专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08137510B2 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US08137510B2
公开(公告)日：2012-03-20
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
IPC分类号： C23C14/00
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

2. 发明申请

US20050252768A1 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US20050252768A1
公开(公告)日：2005-11-17
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
IPC分类号： C23C14/34 , C23C14/35 , C23C14/56 , H01J37/34 , C23C14/32
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

3. 发明授权

US07837799B2 Arrangement for transporting a flat substrate in a vacuum chamber 失效
标题翻译：用于在真空室中输送平面基板的布置
公开(公告)号：US07837799B2
公开(公告)日：2010-11-23
申请号：US10732179
申请日：2003-12-10
申请人： Stefan Bangert , Frank Fuchs , Uwe Schuessler , Ralph Lindenberg , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Uwe Schuessler , Ralph Lindenberg , Tobias Stolley
IPC分类号： C23C16/00 , C23C14/00 , C23F1/00 , H01L21/306 , C25B11/00 , C25B13/00
CPC分类号： B65G49/065 , B65G49/063 , B65G2249/02 , B65G2249/045 , Y10S414/139
摘要： An arrangement for transporting a flat substrate through a coating installation, wherein the coating installation comprises, e.g., several and different sputter cathodes, to which the flat substrate, for example a glass pane, is transported one after the other in vacuo. So that no abrasion is generated between glass pane and contact, the glass pane is kept spaced apart from the contact by means of gas pressure. The gas pressure is herein built up through relatively few and small holes in a gas channel. Since during flooding of the coating installation to atmospheric pressure or during evacuation, due to the small holes, no fast pressure equalization between gas channel and the remaining coating installation is possible, the gas channel is decoupled in terms of gas from the remaining coating installation and provided with a separate gas line, via which gas can be introduced into the gas channel or pumped out of it.
摘要翻译：用于将平坦基底输送通过涂覆装置的布置，其中所述涂覆装置包括例如多个和不同的溅射阴极，平坦基底例如玻璃板在其中真空地彼此输送。因此，玻璃板和接触件之间不会产生磨损，玻璃板通过气体压力与接触件保持间隔开。气体压力通过气体通道中相对较少和小的孔形成。由于涂层装置在大气压下或排空过程中，由于小孔，气体通道和剩余的涂层装置之间无法实现快速压力平衡，所以气体通道与剩余涂层装置的气体相分离，设置有单独的气体管线，通过该气体管线可以将气体引入气体通道中或从其中泵出。

4. 发明申请

US20050199493A1 Arrangement for transporting a flat substrate in a vacuum chamber 失效
标题翻译：用于在真空室中输送平面基板的布置
公开(公告)号：US20050199493A1
公开(公告)日：2005-09-15
申请号：US10732179
申请日：2003-12-10
申请人： Stefan Bangert , Frank Fuchs , Uwe Schuessler , Ralph Lindenberg , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Uwe Schuessler , Ralph Lindenberg , Tobias Stolley
IPC分类号： B65G49/06 , B65G49/07 , C23C14/00
CPC分类号： B65G49/065 , B65G49/063 , B65G2249/02 , B65G2249/045 , Y10S414/139
摘要： An arrangement for transporting a flat substrate through a coating installation, wherein the comprises, e.g., several and different sputter cathodes, to which the flat substrate, for example a glass pane, is transported one after the other in vacuo. So that no abrasion is generated between glass pane and contact, the glass pane is kept spaced apart from the contact by means of gas pressure. The gas pressure is herein built up through relatively few and small holes in a gas channel. Since during flooding of the coating installation to atmospheric pressure or during evacuation, due to the small holes, no fast pressure equalization between gas channel and the remaining coating installation is possible, the gas channel is decoupled in terms of gas from the remaining coating installation and provided with a separate gas line, via which gas can be introduced into the gas channel or pumped out of it.
摘要翻译：用于将平坦基板输送通过涂布设备的布置，其中包括例如几个和不同的溅射阴极，平板基板（例如玻璃板）在其中真空地一个接一个地输送到该喷涂阴极。因此，玻璃板和接触件之间不会产生磨损，玻璃板通过气体压力与接触件保持间隔开。气体压力通过气体通道中相对较少和小的孔形成。由于涂层装置在大气压下或排空过程中，由于小孔，气体通道和剩余的涂层装置之间无法实现快速压力平衡，所以气体通道与剩余涂层装置的气体相分离，设置有单独的气体管线，通过该气体管线可以将气体引入气体通道中或从其中泵出。

5. 发明申请

US20060102863A1 Vacuum closure with linear drive unit 审中-公开
标题翻译：带线性驱动单元的真空关闭
公开(公告)号：US20060102863A1
公开(公告)日：2006-05-18
申请号：US11143822
申请日：2005-06-02
申请人： Stefan Bangert , Michael Konig , Ralph Lindenberg , Uwe Schussler , Tobias Stolley , Frank Fuchs
发明人： Stefan Bangert , Michael Konig , Ralph Lindenberg , Uwe Schussler , Tobias Stolley , Frank Fuchs
IPC分类号： F16K11/074
CPC分类号： F16K31/04 , F16K51/02
摘要： This invention relates to a vacuum treatment installation and a device therefor for the tight, especially vacuum-tight closing of an aperture, in particular a slit-like or rectangular aperture with a length that is preferably a multiple of the width of the aperture, in particular for a lock arrangement of a vacuum treatment installation, said device having a closure member (2) and for said closure member a linear drive unit (3,4,5) which, by way of a translational movement, can move the closure member from an open position into a closed position, said closure member having a sealing surface which is disposed in a plane (16) and which, in the closed position, makes sealing contact with a counter-sealing surface on the aperture side, and said plane running perpendicular to the direction of the translational movement (14) and at an oblique angle to the aperture normal (13).
摘要翻译：本发明涉及一种真空处理装置及其装置，用于紧密，特别地真空密封孔，特别是狭缝状或矩形孔，其长度优选为孔的宽度的倍数，在特别是用于真空处理装置的锁定装置，所述装置具有闭合构件（2），并且对于所述闭合构件，线性驱动单元（3,4,5）通过平移运动可移动闭合构件从打开位置到关闭位置，所述封闭构件具有设置在平面（16）中的密封表面，并且在关闭位置与密封面密封接触开口侧上的反向密封表面，并且所述平面垂直于平移运动（14）的方向延伸并且与孔径法线（13）成倾斜的角度。

6. 发明申请

US20050034981A1 Cathodic sputtering apparatus 审中-公开
标题翻译：阴极溅射装置
公开(公告)号：US20050034981A1
公开(公告)日：2005-02-17
申请号：US10851998
申请日：2004-05-20
申请人： Frank Fuchs , Stefan Bangert , Ralph Lindenberg , Helmut Grimm , Tobias Stolley , Uwe Schussler
发明人： Frank Fuchs , Stefan Bangert , Ralph Lindenberg , Helmut Grimm , Tobias Stolley , Uwe Schussler
IPC分类号： C23C14/35 , C23C14/00 , C23C14/34 , H01J37/34
CPC分类号： H01J37/3455 , C23C14/3407 , C23C14/35 , H01J37/3405
摘要： The invention relates to a cathodic sputtering apparatus (8) for coating substrates (17) in a vacuum, comprising an essentially tubular support for the material to be sputtered (2) which is rotatable about its longitudinal axis, a cooling system which is suitable for circulating a cooling medium in the tubular support (2) in conjunction with a cooling device external to the support (2), a device for connecting to an electrical power circuit, and a device for the rotary drive of the tubular support about its longitudinal axis. This apparatus also is provided with a magnet system which extends along the axis for the magnetic confinement of a plasma which is provided near a target made of the material to be sputtered, the magnet system being composed of pole shoes (9, 10), magnet yokes (12, 13) made of magnetically permeable metal, and magnetization means (5) which are suitable for generating a magnetic flux in the magnet system. The magnet poles of one polarity in the magnet system are situated outside the tubular target support (2) and enclose same in a frame-like manner, and the opposite magnetic poles are provided in the tubular, rotatable target support (2).
摘要翻译：本发明涉及一种用于在真空中涂覆基底（17）的阴极溅射装置（8），其包括可围绕其纵向轴线旋转的待溅射材料（2）的基本上管状的支撑件，适用于将冷却介质与支撑件（2）外部的冷却装置结合在一起，在管状支撑件（2）中循环冷却介质，用于连接到电力回路的装置和用于管状支撑件围绕其纵向轴线的旋转驱动的装置。该装置还设置有磁体系统，其沿着轴线延伸，用于限制等离子体的磁场限制，等离子体设置在由被溅射材料制成的靶材附近，磁体系统由极靴（9,10），磁体由导磁体金属制成的轭铁（12,13）和适用于在磁铁系统中产生磁通量的磁化装置（5）。磁体系中一个极性的磁极位于管状目标支架（2）的外侧并以框架状方式封闭，并且相对的磁极设置在管状可转动的目标支架（2）中。

7. 发明申请

US20050081791A1 Vacuum treatment installation for flat rectangular or square substrates 审中-公开
标题翻译：平面矩形或方形衬底的真空处理设备
公开(公告)号：US20050081791A1
公开(公告)日：2005-04-21
申请号：US10932563
申请日：2004-09-02
申请人： Ralph Lindenberg , Frank Fuchs , Uwe Schussler , Stefan Bangert , Tobias Stolley
发明人： Ralph Lindenberg , Frank Fuchs , Uwe Schussler , Stefan Bangert , Tobias Stolley
IPC分类号： C23C14/56 , B65G49/06 , H01L21/205 , H01L21/68 , C23C16/00
CPC分类号： C23C14/568 , B65G49/067 , B65G2249/02
摘要： A vacuum treatment installation is provided for flat substrates of large edge lengths, which are conducted to and treated in an at least substantially perpendicular position. The treatment installation comprises a vacuum chamber with at least two treatment chambers, distributed over the circumference and open at the chamber side, a series of interlocks and a rotatable configuration of substrate holders (13) within the vacuum chamber with a driving mechanism (1) for the sequential rotation and radial movement of the substrate holders (13) relative to the treatment chambers. In order to decrease the placement area, the chamber volumes and the evacuation times, to simplify the “handling”, and especially to decrease the contamination hazard of the substrates by spalled-off layer particles, it is proposed that the substrate holders (13) are connected to the driving mechanism (1) in their lower regions via connecting rods (8), and that at least the lower pivot bearings of the connecting rod configurations (8) are disposed below a horizontal center line (M) of the height (H) of the bearing surface of the substrate holders (13). All pivot bearings are preferably disposed below the horizontal center line (M). Alternatively, parallelogram connecting rod configurations suspended on extension arms (4) can be disposed or trapezoidal connecting rod configurations can be placed onto a rotary table. The substrate transport takes place free of frames and preferably in the upward direction sloped at an angle between 1 and 20 degrees with respect to the rotational axis.
摘要翻译：提供了一种真空处理装置，用于大边缘长度的平坦基底，其被传导至至少基本上垂直的位置处理和处理。处理装置包括具有至少两个处理室的真空室，分布在圆周上并在室侧开口，在真空室内具有驱动机构（1）的一系列互锁和基板保持件（13）的可旋转构造，用于衬底保持器（13）相对于处理室的顺序旋转和径向移动。为了减少放置面积，室容积和抽空时间，为了简化“处理”，特别是通过剥离层颗粒来减少基板的污染危害，提出了基板保持件（13）通过连杆（8）在其下部区域连接到驱动机构（1），并且至少连杆结构（8）的下枢转轴承设置在高度的水平中心线（M）的下方（13）的轴承表面。所有枢转轴承优选地设置在水平中心线（M）的下方。或者，可以布置悬挂在延伸臂（4）上的平行四边形连杆构造，或者可以将梯形连杆构造放置在旋转台上。衬底传送发生在没有框架的情况下，并且优选地在向上方向上以相对于旋转轴线以1和20度之间的角度倾斜。

8. 发明授权

US07575662B2 Method for operating a sputter cathode with a target 有权
标题翻译：用靶操作溅射阴极的方法
公开(公告)号：US07575662B2
公开(公告)日：2009-08-18
申请号：US11170640
申请日：2005-06-29
申请人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
发明人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
IPC分类号： C23C14/35
CPC分类号： H01J37/3405 , C23C14/352 , H01J37/3455
摘要： The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.
摘要翻译：本发明涉及一种用于操作磁控溅射阴极的方法，特别是管阴极或形成阵列的多个管阴极。在这样的阴极中，目标通过磁场，由此感应电流流过靶，使磁场发生变形。这导致衬底的不均匀涂覆。通过使磁场和目标之间的相对运动交替地反转其方向，可以补偿磁场失真的影响。这样可以使待涂覆的基底上的涂层更均匀。

9. 发明申请

US20060254905A1 Method for operating a sputter cathode with a target 有权
公开(公告)号：US20060254905A1
公开(公告)日：2006-11-16
申请号：US11170640
申请日：2005-06-29
申请人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
发明人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
IPC分类号： C23C14/00
CPC分类号： H01J37/3405 , C23C14/352 , H01J37/3455
摘要： The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.

10. 发明授权

US07479189B2 Coating plant with a charging lock and device therefor 有权
标题翻译：涂装厂带有充电锁及其装置
公开(公告)号：US07479189B2
公开(公告)日：2009-01-20
申请号：US10547718
申请日：2004-03-11
申请人： Uwe Schüssler , Stefan Bangert , Jürgen Henrich
发明人： Uwe Schüssler , Stefan Bangert , Jürgen Henrich
IPC分类号： B05C15/00
CPC分类号： C03C17/001 , C03C17/002 , C23C14/56 , C23C14/566 , F16K1/2007 , F16K1/205 , F16K1/2085 , F16K1/24 , F16K51/02
摘要： The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.
摘要翻译：本发明涉及一种具有充电锁，特别是用于涂覆室的矩形真空锁的涂覆设备，特别是真空镀膜设备，其具有长度至少为1000mm的锁定孔（13），其包括快门（ 6）用于关闭和打开锁定孔，以及用于固定闸门的闩锁（7），其中设置有用于将闸板和闩锁从第一打开位置移动到第二关闭位置的装置，反之亦然，这些装置确保还有，快门（6）和闩锁（7）的运动将以这样的方式彼此联接，使得在快门关闭之后快门（6）将被闩锁（7）自动固定，并且将是在开放之前再次释放。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式