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    • 1. 发明授权
    • Processes for synthesizing borohydride compounds
    • 合成硼氢化合物的方法
    • US06670444B2
    • 2003-12-30
    • US10331674
    • 2002-12-27
    • Steven C. AmendolaMichael T. KellyJeffrey V. OrtegaYing Wu
    • Steven C. AmendolaMichael T. KellyJeffrey V. OrtegaYing Wu
    • C08G7908
    • C01B6/21C01B3/34C01B6/13C01B6/19C01B2203/0227C01B2203/0283F17C11/005Y02P20/582
    • The present invention relates to processes for producing borohydride compounds. In particular, the present invention provides efficient processes and compositions for the large-scale production of borohydride compounds of the formula YBH4 by the reaction of a boron-containing compound represented by the formula BX3 with hydrogen or an aldehyde to obtain diborane and HX, and reacting the diborane with a Y-containing base selected from those represented by the formula Y2O, YOH and Y2CO3 to obtain YBH4 and YBO2. Y is selected from the group consisting of the alkali metals, pseudo-alkali metals, alkaline earth metals, an ammonium ion, and quaternary amines of the formula NR4+, wherein each R is independently selected from hydrogen and a straight- or branched-chain C1-4 alkyl group, and X is selected from the group consisting of halide ions, —OH, —R′ and —OR′ groups, chalcogens, and chalcogenides, wherein R′ is a straight- or branched-chain C1-4 alkyl group.
    • 本发明涉及生产硼氢化合物的方法。 特别地,本发明提供了通过式BX3表示的含硼化合物与氢或醛反应而大规模生产式YBH4的硼氢化合物的有效方法和组合物,以获得乙硼烷和HX,以及 使乙硼烷与选自由式Y 2 O,YOH和Y 2 CO 3表示的Y含量碱反应,得到YBH 4和YBO 2。 Y选自碱金属,假碱金属,碱土金属,铵离子和式NR4 +的季胺,其中每个R独立地选自氢和直链或支链的 - 链C 1-4烷基,X选自卤离子,-OH,-R'和-OR'基,硫属元素和硫族化物,其中R'是直链或支链C1- 4烷基。
    • 7. 发明申请
    • POWERED GRID FOR PLASMA CHAMBER
    • 等离子室用电网
    • US20120322270A1
    • 2012-12-20
    • US13161372
    • 2011-06-15
    • Maolin LongAlex PatersonRichard MarshYing Wu
    • Maolin LongAlex PatersonRichard MarshYing Wu
    • H01L21/3065C23F1/08
    • H01J37/32651H01J37/321H01J37/32697H01L21/6831
    • A plasma processing chamber and methods for operating the chamber are provided. An exemplary chamber includes an electrostatic chuck for receiving a substrate and a dielectric window connected to a top portion of the chamber. An inner side of dielectric window faces a plasma processing region that is above the electrostatic chuck and an outer side of the dielectric window is exterior to the plasma processing region. Inner and outer coils are disposed above the outer side of the dielectric window, and the inner and outer coils are connected to a first RF power source. A powered grid is disposed between the outer side of dielectric window and the inner and outer coils. The powered grid is connected to a second RF power source that is independent from the first RF power source.
    • 提供等离子体处理室和操作室的方法。 示例性室包括用于接收基板的静电卡盘和连接到腔室顶部的电介质窗口。 电介质窗口的内侧面对位于静电卡盘上方的等离子体处理区域,并且电介质窗口的外侧在等离子体处理区域的外部。 内部和外部线圈设置在电介质窗口的外侧上方,内部和外部线圈连接到第一RF电源。 电力网格设置在电介质窗口的外侧和内部和外部线圈之间。 电网连接到独立于第一RF电源的第二RF电源。