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1. 发明授权

US4358198A Apparatus for moving table on stage 失效
标题翻译：用于在舞台上移动桌子的装置
公开(公告)号：US4358198A
公开(公告)日：1982-11-09
申请号：US188511
申请日：1980-09-18
申请人： Shigeo Moriyama , Tatsuo Harada , Masaaki Ito
发明人： Shigeo Moriyama , Tatsuo Harada , Masaaki Ito
IPC分类号： B26D7/20 , B23Q1/26 , B23Q1/62 , G02B21/32 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/68 , H05K13/00 , G03B27/42
CPC分类号： G03F7/70716 , B23Q1/26 , B23Q1/621 , G02B21/32 , H01L21/30 , H05K13/0015
摘要： An apparatus for moving a table or a stage having movable parts adapted to be guided by guide rail means slidingly and rectilinearly. At least the movable parts are made of a non-iron light metal material. The sliding surfaces of the movable parts making sliding contact with the guide rail means are made of a self-lubricating material, while the sliding surfaces of the guide rail means making sliding contact with the movable parts are made of a material having a higher hardness and wear resistance than the non-iron light metal material, so that the weight of at least the movable parts is reduced to decrease the weight of the apparatus as a whole.
摘要翻译：一种用于移动桌子或台架的装置，其具有适于被导轨装置滑动且直线地引导的可移动部件。至少可移动部件由非铁轻金属材料制成。与导轨装置滑动接触的可移动部件的滑动表面由自润滑材料制成，而与可移动部件滑动接触的导轨装置的滑动表面由具有较高硬度的材料制成，耐磨性比非铁轻金属材料低，使得至少可移动部件的重量减小，从而降低整体装置的重量。

2. 发明授权

US4409860A Apparatus for precisely moving a table 失效
标题翻译：用于精确移动桌子的装置
公开(公告)号：US4409860A
公开(公告)日：1983-10-18
申请号：US138095
申请日：1980-04-07
申请人： Shigeo Moriyama , Masaaki Ito , Tatsuo Harada
发明人： Shigeo Moriyama , Masaaki Ito , Tatsuo Harada
IPC分类号： G05G23/00 , B23Q1/62 , G03F7/20 , G05G11/00 , A47B11/00
CPC分类号： G03F7/70716 , B23Q1/621 , Y10T74/20354
摘要： In an apparatus for precisely moving a table, rectilinear drive systems for both X- and Y-axes are fixed to a support frame, a movable stage is constructed so as to have its motion in the direction of one of these axes constrained by the motion of the rectilinear drive system for the one axis and to have its motion in the direction of the other axis constrained by the rectilinear motion of the rectilinear drive system for the other axis, and means for coupling the rectilinear drive system for at least one of the axes and the movable stage so as to have a backlash.
摘要翻译：在用于精确移动工作台的装置中，用于X轴和Y轴两者的直线驱动系统固定在支撑框架上，可动台被构造成使得其运动沿这些轴中的一个受到运动约束的方向的直线驱动系统，并且沿着另一个轴线的直线运动限制的另一个轴线的方向运动;以及用于将直线驱动系统耦合到至少一个的直线驱动系统的装置，轴和可动台以具有间隙。

3. 发明授权

US4012843A Concave diffraction grating and a manufacturing method thereof 失效
$Concave diffraction grating and a manufacturing method thereof$
标题翻译：凹面衍射光栅及其制造方法
公开(公告)号：US4012843A
公开(公告)日：1977-03-22
申请号：US531156
申请日：1974-12-09
申请人： Tatsuo Harada , Shigeo Moriyama , Toshiaki Kita , Hidenori Yamaguchi
发明人： Tatsuo Harada , Shigeo Moriyama , Toshiaki Kita , Hidenori Yamaguchi
IPC分类号： G02B5/18 , B43L13/24
CPC分类号： G02B5/1852
摘要： A tool for ruling grating grooves is reciprocated on a diffraction grating blank with the tool being restrained within a plane inclined at an arbitrary angle relative to a plane lying in contact with one point on a spherical concave of the diffraction grating blank. Translation for a variable pitch-groove spacing which changes as a function of the groove number or groove position is imparted to the diffraction grating blank in interlocking relationship with the reciprocation, thereby mechanically ruling the desired sphere of the grating blank with the grating grooves, whereby a concave diffraction grating which forms diffracted light of a specific wavelength into a completely stigmatic image at high diffraction efficiency can be manufactured.
摘要翻译：用于排列光栅槽的工具在衍射光栅坯料上往复运动，其中工具被限制在相对于与衍射光栅坯料的球形凹部上的一个点接触的平面倾斜任意角度的平面内。对于作为凹槽编号或凹槽位置的函数而变化的可变节距间距的平移被赋予与往复运动互锁关系的衍射光栅坯料，由此用光栅槽机械地划定光栅坯料的所需球体，由此可以制造以高衍射效率将特定波长的衍射光形成为完全眩晕图像的凹面衍射光栅。

4. 发明授权

US4219933A Diffraction grating ruling engine 失效
$Diffraction grating ruling engine$
标题翻译：衍射光栅定尺引擎
公开(公告)号：US4219933A
公开(公告)日：1980-09-02
申请号：US56257
申请日：1979-07-10
申请人： Toshiaki Kita , Shigeo Moriyama , Tatsuo Harada
发明人： Toshiaki Kita , Shigeo Moriyama , Tatsuo Harada
IPC分类号： G01J3/20 , B23D1/26 , B24B13/04 , B24B19/02 , B26D3/08 , G02B5/18 , B43L13/24
CPC分类号： B26D3/08 , B24B13/046 , B24B19/02 , G02B5/1852
摘要： A device for the fabrication of a concave diffraction grating wherein grating grooves are mechanically ruled on a spherical surface of a diffraction grating blank and wherein a tool for ruling the grating grooves is reciprocated along the spherical surface of the diffraction grating blank, guided by a cylindrical cam, to form grooves having a uniform sectional shape over their whole area, whereby a concave diffraction grating of high diffraction efficiency and little scattering light is fabricated.
摘要翻译：一种用于制造凹衍射光栅的装置，其中光栅槽机械地刻划在衍射光栅坯料的球形表面上，并且其中用于刻划光栅槽的工具沿衍射光栅坯料的球形表面往复运动，由圆柱形凸轮形成在其整个区域上具有均匀截面形状的凹槽，由此制造高衍射效率和少量散射光的凹形衍射光栅。

5. 发明授权

US4057347A Optical exposure apparatus 失效
标题翻译：光学曝光装置
公开(公告)号：US4057347A
公开(公告)日：1977-11-08
申请号：US670830
申请日：1976-03-26
申请人： Shigeo Moriyama , Tatsuo Harada , Yoshio Kawamura , Seiya Hashimoto , Akihiro Takanashi , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka
发明人： Shigeo Moriyama , Tatsuo Harada , Yoshio Kawamura , Seiya Hashimoto , Akihiro Takanashi , Toshiei Kurosaki , Shinji Kuniyoshi , Sumio Hosaka
IPC分类号： G03B27/32 , G02B27/18 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/30 , G01B11/26 , G03B27/54
CPC分类号： G03F9/70
摘要： An improved optical exposure apparatus for use in exposing a workpiece to a desired light pattern with a high alignment accuracy and a high operational speed is disclosed. The apparatus comprises a moving table on which a workpiece to be exposed is disposed, a movable holder on which a mask having an original pattern is disposed, a light source for irradiating said mask, a reduction lens for projecting a reduced pattern of said original pattern onto said workpiece, means for positioning said moving table to a predetermined position, means for detecting the error of said table positioning, means for calculating a value of the error of positioning the workpiece divided by the reduction rate of the reduction lens, and means for automatically shifting said movable holder by the calculated value so as to cancel said error.
摘要翻译：公开了一种用于以高对准精度和高操作速度将工件暴露于期望的光图案的改进的光学曝光装置。该装置包括：移动台，设置待曝光的工件;可移动的保持器，其上设置有原始图案的掩模;用于照射所述掩模的光源;还原透镜，用于将所述原始图案的缩小图案投影在所述工件上，用于将所述移动台定位到预定位置的装置，用于检测所述工作台定位误差的装置，用于计算所述工件定位误差值除以所述还原透镜的减速率的装置，自动地将所述活动支架移动所述计算值，以便消除所述误差。

6. 发明授权

US5047650A Monochrometer 失效
标题翻译：单色器
公开(公告)号：US5047650A
公开(公告)日：1991-09-10
申请号：US639303
申请日：1990-12-31
申请人： Tatsuo Harada , Masaaki Ito , Toshiaki Kita
发明人： Tatsuo Harada , Masaaki Ito , Toshiaki Kita
IPC分类号： G01J3/18 , G02B5/18 , G21K1/06
CPC分类号： G01J3/1804
摘要： The invention relates to a monochromator which disperses the light containing many wavelengths emitted from a source of light, and which takes out a given wavelength component only. The invention realizes a monochromator which can take out the light of a single wavelength maintaining a very high wavelength purity by using a plane grating C which can be easily manufactured maintaining a high precision and by employing a very simply constructed wavelength sweeping mechanism in which the distance between the incident slit A and the diffraction grating C as well as the distance between the exit slit B and the diffraction grating C are maintained constant, instead of using a concave grating that had been indispensable in the conventional monochromator adapted to the wavelength regions of from soft X-rays to vacuum ultraviolet rays.
摘要翻译： PCT No.PCT / JP84 / 00545 Sec。 371日期：1985年7月17日 102（e）日期1985年7月17日PCT提交1984年11月14日PCT公布。公开号WO85 / 02254 日期1985年5月23日。本发明涉及一种单色器，其分散包含从光源发射的许多波长的光，并且仅取出给定波长分量。本发明实现了一种单色器，其可以通过使用能够容易地制造并保持高精度的平面光栅C并且通过采用非常简单构造的波长扫描机构来取出保持非常高的波长纯度的单一波长的光，其中距离在入射狭缝A和衍射光栅C之间以及出射狭缝B和衍射光栅C之间的距离保持恒定，而不是使用在适合于波长区域的常规单色仪中不可缺少的凹形光栅软X射线真空紫外线。

7. 发明授权

US4568187A Concave grating spectrometer 失效
标题翻译：凹面光栅光谱仪
公开(公告)号：US4568187A
公开(公告)日：1986-02-04
申请号：US504437
申请日：1983-06-15
申请人： Toshiaki Kita , Tatsuo Harada
发明人： Toshiaki Kita , Tatsuo Harada
IPC分类号： G01J3/18 , G01J3/20
CPC分类号： G01J3/18
摘要： In a concave grating spectrometer for creating a spectral image by dispersing a light to be measured according to the wavelength, an arrangement comprising a concave grating with varied spacing and/or curved grooves formed on a concave spherical surface, and an entrance slit located at such a position on a vertical focal line passing through the center of curvature of the spherical surface, that the sum of the square of the difference between horizontal and vertical focal lengths at each wavelength in the wavelength range takes a minimum value. The light to be measured projected through the entrance slit is dispersed by the concave grating according to the wavelength and an image is focused on the vertical focal line passing through the center of curvature of the spherical grating.
摘要翻译：在凹面光栅光谱仪中，用于通过根据波长分散待测量的光来产生光谱图像，包括形成在凹球面上的具有不同间隔和/或弯曲凹槽的凹形光栅的布置，以及位于其上的入口狭缝在通过球面的曲率中心的垂直焦线上的位置，在波长范围内的每个波长处的水平和垂直焦距之间的差的平方和之和为最小值。通过入口狭缝投射的被测光通过凹面光栅根据波长分散，并且图像聚焦在穿过球形光栅的曲率中心的垂直焦线上。

8. 发明授权

US4159328A Tetrahydro-1,3,5-thiadiazin-4-one derivative 失效
标题翻译：四氢-1,3,5-噻二嗪-4-酮衍生物
公开(公告)号：US4159328A
公开(公告)日：1979-06-26
申请号：US911755
申请日：1978-06-02
申请人： Kenichi Ikeda , Hideo Kanno , Michihiro Yasui , Tatsuo Harada
发明人： Kenichi Ikeda , Hideo Kanno , Michihiro Yasui , Tatsuo Harada
IPC分类号： A01N43/88 , A01P7/04 , C07D285/34 , A01N9/12
CPC分类号： A01N43/88 , C07D285/34
摘要： A tetrahydro-1,3,5-thiadiazin-4-one represented by the general formula, ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3, which may be the same or different, represent each an alkyl group, allyl group, cycloalkyl group, alkoxyalkyl group, benzyl group, phenyl group or substituted phenyl group having as substituents alkyl groups, nitro group, halogen atoms, alkoxy groups, or trifluoromethyl group and R.sup.2 and R.sup.3 may also represent hydrogen atoms, is a new compound and useful for controlling insects and mites.
摘要翻译：由通式表示的四氢-1,3,5-噻二嗪-4-酮其中R 1，R 2和R 3可以相同或不同，代表烷基，烯丙基，环烷基，烷氧基烷基，苄基，苯基或具有取代基烷基的取代苯基，硝基，卤素原子，烷氧基或三氟甲基，R2和R3也可以表示氢原子，是新的化合物，可用于控制昆虫和螨虫。

9. 发明申请

US20070267663A1 Semiconductor device having improved insulated gate bipolar transistor and method for manufacturing the same 有权
标题翻译：具有改进的绝缘栅双极晶体管的半导体器件及其制造方法
公开(公告)号：US20070267663A1
公开(公告)日：2007-11-22
申请号：US11514994
申请日：2006-09-05
申请人： Tatsuo Harada
发明人： Tatsuo Harada
IPC分类号： H01L29/76
CPC分类号： H01L29/7397 , H01L29/0834 , H01L29/0847
摘要： An n-type first base layer is formed on a semiconductor substrate 1 having a first major surface and a second major surface, and a p-type second base layer is formed thereon. Between the first base layer and the second base layer, a carrier stored layer is formed. The carrier stored layer has a high-concentration impurity layer and a low concentration impurity layer, and the high-concentration impurity layer has a thickness of 1.5 μm or more and an impurity concentration therethrough is made to be 1.0×1016 cm−3 or more throughout the layer.
摘要翻译：在具有第一主表面和第二主表面的半导体衬底1上形成n型第一基底层，并且在其上形成p型第二基底层。在第一基底层和第二基底层之间形成载体存储层。载体存储层具有高浓度杂质层和低浓度杂质层，高浓度杂质层的厚度为1.5μm以上，杂质浓度为1.0×10 16，在整个层中，超过3cm 3以上。

10. 发明授权

US5340637A Optical device diffraction gratings and a photomask for use in the same 失效
$Optical device diffraction gratings and a photomask for use in the same$
标题翻译：光学器件衍射光栅和用于其中的光掩模
公开(公告)号：US5340637A
公开(公告)日：1994-08-23
申请号：US895430
申请日：1992-06-05
申请人： Makoto Okai , Shinji Tsuji , Akio Ohishi , Motohisa Hirao , Hiroyoshi Matsumura , Tatsuo Harada , Toshiaki Kita , Hideki Taira
发明人： Makoto Okai , Shinji Tsuji , Akio Ohishi , Motohisa Hirao , Hiroyoshi Matsumura , Tatsuo Harada , Toshiaki Kita , Hideki Taira
IPC分类号： G02B5/18 , G03F1/00 , B32B3/28 , G02B27/42 , G03C5/00
CPC分类号： G02B5/1857 , Y10T428/2457 , Y10T428/24612 , Y10T428/24942
摘要： A method of fabricating diffraction gratings wherein a photomask is arranged on a substrate which is coated with a photoresist, light is to be incident thereupon at an acute angle relative to the normal direction of the photomask, and a bright/dark pattern is formed on said photoresist by the interference of the transmission light that has passed through the photomask and the diffraction light. The invention further deals with a photomask used for the above method.
摘要翻译：一种制造衍射光栅的方法，其中光掩模布置在涂覆有光致抗蚀剂的基底上，光将相对于光掩模的法线方向以锐角入射到其上，并且在所述光掩模上形成明暗图案通过透过光掩模的透射光的干涉和衍射光的光致抗蚀剂。本发明还涉及用于上述方法的光掩模。

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