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1. 发明授权

US5782990A Method for washing objects 失效
标题翻译：清洗物品的方法
公开(公告)号：US5782990A
公开(公告)日：1998-07-21
申请号：US789537
申请日：1997-01-27
申请人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： A washing method for washing objects includes the steps of supplying a washing liquid to a washing vessel and immersing objects in the washing liquid contained in the washing vessel. The method also includes the steps of discharging the liquid at least once from the washing vessel, and starting to apply the washing liquid to the objects when the objects are partly exposed to air as the liquid is discharged from the washing vessel. The washing liquid application is continued during exposure of the objects to the air to prevent the surface of the objects from being dried and stained.
摘要翻译：用于清洗物体的清洗方法包括以下步骤：将洗涤液体供应到洗涤容器中，并将物品浸入容纳在洗涤容器中的洗涤液体中。该方法还包括以下步骤：从洗涤容器排出至少一次液体，并且当液体从洗涤容器中排出时，当物体部分暴露在空气中时，开始将洗涤液施加到物体上。在将物体暴露于空气中期间继续洗涤液体的应用，以防止物体的表面被干燥和染色。

2. 发明授权

US5671764A Washing apparatus, and washing method 失效
标题翻译：洗衣机和洗涤方法
公开(公告)号：US5671764A
公开(公告)日：1997-09-30
申请号：US560708
申请日：1995-11-20
申请人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677 , B08B15/00
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.
摘要翻译：本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。该室具有开口，设计用于清洗从外部通过开口运送的物体。打开/关闭机构设计成打开和关闭洗涤室的开口。喷嘴用于清洗打开/关闭机构。该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当清洗液体从洗涤液中排出时物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上船只。

3. 发明授权

US5887604A Washing apparatus, and washing method 失效
标题翻译：洗衣机和洗涤方法
公开(公告)号：US5887604A
公开(公告)日：1999-03-30
申请号：US743836
申请日：1996-11-05
申请人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.
摘要翻译：本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。该室具有开口，设计用于清洗从外部通过开口运送的物体。打开/关闭机构设计成打开和关闭洗涤室的开口。喷嘴用于清洗打开/关闭机构。该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当洗涤液从洗涤液中排出时，当物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上船只。

4. 发明授权

US5488964A Washing apparatus, and washing method 失效
公开(公告)号：US5488964A
公开(公告)日：1996-02-06
申请号：US880068
申请日：1992-05-07
申请人： Shinya Murakami , Yuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

5. 发明授权

US5518552A Method for scrubbing and cleaning substrate 失效
标题翻译：洗涤和清洁基材的方法
公开(公告)号：US5518552A
公开(公告)日：1996-05-21
申请号：US267542
申请日：1994-06-29
申请人： Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
发明人： Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
IPC分类号： G02F1/1333 , H01L21/00 , B08B1/00 , B08B3/02 , B08B3/12 , B08B7/02
CPC分类号： H01L21/67051 , G02F1/1333 , H01L21/67046
摘要： A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.
摘要翻译：衬底洗涤和清洁方法，其中衬底被携带到可旋转的擦洗装置，并且衬底的两个表面被基本保持基本水平的可旋转洗涤装置擦洗。此外，在衬底基本上水平并且被线性往复运动的同时，将清洁溶液施加到衬底的两个表面。

6. 发明授权

US5345639A Device and method for scrubbing and cleaning substrate 失效
标题翻译：洗涤和清洁基材的装置和方法
公开(公告)号：US5345639A
公开(公告)日：1994-09-13
申请号：US69106
申请日：1993-05-28
申请人： Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
发明人： Kouichi Tanoue , Shinzi Kitamura , Noriyuki Anai , Takami Satoh , Takayuki Tomoeda , Tatsuya Iwasaki , Kengo Mizosaki
IPC分类号： G02F1/1333 , H01L21/00 , A46B13/04
CPC分类号： H01L21/67051 , G02F1/1333 , H01L21/67046
摘要： A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.
摘要翻译：一种基板洗涤和清洁装置，包括具有用于洗涤LCD玻璃基板的两个表面的上部和下部刷构件的机构，用于旋转上部和下部刷构件的机构，用于向上部和下部刷子提供纯水的机构构件，用于在基板传送方向上相对于上刷毛构件和下刷构件在上刷毛构件和下刷构件之间承载衬底往复运动的机构，以及用于控制衬底承载机构的操作的控制器。

7. 发明授权

US5965200A Processing apparatus and processing method 失效
公开(公告)号：US5965200A
公开(公告)日：1999-10-12
申请号：US936723
申请日：1997-09-25
申请人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
发明人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
IPC分类号： G03F7/30 , B05C5/02 , B05C11/08 , B05C11/10 , H01L21/02 , H01L21/027 , B05D3/12
CPC分类号： B05C11/1039 , G03F7/3021 , B05C11/08 , B05C5/0208 , Y10S134/902
摘要： A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.

8. 发明授权

US5626913A Resist processing method and apparatus 失效
标题翻译：抗蚀剂加工方法及装置
公开(公告)号：US5626913A
公开(公告)日：1997-05-06
申请号：US400935
申请日：1995-03-09
申请人： Takayuki Tomoeda , Masaaki Murakami , Kenichi Nishioka
发明人： Takayuki Tomoeda , Masaaki Murakami , Kenichi Nishioka
IPC分类号： G03F7/16 , G03F7/30 , B65D3/00
CPC分类号： G03F7/162 , G03F7/3021 , Y10S134/902
摘要： A invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.
摘要翻译：本发明提供了一种用于待处理物体的抗蚀剂处理方法，包括将处理液供给到待处理物体上以对被处理物进行处理的处理步骤，以及将清洗液供给到要处理的对象以清洁待处理的对象，其中处理步骤至少部分地与清洁步骤重叠。本发明还提供了一种用于待处理对象的抗蚀剂处理方法，包括以下步骤：将处理溶液供应装置定位在用于将处理溶液供给到具有一对相对边缘的待处理四边形物体上方，在所述处理液供给单元将所述处理液供给到被处理对象物的同时，将所述待处理对象物的一对边缘的一个边缘相对于所述待处理物体移动，将所述处理液供给单元从一个边缘将待处理物体相对于被处理物体的待处理物体的一对边缘的另一边缘相对于被处理物体供给到待处理物体上。

9. 发明授权

US5871584A Processing apparatus and processing method 失效
标题翻译：处理装置及处理方法
公开(公告)号：US5871584A
公开(公告)日：1999-02-16
申请号：US929106
申请日：1997-09-15
申请人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
发明人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
IPC分类号： G03F7/30 , B05C5/02 , B05C11/08 , B05C11/10 , H01L21/02 , H01L21/027 , B05B3/00 , B08B3/00
CPC分类号： B05C11/1039 , G03F7/3021 , B05C11/08 , B05C5/0208 , Y10S134/902
摘要： A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.
摘要翻译：一种显影处理装置，用于处理具有显影液的物体，包括用于可旋转地保持物体的保持构件，用于将显影液供给到物体的显影液供给喷嘴，用于吸取供给的显影液的显影液吸嘴本发明的目的是提供一种用于使显影液供给喷嘴在物体上方移动的显影液供给喷嘴移动机构，用于将显影液吸引喷嘴移动到物体上方的显影液吸引喷嘴移动机构。在显影液供给喷嘴移动之后向显影液供给显影液后，使显影液吸引喷嘴移动，并将吸收对象物的显影液。

10. 发明授权

US5779796A Resist processing method and apparatus 失效
标题翻译：抗蚀剂加工方法及装置
公开(公告)号：US5779796A
公开(公告)日：1998-07-14
申请号：US768884
申请日：1996-12-17
申请人： Takayuki Tomoeda , Masaaki Murakami , Kenichi Nishioka
发明人： Takayuki Tomoeda , Masaaki Murakami , Kenichi Nishioka
IPC分类号： G03F7/16 , G03F7/30 , B05B13/02
CPC分类号： G03F7/162 , G03F7/3021 , Y10S134/902
摘要： The present invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.
摘要翻译：本发明提供了一种用于待处理物体的抗蚀剂处理方法，包括将处理液供给到待处理物体上以对被处理物进行处理的处理步骤，以及提供清洗液到待处理的物体上以清洁待处理的物体，其中处理步骤至少部分地与清洁步骤重叠。本发明还提供了一种用于待处理对象的抗蚀剂处理方法，包括以下步骤：将处理溶液供应装置定位在用于将处理溶液供给到具有一对相对边缘的待处理四边形物体上方，在所述处理液供给单元将所述处理液供给到被处理对象物的同时，将所述待处理对象物的一对边缘的一个边缘相对于所述待处理物体移动，将所述处理液供给单元从一个边缘将待处理物体相对于被处理物体的待处理物体的一对边缘的另一边缘相对于被处理物体供给到待处理物体上。

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