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1. 发明授权

US5977000A High purity opaque silica glass 失效
标题翻译：高纯度不透明石英玻璃
公开(公告)号：US5977000A
公开(公告)日：1999-11-02
申请号：US977887
申请日：1997-11-25
申请人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
发明人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
IPC分类号： C03B5/02 , C03B5/08 , C03B19/09 , C03B20/00 , C03C3/06 , C03C4/08 , C03C11/00
CPC分类号： C03B5/08 , C03B19/09 , C03B20/00 , C03B5/021 , C03C3/06 , C03C2201/02 , C03C2201/80 , Y10S501/904 , Y10S501/905 , Y10T428/249969
摘要： Opaque silica glass having a density of 2.0 to 2.18 g/cm.sup.3, sodium and potassium elements concentrations in the silica glass of each 0.5 ppm or less and an OH group concentration of 30 ppm or less, and containing bubbles which are independent bubbles having the following physical values: a bubble diameter of 300 .mu.m or less, and a bubble density of 100,000 to 1,000,000 bubbles/cm.sup.3, and a production process for opaque silica glass, including: filling quartz raw material grain having a particle size of 10 to 350 .mu.m in a heat resistant mold, heating it in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50 to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-raising speed not exceeding 50.degree. C./minute, then, slowly heating it up to a temperature higher by 10 to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and cooling after maintaining at the above temperature.
摘要翻译：密度为2.0〜2.18g / cm 3的不透明二氧化硅玻璃，二氧化硅玻璃中的钠和钾元素浓度为0.5ppm以下，OH基浓度为30ppm以下，并且含有具有以下的独立气泡的气泡物理值：气泡直径为300μm以下，气泡密度为100,000〜1,000,000个气泡/ cm 3，以及不透明石英玻璃的制造方法，其特征在于，填充粒径为10〜350μm的石英原料粒子在耐热模具中，将其在非氧化性气氛中从室温加热到低于50-150℃的温度，而不是以不升温速度将上述原料颗粒熔化的温度超过50℃/分钟，然后缓慢加热至高于10℃至80℃的温度，高于石英原料颗粒以10℃/分钟或更低的速度熔化的温度，并保持冷却在上述温度下。

2. 发明授权

US5772714A Process for producing opaque silica glass 失效
标题翻译：生产不透明石英玻璃的方法
公开(公告)号：US5772714A
公开(公告)日：1998-06-30
申请号：US682962
申请日：1996-07-18
申请人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
发明人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
IPC分类号： C03B5/02 , C03B5/08 , C03B19/09 , C03B20/00 , C03C3/06
CPC分类号： C03B5/08 , C03B19/09 , C03B20/00 , C03B5/021 , C03C3/06 , C03C2201/02 , C03C2201/80 , Y10S501/904 , Y10S501/905 , Y10T428/249969
摘要： A process for producing opaque silica glass in which a quartz raw material grain having a particle size of 10 to 350 .mu.m is filled into a heat resistant mold, the quartz raw material grain is heated in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50.degree. to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-increase speed not exceeding 50.degree. C./minute, then, slowly heated up to a temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and the heated quartz raw material grain is further maintained at the temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted, followed by cooling down to the room temperature. Especially, in the case of producing a large scale opaque silica glass block, a quartz raw material grain filled into a heat-resistant mold is heated by a belt-like heating source located perpendicularly to a trunk of a filling layer of the quartz raw material grain so as to form a moving heating zone in the filling layer and the heating zone is successively moved either upwardly starting at the lower end portion of the filling layer or downwardly starting at the upper end portion thereof in a non-oxidizing atomosphere.
摘要翻译：将具有10〜350μm粒径的石英原料颗粒填充到耐热性模具中的不透明石英玻璃的制造方法，将石英原料颗粒从室温下在非氧化性气氛中加热比上述原料颗粒以不超过50℃/分钟的升温速度熔化的温度低于50℃至150℃的温度，然后缓慢加热至高于10℃的温度相对于石英原料粒子以10℃/分钟以下的速度熔融的温度为80℃以下，加热的石英原料粒子进一步保持在10〜80℃ 比石英原料晶粒熔化的温度高，然后冷却至室温。特别是，在生产大型不透明石英玻璃块的情况下，填充在耐热性模具中的石英原料颗粒通过垂直于石英原料填充层的树干的带状加热源加热从而在填充层中形成移动的加热区域，并且加热区域从填充层的下端部开始向上移动，或者从非氧化性空气的上端向下移动。

3. 再颁专利

USRE41249E1 Quartz glass body having improved resistance against plasma corrosion, and method for production thereof 有权
标题翻译：具有改善的耐等离子体腐蚀性的石英玻璃体及其制造方法
公开(公告)号：USRE41249E1
公开(公告)日：2010-04-20
申请号：US11633136
申请日：2006-11-30
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
IPC分类号： B32B15/00
CPC分类号： C30B31/14 , C03B19/01 , C03B19/066 , C03B19/1453 , C03B20/00 , C03B32/00 , C03B2201/30 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/32 , C30B25/12 , C30B35/00 , Y10T428/24496 , Y10T428/26 , Y10T428/315
摘要： An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.
摘要翻译：本发明的目的是提供一种石英玻璃体，特别是用于制造具有优异的耐等离子体腐蚀性的半导体的等离子体反应用石英玻璃夹具，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。提供由含有金属元素并具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 3小于100mm 2的投影面积表示的量的气泡和结晶相。

4. 发明授权

US06887576B2 Quartz glass body having improved resistance against plasma corrosion, and method for production thereof 有权
标题翻译：具有改善的耐等离子体腐蚀性的石英玻璃体及其制造方法
公开(公告)号：US06887576B2
公开(公告)日：2005-05-03
申请号：US09935334
申请日：2001-08-22
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
IPC分类号： C03B19/01 , C03B19/06 , C03B19/14 , C03B32/00 , C03C1/00 , C03C3/06 , C03C21/00 , C03C23/00 , C30B25/12 , C30B31/14 , B32B17/06 , B32B9/00
CPC分类号： C30B31/14 , C03B19/01 , C03B19/066 , C03B19/1453 , C03B20/00 , C03B32/00 , C03B2201/30 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/32 , C30B25/12 , C30B35/00 , Y10T428/24496 , Y10T428/26 , Y10T428/315
摘要： An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.
摘要翻译：本发明的目的是提供一种石英玻璃体，特别是用于制造具有优异的耐等离子体腐蚀性的半导体的等离子体反应用石英玻璃夹具，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。提供了由含有金属元素并且具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 2小于100mm 2的投影面积表示的量的气泡和结晶相， SUP> 3 。

5. 发明授权

US5523266A Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
标题翻译：用于准分子激光的合成石英玻璃的光学元件及其制造方法
公开(公告)号：US5523266A
公开(公告)日：1996-06-04
申请号：US286538
申请日：1994-08-05
申请人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
发明人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , G03F7/20 , C03B20/00
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03C3/06 , G03F7/70958 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , Y02P40/57 , Y10S501/90 , Y10S65/08
摘要： A synthetic quartz glass optical member for an ultraviolet laser, where the quartz glass has a hydroxyl content of 10-100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less.
摘要翻译：一种用于紫外线激光的合成石英玻璃光学构件，其中石英玻璃的羟基含量为10-100ppm，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性在DELTA n方面为5×10 -6以下，双折射为5nm / cm以下。

6. 发明授权

US5364433A Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
标题翻译：用于准分子激光的合成石英玻璃的光学元件及其制造方法
公开(公告)号：US5364433A
公开(公告)日：1994-11-15
申请号：US977397
申请日：1993-05-15
申请人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
发明人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , G03F7/20
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03C3/06 , G03F7/70958 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , Y02P40/57 , Y10S501/90 , Y10S65/08
摘要： A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1.times.10.sup.-2 Torr or above to a temperature of 1,400 .degree. C. or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at last one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.
摘要翻译： PCT No.PCT / JP92 / 00821 Sec。 371日期1993年3月15日 102（e）1993年3月15日PCT提交1992年6月29日PCT公布。公开号WO93 / 00307 日期：1993年1月7日。一种用于紫外线激光的合成石英玻璃光学元件，适用于使用准分子激光束和其它光学部件的平版印刷机的步进透镜，其中石英玻璃的羟基含量为10〜100ppm ，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性为DELTA n为5×10 -6以下，双折射为5nm / cm以下。光学构件可以通过使挥发性硅化合物用氢氧焰火焰水解，将形成的颗粒二氧化硅沉积在耐热载体上以制备多孔二氧化硅基质来制造，在高达1×10 -2乇的真空中加热基质以上至1400℃以上的温度进行脱水脱气，将得到的透明石英玻璃均匀化成最后一个方向不含条纹的高度均匀的石英玻璃，成型高度均匀的石英玻璃，退火成型玻璃。

7. 发明授权

US5876473A Method of producing cristobalite containing silica glass 失效
标题翻译：生产含方石英的石英玻璃的方法
公开(公告)号：US5876473A
公开(公告)日：1999-03-02
申请号：US727552
申请日：1996-10-25
申请人： Kyoichi Inaki , Tohru Segawa , Nobumasa Yoshida , Mamoru Endo
发明人： Kyoichi Inaki , Tohru Segawa , Nobumasa Yoshida , Mamoru Endo
IPC分类号： C03B20/00 , C03B32/02 , C03C3/06 , C03C14/00 , C03B5/00 , C03C10/14
CPC分类号： C03C14/004 , C03B20/00 , C03B32/02 , C03C3/06 , C03C2201/02 , C03C2201/80 , C03C2214/20 , C03C2214/30
摘要： Cristobalite-containing silica glass is provided wherein .alpha.-cristobalite in the shape of a small sphere or a small, round-edged or sharp-edged, three-dimensional region is dispersed in the silica glass matrix. The diameter of each .alpha.-cristobalite sphere or region is, in the range of 0.1 um to 1000 um, and the content of the .alpha.-cristobalite is at least 10 wt. %. The cristobalite-containing silica glass is produced by heating a mixture of two kinds or more of crystalline silicon dioxide powder with melting points different from each other by 20.degree. C. or more. The mixture contains silicon dioxide having the highest melting point in the range of 10 wt. % to 80 Wt. % and is heated at temperatures ranging from the lowest melting point to a temperature lower than the highest melting point.
摘要翻译： PCT No.PCT / EP96 / 00794 Sec。 371日期1996年10月25日第 102（e）日期1996年10月25日PCT 1996年2月27日PCT公布。公开号WO96 / 26908 日本1996年9月6日提供了含方石英的二氧化硅玻璃，其中将小球形或小圆形边缘或锐边三维区域形成的α-方英石分散在石英玻璃基质中。每个α-方解石球体或区域的直径在0.1μm至1000μm的范围内，并且α-方英石的含量为至少10wt。％。通过将两种以上的结晶二氧化硅粉末的熔点彼此不同的混合物加热20℃以上来制造含方石英的石英玻璃。该混合物含有熔点最高在10wt。％范围内的二氧化硅。至80 Wt。并且在从最低熔点到低于最高熔点的温度的温度下加热。

8. 发明申请

US20110232847A1 QUARTZ GLASS MEMBER FOR PLASMA ETCHING 审中-公开
标题翻译：用于等离子体蚀刻的QUARTZ玻璃成员
公开(公告)号：US20110232847A1
公开(公告)日：2011-09-29
申请号：US12671903
申请日：2008-07-24
申请人： Tatsuhiro Sato , Kyoichi Inaki
发明人： Tatsuhiro Sato , Kyoichi Inaki
IPC分类号： H01L21/683 , C23F1/08
CPC分类号： C03B19/01 , C03B2201/30 , C03B2201/34 , C03B2201/36 , C03B2201/40 , C03B2201/54 , C03C3/06 , C03C2201/36 , H01L21/67069 , H01L21/68757 , Y02P40/57
摘要： Provided is a doped quartz glass member for plasma etching, which is used in a plasma etching process and is free from any problematic fluoride accumulation during use. The quartz glass member for plasma etching is used as a jig for semiconductor production in a plasma etching process, and includes at least two or more kinds of metal elements in a total amount of 0.01 wt % or more to less than 0.1 wt %, in which the metal elements are formed of at least one kind of a first metal element selected from metal elements belonging to Group 3B of the periodic table and at least one kind of a second metal element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.
摘要翻译：提供了用于等离子体蚀刻的掺杂石英玻璃构件，其用于等离子体蚀刻工艺中，并且在使用期间没有任何有问题的氟化物积聚。用于等离子体蚀刻的石英玻璃构件用作等离子体蚀刻工艺中的半导体制造的夹具，并且包括总量为0.01重量％以上至小于0.1重量％的至少两种以上的金属元素，金属元素由选自属于周期表第3B族的金属元素中的至少一种第一金属元素和选自Mg，Ca，Sr等的至少一种第二金属元素形成， Ba，Sc，Y，Ti，Zr，Hf，镧系元素和锕系元素。

9. 发明授权

US07645526B2 Member for plasma etching device and method for manufacture thereof 有权
标题翻译：等离子体蚀刻装置的构件及其制造方法
公开(公告)号：US07645526B2
公开(公告)日：2010-01-12
申请号：US10546798
申请日：2003-09-16
申请人： Kyoichi Inaki , Itsuo Araki
发明人： Kyoichi Inaki , Itsuo Araki
IPC分类号： B32B9/00 , B32B19/00 , C03C3/04 , C03C3/06 , C04B35/50
CPC分类号： C23C26/00 , C23C4/11 , C23C4/18 , C23C30/00 , H01J37/32477 , H01L21/67069
摘要： A member for a plasma etching device, comprising a coating film of yttrium oxide or YAG having a coating film thickness of 10 μm or more, a coating film thickness variance of 15% or less, preferably a surface roughness (Ra) of 1 μm or less, formed on a surface of a member, comprising quartz glass which contains 1 to 10% by weight of yttrium oxide or YAG. The member for a plasma etching device has high plasma resistance, is not subjected to an abnormal etching on the basis of a partial change of electric properties and, accordingly, can be used for a long period of time. Even when the member is large enough to handle 12-inch Si wafers, the above-described advantageous properties are maintained and the member can be used for a long period of time.
摘要翻译：一种用于等离子体蚀刻装置的构件，其包括涂覆膜厚度为10μm或更大，涂膜厚度变化为15％或更小，优选表面粗糙度（Ra）为1μm或更大的氧化钇涂层或YAG涂层，或较少，形成在构件的表面上，包括含有1-10重量％的氧化钇或YAG的石英玻璃。用于等离子体蚀刻装置的构件具有高等离子体电阻，不会基于电性能的部分变化而进行异常蚀刻，因此可以长时间使用。即使当该构件足够大以处理12英寸Si晶片时，仍保持上述有利的特性，并且该构件可以长时间使用。

10. 发明授权

US5086352A Optical members and blanks or synthetic silica glass and method for their production 失效
标题翻译：光学成员和空白或合成二氧化硅玻璃及其生产方法
公开(公告)号：US5086352A
公开(公告)日：1992-02-04
申请号：US535205
申请日：1990-06-08
申请人： Shigeru Yamagata , Kyoichi Inaki , Toshikatu Matsuya , Ralf Takke , Stephan Thomas , Heinz Fabian
发明人： Shigeru Yamagata , Kyoichi Inaki , Toshikatu Matsuya , Ralf Takke , Stephan Thomas , Heinz Fabian
IPC分类号： C03B19/14 , C03B32/00 , C03C3/06 , C03C23/00 , G02B1/00 , G03F7/20
CPC分类号： G03F7/70241 , C03B19/1423 , C03B19/1453 , C03B32/00 , C03C23/007 , C03C3/06 , G02B1/00 , C03B2201/07 , C03B2201/21 , C03B2201/23 , C03B2207/06 , C03B2207/08 , C03B2207/12 , C03B2207/14 , C03B2207/20 , C03B2207/32 , C03B2207/36 , C03B2207/42 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/54 , Y02P40/57 , Y10S65/90
摘要： The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.
摘要翻译：本发明涉及经受大约360nm或更小的波长的大功率紫外光的透镜，棱镜或其它光学构件，或者电离辐射，特别是用于光刻的激光曝光装置的光学构件，以及用于这种光学构件。当光学元件长时间暴露于来自激光束的短波长紫外光时，折射率分布的均匀性和光学劣化的抵抗性得到改善。光学构件由含有至少约50重量％的高纯度合成石英玻璃材料制成。 ppm的OH基团，并掺杂氢气。在根据本发明的用于制造用于光学部件的高纯度二氧化硅玻璃毛坯的过程中由热处理期间的假想温度分布引起的折射率分布由由OH基浓度分布或由OH基浓度分布确定的组合折射率分布或由玻璃中的OH基浓度分布和Cl浓度分布。

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