专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060102863A1 Vacuum closure with linear drive unit 审中-公开
标题翻译：带线性驱动单元的真空关闭
公开(公告)号：US20060102863A1
公开(公告)日：2006-05-18
申请号：US11143822
申请日：2005-06-02
申请人： Stefan Bangert , Michael Konig , Ralph Lindenberg , Uwe Schussler , Tobias Stolley , Frank Fuchs
发明人： Stefan Bangert , Michael Konig , Ralph Lindenberg , Uwe Schussler , Tobias Stolley , Frank Fuchs
IPC分类号： F16K11/074
CPC分类号： F16K31/04 , F16K51/02
摘要： This invention relates to a vacuum treatment installation and a device therefor for the tight, especially vacuum-tight closing of an aperture, in particular a slit-like or rectangular aperture with a length that is preferably a multiple of the width of the aperture, in particular for a lock arrangement of a vacuum treatment installation, said device having a closure member (2) and for said closure member a linear drive unit (3,4,5) which, by way of a translational movement, can move the closure member from an open position into a closed position, said closure member having a sealing surface which is disposed in a plane (16) and which, in the closed position, makes sealing contact with a counter-sealing surface on the aperture side, and said plane running perpendicular to the direction of the translational movement (14) and at an oblique angle to the aperture normal (13).
摘要翻译：本发明涉及一种真空处理装置及其装置，用于紧密，特别地真空密封孔，特别是狭缝状或矩形孔，其长度优选为孔的宽度的倍数，在特别是用于真空处理装置的锁定装置，所述装置具有闭合构件（2），并且对于所述闭合构件，线性驱动单元（3,4,5）通过平移运动可移动闭合构件从打开位置到关闭位置，所述封闭构件具有设置在平面（16）中的密封表面，并且在关闭位置与密封面密封接触开口侧上的反向密封表面，并且所述平面垂直于平移运动（14）的方向延伸并且与孔径法线（13）成倾斜的角度。

2. 发明申请

US20050252768A1 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US20050252768A1
公开(公告)日：2005-11-17
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
IPC分类号： C23C14/34 , C23C14/35 , C23C14/56 , H01J37/34 , C23C14/32
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

3. 发明申请

US20050034981A1 Cathodic sputtering apparatus 审中-公开
标题翻译：阴极溅射装置
公开(公告)号：US20050034981A1
公开(公告)日：2005-02-17
申请号：US10851998
申请日：2004-05-20
申请人： Frank Fuchs , Stefan Bangert , Ralph Lindenberg , Helmut Grimm , Tobias Stolley , Uwe Schussler
发明人： Frank Fuchs , Stefan Bangert , Ralph Lindenberg , Helmut Grimm , Tobias Stolley , Uwe Schussler
IPC分类号： C23C14/35 , C23C14/00 , C23C14/34 , H01J37/34
CPC分类号： H01J37/3455 , C23C14/3407 , C23C14/35 , H01J37/3405
摘要： The invention relates to a cathodic sputtering apparatus (8) for coating substrates (17) in a vacuum, comprising an essentially tubular support for the material to be sputtered (2) which is rotatable about its longitudinal axis, a cooling system which is suitable for circulating a cooling medium in the tubular support (2) in conjunction with a cooling device external to the support (2), a device for connecting to an electrical power circuit, and a device for the rotary drive of the tubular support about its longitudinal axis. This apparatus also is provided with a magnet system which extends along the axis for the magnetic confinement of a plasma which is provided near a target made of the material to be sputtered, the magnet system being composed of pole shoes (9, 10), magnet yokes (12, 13) made of magnetically permeable metal, and magnetization means (5) which are suitable for generating a magnetic flux in the magnet system. The magnet poles of one polarity in the magnet system are situated outside the tubular target support (2) and enclose same in a frame-like manner, and the opposite magnetic poles are provided in the tubular, rotatable target support (2).
摘要翻译：本发明涉及一种用于在真空中涂覆基底（17）的阴极溅射装置（8），其包括可围绕其纵向轴线旋转的待溅射材料（2）的基本上管状的支撑件，适用于将冷却介质与支撑件（2）外部的冷却装置结合在一起，在管状支撑件（2）中循环冷却介质，用于连接到电力回路的装置和用于管状支撑件围绕其纵向轴线的旋转驱动的装置。该装置还设置有磁体系统，其沿着轴线延伸，用于限制等离子体的磁场限制，等离子体设置在由被溅射材料制成的靶材附近，磁体系统由极靴（9,10），磁体由导磁体金属制成的轭铁（12,13）和适用于在磁铁系统中产生磁通量的磁化装置（5）。磁体系中一个极性的磁极位于管状目标支架（2）的外侧并以框架状方式封闭，并且相对的磁极设置在管状可转动的目标支架（2）中。

4. 发明申请

US20050081791A1 Vacuum treatment installation for flat rectangular or square substrates 审中-公开
标题翻译：平面矩形或方形衬底的真空处理设备
公开(公告)号：US20050081791A1
公开(公告)日：2005-04-21
申请号：US10932563
申请日：2004-09-02
申请人： Ralph Lindenberg , Frank Fuchs , Uwe Schussler , Stefan Bangert , Tobias Stolley
发明人： Ralph Lindenberg , Frank Fuchs , Uwe Schussler , Stefan Bangert , Tobias Stolley
IPC分类号： C23C14/56 , B65G49/06 , H01L21/205 , H01L21/68 , C23C16/00
CPC分类号： C23C14/568 , B65G49/067 , B65G2249/02
摘要： A vacuum treatment installation is provided for flat substrates of large edge lengths, which are conducted to and treated in an at least substantially perpendicular position. The treatment installation comprises a vacuum chamber with at least two treatment chambers, distributed over the circumference and open at the chamber side, a series of interlocks and a rotatable configuration of substrate holders (13) within the vacuum chamber with a driving mechanism (1) for the sequential rotation and radial movement of the substrate holders (13) relative to the treatment chambers. In order to decrease the placement area, the chamber volumes and the evacuation times, to simplify the “handling”, and especially to decrease the contamination hazard of the substrates by spalled-off layer particles, it is proposed that the substrate holders (13) are connected to the driving mechanism (1) in their lower regions via connecting rods (8), and that at least the lower pivot bearings of the connecting rod configurations (8) are disposed below a horizontal center line (M) of the height (H) of the bearing surface of the substrate holders (13). All pivot bearings are preferably disposed below the horizontal center line (M). Alternatively, parallelogram connecting rod configurations suspended on extension arms (4) can be disposed or trapezoidal connecting rod configurations can be placed onto a rotary table. The substrate transport takes place free of frames and preferably in the upward direction sloped at an angle between 1 and 20 degrees with respect to the rotational axis.
摘要翻译：提供了一种真空处理装置，用于大边缘长度的平坦基底，其被传导至至少基本上垂直的位置处理和处理。处理装置包括具有至少两个处理室的真空室，分布在圆周上并在室侧开口，在真空室内具有驱动机构（1）的一系列互锁和基板保持件（13）的可旋转构造，用于衬底保持器（13）相对于处理室的顺序旋转和径向移动。为了减少放置面积，室容积和抽空时间，为了简化“处理”，特别是通过剥离层颗粒来减少基板的污染危害，提出了基板保持件（13）通过连杆（8）在其下部区域连接到驱动机构（1），并且至少连杆结构（8）的下枢转轴承设置在高度的水平中心线（M）的下方（13）的轴承表面。所有枢转轴承优选地设置在水平中心线（M）的下方。或者，可以布置悬挂在延伸臂（4）上的平行四边形连杆构造，或者可以将梯形连杆构造放置在旋转台上。衬底传送发生在没有框架的情况下，并且优选地在向上方向上以相对于旋转轴线以1和20度之间的角度倾斜。

5. 发明申请

US20050263078A1 Drive mechanism for a vacuum treatment apparatus 失效
标题翻译：真空处理设备的驱动机构
公开(公告)号：US20050263078A1
公开(公告)日：2005-12-01
申请号：US10898018
申请日：2004-07-23
申请人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
发明人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
IPC分类号： C23C14/50 , C23C14/56 , C23C16/44 , C23C16/54 , H01L21/00 , H01L21/677 , C23C16/00
CPC分类号： C23C14/568 , C23C16/54 , H01L21/67196 , H01L21/67742
摘要： The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A-A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is borne which has control rods (9) for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (6), a motor (4) and rotatory displacement drives for the control rods (9) are arranged on the supporting column (1), the control rods being in active connection each with a corresponding substrate holder. To solve the problem of carrying substrates through the vacuum treatment apparatus, even substrates of great area, smoothly, at a slight angle to the vertical, not fastened to the substrate holders, it is provided that a) the motor (4) is joined to a stationary bearing carrier (5) in which a rotatory star-shaped array of cantilevers (14) is mounted, b) the cantilevers (14) are articulated at one end to bell-crank levers (16), each of which has a pivot pin (17), c) the other end of each of the bell-crank levers (16) is articulated to one of the control rods (9), and that d) the pivot pins (17) of the bell-crank levers (16) are guided in a first stationary radial cam (11) whose shape determines the radial movements of the control rods (9). A periodic, variable superposition of the radial movements is performed by variable tangential movements produced by a second stationary radial cam (12) with a bell-crank lever which is joined by a link (24) to the drive chamber (6).
摘要翻译：本发明涉及一种用于真空处理设备的驱动机构，通过该驱动机构，基板保持器可以从轴线（A-A）从入口气闸传送到出口气闸。固定支撑柱（1）设置在中心，并且在其上具有旋转驱动室（6），其具有用于基板保持器的旋转和径向位移的控制杆（9）。在旋转驱动室（6）中，在支撑柱（1）上布置有用于控制杆（9）的马达（4）和旋转位移驱动装置，控制杆主动地连接到相应的基板支架。为了解决通过真空处理装置承载基板的问题，即使是没有紧固到基板保持器上的大面积，平滑地，与垂直方向成微小角度的基板，即使将a）马达（4）接合到固定轴承架（5），其中安装有悬臂（14）的旋转星形阵列，b）悬臂（14）在一端铰接到钟形曲柄杆（16），每一个都具有枢轴销（17），c）每个钟形杠杆（16）的另一端铰接到控制杆（9）中的一个，并且d）钟形曲柄杆（10）的枢轴销（17） 16）在其形状确定控制杆（9）的径向移动的第一固定径向凸轮（11）中引导。径向运动的周期性可变叠加通过由具有连杆（24）连接到驱动室（6）的钟形曲柄杆的第二静止径向凸轮（12）产生的可变切向运动来执行。

6. 发明授权

US07153367B2 Drive mechanism for a vacuum treatment apparatus 失效
标题翻译：真空处理设备的驱动机构
公开(公告)号：US07153367B2
公开(公告)日：2006-12-26
申请号：US10898018
申请日：2004-07-23
申请人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
发明人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
IPC分类号： C23C16/00 , C23C14/00 , C23F1/00 , H01L21/306 , H01L21/677
CPC分类号： C23C14/568 , C23C16/54 , H01L21/67196 , H01L21/67742
摘要： The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is borne which has control rods (9) for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (6), a motor (4) and rotatory displacement drives for the control rods (9) are arranged on the supporting column (1), the control rods being in active connection each with a corresponding substrate holder. To solve the problem of carrying substrates through the vacuum treatment apparatus, even substrates of great area, smoothly, at a slight angle to the vertical, not fastened to the substrate holders, it is provided that a) the motor (4) is joined to a stationary bearing carrier (5) in which a rotatory star-shaped array of cantilevers (14) is mounted, b) the cantilevers (14) are articulated at one end to bell-crank levers (16), each of which has a pivot pin (17), c) the other end of each of the bell-crank levers (16) is articulated to one of the control rods (9), and that d) the pivot pins (17) of the bell-crank levers (16) are guided in a first stationary radial cam (11) whose shape determines the radial movements of the control rods (9). A periodic, variable superposition of the radial movements is performed by variable tangential movements produced by a second stationary radial cam (12) with a bell-crank lever which is joined by a link (24) to the drive chamber (6).
摘要翻译：本发明涉及一种用于真空处理设备的驱动机构，通过该驱动机构，基板保持器可以从轴线（A-A）从入口气闸传送到出口气闸。固定支撑柱（1）设置在中心，并且在其上具有旋转驱动室（6），其具有用于基板保持器的旋转和径向位移的控制杆（9）。在旋转驱动室（6）中，在支撑柱（1）上布置有用于控制杆（9）的马达（4）和旋转位移驱动装置，控制杆主动地连接到相应的基板支架。为了解决通过真空处理装置承载基板的问题，即使是没有紧固到基板保持器上的大面积，平滑地，与垂直方向成微小角度的基板，即使将a）马达（4）接合到固定轴承架（5），其中安装有悬臂（14）的旋转星形阵列，b）悬臂（14）在一端铰接到钟形曲柄杆（16），每一个都具有枢轴销（17），c）每个钟形杠杆（16）的另一端铰接到控制杆（9）中的一个，并且d）钟形曲柄杆（10）的枢轴销（17） 16）在其形状确定控制杆（9）的径向移动的第一固定径向凸轮（11）中引导。径向运动的周期性可变叠加通过由具有连杆（24）连接到驱动室（6）的钟形曲柄杆的第二静止径向凸轮（12）产生的可变切向运动来执行。

7. 发明授权

US08733277B2 Mask support, mask assembly, and assembly comprising a mask support and a mask 有权
标题翻译：掩模支撑，面罩组装和组件，其包括掩模支架和掩模
公开(公告)号：US08733277B2
公开(公告)日：2014-05-27
申请号：US12988499
申请日：2008-12-01
申请人： Heike Landgraf , Uwe Schussler , Stefan Bangert
发明人： Heike Landgraf , Uwe Schussler , Stefan Bangert
IPC分类号： B05C11/00 , B23P11/02 , B23P11/00 , C23C14/04 , G03F7/12 , H05B33/10 , B05C21/00
CPC分类号： C23C14/042 , B05C21/005 , C23C14/04 , G03F7/12 , H05B33/10 , Y10T29/49826 , Y10T29/49863
摘要： A mask support 10 comprises a frame element 20 and an elastic element 30. The elastic element 30 is fixed to the frame element 20. The elastic element 30 is a component integrally formed of a flexible material. It comprises a lever or arm portion 37 having a first engagement protrusion 38 extending in an angle of approximately 90° from the free end of the arm portion 37. A mask assembly 40 comprises a laminar mask 41, e.g. manufactured from a thin metal foil, and connecting elements 42. The connecting elements 42 include an engagement portion 43 for engagement with the engagement protrusion 38 of the elastic element 30. The mask 41 may be attached/stretched to the mask support 10 as well as to detached from the mask support 10 comfortably.
摘要翻译：面罩支撑件10包括框架元件20和弹性元件30.弹性元件30固定到框架元件20.弹性元件30是由柔性材料整体形成的部件。它包括杠杆或臂部分37，其具有从臂部分37的自由端以大约90°的角度延伸的第一接合突出部38。由薄金属箔制成，以及连接元件42.连接元件42包括用于与弹性元件30的接合突起38接合的接合部分43.掩模41可以附着/拉伸到掩模支撑件10以及以便从面罩支撑件10舒适地脱离。

8. 发明申请

US20060162659A1 Coating plant with a charging lock and device therefor 有权
标题翻译：涂装厂带有充电锁及其装置
公开(公告)号：US20060162659A1
公开(公告)日：2006-07-27
申请号：US10547718
申请日：2004-03-11
申请人： Uwe Schussler , Stefan Bangert , Jurgen Henrich
发明人： Uwe Schussler , Stefan Bangert , Jurgen Henrich
IPC分类号： C23C16/00
CPC分类号： C03C17/001 , C03C17/002 , C23C14/56 , C23C14/566 , F16K1/2007 , F16K1/205 , F16K1/2085 , F16K1/24 , F16K51/02
摘要： The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.
摘要翻译：本发明涉及一种具有充电锁，特别是用于涂覆室的矩形真空锁的涂覆设备，特别是真空镀膜设备，其具有长度至少为1000mm的锁定孔（13），其包括快门（ 6）用于关闭和打开锁定孔，以及用于固定闸门的闩锁（7），其中设置有用于将闸板和闩锁从第一打开位置移动到第二关闭位置的装置，反之亦然，这些装置确保还有，快门（6）和闩锁（7）的运动将以这样的方式彼此联接，使得在快门关闭之后快门（6）将被闩锁（7）自动固定，并且将是在开放之前再次释放。

9. 发明申请

US20080086948A1 COATING PLANT WITH A CHARGING LOCK AND DEVICE THEREFOR 审中-公开
标题翻译：带充电锁的涂装厂及其设备
公开(公告)号：US20080086948A1
公开(公告)日：2008-04-17
申请号：US11955876
申请日：2007-12-13
申请人： Uwe Schussler , Stefan Bangert , Jurgen Henrich
发明人： Uwe Schussler , Stefan Bangert , Jurgen Henrich
IPC分类号： E05F11/02
CPC分类号： C03C17/001 , C03C17/002 , C23C14/56 , C23C14/566 , F16K1/2007 , F16K1/205 , F16K1/2085 , F16K1/24 , F16K51/02
摘要： The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.
摘要翻译：本发明涉及一种具有充电锁，特别是用于涂覆室的矩形真空锁的涂覆设备，特别是真空镀膜设备，其具有长度至少为1000mm的锁定孔（13），其包括快门（ 6）用于关闭和打开锁定孔，以及用于固定闸门的闩锁（7），其中设置有用于将闸板和闩锁从第一打开位置移动到第二关闭位置的装置，反之亦然，这些装置确保还有，快门（6）和闩锁（7）的运动将以这样的方式彼此联接，使得在快门关闭之后快门（6）将被闩锁（7）自动固定，并且将是在开放之前再次释放。

10. 发明申请

US20060108217A1 Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates 审中-公开
标题翻译：用于溅射靶的冷却背板，以及包括多个背板的溅射靶
公开(公告)号：US20060108217A1
公开(公告)日：2006-05-25
申请号：US11068538
申请日：2005-02-28
申请人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
发明人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
IPC分类号： C23C14/00
CPC分类号： C23C14/3407
摘要： Claimed is a sputtering target system comprising a plurality of backing plates (2, 3, 4) to be individually cooled. Each backing plate (2, 3, 4) is provided on its back side with a meandering groove (5) that is closed off by a sealing plate. The sealing plate (9) is welded around its circumference to the backing plate (2), and at the same time is welded to at least one ridge (7), located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate (3) not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate (20).
摘要翻译：所要求的是一种溅射靶系统，包括要单独冷却的多个背板（2,3,4）。每个背板（2,3,4）在其后侧设置有由密封板封闭的曲折槽（5）。密封板（9）围绕其圆周焊接到背板（2）上，并且同时被焊接到至少一个与框架一定距离的脊（7），所述脊（7）将两个凹槽部分与一个另一个。这样焊接到背板（3）的密封板不仅封闭凹槽以形成冷却通道，而且还用于加强相对平坦的背板（20）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式