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    • 2. 发明授权
    • Vertical heat treatment device and method controlling the same
    • 立式热处理装置及其控制方法
    • US07432475B2
    • 2008-10-07
    • US10584258
    • 2004-12-22
    • Makoto NakajimaTakanori SaitoTsuyoshi TakizawaManabu Honma
    • Makoto NakajimaTakanori SaitoTsuyoshi TakizawaManabu Honma
    • F27B5/14
    • F27B17/0025F27B5/04F27B5/18
    • A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating furnace (8) surrounding the process chamber (5) and including an electric heater (15), and an electric blower (16) configured to send a cooling gas into the heating furnace (8). A control section (22) executes, in order to converge the process field (A1) to a target temperature, performing power feeding to the heater (15) to heat up the process field (A1) to a predetermined temperature immediately below the target temperature, and at a time point when the process field (A1) reaches the predetermined temperature, decreasing the power feeding to the heater (15), and supplying the cooling gas from the blower (16) to forcibly cool the process field (A1).
    • 垂直加热设备包括一个处理室(5),该处理室(5)限定一个处理场(A 1),该处理区域被配置为容纳在垂直方向间隔地支撑的多个目标衬底(W)。 该装置还包括围绕处理室(5)并包括电加热器(15)的加热炉(8)和构造成将冷却气体送入加热炉(8)的电动鼓风机(16)。 控制部(22)为了将处理场(A 1)收敛到目标温度,执行向加热器(15)供电以将处理场(A 1)加热至紧接在 目标温度,并且当处理场(A 1)达到预定温度的时间点,减少对加热器(15)的供电,并且从鼓风机(16)供应冷却气体以强制冷却过程场( A 1)。
    • 3. 发明申请
    • Vertical heat treatment device and method controlling the same
    • 立式热处理装置及其控制方法
    • US20070148606A1
    • 2007-06-28
    • US10584258
    • 2004-12-22
    • Makoto NakajimaTakanori SaitoTsuyoshi TakizawaManabu Honma
    • Makoto NakajimaTakanori SaitoTsuyoshi TakizawaManabu Honma
    • F27D15/02
    • F27B17/0025F27B5/04F27B5/18
    • A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating furnace (8) surrounding the process chamber (5) and including an electric heater (15), and an electric blower (16) configured to send a cooling gas into the heating furnace (8). A control section (22) executes, in order to converge the process field (A1) to a target temperature, performing power feeding to the heater (15) to heat up the process field (A1) to a predetermined temperature immediately below the target temperature, and at a time point when the process field (A1) reaches the predetermined temperature, decreasing the power feeding to the heater (15), and supplying the cooling gas from the blower (16) to forcibly cool the process field (A1).
    • 垂直加热设备包括一个处理室(5),该处理室(5)限定一个处理场(A 1),该处理区域被配置为容纳在垂直方向间隔地支撑的多个目标衬底(W)。 该装置还包括围绕处理室(5)并包括电加热器(15)的加热炉(8)和构造成将冷却气体送入加热炉(8)的电动鼓风机(16)。 控制部(22)为了将处理场(A 1)收敛到目标温度,执行向加热器(15)供电以将处理场(A 1)加热至紧接在 目标温度,并且当处理场(A 1)达到预定温度的时间点,减少对加热器(15)的供电,并且从鼓风机(16)供应冷却气体以强制冷却过程场( A 1)。
    • 4. 发明授权
    • Heat treatment apparatus and heat treatment method
    • 热处理设备及热处理方法
    • US09324591B2
    • 2016-04-26
    • US13438234
    • 2012-04-03
    • Koji YoshiiTatsuya YamaguchiWenling WangTakanori Saito
    • Koji YoshiiTatsuya YamaguchiWenling WangTakanori Saito
    • F27D21/00H01L21/67
    • H01L21/67109H01L21/67248
    • A heat treatment apparatus including: a processing container for processing wafers held in a boat; heaters for heating the processing container; and a control section for controlling the heaters. Heater temperature sensors are provided between the heaters and the processing container, in-container temperature sensors are provided in the processing container, and movable temperature sensors are provided in the boat. The temperature sensors are connected to a temperature estimation section. The temperature estimation section selects two of the three types of temperature sensors, e.g. the movable temperature sensors and the in-container temperature sensors, and determines the temperature of a wafer according to the following formula: T=T1×(1−α)+T2×α, α>1, where T1 and T2 represent detection temperatures of the selected temperature sensors, and α represents a mixing ratio.
    • 一种热处理设备,包括:处理容器,用于处理保存在船上的晶片; 用于加热处理容器的加热器; 以及用于控制加热器的控制部。 加热器温度传感器设置在加热器和处理容器之间,容器内温度传感器设置在处理容器中,并且可移动的温度传感器设置在船上。 温度传感器连接到温度估计部。 温度估计部分选择三种类型的温度传感器中的两种,例如, 可移动温度传感器和容器内温度传感器,并根据以下公式确定晶片的温度:T = T1×(1-α)+ T2×α,α> 1,其中T1和T2表示检测温度 的选定温度传感器,α表示混合比。
    • 8. 发明申请
    • HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
    • 热处理设备和热处理方法
    • US20120258415A1
    • 2012-10-11
    • US13438234
    • 2012-04-03
    • Koji YOSHIITatsuya YamaguchiWenling WangTakanori Saito
    • Koji YOSHIITatsuya YamaguchiWenling WangTakanori Saito
    • F27D21/00F27D3/00
    • H01L21/67109H01L21/67248
    • A heat treatment apparatus including: a processing container for processing wafers held in a boat; heaters for heating the processing container; and a control section for controlling the heaters. Heater temperature sensors are provided between the heaters and the processing container, in-container temperature sensors are provided in the processing container, and movable temperature sensors are provided in the boat. The temperature sensors are connected to a temperature estimation section. The temperature estimation section selects two of the three types of temperature sensors, e.g. the movable temperature sensors and the in-container temperature sensors, and determines the temperature of a wafer according to the following formula: T=T1×(1−α)+T2×α, α>1, where T1 and T2 represent detection temperatures of the selected temperature sensors, and α represents a mixing ratio.
    • 一种热处理设备,包括:处理容器,用于处理保存在船上的晶片; 用于加热处理容器的加热器; 以及用于控制加热器的控制部。 加热器温度传感器设置在加热器和处理容器之间,容器内温度传感器设置在处理容器中,并且可移动的温度传感器设置在船上。 温度传感器连接到温度估计部。 温度估计部分选择三种类型的温度传感器中的两种,例如, 可移动温度传感器和容器内温度传感器,并根据以下公式确定晶片的温度:T = T1×(1-α)+ T2×α,α> 1,其中T1和T2表示检测温度 的选定温度传感器,α表示混合比。
    • 10. 发明申请
    • Heat Treatment Apparatus, Heater, and Method for Manufacturing the Heater
    • 热处理装置,加热器及加热器制造方法
    • US20100224614A1
    • 2010-09-09
    • US12223162
    • 2007-02-07
    • Makoto KobayashiKenichi YamagaTakanori Saito
    • Makoto KobayashiKenichi YamagaTakanori Saito
    • F27D11/00H05B3/02
    • H01L21/67109H01L21/425Y10T29/49083
    • The present invention provides a heat treatment apparatus having a high degree of freedom of an outlet design and capable of adjusting the rate of a reduction in the temperature of each part of a heater without using an adjustment valve. The heat treatment apparatus having a simple flow path structure can be constructed with simplified sealing and a reduced cost.The heat treatment apparatus 1 includes a process chamber 2, a tubular heater 3, a heat exhaust system 25 and a cooling section 26. The process chamber 2 accommodates objects W to be placed in multiple stages and to be treated. A predetermined heat treatment is performed in the process chamber. The heater 3 surrounds an outer circumference of the process chamber 2 and heats the objects W to be treated. The heat exhaust system 25 is adapted to exhaust an atmosphere present in a space 24 existing between the heater 3 and the process chamber 2. The cooling section 26 is adapted to blow a cooling fluid into the space 24 to cool the atmosphere. The heater 3 includes a tubular heat insulator 17, a heat generating resistor 18 and an outer shell 20. The heat generating resistor 18 is provided on an inner circumference of the heat insulator 17. The outer shell 20 is provided on an outer circumference of the heat insulator 17. The cooling section 26 includes at least one annular flow path 28 and an outlet 29. The annular flow path 28 is arranged between the heat insulator 17 and the outer shell 20. The outlet 29 is provided in the heat insulator 17. The outlet 29 is arranged to ensure that the cooling fluid is blown out of the outlet 29 toward a vertical central axis of the heat insulator 17 or in a direction oblique to the direction toward vertical central axis of the heat insulator 17.
    • 本发明提供一种热处理装置,其具有出口设计的高自由度,并且能够调节加热器的每个部件的温度降低的速率而不使用调节阀。 具有简单的流路结构的热处理装置可以以简单的密封和降低的成本构成。 热处理设备1包括处理室2,管状加热器3,散热系统25和冷却部分26.处理室2容纳待放置的多个物体W并进行处理。 在处理室中进行预定的热处理。 加热器3围绕处理室2的外周并加热被处理物体W. 散热系统25适于排出存在于加热器3和处理室2之间的空间24中的气氛。冷却部分26适于将冷却流体吹入空间24以冷却大气。 加热器3包括管状隔热件17,发热电阻18和外壳20.发热电阻18设置在隔热材料17的内周上。外壳20设置在绝热体17的外周。 绝热体17.冷却部分26包括至少一个环形流动路径28和出口29.环形流路28设置在绝热体17和外壳20之间。出口29设置在绝热体17中。 出口29布置成确保冷却流体从出口29朝向隔热件17的垂直中心轴线或者沿着与隔热件17的垂直中心轴方向倾斜的方向吹出。