, the first RF signal having a first RF frequency. The first RF signal couples with a plasma in the plasma processing chamber, thereby inducing an induced RF signal on the upper electrode. The plasma processing system further includes means for rectifying the induced RF signal to generate a rectified RF signal such that the rectified RF signal is more positively biased than negatively biased, wherein the substrate is configured to be processed while the rectified RF signal is provided to the upper electrode.
摘要翻译：提供了具有用于处理衬底的等离子体处理室的电容耦合等离子体处理系统。等离子体处理系统至少包括用于处理衬底的上电极和下电极，衬底在等离子体处理期间设置在下电极上。等离子体处理系统还包括用于向下电极提供至少第一RF信号的装置，第一RF信号具有第一RF频率。第一RF信号与等离子体处理室中的等离子体耦合，从而在上电极上感应感应RF信号。等离子体处理系统还包括用于整流感应RF信号以产生经整流的RF信号的装置，使得整流的RF信号比负偏置更积极地偏置，其中衬底被配置为在被整流的RF信号被提供给上电极。

4. 发明授权

US09061961B2 Method for direct amination of hydrocarbons to form amino hydrocarbons with the electrochemical separation of hydrocarbon 有权
标题翻译：碳氢化合物直接胺化形成氨基烃的方法
公开(公告)号：US09061961B2
公开(公告)日：2015-06-23
申请号：US13383321
申请日：2010-07-08
申请人： Petr Kubanek , Alexander Panchenko , Andreas Fischer , Thomas Heidemann
发明人： Petr Kubanek , Alexander Panchenko , Andreas Fischer , Thomas Heidemann
IPC分类号： C07C209/02 , C25B3/00
CPC分类号： C07C209/02 , C25B3/00 , Y02P20/582 , C07C211/46
摘要： Process for the direct amination of hydrocarbons to aminohydrocarbons, which comprises the steps: a) reaction of a feed stream E comprising at least one hydrocarbon and at least one aminating reagent to form a reaction mixture R comprising aminohydrocarbons and hydrogen and b) electrochemical separation of at least part of the hydrogen formed in the reaction from the reaction mixture R by means of a gastight membrane-electrode assembly having at least one selectively proton-conducting membrane and at least one electrode catalyst on each side of the membrane, where at least part of the hydrogen is oxidized to protons over the anode catalyst on the retentate side of the membrane and the protons are, after passing through the membrane, b1) reduced to hydrogen and/or b2) reacted with oxygen from an oxygen-comprising stream O which is brought into contact with the permeate side of the membrane to form water over the cathode catalyst on the permeate side.
摘要翻译：用于将烃直接胺化成氨基烃的方法，其包括以下步骤：a）包含至少一种烃和至少一种氨化试剂的进料流E的反应以形成包含氨基烃和氢的反应混合物R和b）电化学分离通过具有至少一个选择性质子传导膜和在膜的每一侧上的至少一个电极催化剂的气密膜 - 电极组件在反应混合物R的反应中形成的至少一部分氢，其中至少部分的氢被氧化成在膜的滞留侧上的阳极催化剂上的质子，并且质子在通过膜之后，b1）还原为氢和/或b2）与来自含氧流O的氧反应，其中与膜的渗透侧接触以在渗透侧的阴极催化剂上形成水。

5. 发明授权

US08884178B2 Methods and apparatus for igniting and sustaining plasma 有权
标题翻译：用于点燃和维持血浆的方法和装置
公开(公告)号：US08884178B2
公开(公告)日：2014-11-11
申请号：US12908462
申请日：2010-10-20
申请人： Andreas Fischer , Neil Martin Paul Benjamin
发明人： Andreas Fischer , Neil Martin Paul Benjamin
IPC分类号： B23K10/00 , H05H1/46 , H01J37/32 , B23K9/013
CPC分类号： B23K10/00 , B23K9/013 , B23K2101/40 , H01J37/321 , H01J37/3211 , H01J37/32366 , H01J37/32825 , H05H1/46 , H05H2001/4667
摘要： Atmospheric inductively coupled plasma torch comprising a vessel within which the plasma is generated and a coil wound around the periphery of the vessel. The coil has at least two spaced-apart winding layers. The coil is constructed such that all winding layers of a given multi-turn is wound before an adjacent multi-turn is wound. A first end of the coil is coupled to ground, and a second end of the coil is coupled to receive a RF driver signal that is configured to ignite the plasma to facilitate processing.
摘要翻译：大气感应耦合等离子体焰炬，其包括在其内产生等离子体的容器和缠绕在容器外围的线圈。线圈具有至少两个间隔开的绕组层。线圈被构造成使得在相邻的多匝卷绕之前，给定多匝的所有绕组层被卷绕。线圈的第一端耦合到地，并且线圈的第二端被耦合以接收被配置为点燃等离子体以促进处理的RF驱动器信号。

6. 发明申请

US20140220231A1 COATING METHOD AND COATING DEVICE WITH COMPENSATION FOR ASYMMETRIES OF THE SPRAY JET 审中-公开
标题翻译：涂料方法和涂料装置与喷涂喷嘴的不对称补偿
公开(公告)号：US20140220231A1
公开(公告)日：2014-08-07
申请号：US14345706
申请日：2012-09-05
申请人： Andreas Fischer , Ralph Glaser , Carmen Goltz
发明人： Andreas Fischer , Ralph Glaser , Carmen Goltz
IPC分类号： B05B15/04 , B05D1/04 , B05D1/02
CPC分类号： B05D1/04 , B05B5/04 , B05B12/082 , B05B12/16 , B05B13/0452 , B05D1/02 , G05B2219/45065
摘要： The invention relates to a coating method for coating a component surface (4) with a coating agent, in particular for painting a motor vehicle body component with a paint, having the following steps: • emitting a spray jet (1) of the coating agent onto the component surface (4) of the component to be coated by means of an atomizer (2), said spray jet (1) having a main axis (5) and having an asymmetry with respect to the main axis (5) such that the spray jet (1) generates a spray pattern with a corresponding asymmetry on the component surface (4), and • at least partially compensating for the asymmetry of the spray jet (1) such that the asymmetry of the resulting spray pattern on the component surface (4) is reduced. The invention further relates to a corresponding coating device.
摘要翻译：本发明涉及一种用涂料涂覆组分表面（4）的涂覆方法，特别是用涂料涂漆机动车辆部件，具有以下步骤：•发射喷涂剂（1）通过雾化器（2）到要涂覆的部件的部件表面（4）上，所述喷射喷嘴（1）具有主轴线（5），并且相对于主轴线（5）具有不对称性，使得喷射喷嘴（1）产生在组件表面（4）上具有对应不对称性的喷雾图案，以及•至少部分地补偿喷射喷嘴（1）的不对称性，使得所得到的喷涂图案在部件上的不对称性表面（4）减少。本发明还涉及相应的涂覆装置。

7. 发明授权

US08747900B2 Dosage form with improved release of cefuroximaxetil 失效
标题翻译：剂量形式，具有改善头孢呋辛酯释放的作用
公开(公告)号：US08747900B2
公开(公告)日：2014-06-10
申请号：US11912627
申请日：2006-04-25
申请人： Iris Ziegler , Andreas Fischer
发明人： Iris Ziegler , Andreas Fischer
IPC分类号： A61K9/16 , A61K9/50 , A01N59/26 , A61K33/42 , A61K9/54 , A61K31/545
CPC分类号： A61K9/5047 , A61K9/1611 , A61K9/1652 , A61K31/43 , A61K31/546
摘要： The invention relates to a pharmaceutical composition comprising cefuroximaxetil and at least one carrageenan selected from the group consisting of κ-carrageenan, λ-carrageenan and -carrageenan. The invention furthermore relates to pellets, to a multiparticulate, pharmaceutical dosage form and to a novel crystalline modification of cefuroximaxetil.
摘要翻译：本发明涉及包含头孢曲松和至少一种选自以下的卡拉胶的药物组合物：卡拉胶，β-角叉菜胶和角叉菜胶。本发明还涉及丸剂，多颗粒剂型药物剂型和头孢曲松新颖结晶改性剂。

8. 发明授权

US08679668B2 Industrial apparatus for the large-scale storage of electric energy 有权
标题翻译：用于大规模储存电能的工业设备
公开(公告)号：US08679668B2
公开(公告)日：2014-03-25
申请号：US13166359
申请日：2011-06-22
申请人： Christoph Übler , Dietmar Bender , Günther Huber , Andreas Fischer , Bernd Schube , Glyn Atherton , Francis Michael Stackpool , Cord-Henrich Dustmann
发明人： Christoph Übler , Dietmar Bender , Günther Huber , Andreas Fischer , Bernd Schube , Glyn Atherton , Francis Michael Stackpool , Cord-Henrich Dustmann
IPC分类号： H01M4/36
CPC分类号： H01M10/3909 , H01M10/3918
摘要： The invention relates to an improved industrial apparatus for the large-scale storage of energy and a process for storing and transporting electric energy by means of this apparatus.
摘要翻译：本发明涉及一种用于大规模储存能量的改进的工业设备以及借助该装置储存和传输电能的方法。

9. 发明授权

US08677590B2 Plasma confinement structures in plasma processing systems and methods thereof 有权
标题翻译：等离子体处理系统中的等离子体约束结构及其方法
公开(公告)号：US08677590B2
公开(公告)日：2014-03-25
申请号：US14022111
申请日：2013-09-09
申请人： Eric Hudson , Andreas Fischer
发明人： Eric Hudson , Andreas Fischer
IPC分类号： C23F1/00 , H01L21/306 , C23C16/50 , C23C16/509 , B25B27/14 , C23C16/06 , C23C16/22
CPC分类号： C23C16/00 , C23F1/00 , H01J37/32082 , H01J37/32623
摘要： A method for manufacturing a plasma processing system is provided. The method includes providing a movable plasma-facing structure configured to surround a plasma that is generated during processing of a substrate. The method also includes disposing a movable electrically conductive structure outside of the movable plasma-facing structure, wherein both structures configured to be deployed and retracted as a single unit to facilitate handling of the substrate. The movable electrically conductive structure is radio frequency (RF) grounded during the plasma processing. During processing, the RF current from the plasma flows to the movable electrically conductive structure through the movable plasma-facing structure during the plasma processing. The method further includes coupling a set of conductive straps to the movable electrically conductive structure. The set of conductive straps accommodates the movable electrically conductive structure when it is deployed and retracted while providing the RF current a low impedance path to ground.
摘要翻译：提供了一种制造等离子体处理系统的方法。该方法包括提供构造成围绕在衬底的处理期间产生的等离子体的可移动等离子体面向结构。该方法还包括将可移动导电结构设置在可移动等离子体面向结构的外部，其中两个结构构造成作为单个单元展开和缩回以便于处理基板。可移动导电结构是在等离子体处理期间接地的射频（RF）。在处理期间，等离子体处理期间来自等离子体的RF电流通过可移动等离子体面向结构流动到可移动导电结构。该方法还包括将一组导电带耦合到可移动导电结构。一组导电带在展开和缩回时容纳可移动的导电结构，同时为RF电流提供一个低阻抗地线路径。

10. 发明授权

US08627783B2 Combined wafer area pressure control and plasma confinement assembly 有权
标题翻译：组合晶圆面积压力控制和等离子体约束组件
公开(公告)号：US08627783B2
公开(公告)日：2014-01-14
申请号：US12361490
申请日：2009-01-28
申请人： Andreas Fischer , Akira Koshiishi
发明人： Andreas Fischer , Akira Koshiishi
IPC分类号： C23C16/455 , C23C16/50 , C23C16/505 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32642 , H01J37/32449 , H01J37/32623
摘要： A combined pressure control/plasma confinement assembly configured for confining a plasma and for at least partially regulating pressure in a plasma processing chamber during plasma processing of a substrate is provided. The assembly includes a movable plasma confinement structure having therein a plurality of perforations and configured to surround the plasma when deployed. The assembly also includes a movable pressure control structure disposed outside of the movable plasma confinement structure such that the movable plasma confinement structure is disposed between the plasma and the movable pressure control structure during the plasma processing, the movable pressure control structure being deployable and retractable along with the movable plasma confinement structure to facilitate handling of the substrate, the movable pressure control structure being independently movable relative to the movable plasma confinement structure to regulate the pressure by blocking at least a portion of the plurality of perforations.
摘要翻译：提供了一种组合的压力控制/等离子体限制组件，其被配置为限制等离子体并且用于在等离子体处理室中等离子体处理室中至少部分地调节压力。组件包括可移动的等离子体限制结构，其中具有多个穿孔并且构造成在展开时包围等离子体。组件还包括可移动压力控制结构，其设置在可移动等离子体限制结构的外部，使得等离子体约束结构在等离子体处理期间设置在等离子体和可移动压力控制结构之间，可移动压力控制结构可以沿着可展开和缩回利用可移动的等离子体约束结构以便于处理衬底，可移动压力控制结构可相对于可移动等离子体限制结构独立地移动，以通过阻挡多个穿孔的至少一部分来调节压力。

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