专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06953939B2 Testing apparatus using scanning electron microscope 失效
标题翻译：使用扫描电子显微镜的测试仪器
公开(公告)号：US06953939B2
公开(公告)日：2005-10-11
申请号：US10472312
申请日：2003-01-21
申请人： Tetsuo Abe , Kouki Okawauchi , Tadashi Hattori , Hironori Fujita , Minoru Takeda , Yuichi Aki , Naoki Date , Setsuo Norioka , Toshiaki Miyokawa , Seiichi Nakagawa
发明人： Tetsuo Abe , Kouki Okawauchi , Tadashi Hattori , Hironori Fujita , Minoru Takeda , Yuichi Aki , Naoki Date , Setsuo Norioka , Toshiaki Miyokawa , Seiichi Nakagawa
IPC分类号： G01N23/225 , G01Q30/02 , G01Q30/16 , H01J37/18 , H01J37/20 , H01J37/28 , G01K5/10 , G21K5/10 , G21K7/00
CPC分类号： H01J37/20 , G01N23/225 , H01J37/18 , H01J2237/188 , H01J2237/2817
摘要： A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floating of the local vacuum formation portion by the float means.
摘要翻译：一种使用扫描电子显微镜的测试装置，用于以非破坏性方式对测试对象的任何部分进行测试和测量，而不受被测对象的尺寸的限制，即使用扫描电子显微镜进行测试的测试装置1 以及通过使用扫描电子显微镜6a以非破坏性方式对测试对象的任何部分进行测量，该扫描电子显微镜包括用于通过从外部阻挡测试对象的被测试部分而形成局部真空区域的局部真空形成部分9 空气，其中所述局部真空形成部分包括用于排出以形成部分真空区域的排气部分，浮子装置14，用于通过将压缩气体发射到所述局部真空部分的外圆周部分来使所述局部真空形成部分上方的整个局部真空形成部分真空形成部分和用于测量测试对象与局部真空形成口之间的距离的长度测量装置16 用于通过浮动装置控制局部真空形成部分的浮动。

2. 发明授权

US06524871B2 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US06524871B2
公开(公告)日：2003-02-25
申请号：US10038775
申请日：2002-01-08
申请人： Kouki Okawauchi
发明人： Kouki Okawauchi
IPC分类号： H01L2100
CPC分类号： G01N21/9501 , G01N21/8422
摘要： A defect inspection apparatus enabling more reliable and quicker detection of a defect present in the surface of a stacked film formed on a wafer and enabling reliable and quicker detection of a minute defect even if there is unevenness in the surface of the wafer, including a light source, a light frequency shifter unit for converting light from the light source to a plurality of beams of inspection light and a beam of reference light having close frequencies, an object lens upon which the beams of inspection light are incident and focusing the beams of light on the wafer to form a plurality of different focal points corresponding to the beams of inspection light, a laser scanning unit for making the beams of inspection light scan the wafer, a light detection unit and cofocal pinhole plate 13 for detecting an intensity of a superposed light of the beams of reflected light and the beam of reference light at a cofocal point, and an analyzing unit serving as a contrast waveform generating means for generating and combining contrast waveforms in the scanning direction at focal positions based on the light intensity detected by the optical detection unit and defect inspection method
摘要翻译：一种缺陷检查装置，其能够更加可靠和更快速地检测在晶片上形成的层叠膜的表面上存在的缺陷，并且即使在晶片的表面上存在不均匀性，也能够可靠且快速地检测微小缺陷，包括光光源，用于将来自光源的光转换成多个检查光束和具有接近频率的参考光束的光移动器单元，检查光束入射并聚焦光束的物镜在晶片上形成对应于检查光束的多个不同的焦点，用于使检查光束扫描晶片的激光扫描单元，用于检测重叠的检测光的强度的光检测单元和共焦孔板13 反射光束的光和共焦点的参考光束，以及用作对比波形成像器的分析单元 g装置，用于基于由光学检测单元检测到的光强度和缺陷检查方法来产生和组合在焦点位置处的扫描方向上的对比度波形

3. 发明授权

US06337488B1 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US06337488B1
公开(公告)日：2002-01-08
申请号：US09515672
申请日：2000-02-29
申请人： Kouki Okawauchi
发明人： Kouki Okawauchi
IPC分类号： G01N2186
CPC分类号： G01N21/9501 , G01N21/8422
摘要： A defect inspection apparatus enabling more reliable and quicker detection of a defect present in the surface of a stacked film formed on a wafer and enabling reliable and quicker detection of a minute defect even if there is unevenness in the surface of the wafer, including a light source, a light frequency shifter unit for converting light from the light source to a plurality of beams of inspection light and a beam of reference light having close frequencies, an object lens upon which the beams of inspection light are incident and focusing the beams of light on the wafer to form a plurality of different focal points corresponding to the beams of inspection light, a laser scanning unit for making the beams of inspection light scan the wafer, a light detection unit and cofocal pinhole plate 13 for detecting an intensity of a superposed light of the beams of reflected light and the beam of reference light at a cofocal point, and an analyzing unit serving as a contrast waveform generating means for generating and combining contrast waveforms in the scanning direction at focal positions based on the light intensity detected by the optical detection unit and defect inspection method.
摘要翻译：一种缺陷检查装置，其能够更加可靠和更快速地检测在晶片上形成的层叠膜的表面上存在的缺陷，并且即使在晶片的表面上存在不均匀性，也能够可靠且快速地检测微小缺陷，包括光光源，用于将来自光源的光转换成多个检查光束和具有接近频率的参考光束的光移动器单元，检查光束入射并聚焦光束的物镜在晶片上形成对应于检查光束的多个不同的焦点，用于使检查光束扫描晶片的激光扫描单元，用于检测重叠的检测光的强度的光检测单元和共焦孔板13 反射光束的光和共焦点的参考光束，以及用作对比波形成像器的分析单元 g装置，用于基于由光学检测单元检测到的光强度和缺陷检查方法，在焦点位置产生和组合扫描方向上的对比度波形。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式