专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06734437B2 System and method for electron beam irradiation 失效
标题翻译：电子束照射系统和方法
公开(公告)号：US06734437B2
公开(公告)日：2004-05-11
申请号：US10374764
申请日：2003-02-25
申请人： Setsuo Norioka , Toshiaki Miyokawa , Naoki Date , Jun Sasaki , Yuichi Aki , Yoshihisa Miura
发明人： Setsuo Norioka , Toshiaki Miyokawa , Naoki Date , Jun Sasaki , Yuichi Aki , Yoshihisa Miura
IPC分类号： G01N2300
CPC分类号： H01J37/305 , H01J37/18 , H01J37/21 , H01J37/3056 , H01J2237/162 , H01J2237/188 , H01J2237/216 , H01J2237/24405
摘要： An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.
摘要翻译：一种用于在母盘上拍摄电子束以进行记录的电子束照射系统。该系统能够以与母盘相对应的方式容易且准确地聚焦光束，从而允许精确的记录。该系统具有将母盘保持在其上的支撑机构部分。支撑机构部分具有放置聚焦台的滑动台。聚焦阶段有刀刃和法拉第杯。刀刃位于主盘的正上方。当进行记录时，首先在聚焦阶段拍摄电子束并进行聚焦。然后，在主盘上拍摄光束，从而进行录制。

2. 发明授权

US06953939B2 Testing apparatus using scanning electron microscope 失效
标题翻译：使用扫描电子显微镜的测试仪器
公开(公告)号：US06953939B2
公开(公告)日：2005-10-11
申请号：US10472312
申请日：2003-01-21
申请人： Tetsuo Abe , Kouki Okawauchi , Tadashi Hattori , Hironori Fujita , Minoru Takeda , Yuichi Aki , Naoki Date , Setsuo Norioka , Toshiaki Miyokawa , Seiichi Nakagawa
发明人： Tetsuo Abe , Kouki Okawauchi , Tadashi Hattori , Hironori Fujita , Minoru Takeda , Yuichi Aki , Naoki Date , Setsuo Norioka , Toshiaki Miyokawa , Seiichi Nakagawa
IPC分类号： G01N23/225 , G01Q30/02 , G01Q30/16 , H01J37/18 , H01J37/20 , H01J37/28 , G01K5/10 , G21K5/10 , G21K7/00
CPC分类号： H01J37/20 , G01N23/225 , H01J37/18 , H01J2237/188 , H01J2237/2817
摘要： A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floating of the local vacuum formation portion by the float means.
摘要翻译：一种使用扫描电子显微镜的测试装置，用于以非破坏性方式对测试对象的任何部分进行测试和测量，而不受被测对象的尺寸的限制，即使用扫描电子显微镜进行测试的测试装置1 以及通过使用扫描电子显微镜6a以非破坏性方式对测试对象的任何部分进行测量，该扫描电子显微镜包括用于通过从外部阻挡测试对象的被测试部分而形成局部真空区域的局部真空形成部分9 空气，其中所述局部真空形成部分包括用于排出以形成部分真空区域的排气部分，浮子装置14，用于通过将压缩气体发射到所述局部真空部分的外圆周部分来使所述局部真空形成部分上方的整个局部真空形成部分真空形成部分和用于测量测试对象与局部真空形成口之间的距离的长度测量装置16 用于通过浮动装置控制局部真空形成部分的浮动。

3. 发明授权

US06737660B2 Electron beam irradiation apparatus and electron beam irradiating method 失效
标题翻译：电子束照射装置和电子束照射法
公开(公告)号：US06737660B2
公开(公告)日：2004-05-18
申请号：US10372419
申请日：2003-02-24
申请人： Yoshihisa Miura , Yuichi Aki , Hiroshi Kawase , Masanobu Yamamoto , Naoki Date , Setsuo Norioka , Mitsuru Koizumi , Gakuo Komatsubara
发明人： Yoshihisa Miura , Yuichi Aki , Hiroshi Kawase , Masanobu Yamamoto , Naoki Date , Setsuo Norioka , Mitsuru Koizumi , Gakuo Komatsubara
IPC分类号： G11B910
CPC分类号： H01J37/18 , G11B7/261 , H01J37/305 , H01J37/3056 , H01J2237/162 , H01J2237/188
摘要： An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.
摘要翻译：部分真空法中的电子束照射装置由连接到包含电子束柱15的真空室14的静压浮动垫18构成，并且在将静压浮动垫18附着到被检体1的状态下照射不经接触的电子束，以及通过静压浮动垫18的电子束路径19照射待被检体1的电子束，由此即使在真空室和电子束柱中也可以将真空室和电子束柱保持在所需的真空度条件是静压浮动垫18与待照射的被检体1分离。在静压浮动垫18内设置包括打开和关闭电子束通道19的活塞的真空密封阀30.当静压浮动垫18与被检体1分离时，真空密封阀30构成为激活以闭合电子束路径19，以防止空气流入真空室14.在该结构中，真空密封阀30形成为圆形截面并具有窄尖端的锥形形状，以便实现高真空密封而没有间隙，从而可以确保真空室和电子束柱中的真空度。

4. 发明授权

US06831278B2 System and method for electron beam irradiation 失效
标题翻译：电子束照射系统和方法
公开(公告)号：US06831278B2
公开(公告)日：2004-12-14
申请号：US10286442
申请日：2002-11-01
申请人： Masanobu Yamamoto , Hiroshi Kawase , Jun Sasaki , Minoru Takeda , Gakuo Komatsubara , Mitsuru Koizumi , Setsuo Norioka , Naoki Date
发明人： Masanobu Yamamoto , Hiroshi Kawase , Jun Sasaki , Minoru Takeda , Gakuo Komatsubara , Mitsuru Koizumi , Setsuo Norioka , Naoki Date
IPC分类号： H01J3720
CPC分类号： H01J37/18 , G11B7/261 , H01J37/20 , H01J2237/188 , H01J2237/3175
摘要： An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
摘要翻译：电子束照射系统在电子光学显微镜柱的末端具有泵送块。该系统具有旋转台，用于在旋转台上的目标处引导电子束的显微镜柱，用于在柱和靶之间的间隙中排空空气的泵送块，用于在工作期间将旋转台滑动的移动机构位置和安装位置，以及盖构件。在工作位置，目标与柱相反。盖构件与旋转台或目标物紧密接触，以防止当旋转台从工作位置移动到安装位置时真空劣化。

5. 发明授权

US4439681A Charged particle beam scanning device 失效
标题翻译：带电粒子束扫描装置
公开(公告)号：US4439681A
公开(公告)日：1984-03-27
申请号：US312955
申请日：1981-10-20
申请人： Setsuo Norioka , Naoki Date
发明人： Setsuo Norioka , Naoki Date
IPC分类号： H01J37/22 , H01J37/24 , H01J37/28 , H04N3/22 , H01J37/26
CPC分类号： H01J37/28 , H01J37/24 , H04N3/22
摘要： A charged particle beam scanning device is provided with two coordinates conversion circuits. For rotating the scanning direction of the charged particle beam, one of the coordinates conversion circuit is connected between a scanning signal generator and a magnification circuit, the output of which is supplied to a deflecting means for scanning the charged particle beam over the specimen surface, as in the case of a conventional device. Another coordinates conversion circuit is used for keeping independent operation of the image rotation and the image shift. This coordinates conversion circuit converts the output signal of a d.c. signal generator for image shift, and the converted signal is added to the input signal of the said magnification circuit.
摘要翻译：带电粒子束扫描装置设有两个坐标转换电路。为了旋转带电粒子束的扫描方向，坐标转换电路之一连接在扫描信号发生器和放大电路之间，该放大电路的输出被提供给用于在被检体表面上扫描带电粒子束的偏转装置，如在常规设备的情况下。另一个坐标转换电路用于保持图像旋转和图像偏移的独立操作。该坐标转换电路转换直流的输出信号。用于图像偏移的信号发生器，并且将转换的信号添加到所述放大电路的输入信号。

6. 发明授权

US06904164B2 Method of inspecting accuracy in stitching pattern elements 失效
标题翻译：检查拼接图案元素精度的方法
公开(公告)号：US06904164B2
公开(公告)日：2005-06-07
申请号：US09860242
申请日：2001-05-18
申请人： Setsuo Norioka , Manabu Saito , Akira Tohyama
发明人： Setsuo Norioka , Manabu Saito , Akira Tohyama
IPC分类号： G06T7/00 , G06K9/00 , G06K9/32 , G06K9/36
CPC分类号： G06T7/001 , G06T7/0002 , G06T7/74 , G06T2207/30148
摘要： A method of quickly and accurately inspecting the stitching accuracy at which regions of a lithographic pattern are stitched at boundaries. The numerous regions of the lithographic pattern are exposed or delineated, one at a time. Inspected regions are scanned with a charged-particle beam to detect secondary electrons. The obtained signal is stored as an inspected image in an image memory, together with positional data about the inspected regions. After completion of acceptance of images from all the inspected regions, the inspected image is compared with a separately prepared reference image by an image processing unit. Pattern elements in the inspected regions corresponding to the reference image are extracted. Deviations at field boundaries or the like can be detected from the relative positions of these pattern elements, if any.
摘要翻译：快速准确地检查光刻图案的区域在边界处被缝合的缝合精度的方法。光刻图案的许多区域被暴露或划定，一次一个。用带电粒子束扫描检查区域以检测二次电子。所获得的信号与检查区域的位置数据一起作为检查图像存储在图像存储器中。在完成从所有检查区域的图像的接受之后，将检查图像与图像处理单元单独准备的参考图像进行比较。提取与参考图像对应的被检查区域中的图案元素。可以从这些图形元素的相对位置（如果有的话）检测场边界等的偏差。

7. 发明授权

US5185530A Electron beam instrument 失效
标题翻译：电子束仪器
公开(公告)号：US5185530A
公开(公告)日：1993-02-09
申请号：US786264
申请日：1991-11-01
申请人： Setsuo Norioka , Hiroshi Shimada
发明人： Setsuo Norioka , Hiroshi Shimada
IPC分类号： H01J37/09
CPC分类号： H01J37/09 , H01J2237/0264
摘要： A condenser means for focusing an electron beam onto a specimen and a scanning means for scanning the beam in two dimensions on the specimen placed inside a specimen chamber are disposed inside an electron beam column. The top portion of the specimem chamber is connected with the column by an annular member of a high magnetic permeability which surrounds the column. Magnetic flux passed through the top wall of the chamber is made to penetrate the annular member of a high magnetic permeability. The flux is then caused to enter the portion of the upper wall remote from the column, after which the flux leaks out. Thus, leakage of the magnetic flux into the specimem chamber is prevented.
摘要翻译：用于将电子束聚焦到样本上的聚光器装置和用于在放置在样本室内的样本上二维地扫描光束的扫描装置设置在电子束柱内。标本室的顶部通过围绕柱的高磁导率的环形构件与柱连接。使通过腔室顶壁的磁通量穿透高磁导率的环形构件。然后使磁通进入远离柱的上壁的部分，之后焊剂泄漏。因此，防止磁通量泄漏到原料室中。

8. 发明授权

US4990778A Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US4990778A
公开(公告)日：1991-02-05
申请号：US413825
申请日：1989-09-28
申请人： Setsuo Norioka
发明人： Setsuo Norioka
IPC分类号： H01J37/04 , H01J37/22 , H01J37/28
CPC分类号： H01J37/28 , H01J37/222
摘要： In a field emission gun, current intensity of the electron beam passing through the gun anode contains a fluctuation component due to the ion bombardment and ion absorption near the emitter tip. For this reason, a scanning electron microscope having a field emission gun usually incorporates a fluctuation compensation device, which generates the signal ratio of the secondary electron signal from a specimen irradiated by the electron beam and the monitor signal corresponding to the current intensity of the electron beam passing through the gun anode and supplies the signal ratio for brightness modulation signal to the scanning image display means of the microscope. However, if the electron beam intensity is varied in a very wide operating range, the conventional fluctuation compensation device cannot operate with enough compensation effect. In this invention, the signal level of the monitor signal is maintained constant, so that the fluctuation correction device operates with enough compensation effect for a wide operating range of electron beam intensity.
摘要翻译：在场发射枪中，通过枪阳极的电子束的电流强度由于在发射极尖端附近的离子轰击和离子吸收而包含波动分量。为此，具有场发射枪的扫描电子显微镜通常包括波动补偿装置，该波动补偿装置产生由电子束照射的样本的二次电子信号的信号比和对应于电子的当前强度的监测信号光束通过枪阳极，并将亮度调制信号的信号比提供给显微镜的扫描图像显示装置。然而，如果电子束强度在非常宽的工作范围内变化，则传统的波动补偿装置不能以足够的补偿效果进行工作。在本发明中，监视信号的信号电平保持恒定，使得波动校正装置对于电子束强度的宽工作范围具有足够的补偿效果。

9. 发明授权

US4417145A Apparatus for controlling magnetic field intensity 失效
标题翻译：用于控制磁场强度的装置
公开(公告)号：US4417145A
公开(公告)日：1983-11-22
申请号：US305404
申请日：1981-09-25
申请人： Setsuo Norioka
发明人： Setsuo Norioka
IPC分类号： G01N23/225 , G01R33/12 , G05F7/00 , H01J37/14 , H01J37/141 , H01J37/147 , H01J37/24 , H01L21/027 , G21K1/08 , H01J37/00
CPC分类号： H01J37/24 , H01J37/14 , H01J37/141 , H01J37/1475
摘要： A control apparatus according to this invention is installed between an intensity specifying circuit and an excitation current source for a magnetic lens or deflecting coil. The intensity specifying circuit generates a target signal (B) corresponding to the desired magnetic flux density (B) in a magnetic lens or deflecting coil. The excitation current source outputs a current (I) which produces the desired flux density (B). Due to the effects of hysteresis the ferromagnetic yoke adjacent the lens or deflecting coil, the relationship between the target signal (B) and current (I) is nonlinear. The control apparatus has a memory in which data defining the hysteresis characteristics of the lens or coil being controlled has been stored. The control means saves the present intensity specifying signal (the old target signal) and the most recent reverse-value signal (the last target signal proceeded and followed by target signals, both of which are higher or both of which are lower than the reverse-value signal) and with the new target signal calculates the change in current (.DELTA.I) required to produce the desired flux density and commands the excitation current source to output the corresponding current. The effects due to hysteresis of the ferromagnetic yoke are dealt with by the control apparatus facilitating computer control of the electromagnetic lens or deflecting means.
摘要翻译：根据本发明的控制装置安装在用于磁性透镜或偏转线圈的强度指定电路和激励电流源之间。强度指定电路产生与磁性透镜或偏转线圈中的期望磁通密度（B）相对应的目标信号（B）。励磁电流源输出产生所需磁通密度（B）的电流（I）。由于邻近透镜或偏转线圈的铁磁磁轭的滞后效应，目标信号（B）和电流（I）之间的关系是非线性的。控制装置具有存储器，其中存储了限定被控制的透镜或线圈的滞后特性的数据。控制装置保存当前强度指定信号（旧目标信号）和最近的反向值信号（最后的目标信号进行并跟随目标信号，两者都较高或两者均低于反向信号，值信号），并且新的目标信号计算产生所需通量密度所需的电流变化（DELTA I），并命令激励电流源输出相应的电流。由铁磁轭的滞后引起的影响由控制装置处理，便于计算机控制电磁透镜或偏转装置。

10. 发明授权

US5801382A Method of analyzing foreign materials 失效
标题翻译：异物分析方法
公开(公告)号：US5801382A
公开(公告)日：1998-09-01
申请号：US889659
申请日：1997-07-08
申请人： Osamu Noda , Setsuo Norioka
发明人： Osamu Noda , Setsuo Norioka
IPC分类号： G01N23/22 , H01J37/256 , H01L21/66 , H01J37/00
CPC分类号： H01J37/256 , H01J2237/2561
摘要： A method of quite efficiently analyzing contaminants such as dust on a semiconductor material with a scanning electron microscope. The instrument holds a list of data about contaminants. The operator selects desired items from the list and marks them to register them in a registered contaminant data table. Then, he establishes illumination conditions used for analysis and starts x-ray analysis. A secondary electron image of any contaminant of interest is displayed on a CRT at a magnification corresponding to the dimensions of the contaminant. The dimensions are retrieved from the data table. All addresses of a frame memory are searched. According to the results, the coordinates of the position of the contaminant are measured. The difference between the central position of the viewing screen of the CRT and the coordinate of the contaminant is calculated for each direction. The calculated differences are sent either to a specimen stage-driving mechanism or to an image shift power supply. In this way, the contaminant is automatically centered. The focused electron beam is directed at the center of this contaminant to produce x-rays. If the analysis of this wafer is not yet complete, data about the next contaminant item is retrieved from the registered contaminant data table.
摘要翻译：用扫描电子显微镜相当有效地分析半导体材料上的灰尘等污染物的方法。该仪器包含有关污染物的数据列表。操作员从列表中选择所需的项目，并将其标记为在注册的污染物数据表中注册。然后，他建立了用于分析的照明条件，开始X射线分析。感兴趣的任何污染物的二次电子图像以与污染物的尺寸相对应的放大倍数显示在CRT上。从数据表中检索尺寸。搜索帧存储器的所有地址。根据结果，测量污染物位置的坐标。对于每个方向计算CRT的观察屏幕的中心位置和污染物的坐标之间的差异。将计算出的差异发送到样本台驱动机构或图像移位电源。以这种方式，污染物自动居中。聚焦的电子束被引导到该污染物的中心以产生x射线。如果该晶片的分析尚未完成，则从登记的污染物数据表中检索关于下一污染物项目的数据。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式