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    • 7. 发明授权
    • Fabrication method of printed wiring board
    • 印刷电路板的制造方法
    • US5464662A
    • 1995-11-07
    • US300131
    • 1994-09-02
    • Tomoo MurakamiTakanori Tsunoda
    • Tomoo MurakamiTakanori Tsunoda
    • H05K3/24H05K1/11H05K3/00H05K3/06H05K3/28H05K3/38B05D5/12
    • H05K3/0094H05K1/111H05K3/28H05K2201/09745H05K2201/09881H05K2203/0353H05K2203/0369H05K2203/0508H05K2203/0574H05K2203/0759H05K2203/1394H05K3/0082H05K3/061H05K3/383Y02P70/611
    • A fabrication method of a printed wiring board in which the halation effect of light irradiated to a solder resist film is utilized in a process of selectively removing the solder resist film. After a conductive layer is patterned to a given circuit pattern including soldering pads, the solder resist film is formed on the base material to cover the patterned conductive layer. The solder resist film is selectively exposed to light utilizing reflection of the irradiated light from the insulating base material and developed so that the solder resist film is selectively left in areas adjacent to the respective soldering pads. Then, an etching resist film is formed to cover the patterned conductive layer except for the soldering pads, and surface areas of the respective soldering pads are selectively etched using the etching resist film as a mask to produce solder resist dams made of the solder resist film left on the base material. Solder films are formed on the respective soldering pads thus selectively etched. Electronic components can be soldered on the soldering pads with satisfactory reliability even if the soldering pads have narrow pitches such as 500 .mu.m or less.
    • 在选择性去除阻焊膜的工序中,利用照射到阻焊膜的光的晕影效果的印刷电路板的制造方法。 在将导电层图案化为包括焊盘的给定电路图案之后,在基底材料上形成阻焊膜以覆盖图案化的导电层。 利用来自绝缘基材的照射光的反射来选择性地将阻焊膜暴露于光,并显影,使得阻焊膜选择性地留在与各个焊盘相邻的区域中。 然后,形成抗蚀剂膜以覆盖除了焊盘之外的图案化导电层,并且使用抗蚀剂膜作为掩模来选择性地蚀刻各个焊盘的表面积,以形成由阻焊膜制成的阻焊堤 留在基材上。 在相应的焊盘上形成焊接膜,从而选择性地蚀刻。 即使焊盘具有500μm以下的窄间距,也可以将电子部件焊接在焊盘上,其可靠性良好。