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    • 4. 发明申请
    • GAS BARRIER COATING AND GAS BARRIER FILM
    • 气体阻隔涂层和气体阻隔膜
    • US20110064932A1
    • 2011-03-17
    • US12884468
    • 2010-09-17
    • Toshiya TAKAHASHITakeshi SENGAKouji TONOHARA
    • Toshiya TAKAHASHITakeshi SENGAKouji TONOHARA
    • B32B27/06B32B33/00C09K3/00
    • C23C16/345C23C16/52
    • Gas barrier coatings and gas barrier films are used in displays and so forth. Described gas barrier coatings are excellent not only in gas barrier properties but oxidation resistance, transparency and flexibility. A gas barrier coating is based on silicon nitride, and includes: a N/Si compositional ratio of 1 to 1.4; and a hydrogen content of 10 to 30 atomic percent. A peak of an absorption caused by Si—H stretching vibration occurs at a wavenumber ranging from 2170 to 2200 cm−1 in a Fourier transform infrared absorption spectrum of the coating, with a ratio [I(Si—H)/I(Si—N)] between a peak intensity I(Si—H) of the absorption caused by Si—H stretching vibration and a peak intensity I(Si—H) of an absorption caused by Si—N stretching vibration in the vicinity of 840 cm−1 being 0.03 to 0.15.
    • 气体阻隔涂层和阻气膜用于显示器等。 描述的阻气涂层不仅具有阻气性,而且具有抗氧化性,透明性和柔韧性。 气体阻隔涂层是基于氮化硅,并且包括:N / Si组成比为1至1.4; 氢含量为10〜30原子%。 在涂层的傅里叶变换红外吸收光谱中,由Si-H伸缩振动引起的吸收峰出现在2170〜2200cm -1的波数,[I(Si-H)/ I(Si- 由Si-H伸缩振动引起的吸收的峰强度I(Si-H)与在840cm -1附近的Si-N伸缩振动引起的吸收的峰值强度I(Si-H) 1为0.03〜0.15。