专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07368068B2 Sulfonic group-containing polyarylene block copolymer, process for production thereof, solid polymer electrolyte and proton conductive membrane 有权
标题翻译：含磺基的聚亚芳基嵌段共聚物，其制备方法，固体聚合物电解质和质子传导膜
公开(公告)号：US07368068B2
公开(公告)日：2008-05-06
申请号：US11212688
申请日：2005-08-29
申请人： Takashi Okada , Mayumi Shinoda , Kimihiko Yoshii , Yousuke Konno , Toshihiro Otsuki , Kohei Goto
发明人： Takashi Okada , Mayumi Shinoda , Kimihiko Yoshii , Yousuke Konno , Toshihiro Otsuki , Kohei Goto
IPC分类号： H01B1/00 , C08G8/02 , C08G61/02 , H01M6/18
CPC分类号： B01D71/80 , B01D71/52 , B01D71/66 , B01D71/68 , B01D71/72 , B01D71/82 , C08G61/12 , C08J5/2256 , C08J2365/00 , C08L65/00 , H01M8/1023 , H01M2300/0082 , Y02P70/56
摘要： The present invention provides a sulfonic group-containing polyarylene block copolymer superior to the perfluoroalkylsulfonic acid polymers in cost, conductive properties and proccessability, a process for producing the copolymer, a solid polymer electrolyte and a proton conductive membrane.The sulfonic group-containing polyarylene block copolymer includes a polymer segment with an ion conductive component represented by the formula (A) and at least one polymer segment without an ion conductive component represented by the formulae (B-1), (B-3) and the like and containing an aromatic ring bonded at the meta-positions or ortho-positions: wherein X is a single bond, —CO—, —SO2— or the like; W is a single bond, —CO—, —SO2— or the like; Q is a single bond, —O—, —S— or the like; J is a single bond, —CO—, —SO2— or the like; and R1 to R24 are each a hydrogen atom, a fluorine atom, an alkyl group or the like.
摘要翻译：本发明提供了一种在成本高，导电性和可加工性方面优于全氟烷基磺酸聚合物的含磺基聚亚芳基嵌段共聚物，制备共聚物的方法，固体聚合物电解质和质子传导膜。含有磺酸基的聚亚芳基嵌段共聚物包括具有由式（A）表示的离子传导性成分的聚合物链段和至少一个不具有由式（B-1），（B-3）表示的离子传导性成分的聚合物链段，并且含有在间位或邻位键合的芳环：其中X是单键，-CO - ， - SO 2 - 等; W是单键，-CO - ， - SO 2 - 等; Q是单键，-O - ， - S-等; J是单键，-CO - ， - SO 2 - 等; R 12和R 24各自为氢原子，氟原子，烷基等。

2. 发明申请

US20060043344A1 Sulfonic group-containing polyarylene block copolymer, process for production thereof, solid polymer electrolyte and proton conductive membrane 有权
标题翻译：含磺基的聚亚芳基嵌段共聚物，其制备方法，固体聚合物电解质和质子传导膜
公开(公告)号：US20060043344A1
公开(公告)日：2006-03-02
申请号：US11212688
申请日：2005-08-29
申请人： Takashi Okada , Mayumi Shinoda , Kimihiko Yoshii , Yousuke Konno , Toshihiro Otsuki , Kohei Goto
发明人： Takashi Okada , Mayumi Shinoda , Kimihiko Yoshii , Yousuke Konno , Toshihiro Otsuki , Kohei Goto
IPC分类号： H01B1/12
CPC分类号： B01D71/80 , B01D71/52 , B01D71/66 , B01D71/68 , B01D71/72 , B01D71/82 , C08G61/12 , C08J5/2256 , C08J2365/00 , C08L65/00 , H01M8/1023 , H01M2300/0082 , Y02P70/56
摘要： The present invention provides a sulfonic group-containing polyarylene block copolymer superior to the perfluoroalkylsulfonic acid polymers in cost, conductive properties and processability, a process for producing the copolymer, a solid polymer electrolyte and a proton conductive membrane. The sulfonic group-containing polyarylene block copolymer includes a polymer segment with an ion conductive component represented by the formula (A) and at least one polymer segment without an ion conductive component represented by the formulae (B-1), (B-3) and the like and containing an aromatic ring bonded at the meta-positions or ortho-positions: wherein X is a single bond, —CO—, —SO2— or the like; W is a single bond, —CO—, —SO2— or the like; Q is a single bond, —O—, —S— or the like; J is a single bond, —CO—, —SO2— or the like; and R1 to R24 are each a hydrogen atom, a fluorine atom, an alkyl group or the like.
摘要翻译：本发明提供了具有成本高，导电性和加工性优于全氟烷基磺酸聚合物的含磺基聚亚芳基嵌段共聚物，制备共聚物的方法，固体聚合物电解质和质子传导膜。含有磺酸基的聚亚芳基嵌段共聚物包括具有由式（A）表示的离子传导性成分的聚合物链段和至少一个不具有由式（B-1），（B-3）表示的离子传导性成分的聚合物链段，并且含有在间位或邻位键合的芳环：其中X是单键，-CO - ， - SO 2 - 等; W是单键，-CO - ， - SO 2 - 等; Q是单键，-O - ， - S-等; J是单键，-CO - ， - SO 2 - 等; R 12和R 24各自为氢原子，氟原子，烷基等。

3. 发明申请

US20090149625A1 AROMATIC COMPOUND HAVING FLUORENE SKELETON AND POLYARYLENE HAVING SULFONIC ACID GROUP 审中-公开
标题翻译：具有荧光素的芳香族化合物和具有亚磺酸的聚合物
公开(公告)号：US20090149625A1
公开(公告)日：2009-06-11
申请号：US12298443
申请日：2007-04-24
申请人： Yoshitaka Yamakawa , Yousuke Konno , Kohei Goto
发明人： Yoshitaka Yamakawa , Yousuke Konno , Kohei Goto
IPC分类号： C08G14/00 , C07C317/14
CPC分类号： H01B1/122 , C08G65/4012 , H01M8/1025 , H01M8/1027 , H01M8/103 , H01M8/1032 , H01M8/1039
摘要： Sulfonated polyarylenes have excellent processability and methanol resistance.The polyarylene includes a structural unit (S) represented by Formula (2-2) below and a structural unit (T) represented by Formula (2-3) below, the structural unit (S) accounting for a proportion “s” of 95 to 50 mol %, the structural unit (T) accounting for a proportion “t” of 5 to 50 mol % (“s”+“t”=100 mol %): wherein each A independently represents a divalent linking group represented by —CO— or —SO2—; and R1 to R4 each independently represent a hydrogen atom, a fluorine atom, an alkyl group or an aryl group.
摘要翻译：磺化聚亚芳基具有优异的加工性和耐甲醇性。聚亚芳基包括由下式（2-2）表示的结构单元（S）和由下式（2-3）表示的结构单元（T），结构单元（S）占比例“s”为95 至50摩尔％，结构单元（T）的比例“t”为5-50摩尔％（“s”+“t”= 100摩尔％））：其中每个A独立地表示由 - CO-或-SO 2 - ; R 1〜R 4各自独立地表示氢原子，氟原子，烷基或芳基。

4. 发明授权

US07163988B2 Aromatic sulfonic acid ester derivative, polyarylene, polyarylene having sulfonic acid group and process for producing the same, and polymer solid electrolyte and proton-conductive membrane 有权
标题翻译：芳族磺酸酯衍生物，聚亚芳基，具有磺酸基的聚亚芳基及其制备方法，以及聚合物固体电解质和质子传导膜
公开(公告)号：US07163988B2
公开(公告)日：2007-01-16
申请号：US10642694
申请日：2003-08-19
申请人： Igor Rozhanskii , Masayuki Takahashi , Kohei Goto , Yousuke Konno , Toshihiro Ohtsuki , Yoshitaka Yamakawa , Toshiaki Kadota
发明人： Igor Rozhanskii , Masayuki Takahashi , Kohei Goto , Yousuke Konno , Toshihiro Ohtsuki , Yoshitaka Yamakawa , Toshiaki Kadota
IPC分类号： C08F283/08 , C08G61/10
CPC分类号： C08G61/12 , C07C309/73 , C07C309/75
摘要： Disclosed is an aromatic sulfonic acid ester derivative represented by the formula (1); in the formula, X is an atom or a group selected from a halogen atom excluding fluorine, —OSO3CH3 and —OSO3CF3, A is a divalent electron attractive group, B is a divalent electron donating group or a direct bonding, Ra is a hydrocarbon group of 1 to 20 carbon atoms, Ar is an aromatic group having a substituent of —SO3Rb (wherein Rb is a hydrocarbon group of 1 to 20 carbon atoms), m is an integer of 0 to 10, n is an integer of 0 to 10 and k is an integer of 1 to 4. Also disclosed is a process for producing a polyarylene having a sulfonic acid group, which process comprises the steps of coupling polymerization of an aromatic compound containing the derivative of the formula (1), to prepare a polyarylene and hydrolysis of the polyarylene, and which process has high safety and is easily capable of controlling the amount of sulfonoc acid group introduced into a polymer and the introducing position thereof.
摘要翻译：公开了由式（1）表示的芳族磺酸酯衍生物; 在该式中，X是选自除氟以外的卤素原子的原子或基团，-OSO 3 CH 3和-OSO 3 CF A是二价吸电子基团，B是二价给电子基团或直接键合，R a是1-20个碳原子的烃基，Ar 是具有-SO 3 R b的取代基的芳香族基团（其中R b为1〜20个碳原子的烃基）， m为0〜10的整数，n为0〜10的整数，k为1〜4的整数。还公开了具有磺酸基的聚亚芳基的制造方法，该方法包括使聚合的含有式（1）的衍生物的芳族化合物，以制备聚亚芳基并且聚亚芳基的水解，并且该方法具有高安全性并且易于控制引入聚合物的磺酸基团的量和引入位置那里 F。

5. 发明授权

US08431676B2 Aromatic compound and sulfonated polyarylene polymer 有权
标题翻译：芳香族化合物和磺化聚亚芳基聚合物
公开(公告)号：US08431676B2
公开(公告)日：2013-04-30
申请号：US12298385
申请日：2007-04-24
申请人： Yoshitaka Yamakawa , Yousuke Konno , Teruhiko Umehara
发明人： Yoshitaka Yamakawa , Yousuke Konno , Teruhiko Umehara
IPC分类号： C08G8/02
CPC分类号： C07C49/84 , C07C45/71 , C07C255/54 , C07C2603/18 , C08G65/40 , C08G65/4012 , C08G65/4031 , C08J5/2231 , C08J2365/02 , H01M8/0289 , H01M8/1025 , H01M8/1027 , H01M8/103 , H01M8/1032 , H01M8/1039 , Y02E60/523
摘要： The invention described herein relates to a polyarylene copolymer comprising a structural unit represented by formula (1′): where the structural variables are defined herein. The invention also relates to a solid polymer electrolyte, a proton conductive membrane and A proton conductive membrane for direct methanol fuel cell which contains the polyarylene copolymer.
摘要翻译：本文描述的本发明涉及包含由式（1'）表示的结构单元的聚亚芳基共聚物：其中结构变量在本文中定义。本发明还涉及包含聚亚芳基共聚物的直接甲醇燃料电池的固体聚合物电解质，质子传导膜和A质子传导膜。

6. 发明申请

US20110251323A1 COMPOSITION FOR FORMING RESIST LOWER LAYER FILM 有权
标题翻译：用于形成较低层膜的组合物
公开(公告)号：US20110251323A1
公开(公告)日：2011-10-13
申请号：US12599694
申请日：2008-05-21
申请人： Nakaatsu Yoshimura , Yousuke Konno
发明人： Nakaatsu Yoshimura , Yousuke Konno
IPC分类号： C08K5/101
CPC分类号： G03F7/094 , H01L21/31144 , H01L21/76808
摘要： A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.
摘要翻译：含有（A）树脂，（B）含有丁基醚基团的交联剂和（C）溶剂的形成抗蚀剂下层膜的组合物。

7. 发明申请

US20100174042A1 AROMATIC COMPOUND AND SULFONATED POLYARYLENE POLYMER 有权
标题翻译：芳香化合物和磺化聚亚烷基聚合物
公开(公告)号：US20100174042A1
公开(公告)日：2010-07-08
申请号：US12298385
申请日：2007-04-24
申请人： Yoshitaka Yamakawa , Yousuke Konno , Teruhiko Umehara
发明人： Yoshitaka Yamakawa , Yousuke Konno , Teruhiko Umehara
IPC分类号： C08G8/02 , C07C49/317 , C07C255/51 , C08G75/24
CPC分类号： C07C49/84 , C07C45/71 , C07C255/54 , C07C2603/18 , C08G65/40 , C08G65/4012 , C08G65/4031 , C08J5/2231 , C08J2365/02 , H01M8/0289 , H01M8/1025 , H01M8/1027 , H01M8/103 , H01M8/1032 , H01M8/1039 , Y02E60/523
摘要： Sulfonated polymers have excellent processability and methanol resistance.An aromatic compound is represented by Formula (1) below: wherein A, D and E are each at least one structure selected from the group consisting of a direct bond, —O—, —S—, —CO—, —SO2—, —SO—, —CONH—, —COO—, —(CF2)f— (wherein f is an integer of 1 to 10), —(CH2)h— (wherein h is an integer of 1 to 10), —CR′2— (wherein R′ is an aliphatic hydrocarbon group, an aromatic hydrocarbon group or a halogenated hydrocarbon group), a cyclohexylidene group and a fluorenylidene group; each B is independently an oxygen atom or a sulfur atom; X is an atom or a group selected from halogen atoms other than fluorine, —OSO2CH3 and —OSO2CF3; R1 to R28 are the same or different from one another and are each at least one atom or group selected from the group consisting of a hydrogen atom, a fluorine atom, alkyl groups, partially or completely halogenated alkyl groups, allyl groups, aryl groups, nitro group and nitrile group; l and o are each an integer of 0 to 4; m is an integer of 1 to 4; q is an integer of 2 or greater; n and p indicate a composition ratio of the respective units and are each a number ranging from 0 to 1; n+p=1; and n is not 0.
摘要翻译：磺化聚合物具有优异的加工性和耐甲醇性。芳族化合物由下式（1）表示：其中A，D和E各自为至少一个选自直接键，-O - ， - S-，-CO-，-SO 2 - 的结构， - （CH 2）h - （其中h为1至10的整数），-CR（CH 2）n - ， - （CF 2）f - （其中f为1至10的整数） '2-（其中R'是脂族烃基，芳族烃基或卤代烃基），亚环己基和亚芴基; 每个B独立地是氧原子或硫原子; X是选自氟以外的卤素原子，-OSO 2 CH 3和-OSO 2 CF 3的原子或基团; R1至R28彼此相同或不同，并且各自为至少一个选自氢原子，氟原子，烷基，部分或完全卤化的烷基，烯丙基，芳基，硝基和腈基; l和o分别为0〜4的整数; m为1〜4的整数。 q是2或更大的整数; n和p表示各单元的组成比，分别为0〜1的数。 n + p = 1; 并且n不为0。

8. 发明授权

US08334338B2 Composition for forming resist lower layer film 有权
标题翻译：用于形成抗蚀剂下层膜的组合物
公开(公告)号：US08334338B2
公开(公告)日：2012-12-18
申请号：US12599694
申请日：2008-05-21
申请人： Nakaatsu Yoshimura , Yousuke Konno
发明人： Nakaatsu Yoshimura , Yousuke Konno
IPC分类号： A61K9/16 , C08K5/10
CPC分类号： G03F7/094 , H01L21/31144 , H01L21/76808
摘要： A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.
摘要翻译：含有（A）树脂，（B）含有丁基醚基团的交联剂和（C）溶剂的形成抗蚀剂下层膜的组合物。

9. 发明申请

US20090098486A1 COMPOSITION FOR FORMING LOWER LAYER FILM AND PATTERN FORMING METHOD 有权
标题翻译：用于形成下层薄膜和图案形成方法的组合物
公开(公告)号：US20090098486A1
公开(公告)日：2009-04-16
申请号：US12282599
申请日：2007-03-14
申请人： Nakaatsu Yoshimura , Yousuke Konno , Hikaru Sugita , Junichi Takahashi
发明人： Nakaatsu Yoshimura , Yousuke Konno , Hikaru Sugita , Junichi Takahashi
IPC分类号： G03F7/004 , C08G61/12 , G03F7/20
CPC分类号： G03F7/091 , G03F7/094 , G03F7/11 , Y10S430/106
摘要： A composition for forming a lower layer film comprises a polymer (A) having a naphthalene derivative structural unit shown by the following formula (1), wherein R1 represents a hydroxyl group and the like, X represents a substitutable alkylene group having 1 to 20 carbon atoms and the like, n represents 0 to 6, m represents 1 to 8, and n+m represents an integer from 1 to 8, provided that two or more R1s may be the same or different and two or more Xs may be the same or different.
摘要翻译：用于形成下层膜的组合物包括具有如下式（1）所示的萘衍生物结构单元的聚合物（A），其中R1表示羟基等，X表示具有1〜20碳的可取代亚烷基原子等，n表示0〜6，m表示1〜8，n + m表示1〜8的整数，条件是两个以上的R 1可以相同或不同，两个以上的X可以相同或不同。

10. 发明授权

US08663905B2 Pattern-forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08663905B2
公开(公告)日：2014-03-04
申请号：US12515061
申请日：2007-11-19
申请人： Nakaatsu Yoshimura , Yousuke Konno
发明人： Nakaatsu Yoshimura , Yousuke Konno
IPC分类号： G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/095 , G03F7/11
摘要： A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can transfer a resist pattern faithfully onto a substrate to be processed with high reproducibility.
摘要翻译：抗蚀层下层成膜组合物包含（A）具有至少一个与富勒烯骨架结合的氨基的胺化富勒烯和（B）溶剂。该组合物表现出优异的耐蚀刻性，使得底层膜图案难以弯曲，并且可以将抗蚀剂图案忠实地转印到待加工的基板上，具有高再现性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式