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1. 发明授权

US5523266A Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
标题翻译：用于准分子激光的合成石英玻璃的光学元件及其制造方法
公开(公告)号：US5523266A
公开(公告)日：1996-06-04
申请号：US286538
申请日：1994-08-05
申请人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
发明人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , G03F7/20 , C03B20/00
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03C3/06 , G03F7/70958 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , Y02P40/57 , Y10S501/90 , Y10S65/08
摘要： A synthetic quartz glass optical member for an ultraviolet laser, where the quartz glass has a hydroxyl content of 10-100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less.
摘要翻译：一种用于紫外线激光的合成石英玻璃光学构件，其中石英玻璃的羟基含量为10-100ppm，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性在DELTA n方面为5×10 -6以下，双折射为5nm / cm以下。

2. 发明授权

US5364433A Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
标题翻译：用于准分子激光的合成石英玻璃的光学元件及其制造方法
公开(公告)号：US5364433A
公开(公告)日：1994-11-15
申请号：US977397
申请日：1993-05-15
申请人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
发明人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , G03F7/20
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03C3/06 , G03F7/70958 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , Y02P40/57 , Y10S501/90 , Y10S65/08
摘要： A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1.times.10.sup.-2 Torr or above to a temperature of 1,400 .degree. C. or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at last one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.
摘要翻译： PCT No.PCT / JP92 / 00821 Sec。 371日期1993年3月15日 102（e）1993年3月15日PCT提交1992年6月29日PCT公布。公开号WO93 / 00307 日期：1993年1月7日。一种用于紫外线激光的合成石英玻璃光学元件，适用于使用准分子激光束和其它光学部件的平版印刷机的步进透镜，其中石英玻璃的羟基含量为10〜100ppm ，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性为DELTA n为5×10 -6以下，双折射为5nm / cm以下。光学构件可以通过使挥发性硅化合物用氢氧焰火焰水解，将形成的颗粒二氧化硅沉积在耐热载体上以制备多孔二氧化硅基质来制造，在高达1×10 -2乇的真空中加热基质以上至1400℃以上的温度进行脱水脱气，将得到的透明石英玻璃均匀化成最后一个方向不含条纹的高度均匀的石英玻璃，成型高度均匀的石英玻璃，退火成型玻璃。

3. 发明授权

US6094941A Process for manufacturing optical member for excimer laser 失效
标题翻译：准分子激光用光学元件的制造方法
公开(公告)号：US6094941A
公开(公告)日：2000-08-01
申请号：US115741
申请日：1998-07-15
申请人： Akira Fujinoki , Toshikatsu Matsuya , Hiroyuki Nishimura
发明人： Akira Fujinoki , Toshikatsu Matsuya , Hiroyuki Nishimura
IPC分类号： C03B19/14 , C03C3/06 , C03C15/00 , C03B27/012 , C03B37/00 , C03B37/01 , C03B37/018
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/21 , C03B2207/32 , C03C2201/21 , C03C2203/40 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： An excellent quartz glass optical member having stable laser beam resistance, can be obtained by preparing quartz glass in a process having:a first step of subjecting a starting material obtained from silicon halide, alkoxysilane, alkylalkoxysilane, etc. to an oxidizing heat treatment in a temperature range between 600 and 1,500.degree. C., to decrease the hydrogen concentration to 5.times.10.sup.16 molecules/cm.sup.3 or less and at the same time eliminate reducing defects;a second step of subsequently holding the quartz in a hydrogen-containing atmosphere in a temperature range between 200 and 600.degree. C., to establish a hydrogen concentration in the glass of 1.times.10.sup.17 molecules/cm.sup.3 ; anda third step of carrying out a treatment of making the hydrogen concentration of the resultant quartz glass uniform in an atmosphere of air, inert gas, hydrogen, a mixture of hydrogen and inert gas, or a mixture of air and inert gas in a temperature range between 300 and 800.degree. C.
摘要翻译：具有稳定的激光束电阻的优良的石英玻璃光学部件可以通过以下工序制备石英玻璃得到：第一步是将由卤化硅，烷氧基硅烷，烷基烷氧基硅烷等获得的原料进行氧化热处理温度范围为600〜1500℃，将氢浓度降低至5×1016分子/ cm3以下，同时消除了缺陷; 随后在200℃至600℃的温度范围内将石英保持在含氢气氛中，以在玻璃中形成1×10 17分子/ cm 3的氢浓度; 以及在空气，惰性气体，氢气，氢气和惰性气体的混合物或空气和惰性气体的混合物的温度下进行使所得石英玻璃的氢浓度均匀的处理的第三步骤范围在300和800℃之间

4. 再颁专利

USRE41249E1 Quartz glass body having improved resistance against plasma corrosion, and method for production thereof 有权
标题翻译：具有改善的耐等离子体腐蚀性的石英玻璃体及其制造方法
公开(公告)号：USRE41249E1
公开(公告)日：2010-04-20
申请号：US11633136
申请日：2006-11-30
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
IPC分类号： B32B15/00
CPC分类号： C30B31/14 , C03B19/01 , C03B19/066 , C03B19/1453 , C03B20/00 , C03B32/00 , C03B2201/30 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/32 , C30B25/12 , C30B35/00 , Y10T428/24496 , Y10T428/26 , Y10T428/315
摘要： An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.
摘要翻译：本发明的目的是提供一种石英玻璃体，特别是用于制造具有优异的耐等离子体腐蚀性的半导体的等离子体反应用石英玻璃夹具，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。提供由含有金属元素并具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 3小于100mm 2的投影面积表示的量的气泡和结晶相。

5. 发明授权

US06887576B2 Quartz glass body having improved resistance against plasma corrosion, and method for production thereof 有权
标题翻译：具有改善的耐等离子体腐蚀性的石英玻璃体及其制造方法
公开(公告)号：US06887576B2
公开(公告)日：2005-05-03
申请号：US09935334
申请日：2001-08-22
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Akira Fujinoki , Kyoichi Inaki , Tomoyuki Shirai
IPC分类号： C03B19/01 , C03B19/06 , C03B19/14 , C03B32/00 , C03C1/00 , C03C3/06 , C03C21/00 , C03C23/00 , C30B25/12 , C30B31/14 , B32B17/06 , B32B9/00
CPC分类号： C30B31/14 , C03B19/01 , C03B19/066 , C03B19/1453 , C03B20/00 , C03B32/00 , C03B2201/30 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/32 , C30B25/12 , C30B35/00 , Y10T428/24496 , Y10T428/26 , Y10T428/315
摘要： An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.
摘要翻译：本发明的目的是提供一种石英玻璃体，特别是用于制造具有优异的耐等离子体腐蚀性的半导体的等离子体反应用石英玻璃夹具，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。提供了由含有金属元素并且具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 2小于100mm 2的投影面积表示的量的气泡和结晶相， SUP> 3 。

6. 发明授权

US5977000A High purity opaque silica glass 失效
标题翻译：高纯度不透明石英玻璃
公开(公告)号：US5977000A
公开(公告)日：1999-11-02
申请号：US977887
申请日：1997-11-25
申请人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
发明人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
IPC分类号： C03B5/02 , C03B5/08 , C03B19/09 , C03B20/00 , C03C3/06 , C03C4/08 , C03C11/00
CPC分类号： C03B5/08 , C03B19/09 , C03B20/00 , C03B5/021 , C03C3/06 , C03C2201/02 , C03C2201/80 , Y10S501/904 , Y10S501/905 , Y10T428/249969
摘要： Opaque silica glass having a density of 2.0 to 2.18 g/cm.sup.3, sodium and potassium elements concentrations in the silica glass of each 0.5 ppm or less and an OH group concentration of 30 ppm or less, and containing bubbles which are independent bubbles having the following physical values: a bubble diameter of 300 .mu.m or less, and a bubble density of 100,000 to 1,000,000 bubbles/cm.sup.3, and a production process for opaque silica glass, including: filling quartz raw material grain having a particle size of 10 to 350 .mu.m in a heat resistant mold, heating it in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50 to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-raising speed not exceeding 50.degree. C./minute, then, slowly heating it up to a temperature higher by 10 to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and cooling after maintaining at the above temperature.
摘要翻译：密度为2.0〜2.18g / cm 3的不透明二氧化硅玻璃，二氧化硅玻璃中的钠和钾元素浓度为0.5ppm以下，OH基浓度为30ppm以下，并且含有具有以下的独立气泡的气泡物理值：气泡直径为300μm以下，气泡密度为100,000〜1,000,000个气泡/ cm 3，以及不透明石英玻璃的制造方法，其特征在于，填充粒径为10〜350μm的石英原料粒子在耐热模具中，将其在非氧化性气氛中从室温加热到低于50-150℃的温度，而不是以不升温速度将上述原料颗粒熔化的温度超过50℃/分钟，然后缓慢加热至高于10℃至80℃的温度，高于石英原料颗粒以10℃/分钟或更低的速度熔化的温度，并保持冷却在上述温度下。

7. 发明授权

US5772714A Process for producing opaque silica glass 失效
标题翻译：生产不透明石英玻璃的方法
公开(公告)号：US5772714A
公开(公告)日：1998-06-30
申请号：US682962
申请日：1996-07-18
申请人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
发明人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
IPC分类号： C03B5/02 , C03B5/08 , C03B19/09 , C03B20/00 , C03C3/06
CPC分类号： C03B5/08 , C03B19/09 , C03B20/00 , C03B5/021 , C03C3/06 , C03C2201/02 , C03C2201/80 , Y10S501/904 , Y10S501/905 , Y10T428/249969
摘要： A process for producing opaque silica glass in which a quartz raw material grain having a particle size of 10 to 350 .mu.m is filled into a heat resistant mold, the quartz raw material grain is heated in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50.degree. to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-increase speed not exceeding 50.degree. C./minute, then, slowly heated up to a temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and the heated quartz raw material grain is further maintained at the temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted, followed by cooling down to the room temperature. Especially, in the case of producing a large scale opaque silica glass block, a quartz raw material grain filled into a heat-resistant mold is heated by a belt-like heating source located perpendicularly to a trunk of a filling layer of the quartz raw material grain so as to form a moving heating zone in the filling layer and the heating zone is successively moved either upwardly starting at the lower end portion of the filling layer or downwardly starting at the upper end portion thereof in a non-oxidizing atomosphere.
摘要翻译：将具有10〜350μm粒径的石英原料颗粒填充到耐热性模具中的不透明石英玻璃的制造方法，将石英原料颗粒从室温下在非氧化性气氛中加热比上述原料颗粒以不超过50℃/分钟的升温速度熔化的温度低于50℃至150℃的温度，然后缓慢加热至高于10℃的温度相对于石英原料粒子以10℃/分钟以下的速度熔融的温度为80℃以下，加热的石英原料粒子进一步保持在10〜80℃ 比石英原料晶粒熔化的温度高，然后冷却至室温。特别是，在生产大型不透明石英玻璃块的情况下，填充在耐热性模具中的石英原料颗粒通过垂直于石英原料填充层的树干的带状加热源加热从而在填充层中形成移动的加热区域，并且加热区域从填充层的下端部开始向上移动，或者从非氧化性空气的上端向下移动。

8. 发明授权

US07312170B2 Optical synthetic quartz glass and method for producing the same 有权
标题翻译：光学合成石英玻璃及其制造方法
公开(公告)号：US07312170B2
公开(公告)日：2007-12-25
申请号：US10548237
申请日：2004-03-03
申请人： Hiroyuki Nishimura , Akira Fujinoki
发明人： Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03C3/06 , C03B37/07 , C03B37/075 , C03B37/018
CPC分类号： C03B32/00 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C2201/12 , C03C2201/23 , C03C2203/40 , C03C2203/42 , Y02P40/57
摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.
摘要翻译：本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化能量密度，例如每个脉冲的能量密度为0.3mJ / cm 2以下。本发明还提供一种制造该方法的方法。为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

9. 发明授权

US07007510B2 Method of producing an optical member 有权
标题翻译：光学构件的制造方法
公开(公告)号：US07007510B2
公开(公告)日：2006-03-07
申请号：US10731186
申请日：2003-12-09
申请人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura , Martin Trommer , Stefan Ochs
发明人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura , Martin Trommer , Stefan Ochs
IPC分类号： C03C23/00
CPC分类号： C03C23/007 , C03B19/1453 , C03B32/00 , Y10T428/131 , Y10T428/24612
摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.
摘要翻译：本发明的目的是提供一种改进的坯料，使得可以获得高均匀性的光学构件，并提供用于热处理高度均匀的合成石英坯的容器和热处理方法。在本发明的第一方面，提供了一种特殊设计的坯件，其显示出凹形外表面。在本发明的第二方面，提供了一种用于热处理坯料的特殊设计容器，由此将中心处的发热度设定为高于周围环境的热量。

10. 发明授权

US06810687B2 Method for producing synthetic quartz glass members for excimer lasers 有权
标题翻译：用于准分子激光的合成石英玻璃构件的制造方法
公开(公告)号：US06810687B2
公开(公告)日：2004-11-02
申请号：US10076034
申请日：2002-02-13
申请人： Hiroyuki Nishimura , Toru Yokota , Akira Fujinoki
发明人： Hiroyuki Nishimura , Toru Yokota , Akira Fujinoki
IPC分类号： C03C2100
CPC分类号： G03F7/70958 , C03B19/1453 , C03B2201/21 , C03C3/06 , C03C2201/21 , C03C2203/54 , Y02P40/57
摘要： In the light of the disadvantages of the prior art technology, an object of the present invention is to provide a method for producing a synthetic quartz glass member for excimer lasers, which comprises, while suppressing the generation of reductive defects which impairs the resistance against laser radiations, incorporating a sufficient amount of hydrogen molecules capable of achieving a high resistance against laser radiation into the quartz glass, yet uniformly incorporating the hydrogen molecules to realize a flat distribution in refractive indices attributed to the distribution in the density of hydrogen molecules. It is also an object of the present invention to provide a synthetic quartz glass member for excimer lasers obtained by the production method above, which yields high resistance against laser radiations and homogeneity. The above problems have been overcome by a method for producing a synthetic quartz glass member for excimer lasers, which, in a method for producing a synthetic quartz glass member for excimer laser optics comprising a step of incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body at a temperature of 600° C. or lower under an atmosphere in a pressure range of 1 atm or higher but lower than 150 atm and containing hydrogen, said method comprises varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of the heat treatment.
摘要翻译：鉴于现有技术的缺点，本发明的一个目的是提供一种制造用于准分子激光器的合成石英玻璃构件的方法，该方法包括在抑制减少激光器抗性的还原性缺陷的产生的同时，将足够量的能够实现激光辐射的高分子氢分子掺入到石英玻璃中，同时均匀地掺入氢分子以实现归因于氢分子密度分布的折射率的平坦分布。本发明的另一个目的是提供一种通过上述制造方法获得的用于准分子激光器的合成石英玻璃构件，其产生高的抗激光辐射和均匀性。上述问题已经通过用于制造用于准分子激光器的合成石英玻璃构件的方法得到克服，该方法在用于准分子激光光学器件的合成石英玻璃构件的制造方法中包括通过以下步骤将氢分子掺入合成石英玻璃体中：在1atm以上但低于150atm的压力范围的气氛中在600℃以下的温度下对合成石英玻璃体进行热处理，并含有氢，所述方法包括改变含氢气体的压力在热处理的至少一部分中连续地或逐步地。

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