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    • 8. 发明授权
    • Method for driving a photo-sensor by applying a pulse voltage to an
auxiliary electrode during a non-read time
    • 在非读取时间期间通过向辅助电极施加脉冲电压来驱动光电传感器的方法
    • US4886962A
    • 1989-12-12
    • US244562
    • 1988-09-12
    • Ihachiro GofukuYoshiyuki OsadaKatsumi Nakagawa
    • Ihachiro GofukuYoshiyuki OsadaKatsumi Nakagawa
    • H01L27/14H01L27/146H04N1/028
    • H01L27/14665H04N3/15
    • A method for driving a photo-sensor to produce an improved, stable output which exactly represents the incident light is disclosed. The photo-sensor has a pair of main electrodes found on a semiconductor layer with a photo-sensing area arranged therebetween. A semiconductor layer and an auxiliary electrode are formed on at least the photo-sensing area with an insulating area being interleaved therein. The auxiliary electrode is used for stabilizing the photosensing output and providing a signal proportional to the incident light. The method of driving such a photo-sensor includes applying a bias voltage to the auxiliary electrode in accordance with the carriers carrying a current of the semiconductor layer. A voltage of the same polarity as that of the bias voltage, but smaller in absolute value, is applied to the auxiliary electrode for a predetermine period of time in a non-read period of the photo-sensor to cause a next photo-sensor output to be read while a previous photo-sensor has been erased.
    • 公开了一种用于驱动光电传感器以产生精确表示入射光的改进的稳定输出的方法。 光电传感器具有在半导体层上发现的一对主电极,其间布置有感光区域。 半导体层和辅助电极形成在至少具有交错的绝缘区域的感光区域上。 辅助电极用于稳定光敏输出并提供与入射光成正比的信号。 驱动这种光电传感器的方法包括:根据承载半导体层电流的载流子向辅助电极施加偏置电压。 在光电传感器的非读取期间,将预定的时间周期,向辅助电极施加与偏置电压相同极性但绝对值相同极性的电压,使下一个光电传感器输出 在先前的光电传感器被擦除时被读取。
    • 10. 发明授权
    • Semiconductor device and fabrication method thereof
    • 半导体器件及其制造方法
    • US06190911B1
    • 2001-02-20
    • US08670148
    • 1996-06-27
    • Ihachiro Gofuku
    • Ihachiro Gofuku
    • H01L21265
    • H01L29/66954H01L21/28525H01L21/31155H01L29/66272
    • A method for fabricating a semiconductor device having a wiring part connected via an opening portion formed in an insulting film on a semiconductor region to the semiconductor region. The wiring part includes a polycrystalline semiconductor layer and a metal or metal silicide on the semiconductor layer. A polycrystalline semiconductor layer is deposited over the opening portion of the semiconductor region. First and second impurities are respectively ion injected into the polycrystalline semiconductor layer, wherein the ion injecting range of the first impurities is longer than that of the second impurities, thereby forming a high concentration region at least on a surface side of the polycrystalline semiconductor layer. Following the ion injection of the first and second impurities, a heat treatment is conducted to grow crystals of the polycrystalline semiconductor layer. After the heat treatment, a metal or a metal silicide is deposited on the polycrystalline layer using a low melting point method.
    • 一种半导体器件的制造方法,其具有通过形成在半导体区域上的绝缘膜上的开口部连接到半导体区域的布线部。 布线部分包括半导体层上的多晶半导体层和金属或金属硅化物。 多晶半导体层沉积在半导体区域的开口部分上。 第一和第二杂质分别离子注入多晶半导体层,其中第一杂质的离子注入范围比第二杂质的离子注入范围长,从而至少在多晶半导体层的表面侧形成高浓度区域。 在离子注入第一和第二杂质之后,进行热处理以生长多晶半导体层的晶体。 在热处理之后,使用低熔点法在多晶层上沉积金属或金属硅化物。