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1. 发明授权

US09267200B2 Method for supplying sequential power impulses 有权
标题翻译：提供顺序电源脉冲的方法
公开(公告)号：US09267200B2
公开(公告)日：2016-02-23
申请号：US14112757
申请日：2012-04-04
申请人： Siegfried Krassnitzer , Daniel Lendi , Markus Lechthaler , Kurt Ruhm
发明人： Siegfried Krassnitzer , Daniel Lendi , Markus Lechthaler , Kurt Ruhm
IPC分类号： C23C14/34 , H01J37/34 , C23C14/35
CPC分类号： C23C14/3485 , C23C14/3407 , C23C14/3492 , C23C14/352 , H01J37/3467
摘要： The invention relates to a method for supplying power impulses for PVD sputtering cathodes subdivided into partial cathodes. In said method, the power impulse intervals acting on the partial cathodes are selected in such a way as to overlap, thereby dispensing with the need to interrupt the drawing of power supplied by the generator.
摘要翻译：本发明涉及一种为分散为部分阴极的PVD溅射阴极提供电源脉冲的方法。在所述方法中，作用在部分阴极上的功率脉冲间隔以重叠的方式进行选择，从而不需要中断由发电机提供的功率的绘制。

2. 发明申请

US20140190819A1 METHOD FOR SUPPLYING SEQUENTIAL POWER IMPULSES 有权
标题翻译：供应顺序功率的方法
公开(公告)号：US20140190819A1
公开(公告)日：2014-07-10
申请号：US14112757
申请日：2012-04-04
申请人： Siegfried Krassnitzer , Daniel Lendi , Markus Lechthaler , Kurt Ruhm
发明人： Siegfried Krassnitzer , Daniel Lendi , Markus Lechthaler , Kurt Ruhm
IPC分类号： C23C14/34
CPC分类号： C23C14/3485 , C23C14/3407 , C23C14/3492 , C23C14/352 , H01J37/3467
摘要： The invention relates to a method for supplying power impulses for PVD sputtering cathodes subdivided into partial cathodes. In said method, the power impulse intervals acting on the partial cathodes are selected in such a way as to overlap, thereby dispensing with the need to interrupt the drawing of power supplied by the generator.
摘要翻译：本发明涉及一种为分散为部分阴极的PVD溅射阴极提供电源脉冲的方法。在所述方法中，作用在部分阴极上的功率脉冲间隔以重叠的方式进行选择，从而不需要中断由发电机提供的功率的绘制。

3. 发明授权

US09226379B2 Plasma source 有权
标题翻译：等离子体源
公开(公告)号：US09226379B2
公开(公告)日：2015-12-29
申请号：US14343549
申请日：2012-08-29
申请人： Siegfried Krassnitzer , Daniel Lendi , Juerg Hagmann
发明人： Siegfried Krassnitzer , Daniel Lendi , Juerg Hagmann
IPC分类号： H01J61/00 , H05H1/24 , H01J27/02 , H01J37/32
CPC分类号： H05H1/24 , H01J27/022 , H01J37/32045 , H01J37/32064
摘要： The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.
摘要翻译：本发明涉及一种以浮动方式设置在真空室上的等离子体源，其中等离子体源包括源壳体，并且灯丝设置在源壳体中并且被布置成与其绝缘，其中用于提供测量源壳体和灯丝之间的电位降。测量的电位降可用于调节灯丝的电压加热。根据本发明，提供了相应的装置。

4. 发明申请

US20140217892A1 PLASMA SOURCE 有权
标题翻译：等离子体源
公开(公告)号：US20140217892A1
公开(公告)日：2014-08-07
申请号：US14343549
申请日：2012-08-29
申请人： Siegfried Krassnitzer , Daniel Lendi , Juerg Hagmann
发明人： Siegfried Krassnitzer , Daniel Lendi , Juerg Hagmann
IPC分类号： H05H1/24
CPC分类号： H05H1/24 , H01J27/022 , H01J37/32045 , H01J37/32064
摘要： The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.
摘要翻译：本发明涉及一种以浮动方式设置在真空室上的等离子体源，其中等离子体源包括源壳体，并且灯丝设置在源壳体中并且被布置成与其绝缘，其中用于提供测量源壳体和灯丝之间的电位降。测量的电位降可用于调节灯丝的电压加热。根据本发明，提供了相应的装置。

5. 发明申请

US20080143260A1 Vacuum Plasma Generator 有权
标题翻译：真空等离子发生器
公开(公告)号：US20080143260A1
公开(公告)日：2008-06-19
申请号：US11817443
申请日：2006-03-01
申请人： Gerhard Tuymer , Jurgen Ramm , Daniel Lendi
发明人： Gerhard Tuymer , Jurgen Ramm , Daniel Lendi
IPC分类号： H01J37/32
CPC分类号： H01J37/32174 , H01J37/32091 , H02M7/10
摘要： The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9′) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9′). The DC/DC voltage converter (7) has at least two floating transformer secondary circuits (23) and comprises a switch-over device (20) with a switch controller (22) for optionally switching the floating transformer secondary circuits (23) in parallel or in series.
摘要翻译：本发明涉及一种用于通过脉冲等离子体处理在真空室（2）中提供用于处理工件（5）的等离子体放电（10）的真空等离子体发生器。所述真空等离子体发生器包括具有AC电源（6a）的发电机输出（9,9'），用于将AC电源电压整流为DC电压的AC / DC电源整流器系统（6），滤波电容器 b），作为时钟的DC / DC电压转换器（7）的第一级，具有用于调节产生中间电路电压（Uz）的DC输出电压的装置，包括受控电源开关（7a），其馈送一个变压器（14），其次级绕组连接到整流器（15）和下游中间电容器（12），并构成浮动变压器次级电路（23）。所述次级电路连接到作为脉冲输出级（8）并连接到发电机输出（9,9'）的下游第二级。 DC / DC电压转换器（7）具有至少两个浮动变压器次级电路（23），并且包括具有开关控制器（22）的切换装置（20），用于可选地平行地切换浮动变压器次级电路（23）或串联。

6. 发明授权

US07455755B2 Vacuum plasma generator 有权
标题翻译：真空等离子发生器
公开(公告)号：US07455755B2
公开(公告)日：2008-11-25
申请号：US11817443
申请日：2006-03-20
申请人： Gerhard Tuymer , Jürgen Ramm , Daniel Lendi
发明人： Gerhard Tuymer , Jürgen Ramm , Daniel Lendi
IPC分类号： C23C14/00
CPC分类号： H01J37/32174 , H01J37/32091 , H02M7/10
摘要： The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9′) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9′). The DC/DC voltage converter (7) has at least two floating transformer secondary circuits (23) and comprises a switch-over device (20) with a switch controller (22) for optionally switching the floating transformer secondary circuits (23) in parallel or in series.
摘要翻译：本发明涉及一种用于通过脉冲等离子体处理在真空室（2）中提供用于处理工件（5）的等离子体放电（10）的真空等离子体发生器。所述真空等离子体发生器包括具有AC电源（6a）的发电机输出（9,9'），用于将AC电源电压整流为DC电压的AC / DC电源整流器系统（6），滤波电容器 b），作为时钟的DC / DC电压转换器（7）的第一级，具有用于调节产生中间电路电压（Uz）的DC输出电压的装置，包括受控电源开关（7a），其馈送一个变压器（14），其次级绕组连接到整流器（15）和下游中间电容器（12），并构成浮动变压器次级电路（23）。所述次级电路连接到作为脉冲输出级（8）并连接到发电机输出（9,9'）的下游第二级。 DC / DC电压转换器（7）具有至少两个浮动变压器次级电路（23），并且包括具有开关控制器（22）的切换装置（20），用于可选地平行地切换浮动变压器次级电路（23）或串联。

7. 发明授权

US09997338B2 Method for operating a pulsed arc source 有权
公开(公告)号：US09997338B2
公开(公告)日：2018-06-12
申请号：US11102337
申请日：2005-04-08
申请人： Jürgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
发明人： Jürgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
IPC分类号： C23C14/00 , H01J37/34 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/32 , F01D5/28 , H01J37/32
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current.The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18′ and an additional power supply 13′, 18″, or a power supply 21, 21′, 22 designed with switchable combinatorial circuitry.

8. 发明授权

US07943017B2 Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source 有权
标题翻译：用于操作脉冲电弧蒸发源和包括所述脉冲电弧蒸发源的真空处理系统的方法
公开(公告)号：US07943017B2
公开(公告)日：2011-05-17
申请号：US11908542
申请日：2006-03-01
申请人： Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
发明人： Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
IPC分类号： C23C14/00
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.
摘要翻译：用于表面处理工件的真空处理系统使用电弧蒸发源。该系统具有连接到与电弧蒸发源分开设置的直流电源和第二电极的第一电极。两个电极在连接到单个脉冲电源时被操作。

9. 发明申请

US20080173536A1 Method For Operating a Pulsed Arc Evaporation Source and Vacuum Process System Comprising Said Pulsed Arc Evaporation Source 有权
标题翻译：用于操作包括所述脉冲电弧蒸发源的脉冲蒸发源和真空处理系统的方法
公开(公告)号：US20080173536A1
公开(公告)日：2008-07-24
申请号：US11908542
申请日：2006-03-01
申请人： Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
发明人： Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
IPC分类号： C23C14/35 , C23C14/00
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.
摘要翻译：用于表面处理工件的真空处理系统使用电弧蒸发源。该系统具有连接到与电弧蒸发源分开设置的直流电源和第二电极的第一电极。两个电极在连接到单个脉冲电源时被操作。

10. 发明申请

US20070000772A1 Method for operating a pulsed arc source 有权
标题翻译：操作脉冲电弧源的方法
公开(公告)号：US20070000772A1
公开(公告)日：2007-01-04
申请号：US11102337
申请日：2005-04-08
申请人： Jurgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
发明人： Jurgen Ramm , Oliver Gstoehl , Beno Widrig , Daniel Lendi
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current. The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18′ and an additional power supply 13′, 18″, or a power supply 21, 21′, 22 designed with switchable combinatorial circuitry.
摘要翻译：本发明涉及一种用于沉积绝缘层的基于弧的方法和用于低温涂覆工艺的基于弧的方法，其中点火并施加在电弧源中的靶的表面上的电弧放电，同时馈送直流电和脉冲或交流电流。本发明还涉及一种电弧源，其中目标物连接到电源单元，该电源单元包含至少一个脉冲大电流电源18,18'和附加电源13'，18“或电源21,21'，22设计具有可切换的组合电路。

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