专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6101237A X-ray mask and X-ray exposure method using the same 失效
标题翻译： X射线掩模和使用其的X射线曝光方法
公开(公告)号：US6101237A
公开(公告)日：2000-08-08
申请号：US917854
申请日：1997-08-27
申请人： Takeshi Miyachi , Keiko Chiba , Hiroshi Osawa , Koichi Sentoku , Hiroshi Maehara
发明人： Takeshi Miyachi , Keiko Chiba , Hiroshi Osawa , Koichi Sentoku , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F1/62 , G03F7/20 , G21K1/10 , G21K5/00
CPC分类号： G03F1/22 , G03F1/62 , G03F7/70691 , G21K1/10
摘要： An X-ray mask includes a holding frame, a membrane held by the holding frame, a pattern formed on a surface of the membrane by an X-ray absorptive material, the surface being disposed opposed to a workpiece to which the pattern is to be transferred when the mask is mounted in an exposure apparatus, a member for reinforcing the holding frame and having a portion placed closer to the workpiece than to the membrane and a pellicle provided at a side where the pattern is formed, the pellicle being attached to the portion of the member so that the pellicle is placed at the workpiece side of the membrane.
摘要翻译： X射线掩模包括保持框架，由保持框架保持的膜，通过X射线吸收材料形成在膜的表面上的图案，该表面设置成与图案所在的工件相对当掩模安装在曝光装置中时转印，用于加强保持框架并且具有比膜更靠近工件的部分的膜和设置在图案形成侧的防护薄膜组件，防护薄膜组件附接到部件，使防护薄膜组件放置在膜的工件侧。

2. 发明授权

US5585923A Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means 失效
标题翻译：在通过误差检测装置的误差检测的基础上校正误差的同时测量位置偏差的方法和装置
公开(公告)号：US5585923A
公开(公告)日：1996-12-17
申请号：US314444
申请日：1994-09-28
申请人： Noriyuki Nose , Takeshi Miyachi , Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
发明人： Noriyuki Nose , Takeshi Miyachi , Kenji Saitoh , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/70
摘要： A method and apparatus for measuring the relative positional deviation between first and second diffraction gratings formed on an object includes determining the relative positional deviation of the first and second diffraction gratings while detecting and correcting an error produced in relation to detection of the positional deviation of the first and second diffraction gratings.
摘要翻译：用于测量形成在物体上的第一和第二衍射光栅之间的相对位置偏差的方法和装置包括确定第一和第二衍射光栅的相对位置偏差，同时检测和校正相对于检测到的位置偏差的检测产生的误差第一和第二衍射光栅。

3. 发明授权

US5589304A Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond 失效
标题翻译：光掩模包括具有陶瓷氧化物键的保持框架和加强构件
公开(公告)号：US5589304A
公开(公告)日：1996-12-31
申请号：US404959
申请日：1995-03-16
申请人： Keiko Chiba , Takeshi Miyachi
发明人： Keiko Chiba , Takeshi Miyachi
IPC分类号： G03F1/22 , H01L21/027 , G03F9/00
CPC分类号： G03F1/22
摘要： Disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member comprises ceramics and wherein the reinforcing member and the holding frame are bonded to each other through a film oxide of the ceramics. Also disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member has a major constituent the same as that of the membrane.
摘要翻译：公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件包括陶瓷，并且其中加强构件和保持框通过陶瓷的氧化膜彼此接合。还公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件具有与膜的那个。

4. 发明授权

US5656398A Method of making X-ray mask structure 失效
标题翻译：制作X光掩模结构的方法
公开(公告)号：US5656398A
公开(公告)日：1997-08-12
申请号：US479358
申请日：1995-06-07
申请人： Takeshi Miyachi , Yasuaki Fukuda , Keiko Chiba
发明人： Takeshi Miyachi , Yasuaki Fukuda , Keiko Chiba
IPC分类号： G03F1/22 , G03F9/00
CPC分类号： G03F1/22
摘要： A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame. The method includes a step of patterning the X-ray absorber, including a drawing step that utilizes charged particles, and a step of thereafter providing the frame with a magnetic member. The frame and the support film each include a non-magnetic material.
摘要翻译：一种在由框架保持的支撑膜的表面上制造具有期望图案的X射线吸收体的X射线掩模结构的方法。该方法包括图案化X射线吸收体的步骤，包括利用带电粒子的拉伸步骤，以及此后向框架提供磁性部件的步骤。框架和支撑膜各自包括非磁性材料。

5. 发明授权

US5485495A X-ray mask, and exposure apparatus and device production using the mask 失效
标题翻译： X射线掩模，以及使用掩模的曝光装置和装置制造
公开(公告)号：US5485495A
公开(公告)日：1996-01-16
申请号：US286904
申请日：1994-08-08
申请人： Takeshi Miyachi , Nobutoshi Mizusawa , Shinichi Hara , Hiroshi Maehara
发明人： Takeshi Miyachi , Nobutoshi Mizusawa , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F7/20 , G21K5/04 , H01L21/027 , G21K5/00
CPC分类号： G03F1/22 , G03F7/70783 , G21K5/04
摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.
摘要翻译：制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。在两个步骤中，掩模基板保持由于翘曲量而获得的形状。由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。因此，提供了适合于非常精确的曝光的X射线掩模。

6. 发明授权

US5861603A Mask structure and method of making the same 失效
标题翻译：面膜结构及制作方法
公开(公告)号：US5861603A
公开(公告)日：1999-01-19
申请号：US884622
申请日：1997-06-27
申请人： Takeshi Miyachi , Hiroshi Maehara , Masatake Akaike
发明人： Takeshi Miyachi , Hiroshi Maehara , Masatake Akaike
IPC分类号： B23K26/32 , G03F1/22 , H01L21/027 , B23K26/00
CPC分类号： H01L21/0278 , G03F1/22
摘要： A method of manufacturing a mask in which laser radiation is projected to a mask substrate of silicon and a supporting frame of heat resisting glass, while a voltage of about 1000-10000 V is applied between the mask substrate and the supporting frame. Cooling water is caused to flow to suppress temperature rise due to the irradiation, to maintain the mask substrate and the supporting frame at a predetermined normal temperature (about the mask temperature in a lithographic pattern transfer process). The light projecting step is performed for a period not shorter than 10 minutes whereby anodic bonding of the mask substrate with the supporting frame is achieved. This prevents a shift of the mask pattern and/or deformation of the mask substrate, and it assures the manufacture of a high precision mask.
摘要翻译：制造掩模的方法，其中激光辐射投射到硅的掩模基板和耐热玻璃的支撑框架上，同时在掩模基板和支撑框架之间施加约1000-10000V的电压。导致冷却水流动以抑制由于照射引起的温度上升，从而将掩模基板和支撑框架保持在预定的常温（约为平版印刷图案转印工艺中的掩模温度）。光投射步骤进行不少于10分钟的时间，由此实现掩模基板与支撑框架的阳极接合。这防止了掩模图案的偏移和/或掩模基板的变形，并且确保了高精度掩模的制造。

7. 发明申请

US20070275493A1 METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE AND METHOD OF DIVIDING DEVICE 失效
标题翻译：制造图像显示装置的方法和分割装置的方法
公开(公告)号：US20070275493A1
公开(公告)日：2007-11-29
申请号：US11749310
申请日：2007-05-16
申请人： Takeshi Miyachi , Masaaki Furuya
发明人： Takeshi Miyachi , Masaaki Furuya
IPC分类号： H01L21/00
CPC分类号： G02F1/133351 , H01L21/78
摘要： A manufacturing method of manufacturing an image display device having a wiring and a display element electrically connected to the wiring, comprises a step of dividing a device having the wiring and a substrate holding the wiring, at a predetermined division position, and the dividing step further comprises a step of dividing the substrate at the predetermined division position, and a step of dividing the wiring at the predetermined division position. The step of dividing the wiring is executed in a method different from a method in the step of dividing the substrate. Thus, the device constituting the image display device can be suitably divided.
摘要翻译：一种制造具有布线的图像显示装置的制造方法和与布线电连接的显示元件，包括在预定分割位置分割具有布线的装置和保持布线的基板的步骤，以及分割步骤包括在预定分割位置分割基板的步骤，以及在预定分割位置分割布线的步骤。以与分割基板的步骤中的方法不同的方法执行分割布线的步骤。因此，可以适当地划分构成图像显示装置的装置。

8. 发明授权

US06258492B1 X-ray mask structure and method of making the same 有权
标题翻译： X射线掩模结构及其制作方法
公开(公告)号：US06258492B1
公开(公告)日：2001-07-10
申请号：US09383626
申请日：1999-08-26
申请人： Takeshi Miyachi
发明人： Takeshi Miyachi
IPC分类号： G03F900
CPC分类号： G03F1/22 , G03F7/70433
摘要： A method of producing a mask for use in lithography is disclosed, wherein a structure having a membrane and a mask substrate for supporting the membrane are prepared, while a pattern is to be formed on the membrane, wherein a force is applied to the structure so that distortion is produced in the membrane, and wherein a pattern is formed on the membrane with the force being applied to the membrane, whereby accurate magnification correction can be accomplished.
摘要翻译：公开了一种制造用于光刻的掩模的方法，其中制备具有用于支撑膜的膜和掩模基板的结构，同时在膜上形成图案，其中力施加到结构上在膜中产生变形，并且其中在膜上形成图案，其中力施加到膜上，由此可以实现精确的放大校正。

9. 发明授权

US5854819A Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same 失效
标题翻译：掩模支撑装置及其校正方法，以及利用其的曝光装置和装置的制造方法
公开(公告)号：US5854819A
公开(公告)日：1998-12-29
申请号：US797467
申请日：1997-02-06
申请人： Shinichi Hara , Takeshi Miyachi , Nobutoshi Mizusawa , Yuji Chiba , Kazuyuki Kasumi
发明人： Shinichi Hara , Takeshi Miyachi , Nobutoshi Mizusawa , Yuji Chiba , Kazuyuki Kasumi
IPC分类号： G03F7/20 , H01L21/30
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/708
摘要： There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.
摘要翻译：公开了一种掩模支撑装置，其包括用于支撑设置有其中形成有掩模图案的矩形窗口的掩模基板的卡盘机构和用于加强掩模基板的框架，以及用于将所述掩模，来自相互正交的方向的载荷。用于施加载荷的机构包括固定的参考，其接触在荫罩框架的外周上的两个位置，以及两个按压机构，用于从两个接触位置相对的两个方向向荫罩框架施加负载。

10. 发明授权

US06985208B2 Apparatus and method for retaining mirror, and mirror exchange method 失效
标题翻译：镜面保护装置及方法，镜面交换方法
公开(公告)号：US06985208B2
公开(公告)日：2006-01-10
申请号：US10661870
申请日：2003-09-11
申请人： Takeshi Miyachi , Akira Miyake
发明人： Takeshi Miyachi , Akira Miyake
IPC分类号： G03B27/42 , G02B5/08
CPC分类号： G03F7/70891 , G02B7/1815 , G02B7/182 , G03F7/70825
摘要： A mirror retainer for retaining a mirror accommodated in a chamber that has a wall and a lid openably provided on the wall, and generates a reduced pressure environment, includes an elastic member for connecting the mirror elastically to the lid.
摘要翻译：用于保持容纳在具有可开启地设置在壁上的壁和盖的反射镜的反射镜保持器中，并且产生减压环境，包括用于将镜子弹性地连接到盖的弹性构件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式