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1. 发明授权

US5448408A Projection lens system 失效
标题翻译：投影镜头系统
公开(公告)号：US5448408A
公开(公告)日：1995-09-05
申请号：US148351
申请日：1993-11-08
申请人： Takayoshi Togino , Yoshiko Tezuka
发明人： Takayoshi Togino , Yoshiko Tezuka
IPC分类号： G02B9/64 , G02B13/24 , G03F7/20 , G02B3/00
CPC分类号： G03F7/70216 , G02B13/24 , G02B9/64
摘要： This invention relates to a projection lens system used for transferring circuit or other patterns from masks, etc. on which the circuit patterns are drawn onto semiconductor wafers by projection photolithography, and provides a projection lens system which makes high resolving power of the order of a few micrometers and wide exposure coverages compatible with each other.This projection lens system includes at least two sets of lens groups, each built up of lenses having concave surfaces located opposite to each other, and includes at least one lens surface of positive refractive power between said two sets of lens groups, said two sets of lens groups all satisfying the following conditions:1/L
摘要翻译：本发明涉及一种投影透镜系统，该投影透镜系统用于通过投影光刻将电路图案从掩模等传送到半导体晶片上的电路或其他图案，并提供一种投影透镜系统，该投影透镜系统具有高分辨率几微米和宽的曝光量相互兼容。该投影透镜系统包括至少两组透镜组，每组透镜具有彼此相对的凹面的透镜，并且包括在所述两组透镜组之间的至少一个正屈光力透镜表面，所述两组透镜组镜头组满足以下条件：1 / L <| phi 1 <20 / L（1）1 / L <| phi 2 <20 / L（2）其中phi 1和phi 2代表所述相对定位的凹面的相应的负折光力，L是物体和图像之间的距离。

2. 发明授权

US5260832A Projection lens system 失效
标题翻译：投影镜头系统
公开(公告)号：US5260832A
公开(公告)日：1993-11-09
申请号：US780339
申请日：1991-10-22
申请人： Takayoshi Togino , Yoshiko Tezuka
发明人： Takayoshi Togino , Yoshiko Tezuka
IPC分类号： G02B9/64 , G02B13/24 , G03F7/20 , G02B9/60 , G02B9/62
CPC分类号： G03F7/70216 , G02B13/24 , G02B9/64
摘要： This invention relates to a projection lens system used for transferring circuit or other patterns from masks, etc. on which the circuit patterns are drawn onto semiconductor wafers by projection photolithography, and provides a projection lens system which makes high resolving power of the order of a few micrometers and wide exposure coverages compatible with each other. This projection lens system includes at least two sets of lens groups, each built up of lenses having concave surfaces located opposite to each other, and includes at least one lens surface of positive refractive power between said two sets of lens groups, said two sets of lens groups all satisfying the following conditions:(1) 1/L
摘要翻译：本发明涉及一种投影透镜系统，该投影透镜系统用于通过投影光刻将电路图案从掩模等传送到半导体晶片上的电路或其他图案，并提供一种投影透镜系统，该投影透镜系统具有高分辨率几微米和宽的曝光量相互兼容。该投影透镜系统包括至少两组透镜组，每组透镜具有彼此相对的凹面的透镜，并且包括在所述两组透镜组之间的至少一个正屈光力透镜表面，所述两组透镜组透镜组全部满足以下条件：（1）1 / L <| phi 1| <20 / L（2）1 / L <| phi 2| <20 / L其中phi 1和phi 2代表各自的负折射率所述相对定位的凹面的功率，L是物体与图像之间的距离。

3. 发明授权

US5170207A Projection lens system 失效
标题翻译：投影镜头系统
公开(公告)号：US5170207A
公开(公告)日：1992-12-08
申请号：US806126
申请日：1991-12-12
申请人： Yoshiko Tezuka , Keiichi Kuba
发明人： Yoshiko Tezuka , Keiichi Kuba
IPC分类号： G02B13/14 , G02B13/24 , G02B27/00 , G03F7/20
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24 , G02B27/0043 , G02B27/4211 , G02B27/4222
摘要： The present invention relates to a projection lens system well-fit for baking integrated circuit patterns onto silicon wafers using a light source having wavelengths ranging from an ultraviolet wavelength zone to a vacuum ultraviolet wavelength zone. This projection lens system is characterized by comprising a plurality of lens elements including a Fresnel lens element having negative dispersion characteristics, said Fresnel lens being located at a position lying somewhere in said projection lens system with the exception of the pupil thereof and satisfying the following condition:2h.sub.MAX /3.ltoreq.h.Here h.sub.MAX is the maximum height of a marginal ray in said projection lens system, and h is the height of a marginal ray at the position of said Fresnel lens.
摘要翻译：本发明涉及一种适用于使用波长范围从紫外线波长区域到真空紫外线波长区域的光源将集成电路图案烘烤在硅晶片上的投影透镜系统。该投影透镜系统的特征在于包括具有负色散特性的菲涅尔透镜元件的多个透镜元件，所述菲涅尔透镜位于除了其瞳孔之外的所述投影透镜系统的某处的位置，并且满足以下条件：2hMAX / 3

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