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    • 1. 发明授权
    • Decoupling capacitors for thin gate oxides
    • 薄栅氧化物去耦电容器
    • US06828638B2
    • 2004-12-07
    • US09469406
    • 1999-12-22
    • Ali KeshavarziVivek K. DeTanay KarnikRajendran Nair
    • Ali KeshavarziVivek K. DeTanay KarnikRajendran Nair
    • H01L2976
    • H01L27/0805H01L29/94H01L2924/0002H01L2924/00
    • In some embodiments, the invention involves a die having a first conductor carrying a power supply voltage and a second conductor carrying a ground voltage. A semiconductor capacitor operating in depletion mode is coupled between the first and second conductors to provide decoupling capacitance between the first and second conductors, the semiconductor capacitor having a gate voltage. Various configurations may be used including: n+ gate poly and n+ source/drain regions in an n-body; p+ gate poly and n+ source/drain regions in an n-body; p+ gate poly and p+ source/drain regions in an n-body; p+ gate poly and p+ source/drain regions in a p-body; n+ gate poly and p+ source/drain regions in a p-body; n+ gate poly and n+ source/drain regions in a p-body. The power supply voltage may have a larger absolute value than does a flatband voltage.
    • 在一些实施例中,本发明涉及具有承载电源电压的第一导体和承载接地电压的第二导体的管芯。 以耗尽模式工作的半导体电容器耦合在第一和第二导体之间,以在第一和第二导体之间提供去耦电容,半导体电容器具有栅极电压。 可以使用各种构造,包括:n体中的n +栅极多晶硅和n +源极/漏极区域; p +栅极多晶硅和n +源极/漏极区域; p +栅极poly和p +源极/漏极区域在n体中; p体中的p +栅极多晶硅和p +源极/漏极区域; p体中的n +栅极多晶硅和p +源极/漏极区域; p体中的n +栅极多晶硅和n +源极/漏极区域。 电源电压可能比平带电压具有更大的绝对值。
    • 3. 发明授权
    • Method and apparatus for weak inversion mode MOS decoupling capacitor
    • 弱反转模式MOS去耦电容器的方法和装置
    • US06849909B1
    • 2005-02-01
    • US09677698
    • 2000-09-28
    • Rajendran NairSiva G. NarendraTanay KarnikVivek K. De
    • Rajendran NairSiva G. NarendraTanay KarnikVivek K. De
    • H01L27/08H01L31/119H01L29/088H01L29/90
    • H01L27/0811Y10S257/901
    • A method and apparatus for providing a weak inversion mode metal-oxide-semiconductor (MOS) decoupling capacitor is described. In one embodiment, an enhancement-mode p-channel MOS (PMOS) transistor is constructed with a gate material whose work function differs from that commonly used. In one exemplary embodiment, platinum silicate (PtSi) is used. In alternate embodiments, the threshold voltage of the PMOS transistor may be changed by modifying the dopant levels of the substrate. In either embodiment the flat band magnitude of the transistor is shifted by the change in materials used to construct the transistor. When such a transistor is connected with the gate lead connected to the positive supply voltage and the other leads connected to the negative (ground) supply voltage, an improved decoupling capacitor results.
    • 描述了用于提供弱反型模式金属氧化物半导体(MOS)去耦电容器的方法和装置。 在一个实施例中,增强型p沟道MOS(PMOS)晶体管由其功能与常用功能不同的栅极材料构成。 在一个示例性实施方案中,使用铂硅酸盐(PtSi)。 在替代实施例中,可以通过修改衬底的掺杂剂水平来改变PMOS晶体管的阈值电压。 在任一实施例中,晶体管的平带幅度偏移用于构造晶体管的材料的变化。 当这种晶体管与连接到正电源电压的栅极引线连接,而其他引线连接到负(接地)电源电压时,会产生改进的去耦电容。