专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06979250B2 Carrier head with flexible membrane to provide controllable pressure and loading area 失效
标题翻译：承载头带有柔性膜，提供可控的压力和装载面积
公开(公告)号：US06979250B2
公开(公告)日：2005-12-27
申请号：US10806649
申请日：2004-03-22
申请人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
发明人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
IPC分类号： B24B37/30 , B24B49/16 , B24B1/00
CPC分类号： B24B37/30 , B24B49/16
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
摘要翻译：用于化学机械抛光装置的载体头包括柔性膜，其在可控内径的区域中对基底施加可控制的载荷。

2. 发明授权

US06776694B2 Methods for carrier head with multi-part flexible membrane 失效
标题翻译：带有多部分柔性膜的载体头的方法
公开(公告)号：US06776694B2
公开(公告)日：2004-08-17
申请号：US10188259
申请日：2002-07-01
申请人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
发明人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
IPC分类号： B24B100
CPC分类号： B24B37/30 , F16J3/02
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
摘要翻译：用于化学机械抛光装置的载体头包括向基底施加载荷的柔性膜。柔性膜的中心部分由与形成柔性膜的环形部分的第二材料刚度不同的第一材料形成。

3. 发明授权

US06722965B2 Carrier head with flexible membranes to provide controllable pressure and loading area 失效
标题翻译：承载头带柔性膜，提供可控的压力和装载面积
公开(公告)号：US06722965B2
公开(公告)日：2004-04-20
申请号：US09903226
申请日：2001-07-10
申请人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
发明人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
IPC分类号： B24B100
CPC分类号： B24B37/30 , B24B49/16
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.
摘要翻译：用于化学机械抛光装置的载体头包括柔性膜，其在可控内径的区域中对基底施加可控制的载荷。

4. 发明授权

US06450868B1 Carrier head with multi-part flexible membrane 有权
标题翻译：载体头部配有多部分柔性膜
公开(公告)号：US06450868B1
公开(公告)日：2002-09-17
申请号：US09535575
申请日：2000-03-27
申请人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
发明人： Steven M. Zuniga , Hung Chih Chen , Ming Kuie Tseng
IPC分类号： B24B4700
CPC分类号： B24B37/30 , F16J3/02
摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
摘要翻译：用于化学机械抛光装置的载体头包括向基底施加载荷的柔性膜。柔性膜的中心部分由与形成柔性膜的环形部分的第二材料刚度不同的第一材料形成。

5. 发明授权

US08454413B2 Multi-chamber carrier head with a textured membrane 有权
标题翻译：具有纹理膜的多腔载体头
公开(公告)号：US08454413B2
公开(公告)日：2013-06-04
申请号：US11614940
申请日：2006-12-21
申请人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chih Chen , Andrew J. Nagengast , Steven M. Zuniga , Thomas B. Brezoczky
发明人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chih Chen , Andrew J. Nagengast , Steven M. Zuniga , Thomas B. Brezoczky
IPC分类号： B24B41/06
CPC分类号： B24B37/30 , B24B41/06 , B29C33/424 , B29C35/02 , B29K2023/00 , B29K2083/00 , B29K2995/0074 , B29L2031/755
摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.
摘要翻译：用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到基座组件。翼片的至少一个表面具有表面纹理以防止粘附。

6. 发明授权

US08298047B2 Substrate retainer 有权
标题翻译：基板保持架
公开(公告)号：US08298047B2
公开(公告)日：2012-10-30
申请号：US12987709
申请日：2011-01-10
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B5/35
CPC分类号： B24B37/32 , B24B37/28
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译：保持器用于抛光衬底的装置。衬底具有上表面和下表面以及侧面，基本上圆形的周边。该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

7. 发明申请

US20110104990A1 Substrate Retainer 有权
标题翻译：基板保持器
公开(公告)号：US20110104990A1
公开(公告)日：2011-05-05
申请号：US12987709
申请日：2011-01-10
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B1/00 , B24B41/06
CPC分类号： B24B37/32 , B24B37/28
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译：保持器用于抛光衬底的装置。衬底具有上表面和下表面以及侧面，基本上圆形的周边。该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

8. 发明授权

US07459057B2 Substrate retainer 有权
标题翻译：基板保持架
公开(公告)号：US07459057B2
公开(公告)日：2008-12-02
申请号：US10199738
申请日：2002-07-18
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： C23F1/02 , B28B1/00 , B32B13/00
CPC分类号： B24B37/32 , B24B37/28
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译：保持器用于抛光衬底的装置。衬底具有上表面和下表面以及侧面，基本上圆形的周边。该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

9. 发明申请

US20080196833A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20080196833A1
公开(公告)日：2008-08-21
申请号：US12049650
申请日：2008-03-17
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： H01L21/306 , B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

10. 发明申请

US20070289124A1 FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP 有权
标题翻译：快速底板装载在无膜渗透步骤的抛光头上
公开(公告)号：US20070289124A1
公开(公告)日：2007-12-20
申请号：US11757069
申请日：2007-06-01
申请人： Jeonghoon Oh , Andrew Nagengast , Steven M. Zuniga , Hung Chih Chen
发明人： Jeonghoon Oh , Andrew Nagengast , Steven M. Zuniga , Hung Chih Chen
IPC分类号： H05K13/04
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/67005 , Y10T29/5313 , Y10T279/11
摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.
摘要翻译：本发明涉及一种用于改善和加速基板加载过程的装置和方法。一个实施例提供了用于真空吸附衬底的方法。该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到柔性膜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式