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    • 1. 发明授权
    • Diamond semiconductor device with P-I-N type multilayer structure
    • 具有P-I-N型多层结构的金刚石半导体器件
    • US5600156A
    • 1997-02-04
    • US303112
    • 1994-09-08
    • Yoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • Yoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • C30B29/04H01L29/16H01L29/74H01L29/772H01L29/861H01L31/0312H01L29/167H01L31/075
    • H01L29/1602H01L29/74H01L29/7722
    • A diamond semiconductor device of the present invention comprises an n-type diamond layer to which an n-type dopant is doped at high concentration so that metal conduction dominates, a p-type diamond layer to which a p-type dopant is doped at high concentration so that metal conduction dominates, and a high resistance diamond layer formed between the n-type diamond layer and the p-type diamond layer. Here, the thickness and the doping concentration of the high resistance diamond layer are values at which semiconductor conduction dominates. Then, in a case that an applied voltage is forward bias, electrons are injected from the n-type region to the p-type region through the conduction band of the high resistance region, and holes are injected from the p-type region to the n-type region through the valance band of the high resistance region, so that a current flows. On the other hand, in a case that an applied voltage is reverse bias because substantially no dopant is doped to the high resistance diamond layer, carriers are not present, so that a large current does not flow. Therefore, semiconductor conduction dominates as carrier conduction in pn junction and the rectification can be obtained, so that with the control of carriers, good diode characteristics or transistor characteristics can be achieved.
    • 本发明的金刚石半导体器件包括n型金刚石层,以高浓度掺杂n型掺杂剂以使金属导电占主导地位,p型掺杂剂掺杂在高的p型金刚石层 浓度使得金属导电占主导地位,并且在n型金刚石层和p型金刚石层之间形成高电阻金刚石层。 这里,高电阻金刚石层的厚度和掺杂浓度是半导体传导占主导地位的值。 然后,在施加的电压为正向偏压的情况下,通过高电阻区域的导带从n型区域向p型区域注入电子,从p型区域注入空穴 n型区域通过高电阻区域的价带,使得电流流动。 另一方面,在施加的电压为反向偏压的情况下,由于基本上没有掺杂剂掺杂到高电阻金刚石层,所以不存在载流子,使得大的电流不流动。 因此,半导体传导作为pn结中的载流子导通,可以获得整流,因此通过载流子的控制,可以实现良好的二极管特性或晶体管特性。
    • 4. 发明授权
    • Electron device
    • 电子器件
    • US5552613A
    • 1996-09-03
    • US311463
    • 1994-09-22
    • Yoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • Yoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • H01J1/304H01J9/02H01J1/02H01J1/14
    • H01J1/3042H01J2201/30457
    • An electron device of the present invention comprises an i-type diamond layer formed on a substrate, and an n-type diamond layer formed on the i-type diamond layer and having a first surface region formed flatly and a second surface region containing an emitter portion, which are set in a vacuum container, in which the emitter portion formed of the n-type diamond has a bottom area 10 or less .mu.m square and projects relative to the first surface region. In the n-type diamond layer, a difference is fine between the conduction band and the vacuum level. Also, since the n-type diamond layer is doped with an n-type dopant in a high concentration, metal conduction is dominant as conduction of electrons. Therefore, setting the temperature of the substrate at a predetermined temperature and generating an electric field near the surface of the emitter portion, electrons are emitted with a high efficiency from the tip portion of the emitter portion into the vacuum. Even though the emitter portion does not have a tip portion formed in a very fine shape, electrons can readily be taken out into the vacuum by the field emission with relatively small field strength. Consequently, the emission current and the current gain increase and the current density in the emitter portion decreases, thus increasing the withstand current or withstand voltage.
    • 本发明的电子器件包括形成在衬底上的i型金刚石层和形成在i型金刚石层上的n型金刚石层,并且具有平坦地形成的第一表面区域和包含发射极的第二表面区域 其设置在真空容器中,其中由n型金刚石形成的发射极部分的底部面积为10μm或更小,并且相对于第一表面区域突出。 在n型金刚石层中,导带和真空度之间的差异很小。 此外,由于n型金刚石层以高浓度掺杂n型掺杂剂,所以金属导电作为电子的传导是主要的。 因此,将基板的温度设定在规定的温度并在发射极部的表面附近产生电场,从发射极部的顶端向真空发射高效率的电子。 尽管发射极部分不具有形成为非常细的形状的尖端部分,但是通过具有相对小的场强的场发射,电子可以容易地被引出到真空中。 因此,发射电流和电流增益增加,并且发射极部分中的电流密度降低,从而增加了耐受电流或耐受电压。
    • 5. 发明授权
    • Ohmic electrode and method for forming it
    • 欧姆电极及其形成方法
    • US5668382A
    • 1997-09-16
    • US668525
    • 1996-06-28
    • Naohiro TodaYoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • Naohiro TodaYoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • H01L21/28H01L21/04H01L21/285H01L21/324H01L29/45H01L33/34H01L33/40H01L31/0312H01L23/48H01L23/52H01L29/40
    • H01L33/40H01L21/043H01L29/45H01L33/34H01L2924/0002
    • An ohmic electorde of the present invention comprises a contact electrode layer formed on a p-type diamond semiconductor layer formed on a substrate so as to be in ohmic contact with the p-type diamond semiconductor layer and to have low contact resistance and high heat resistance, and a lead electrode layer formed on the contact electrode layer so as to have low lead wire resistance and high heat resistance. Specifically, the contact electrode layer is made of either a carbide of at least one metal selected from a metal group comprising Ti, Zr, and Hf, or a carbide of an alloy containing at least one metal selected from the metal group. Since the carbide of the metal or alloy forming the contact electrode layer is stabler in respect of energy because of reduced formation enthalpy than the metal or alloy itself, it is very unlikely to diffuse. Therefore, little metal or alloy forming the contact electrode layer precipitates on the surface of the lead electrode layer formed on the contact electrode layer, thus improving the device performance, based on the reduced lead wire resistance.
    • 本发明的欧姆电极包括形成在基板上的与p型金刚石半导体层欧姆接触并且具有低接触电阻和高耐热性的p型金刚石半导体层上的接触电极层 以及形成在接触电极层上的引线电极层,以便具有低引线电阻和高耐热性。 具体地,接触电极层由选自由Ti,Zr和Hf的金属组成的至少一种金属的碳化物或含有选自金属中的至少一种金属的合金的碳化物制成。 由于形成接触电极层的金属或合金的碳化物相对于能量而言更稳定,因为与金属或合金本身相比,形成焓降低,所以不可能扩散。 因此,形成接触电极层的少量金属或合金在形成在接触电极层上的引线电极层的表面析出,从​​而基于降低的引线电阻提高器件性能。
    • 7. 发明授权
    • Field effect transistor using diamond
    • 场效应晶体管采用金刚石
    • US5903015A
    • 1999-05-11
    • US528028
    • 1995-09-14
    • Hiromu ShiomiYoshiki NishibayashiShin-ichi Shikata
    • Hiromu ShiomiYoshiki NishibayashiShin-ichi Shikata
    • H05H1/46H01L21/31H01L21/338H01L29/10H01L29/16H01L29/80H01L29/812H01L31/312
    • H01L29/1602H01L29/1029
    • A field effect transistor in accordance with the present invention comprises a buffer layer made of a highly resistant diamond on a substrate; an active layer which is made of a conductive diamond on the buffer layer and has such a dopant concentration that conduction of carriers is metallically dominated thereby and such a thickness that dopant distribution is two-dimensionally aligned thereby; a cap layer made of a highly resistant diamond on the active layer; a gate electrode layer formed on the cap layer so as to make Schottky contact therewith; and a source electrode layer and a drain electrode layer which make ohmic contact with a laminate structure of said buffer, active and cap layers. Namely, the active layer is formed as a so-called .delta.-dope layer or pulse-dope layer doped with a conductive dopant, while being held between both highly resistant buffer and cap layers. Accordingly, even when the dopant concentration in the conductive diamond layer is increased, a high gain, as an excellent controllability and an excellent temperature-stability in operation characteristics can be obtained.
    • 根据本发明的场效应晶体管包括由衬底上的高抗性金刚石制成的缓冲层; 在缓冲层上由导电金刚石制成的有源层具有这样的掺杂剂浓度,使得载流子的导电由此被金属化地控制,并且这样的厚度使得掺杂剂分布由二维排列; 在有源层上由耐高度金刚石制成的盖层; 形成在所述盖层上以使其肖特基接触的栅电极层; 以及与所述缓冲层,活性层和盖层的叠层结构欧姆接触的源电极层和漏电极层。 也就是说,有源层被形成为所谓的增量掺杂层或掺杂有导电掺杂剂的脉冲 - 掺杂层,同时保持在高电阻缓冲层和盖层之间。 因此,即使当导电金刚石层中的掺杂剂浓度增加时,也可以获得作为优异的可控性和优异的操作特性温度稳定性的高增益。