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    • 5. 发明授权
    • Semiconductor light emitting element
    • 半导体发光元件
    • US4361887A
    • 1982-11-30
    • US125779
    • 1980-02-29
    • Michiharu NakamuraMotohisa HiraoShigeo YamashitaTadashi FukuzawaJunichi Umeda
    • Michiharu NakamuraMotohisa HiraoShigeo YamashitaTadashi FukuzawaJunichi Umeda
    • H01L29/80H01L21/338H01L27/095H01L27/15H01L29/812H01S5/00H01S5/026H01S5/042H01S3/19
    • H01S5/0265
    • A semiconductor laser light emitting element comprises a semiconductor substrate, a laminate region of semiconductor layers having at least a first, a second and a third semiconductor layer formed over the substrate and having a p-n junction defined therein. The first and third semiconductor layers have smaller refractive indices and greater forbidden band gaps than the second semiconductor layer and are opposite in conductivity type to each other. Provided are on the substrate a field effect transistor section having first and second electrodes and a gate electrode disposed between the first and second electrodes, a means for serving as an optical resonator for emitting light in the lengthwise direction of the p-n junction. A means is formed on one surface of the laminate region for injecting current into the third semiconductor layer, the current injection means is short-circuited with the first electrode of the field transistor section and a means is formed on the substrate for receiving the current injected from the current injecting means.
    • 半导体激光发光元件包括半导体衬底,半导体层的层叠区域,其至少形成在衬底上并具有限定在其中的p-n结的第一,第二和第三半导体层。 第一和第三半导体层具有比第二半导体层更小的折射率和更大的禁带宽度,并且与导电类型相反。 在基板上设置有具有第一和第二电极的场效应晶体管部分和设置在第一和第二电极之间的栅电极,用作用于在p-n结的长度方向上发光的光谐振器的装置。 在层叠区域的一个表面上形成用于将电流注入到第三半导体层中的装置,电流注入装置与场晶体管部分的第一电极短路,并且在基板上形成用于接收注入电流的装置 从目前的注射手段。
    • 7. 发明授权
    • Semiconductor laser devices
    • 半导体激光器件
    • US4841536A
    • 1989-06-20
    • US850685
    • 1986-04-11
    • Aiko OhishiMotohisa HiraoNaoki ChinoneShinji TsujiHitoshi NakamuraHiroyoshi Matsumura
    • Aiko OhishiMotohisa HiraoNaoki ChinoneShinji TsujiHitoshi NakamuraHiroyoshi Matsumura
    • H01S5/227
    • H01S5/227H01S5/2275
    • This invention discloses a semiconductor laser capable of a high temperature and high output operation by forming a mesa stripe having an active layer in a reverse triangular mesa shape and forming thick semiconductor layers on both sides of the mesa stripe in such a manner that the resulting p-n junctions have a current blocking function. The invention discloses also a semiconductor laser wherein the formation of the p-n junctions described above is made before the formation of the reverse mesa stripe, and ion implantation is introduced in order to form the p-n junctions. Furthermore, the invention relates to transistors and semiconductor lasers using InGaAsP type quaternary compounds as the semiconductor. The quaternary compounds having a composition in which an energy band gap is from 1.2 to 1.4 eV are formed in a thickness of up to 1 .mu.m, and there can be thus obtained semiconductor devices having a small leakage current and being stable with time.
    • 本发明公开了一种能够通过形成具有反三角台面形状的有源层的台面条形状的高温高输出操作的半导体激光器,在台面条的两侧形成厚半导体层,使得所得到的pn 结点具有电流阻塞功能。 本发明还公开了一种半导体激光器,其中在形成反向台面条之前进行上述p-n结的形成,并且引入离子注入以形成p-n结。 此外,本发明涉及使用InGaAsP型四元化合物作为半导体的晶体管和半导体激光器。 形成其能带隙为1.2〜1.4eV的组成的四元化合物的厚度为1μm以下,可以得到漏电流小且时间稳定的半导体器件。
    • 8. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US4426700A
    • 1984-01-17
    • US260744
    • 1981-05-05
    • Motohisa HiraoAtsutoshi DoiMichiharu NakamuraShinji TsujiTakao Mori
    • Motohisa HiraoAtsutoshi DoiMichiharu NakamuraShinji TsujiTakao Mori
    • H01S5/00H01S5/227H01S3/19
    • H01S5/227H01S5/2275
    • A buried-heterostructure semiconductor laser including a mesa-shaped optical confinement region having an active layer and a clad layer and disposed on a semiconductor substrate; a burying layer burying both side surfaces of the region; and at least one p-n junction so formed inside the burying layer in parallel to the active layer as to be brought under the reversely biased state during the operation of the laser; wherein surface protection semiconductor layers are formed on the mesa-shaped optical confinement region and on the burying layer, respectively, for protecting the semiconductor assembly in the arrangement such that these surface protection semiconductor layers do not come into direct contact with each other. Even if the forbidden band gas of these surface protection semiconductor layers are relatively small, it is possible to realize a semiconductor laser having an extremely small leakage current and reduced variance of threshold current values, while protecting the surface of the multi-layer semiconductor layers.
    • 一种掩埋异质结构半导体激光器,包括具有有源层和覆层的台面形状的光限制区域,并设置在半导体衬底上; 埋藏在该区域的两个侧表面上的掩埋层; 以及在激光器的工作过程中平行于活性层在掩埋层内部形成的至少一个p-n结,使其处于反向偏置状态; 其中表面保护半导体层分别形成在台状光限制区域和掩埋层上,用于保护半导体组件的布置,使得这些表面保护半导体层不彼此直接接触。 即使这些表面保护半导体层的禁带宽度相对较小,也可以在保护多层半导体层的表面的同时实现具有极小的漏电流和减小阈值电流值的方差的半导体激光器。