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    • 6. 发明授权
    • Transfer apparatus
    • 转运设备
    • US5253663A
    • 1993-10-19
    • US935400
    • 1992-08-26
    • Hiroshi TanakaMitsuo NishiRyuichi MizoguchiYuuji Kamikawa
    • Hiroshi TanakaMitsuo NishiRyuichi MizoguchiYuuji Kamikawa
    • H01L21/00H01L21/677B08B3/02
    • H01L21/67161H01L21/67028H01L21/67126H01L21/67173H01L21/67766H01L21/67772Y10S134/902
    • A rotary transfer arm for transferring semiconductor wafers is disposed in a closed housing. A closable opening portion is formed in the housing, through which the transfer arm can extend out from the housing. A fork is disposed at the distal end of the transfer arm. A plurality of holding grooves are formed in the fork to set a plurality of wafers with predetermined intervals between them. A cleaner for the fork is disposed in the upper portion of the housing. The cleaner has cleaning and drying nozzles mounted at the distal end of a switch arm. The switch arm can pivot between an operation position and a standby position. The switch arm can also move the cleaning and drying nozzles along the fork. During cleaning and drying, pure water is sprayed from the cleaning nozzles against the fork, and a drying gas is sprayed from the drying nozzles against it.
    • 用于转移半导体晶片的旋转传送臂设置在封闭的壳体中。 在壳体中形成可闭合的开口部分,传送臂可以从壳体延伸出来。 叉子设置在传送臂的远端。 在叉中形成有多个保持槽,以在它们之间以预定间隔设置多个晶片。 用于叉子的清洁器设置在壳体的上部。 清洁器具有安装在开关臂远端的清洁和干燥喷嘴。 开关臂可以在操作位置和待机位置之间枢转。 开关臂还可以沿着叉子移动清洁和干燥喷嘴。 在清洁和干燥期间,从清洁喷嘴将纯水喷射到叉子上,并且干燥气体从干燥喷嘴喷射抵靠它。