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    • 4. 发明授权
    • Field effect transistor using diamond
    • 场效应晶体管采用金刚石
    • US5903015A
    • 1999-05-11
    • US528028
    • 1995-09-14
    • Hiromu ShiomiYoshiki NishibayashiShin-ichi Shikata
    • Hiromu ShiomiYoshiki NishibayashiShin-ichi Shikata
    • H05H1/46H01L21/31H01L21/338H01L29/10H01L29/16H01L29/80H01L29/812H01L31/312
    • H01L29/1602H01L29/1029
    • A field effect transistor in accordance with the present invention comprises a buffer layer made of a highly resistant diamond on a substrate; an active layer which is made of a conductive diamond on the buffer layer and has such a dopant concentration that conduction of carriers is metallically dominated thereby and such a thickness that dopant distribution is two-dimensionally aligned thereby; a cap layer made of a highly resistant diamond on the active layer; a gate electrode layer formed on the cap layer so as to make Schottky contact therewith; and a source electrode layer and a drain electrode layer which make ohmic contact with a laminate structure of said buffer, active and cap layers. Namely, the active layer is formed as a so-called .delta.-dope layer or pulse-dope layer doped with a conductive dopant, while being held between both highly resistant buffer and cap layers. Accordingly, even when the dopant concentration in the conductive diamond layer is increased, a high gain, as an excellent controllability and an excellent temperature-stability in operation characteristics can be obtained.
    • 根据本发明的场效应晶体管包括由衬底上的高抗性金刚石制成的缓冲层; 在缓冲层上由导电金刚石制成的有源层具有这样的掺杂剂浓度,使得载流子的导电由此被金属化地控制,并且这样的厚度使得掺杂剂分布由二维排列; 在有源层上由耐高度金刚石制成的盖层; 形成在所述盖层上以使其肖特基接触的栅电极层; 以及与所述缓冲层,活性层和盖层的叠层结构欧姆接触的源电极层和漏电极层。 也就是说,有源层被形成为所谓的增量掺杂层或掺杂有导电掺杂剂的脉冲 - 掺杂层,同时保持在高电阻缓冲层和盖层之间。 因此,即使当导电金刚石层中的掺杂剂浓度增加时,也可以获得作为优异的可控性和优异的操作特性温度稳定性的高增益。
    • 5. 发明授权
    • Diamond heat sink including microchannel therein and methods for
manufacturing diamond heat sinks
    • 金刚石散热器,其中包括微通道及其制造金刚石散热器的方法
    • US5874775A
    • 1999-02-23
    • US840161
    • 1997-04-14
    • Hiromu ShiomiHideaki NakahataYoshiki NishibayashiShin-ichi Shikata
    • Hiromu ShiomiHideaki NakahataYoshiki NishibayashiShin-ichi Shikata
    • H01L23/373H01L23/38H01L23/34H01L23/06
    • H01L23/38H01L23/3732H01L2924/0002Y10S257/93
    • A diamond heat sink of the present invention comprises: a support layer consisting of substantially undoped diamond; a heat sensitive layer consisting of doped diamond, disposed on the surface of the support layer; an insulation layer consisting of substantially undoped diamond, disposed on a predetermined region in the surface of the heat sensitive layer; electrodes disposed on the heat sensitive layer, wherein an exothermal device is placed on the surface of the insulation layer; and a cooling structure disposed on the backside of the support layer, the cooling structure having at least one microchannel, the microchannel being defined by a diamond, wherein an exothermal device is to be placed on the surface of the insulation layer; and wherein the heat sensitive layer and the electrodes form a thermistor, the electrical resistivity of the thermistor being capable of varying corresponding to heat generated from the exothermal device and transferred through the insulation layer to the thermistor.
    • 本发明的金刚石散热器包括:由基本上未掺杂的金刚石构成的支撑层; 由掺杂金刚石构成的热敏层,设置在支撑层的表面上; 由基本上未掺杂的金刚石构成的绝缘层,设置在热敏层表面的预定区域上; 设置在热敏层上的电极,其中放热装置放置在绝缘层的表面上; 以及设置在所述支撑层的背面上的冷却结构,所述冷却结构具有至少一个微通道,所述微通道由金刚石限定,其中放热装置将被放置在所述绝缘层的表面上; 并且其中所述热敏层和所述电极形成热敏电阻,所述热敏电阻的电阻率能够相应于从所述放热器件产生的热量而变化并通过所述绝缘层传递到所述热敏电阻器。
    • 10. 发明授权
    • Diamond semiconductor device with P-I-N type multilayer structure
    • 具有P-I-N型多层结构的金刚石半导体器件
    • US5600156A
    • 1997-02-04
    • US303112
    • 1994-09-08
    • Yoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • Yoshiki NishibayashiTadashi TomikawaShin-ichi Shikata
    • C30B29/04H01L29/16H01L29/74H01L29/772H01L29/861H01L31/0312H01L29/167H01L31/075
    • H01L29/1602H01L29/74H01L29/7722
    • A diamond semiconductor device of the present invention comprises an n-type diamond layer to which an n-type dopant is doped at high concentration so that metal conduction dominates, a p-type diamond layer to which a p-type dopant is doped at high concentration so that metal conduction dominates, and a high resistance diamond layer formed between the n-type diamond layer and the p-type diamond layer. Here, the thickness and the doping concentration of the high resistance diamond layer are values at which semiconductor conduction dominates. Then, in a case that an applied voltage is forward bias, electrons are injected from the n-type region to the p-type region through the conduction band of the high resistance region, and holes are injected from the p-type region to the n-type region through the valance band of the high resistance region, so that a current flows. On the other hand, in a case that an applied voltage is reverse bias because substantially no dopant is doped to the high resistance diamond layer, carriers are not present, so that a large current does not flow. Therefore, semiconductor conduction dominates as carrier conduction in pn junction and the rectification can be obtained, so that with the control of carriers, good diode characteristics or transistor characteristics can be achieved.
    • 本发明的金刚石半导体器件包括n型金刚石层,以高浓度掺杂n型掺杂剂以使金属导电占主导地位,p型掺杂剂掺杂在高的p型金刚石层 浓度使得金属导电占主导地位,并且在n型金刚石层和p型金刚石层之间形成高电阻金刚石层。 这里,高电阻金刚石层的厚度和掺杂浓度是半导体传导占主导地位的值。 然后,在施加的电压为正向偏压的情况下,通过高电阻区域的导带从n型区域向p型区域注入电子,从p型区域注入空穴 n型区域通过高电阻区域的价带,使得电流流动。 另一方面,在施加的电压为反向偏压的情况下,由于基本上没有掺杂剂掺杂到高电阻金刚石层,所以不存在载流子,使得大的电流不流动。 因此,半导体传导作为pn结中的载流子导通,可以获得整流,因此通过载流子的控制,可以实现良好的二极管特性或晶体管特性。