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    • 1. 发明授权
    • Glass substrate for data recording medium and manufacturing method thereof
    • 用于数据记录介质的玻璃基板及其制造方法
    • US07010939B2
    • 2006-03-14
    • US10454230
    • 2003-06-04
    • Takamasa YoshikawaKoichi Suzuki
    • Takamasa YoshikawaKoichi Suzuki
    • C03C21/00C03C15/00
    • B24B37/042Y10T428/252Y10T428/2993
    • In a first polishing step, or in a first half of a super precision polishing, a surface of a glass substrate is polished with a first suspension. The first suspension contains particles and a dispersion agent in which the particles are dispersed. The main ingredient of the particles is silicon dioxide (SiO2), and the average size (D50) of the particles is equal to or less than 100 nm. The dispersion medium comprises an acid solution the pH of which is equal to or less than 4. In a second polishing step, or in a latter half of the super precision polishing, the surface of the glass substrate is continuously polished with a second suspension. The second suspension contains particles and a dispersion agent in which the particles are dispersed. The main ingredient of the particles is silicon dioxide (SiO2), and the average size (D50) of the particles is equal to or less than 100 nm. The dispersion medium comprises an alkaline solution the pH of which is equal to or more than 8.5.
    • 在第一抛光步骤中或在超精密抛光的前半部分中,用第一悬浮液抛光玻璃基板的表面。 第一悬浮液含有颗粒和其中颗粒分散的分散剂。 颗粒的主要成分是二氧化硅(SiO 2),颗粒的平均尺寸(D≤50)等于或小于100nm。 该分散介质包含pH等于或小于4的酸溶液。在第二研磨步骤或超精密抛光的后半部分中,玻璃基板的表面用第二悬浮液连续研磨。 第二悬浮液含有颗粒和其中分散有颗粒的分散剂。 颗粒的主要成分是二氧化硅(SiO 2),颗粒的平均尺寸(D≤50)等于或小于100nm。 分散介质包含碱性溶液,其pH值等于或大于8.5。
    • 3. 发明授权
    • Projection display device
    • 投影显示设备
    • US07118227B2
    • 2006-10-10
    • US10470977
    • 2002-04-23
    • Shinya SannoheHideki IshinagaTakamasa Yoshikawa
    • Shinya SannoheHideki IshinagaTakamasa Yoshikawa
    • G03B21/14G03B21/28G02B26/02G02B9/08G02F1/00
    • G02B5/005G02B26/0833G03B21/005G03B21/006
    • An illuminating optical system for focusing a radiant light of a light source (1) onto a reflecting light valve (6) and a projection lens (7) for magnifying and projecting a reflected light from the reflecting light valve (6) onto a screen are provided, a diaphragm (31) is disposed at a substantially conjugate position of an entrance pupil of the projection lens (7) on an optical path of the illuminating optical system, the diaphragm (31) has an opening whose area is changed by a light-shielding member, and a shape of a shielded portion of the diaphragm (31) shielded by the light-shielding member is rotationally asymmetric to an optical axis (12) of the illuminating optical system. Accordingly, shielding of necessary light can be better avoided compared with a diaphragm for changing the light-shielding area in a rotationally symmetric manner, for example, a diaphragm for narrowing the opening concentrically, making it possible to improve contrast performance while minimizing brightness reduction.
    • 一种用于将光源(1)的辐射光聚焦到反射光阀(6)和用于将来自反射光阀(6)的反射光放大并投影到屏幕上的投影透镜(7))的照明光学系统, 设置在投影透镜(7)的入射光瞳的基本共轭位置处的照明光学系统的光路上的隔膜(31),隔膜(31)具有通过光改变面积的开口 并且由遮光部件遮蔽的隔膜31的遮蔽部的形状与照明光学系统的光轴(12)旋转不对称。 因此,与用于以旋转对称的方式改变遮光区域的隔膜例如用于同心地缩小开口的隔膜相比,可以更好地避免必要的光的屏蔽,使得可以在最小化亮度降低的同时提高对比度性能。