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    • 4. 发明授权
    • Semiconductor integrated circuit having buses with different data transfer rates
    • 具有不同数据传输速率的总线的半导体集成电路
    • US07821824B2
    • 2010-10-26
    • US12258964
    • 2008-10-27
    • Yutaka ShinagawaTakeshi KataokaEiichi IshikawaToshihiro TanakaKazumasa YanagisawaKazufumi Suzukawa
    • Yutaka ShinagawaTakeshi KataokaEiichi IshikawaToshihiro TanakaKazumasa YanagisawaKazufumi Suzukawa
    • G11C16/04
    • G11C16/349G11C16/06G11C16/3495
    • A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed in an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. When the maximum variation width of the threshold voltage for memorizing information is larger, since stress to a memory cell owing to a rewrite operation of memory information becomes larger, it is inferior in a point of guaranteeing the number of times of rewrite operation; however, since a read current becomes larger, a read speed of memory information can be expedited. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information.
    • 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写的非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域,其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 当用于存储信息的阈值电压的最大变化幅度较大时,由于由于存储信息的重写操作而对存储单元的应力变大,所以在保证重写操作次数方面较差; 然而,由于读取电流变大,因此可以加快存储器信息的读取速度。 优先考虑第一非易失性存储器区域以加快存储器信息的读取速度,并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数。
    • 7. 发明申请
    • Semiconductor integrated circuit
    • 半导体集成电路
    • US20060044871A1
    • 2006-03-02
    • US11195684
    • 2005-08-03
    • Hiroyuki TanikawaToshihiro TanakaYutaka ShinagawaTakashi Yamaki
    • Hiroyuki TanikawaToshihiro TanakaYutaka ShinagawaTakashi Yamaki
    • G11C16/06
    • G11C16/344
    • The present invention is directed to realize both higher reading speed and assurance of the larger number of rewriting times for a nonvolatile memory. A semiconductor integrated circuit has a first nonvolatile memory area and a second nonvolatile memory area for storing information in accordance with a threshold voltage which varies. One or plural conditions out of erase verify determination memory gate voltage, erase verify determination memory current, write verify determination memory gate voltage, write verify determination memory current, erase voltage, erase voltage application time, write voltage, and write voltage application time in the first nonvolatile memory area is/are made different from that/those in the second nonvolatile memory area, speed of reading information stored in the first nonvolatile memory area is higher than that of reading information stored in the second nonvolatile memory area, and the assured number of rewriting times in the second nonvolatile memory area is larger than that in the first nonvolatile memory area.
    • 本发明旨在实现更高的读取速度和对非易失性存储器的更大数量的重写时间的保证。 半导体集成电路具有第一非易失性存储区域和用于根据变化的阈值电压存储信息的第二非易失性存储区域。 擦除验证存储器栅极电压,擦除验证确定存储器电流,写入验证确定存储器栅极电压,写入验证确定存储器电流,擦除电压,擦除电压施加时间,写入电压和写入电压施加时间中的一个或多个条件 第一非易失性存储器区域与第二非易失性存储区域中的那些不同,第一非易失性存储区域中存储的读取信息的速度高于存储在第二非易失性存储区域中的读取信息的速度,并且确定的数量 在第二非易失性存储器区域中的重写次数大于第一非易失性存储器区域中的重写时间。
    • 9. 发明授权
    • Nonvolatile semiconductor memory, data deletion method of nonvolatile semiconductor memory, information processing apparatus and nonvolatile semiconductor memory system
    • 非易失性半导体存储器,非易失性半导体存储器的数据删除方法,信息处理装置和非易失性半导体存储器系统
    • US06747895B2
    • 2004-06-08
    • US10083602
    • 2002-02-27
    • Yukiko UmemotoToshihiro TanakaHiroyuki TanikawaYutaka Shinagawa
    • Yukiko UmemotoToshihiro TanakaHiroyuki TanikawaYutaka Shinagawa
    • G11C1604
    • G11C16/3445G11C8/12G11C16/16G11C2216/18
    • This inventing is intended to shorten data deletion time of a nonvolatile semiconductor memory such as a flash memory (EEPROM). When deleting data written to a memory cell MC0 among flash memory cells MC0 to MC2 formed on a semiconductor substrate PSUB through a separation region NiSO, a voltage of p type well PWL0 in which the memory cell MC0 is formed is raised to 10V and a voltage of the separation region NiSO is raised to 12V by using a voltage application unit different from a voltage application unit applying a voltage to the p type well PWL0. As a result, parasitic capacitances Ca1 and Ca2 generated between p type wells PWL1 and PWL2 in which the unselected memory cells MC1 and MC2 are formed and the separation region NiSO, respectively, and a parasitic capacitance Cb generated between the separation region NiSO and the semiconductor substrate PSUB are charged by the voltage application units. It is, therefore, possible to shorten time required to charge the parasitic capacitances and to shorten the deletion time.
    • 本发明旨在缩短诸如闪速存储器(EEPROM)的非易失性半导体存储器的数据删除时间。 当通过分离区域NiSO删除在半导体衬底PSUB上形成的闪存单元MC0至MC2中写入存储单元MC0的数据时,形成存储单元MC0的p型阱PWL0的电压升高到10V, 通过使用与向p型阱PWL0施加电压的电压施加单元不同的电压施加单元将NiSO升高到12V。 结果,在形成未选择的存储单元MC1和MC2的p型阱PWL1和PWL2之间分别产生的寄生电容Ca1和Ca2分别与分离区NiSO和半导体之间产生的寄生电容Cb 基板PSUB由电压施加单元充电。 因此,可以缩短为寄生电容充电所需的时间并缩短删除时间。
    • 10. 发明授权
    • Semiconductor integrated circuit
    • 半导体集成电路
    • US08130571B2
    • 2012-03-06
    • US13162180
    • 2011-06-16
    • Yutaka ShinagawaTakeshi KataokaEiichi IshikawaToshihiro TanakaKazumasa YanagisawaKazufumi Suzukawa
    • Yutaka ShinagawaTakeshi KataokaEiichi IshikawaToshihiro TanakaKazumasa YanagisawaKazufumi Suzukawa
    • G11C7/00
    • G11C16/349G11C16/06G11C16/3495
    • A semiconductor integrated circuit has a central processing unit and a rewritable nonvolatile memory area disposed In an address space of the central processing unit. The nonvolatile memory area has a first nonvolatile memory area and a second nonvolatile memory area, which memorize information depending on the difference of threshold voltages. The first nonvolatile memory area has the maximum variation width of a threshold voltage for memorizing information set larger than that of the second nonvolatile memory area. When the maximum variation width of the threshold voltage for memorizing information is larger, since stress to a memory cell owing to a rewrite operation of memory information becomes larger, it is inferior In a point of guaranteeing the number of times of rewrite operation; however, since a read current becomes larger, a read speed of memory information can be expedited. The first nonvolatile memory area can be prioritized to expedite a read speed of the memory information and the second nonvolatile memory area can be prioritized to guarantee the number of times of rewrite operation of memory information more.
    • 半导体集成电路具有设置在中央处理单元的地址空间中的中央处理单元和可重写非易失性存储区域。 非易失性存储区域具有第一非易失性存储区域和第二非易失性存储器区域,其根据阈值电压的差异来存储信息。 第一非易失性存储区具有用于存储大于第二非易失性存储区的信息的阈值电压的最大变化宽度。 当用于存储信息的阈值电压的最大变化幅度较大时,由于由于存储信息的重写操作而对存储单元的应力变大,所以不利于保证重写操作的次数; 然而,由于读取电流变大,因此可以加快存储器信息的读取速度。 可以优先考虑第一非易失性存储器区域以加快存储器信息的读取速度,并且可以对第二非易失性存储器区域进行优先排列以保证存储器信息的重写操作的次数更多。