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1. 发明申请

US20100224614A1 Heat Treatment Apparatus, Heater, and Method for Manufacturing the Heater 有权
标题翻译：热处理装置，加热器及加热器制造方法
公开(公告)号：US20100224614A1
公开(公告)日：2010-09-09
申请号：US12223162
申请日：2007-02-07
申请人： Makoto Kobayashi , Kenichi Yamaga , Takanori Saito
发明人： Makoto Kobayashi , Kenichi Yamaga , Takanori Saito
IPC分类号： F27D11/00 , H05B3/02
CPC分类号： H01L21/67109 , H01L21/425 , Y10T29/49083
摘要： The present invention provides a heat treatment apparatus having a high degree of freedom of an outlet design and capable of adjusting the rate of a reduction in the temperature of each part of a heater without using an adjustment valve. The heat treatment apparatus having a simple flow path structure can be constructed with simplified sealing and a reduced cost.The heat treatment apparatus 1 includes a process chamber 2, a tubular heater 3, a heat exhaust system 25 and a cooling section 26. The process chamber 2 accommodates objects W to be placed in multiple stages and to be treated. A predetermined heat treatment is performed in the process chamber. The heater 3 surrounds an outer circumference of the process chamber 2 and heats the objects W to be treated. The heat exhaust system 25 is adapted to exhaust an atmosphere present in a space 24 existing between the heater 3 and the process chamber 2. The cooling section 26 is adapted to blow a cooling fluid into the space 24 to cool the atmosphere. The heater 3 includes a tubular heat insulator 17, a heat generating resistor 18 and an outer shell 20. The heat generating resistor 18 is provided on an inner circumference of the heat insulator 17. The outer shell 20 is provided on an outer circumference of the heat insulator 17. The cooling section 26 includes at least one annular flow path 28 and an outlet 29. The annular flow path 28 is arranged between the heat insulator 17 and the outer shell 20. The outlet 29 is provided in the heat insulator 17. The outlet 29 is arranged to ensure that the cooling fluid is blown out of the outlet 29 toward a vertical central axis of the heat insulator 17 or in a direction oblique to the direction toward vertical central axis of the heat insulator 17.
摘要翻译：本发明提供一种热处理装置，其具有出口设计的高自由度，并且能够调节加热器的每个部件的温度降低的速率而不使用调节阀。具有简单的流路结构的热处理装置可以以简单的密封和降低的成本构成。热处理设备1包括处理室2，管状加热器3，散热系统25和冷却部分26.处理室2容纳待放置的多个物体W并进行处理。在处理室中进行预定的热处理。加热器3围绕处理室2的外周并加热被处理物体W. 散热系统25适于排出存在于加热器3和处理室2之间的空间24中的气氛。冷却部分26适于将冷却流体吹入空间24以冷却大气。加热器3包括管状隔热件17，发热电阻18和外壳20.发热电阻18设置在隔热材料17的内周上。外壳20设置在绝热体17的外周。绝热体17.冷却部分26包括至少一个环形流动路径28和出口29.环形流路28设置在绝热体17和外壳20之间。出口29设置在绝热体17中。出口29布置成确保冷却流体从出口29朝向隔热件17的垂直中心轴线或者沿着与隔热件17的垂直中心轴方向倾斜的方向吹出。

2. 发明授权

US08253075B2 Heat treatment apparatus, heater, and method for manufacturing the heater 有权
标题翻译：热处理装置，加热器及加热器的制造方法
公开(公告)号：US08253075B2
公开(公告)日：2012-08-28
申请号：US12223162
申请日：2007-02-07
申请人： Makoto Kobayashi , Kenichi Yamaga , Takanori Saito
发明人： Makoto Kobayashi , Kenichi Yamaga , Takanori Saito
IPC分类号： F27B5/08 , F27B5/16 , F27D1/12
CPC分类号： H01L21/67109 , H01L21/425 , Y10T29/49083
摘要： A heat treatment apparatus with a process chamber, a tubular heater, a heat exhaust system and a cooling section. The heater surrounds an outer circumference of the process chamber. The heat exhaust system exhausts an atmosphere in a space between the heater and the process chamber. The cooling section blows a cooling fluid into the space to cool the atmosphere. The heater includes a tubular heat insulator, a heat generating resistor on an inner circumference of the heat insulator, and an outer shell provided on an outer circumference of the heat insulator. The cooling section includes at least one annular flow path between the heat insulator and the outer shell, and an outlet in the heat insulator. The outlet blows cooling fluid toward a vertical central axis of the heat insulator, or in a direction oblique to the direction toward vertical central axis of the heat insulator.
摘要翻译：一种具有处理室，管状加热器，散热系统和冷却部分的热处理设备。加热器围绕处理室的外周。排热系统排出加热器和处理室之间的空间中的气氛。冷却部分将冷却液吹入空间以冷却大气。加热器包括管状隔热件，隔热件的内周上的发热电阻器和设置在隔热件外周上的外壳。冷却部分包括在绝热器和外壳之间的至少一个环形流动路径以及隔热件中的出口。出口将冷却流体吹向绝热体的垂直中心轴线，或者朝向与绝热体垂直中心轴方向倾斜的方向。

3. 发明申请

US20050028738A1 Thermal treating apparatus 有权
标题翻译：热处理设备
公开(公告)号：US20050028738A1
公开(公告)日：2005-02-10
申请号：US10494970
申请日：2002-09-27
申请人： Takanori Saito , Toshiyuki Makiya , Hisaei Osanai , Tsuyoshi Takizawa , Tomohisa Shimazu , Kazuhide Hasebe , Hiroyuki Yamamoto , Yukimasa Saito , Kenichi Yamaga
发明人： Takanori Saito , Toshiyuki Makiya , Hisaei Osanai , Tsuyoshi Takizawa , Tomohisa Shimazu , Kazuhide Hasebe , Hiroyuki Yamamoto , Yukimasa Saito , Kenichi Yamaga
IPC分类号： C23C16/44 , C23C16/455 , H01L21/00 , H01L21/205 , H01L21/22 , C23C16/00
CPC分类号： H01L21/67109 , H01L21/67098
摘要： The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.
摘要翻译：本发明是一种热处理单元，包括：上端具有开口的加热炉体; 设置在所述加热炉体的内壁上的加热单元; 由包含在加热炉体内的单个管构成的反应容器; 形成在反应容器的上部的气体排出管连接部; 以及设置在气体排出管连接部周围的第一温度控制单元。

4. 发明授权

US07311520B2 Heat treatment apparatus 有权
标题翻译：热处理设备
公开(公告)号：US07311520B2
公开(公告)日：2007-12-25
申请号：US10528704
申请日：2003-08-29
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： F27D11/00
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a reaction tube consisting of a single tube contained in the heating-furnace body; a gas-discharging-unit connecting portion formed at an upper portion of the reaction tube, the gas-discharging-unit connecting portion having a narrow diameter; a substrate-to-be-processed supporting member for supporting a substrate to be processed, contained in the heating-furnace body; and a heating unit for heating the substrate to be processed supported by the substrate-to-be-processed supporting member. The heating unit has: a first heating portion arranged around the reaction tube, a second heating portion arranged around the gas-discharging-unit connecting portion, a third heating portion arranged around an upper portion of the reaction tube, a fourth heating portion arranged around a lower portion of the reaction tube, and a fifth heating portion arranged under the substrate-to-be-processed supporting member.
摘要翻译：本发明是一种热处理单元，包括：上端具有开口的加热炉体; 由包含在加热炉体内的单个管构成的反应管; 气体排出单元连接部，形成在反应管的上部，气体排出单元连接部具有窄直径; 用于支撑加热炉体内所包含的待处理基板的待处理基板的支撑部件; 以及加热单元，用于加热由要处理的基板支撑构件支撑的待处理基板。所述加热单元具有：设置在所述反应管周围的第一加热部，配置在所述排气单元连接部周围的第二加热部，配置在所述反应管的上部的第三加热部，反应管的下部，以及配置在被处理基板的支撑部件的下方的第五加热部。

5. 发明授权

US07102104B2 Heat treatment system 失效
标题翻译：热处理系统
公开(公告)号：US07102104B2
公开(公告)日：2006-09-05
申请号：US10505863
申请日：2002-11-25
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： F27B5/14
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit that includes: a tubular processing container; an object-to-be-processed holding unit that holds a plurality of objects to be processed in a tier-like manner and that can be inserted into and taken out from the processing container; a process-gas introducing unit that introduces a predetermined process gas into the processing container; a heating unit provided in the processing container, the heating unit heating the plurality of objects to be processed held by the object-to-be-processed holding unit when the object-to-be-processed holding unit is inserted into the processing container; and a container cooling unit that cools an outside wall surface of the processing container.
摘要翻译：本发明是一种热处理单元，其包括：管状处理容器; 待处理的待处理的保持单元，其以层状的方式保持待处理的多个对象，并且可以被插入到处理容器中并从处理容器中取出; 将预定的处理气体引入到处理容器内的处理气体导入部; 设置在处理容器中的加热单元，当待处理保持单元插入处理容器中时，加热单元将待处理保持单元保持的多个待处理对象加热; 以及冷却处理容器的外壁表面的容器冷却单元。

6. 发明申请

US20050225937A1 Cooling device and heat treating device using the same 有权
标题翻译：冷却装置及使用其的热处理装置
公开(公告)号：US20050225937A1
公开(公告)日：2005-10-13
申请号：US10505900
申请日：2003-02-28
申请人： Takanori Saito , Kenichi Yamaga
发明人： Takanori Saito , Kenichi Yamaga
IPC分类号： F27B5/04 , F27B5/06 , H01L21/00 , H01L21/205 , H01L21/22 , H01L21/302 , H01L21/31 , H05K7/20
CPC分类号： H01L21/67109
摘要： A heat treating device (50) has a cooling sleeve that covers a treating vessel (56) and a heater (100). The cooling sleeve has a cylindrical base member (110) and a cooling pipe (112) spirally wound on the outer peripheral surface hereof. The cooling pipe (112) is brazed to the base member (110).
摘要翻译：热处理装置（50）具有覆盖处理容器（56）和加热器（100）的冷却套筒。冷却套筒具有圆筒形的基座部件（110）和螺旋地卷绕在其外周面上的冷却管道（112）。冷却管（112）钎焊到基体（110）上。

7. 发明申请

US20050121432A1 Heat treatment system 失效
标题翻译：热处理系统
公开(公告)号：US20050121432A1
公开(公告)日：2005-06-09
申请号：US10505863
申请日：2002-11-25
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： H01L21/28 , H01L21/00 , H01L21/02 , H01L21/205 , H01L21/324 , F27B5/14 , F27D11/00
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit that includes: a tubular processing container; an object-to-be-processed holding unit that holds a plurality of objects to be processed in a tier-like manner and that can be inserted into and taken out from the processing container; a process-gas introducing unit that introduces a predetermined process gas into the processing container; a heating unit provided in the processing container, the heating unit heating the plurality of objects to be processed held by the object-to-be-processed holding unit when the object-to-be-processed holding unit is inserted into the processing container; and a container cooling unit that cools an outside wall surface of the processing container.
摘要翻译：本发明是一种热处理单元，其包括：管状处理容器; 待处理的待处理的保持单元，其以层状的方式保持待处理的多个对象，并且可以被插入到处理容器中并从处理容器中取出; 将预定的处理气体引入到处理容器内的处理气体导入部; 设置在处理容器中的加热单元，当待处理保持单元插入处理容器中时，加热单元将待处理保持单元保持的多个待处理对象加热; 以及冷却处理容器的外壁表面的容器冷却单元。

8. 发明授权

US07144823B2 Thermal treatment apparatus 有权
标题翻译：热处理设备
公开(公告)号：US07144823B2
公开(公告)日：2006-12-05
申请号：US10494970
申请日：2002-09-27
申请人： Takanori Saito , Toshiyuki Makiya , Hisaei Osanai , Tsuyoshi Takizawa , Tomohisa Shimazu , Kazuhide Hasebe , Hiroyuki Yamamoto , Yukimasa Saito , Kenichi Yamaga
发明人： Takanori Saito , Toshiyuki Makiya , Hisaei Osanai , Tsuyoshi Takizawa , Tomohisa Shimazu , Kazuhide Hasebe , Hiroyuki Yamamoto , Yukimasa Saito , Kenichi Yamaga
IPC分类号： H01L21/31
CPC分类号： H01L21/67109 , H01L21/67098
摘要： The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.
摘要翻译：本发明是一种热处理单元，包括：上端具有开口的加热炉体; 设置在所述加热炉体的内壁上的加热单元; 由包含在加热炉体内的单个管构成的反应容器; 形成在反应容器的上部的气体排出管连接部; 以及设置在气体排出管连接部周围的第一温度控制单元。

9. 发明申请

US20060258170A1 Thermal processing unit 有权
公开(公告)号：US20060258170A1
公开(公告)日：2006-11-16
申请号：US11487434
申请日：2006-07-17
申请人： Takanori Saito , Toshiyuki Makiya , Hisaei Osanai , Tsuyoshi Takizawa , Tomohisa Shimazu , Kazuhide Hasebe , Hiroyuki Yamamoto , Yukimasa Saito , Kenichi Yamaga
发明人： Takanori Saito , Toshiyuki Makiya , Hisaei Osanai , Tsuyoshi Takizawa , Tomohisa Shimazu , Kazuhide Hasebe , Hiroyuki Yamamoto , Yukimasa Saito , Kenichi Yamaga
IPC分类号： H01L21/31
CPC分类号： H01L21/67109 , H01L21/67098
摘要： The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.

10. 发明申请

US20060021582A1 Heat treatment apparatus 有权
标题翻译：热处理设备
公开(公告)号：US20060021582A1
公开(公告)日：2006-02-02
申请号：US10528704
申请日：2003-08-29
申请人： Takanori Saito , Kenichi Yamaga , Ken Nakao
发明人： Takanori Saito , Kenichi Yamaga , Ken Nakao
IPC分类号： C23C16/00
CPC分类号： H01L21/67109
摘要： The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a reaction tube consisting of a single tube contained in the heating-furnace body; a gas-discharging-unit connecting portion formed at an upper portion of the reaction tube, the gas-discharging-unit connecting portion having a narrow diameter; a substrate-to-be-processed supporting member for supporting a substrate to be processed, contained in the heating-furnace body; and a heating unit for heating the substrate to be processed supported by the substrate-to-be-processed supporting member. The heating unit has: a first heating portion arranged around the reaction tube, a second heating portion arranged around the gas-discharging-unit connecting portion, a third heating portion arranged around an upper portion of the reaction tube, a fourth heating portion arranged around a lower portion of the reaction tube, and a fifth heating portion arranged under the substrate-to-be-processed supporting member.
摘要翻译：本发明是一种热处理单元，包括：上端具有开口的加热炉体; 由包含在加热炉体内的单个管构成的反应管; 气体排出单元连接部，形成在反应管的上部，气体排出单元连接部具有窄直径; 用于支撑加热炉体内所包含的待处理基板的待处理基板的支撑部件; 以及加热单元，用于加热由要处理的基板支撑构件支撑的待处理基板。所述加热单元具有：设置在所述反应管周围的第一加热部，配置在所述排气单元连接部周围的第二加热部，配置在所述反应管的上部的第三加热部，反应管的下部，以及配置在被处理基板的支撑部件的下方的第五加热部。

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