专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20050161615A1 Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same 审中-公开
标题翻译：位置检测方法，表面形状估计方法以及使用该方法的曝光装置和装置制造方法
公开(公告)号：US20050161615A1
公开(公告)日：2005-07-28
申请号：US10505997
申请日：2003-03-07
申请人： Kohei Maeda , Seiya Miura
发明人： Kohei Maeda , Seiya Miura
IPC分类号： G01B11/00 , G01B11/24 , G03F7/20 , G03F9/00 , H01L21/027 , G01N21/00
CPC分类号： G03F1/64 , G03F9/7023 , G03F9/7026 , G03F9/7088
摘要： A position detecting system including a detecting system for detecting positions, at different points on a surface of a reticle having a predetermined pattern formed thereon, with respect to a direction substantially perpendicular to the reticle surface, wherein the detecting system includes a light projecting portion for directing light from a light source to the reticle surface and a light receiving portion for receiving reflection light from the reticle surface, and wherein the angle of incidence of light from the light projecting portion, being incident on the reticle surface, is not less than 45 degrees.
摘要翻译：一种位置检测系统，包括：检测系统，用于在相对于基本上垂直于所述标线片表面的方向上检测在其上形成有预定图案的标线片的表面上的不同点处的位置，其中所述检测系统包括：用于将光从光源引导到光罩表面，以及光接收部分，用于接收来自光罩表面的反射光，并且其中入射在光罩表面上的来自光投射部分的光的入射角不小于45° 度。

2. 发明申请

US20050042525A1 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method 失效
公开(公告)号：US20050042525A1
公开(公告)日：2005-02-24
申请号：US10886767
申请日：2004-07-08
申请人： Tsutomu Takenaka , Seiya Miura
发明人： Tsutomu Takenaka , Seiya Miura
IPC分类号： G03C5/00 , G03F1/46 , G03F7/22 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70941 , G03F1/38 , G03F1/46
摘要： The invention disclosed herein concerns technology that ensures, in a projection exposure process using a transmission type reticle, exposure with an even finish size throughout the entire exposure region, without adverse influence of external disturbance light such as back-surface reflection, for example. Specifically, the invention provides a reticle, a semiconductor exposure apparatus and method, and a semiconductor device manufacturing method, wherein a reticle used there includes a pattern region in which a circuit pattern is formed, a light blocking region of a width d formed at an outside periphery of the pattern region, and an anti-reflection film formed on a surface of the reticle remote from the pattern region, wherein the width d of the light blocking film satisfies a relation d ≤ 2 ⁢ t · tan ⁢ { sin - 1 ⁡ ( n 1 n 2 ⁢ ⁢ sin ⁢ ⁢ θ ) } where n1 is a refractive index of a medium at a light entrance side of the reticle, n2 is a refractive index of the reticle, t is a thickness of the reticle, and θ is an incidence angle of light upon the reticle.

3. 发明申请

US20120292801A1 IMPRINT APPARATUS, IMPRINT METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：印刷装置，印刷方法和装置制造方法
公开(公告)号：US20120292801A1
公开(公告)日：2012-11-22
申请号：US13469829
申请日：2012-05-11
申请人： Hironori Maeda , Seiya Miura , Kazuhiko Mishima , Ken Minoda
发明人： Hironori Maeda , Seiya Miura , Kazuhiko Mishima , Ken Minoda
IPC分类号： B29C59/02
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7088
摘要： An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.
摘要翻译：一种压印装置，其被配置为通过使用其上形成有图案的模具将图案转印到提供在基板上的压印材料，包括光接收元件，被配置为照亮形成在基板上的标记的检测系统和形成在模具上的标记，以及将形成在基板上的标记和模具上形成的标记反射的光引导到光接收元件，以及中继光学系统。中继光学系统被配置为形成从形成在基板上的标记反射的光和在中继光学系统和检测系统之间形成在模具上的标记的图像。检测系统被配置为将由中继光学系统形成的光引导到光接收元件。

4. 发明申请

US20060268255A1 Exposure method and apparatus 有权
标题翻译：曝光方法和装置
公开(公告)号：US20060268255A1
公开(公告)日：2006-11-30
申请号：US11365045
申请日：2006-02-28
申请人： Yoshihiro Shiode , Seiya Miura
发明人： Yoshihiro Shiode , Seiya Miura
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , G03F7/70516 , G03F7/70641
摘要： An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.
摘要翻译：用于使用投影光学系统将掩模图案曝光在平板上的曝光装置的曝光方法包括以下步骤：获得关于第一掩模的平坦度的信息，通过使用投影来投影第一掩模的图案时的图像平面的状态光学系统，关于驱动系统的驱动量的信息，其可以基于图像平面的状况改变印版上的成像条件，以及关于第二掩模的平坦度的信息，通过使用关于驱动量的信息来改变关于驾驶量的信息第一和第二掩模的平坦度，并且基于关于驱动系统的驱动量的改变的信息来驱动驱动系统，以使用投影光学系统将第二掩模的图案投影到板上。

5. 发明授权

US5815607A Image reading device, and inspection apparatus and exposure apparatus using the device 失效
标题翻译：图像读取装置，使用该装置的检查装置和曝光装置
公开(公告)号：US5815607A
公开(公告)日：1998-09-29
申请号：US734846
申请日：1996-10-22
申请人： Seiya Miura
发明人： Seiya Miura
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G02B3/00 , G03F1/84 , G03F7/20 , H01L21/027 , G06K9/00
CPC分类号： G01N21/94 , G02B3/0062 , G02B3/0068 , G02B3/0087
摘要： An image reading device for detecting a foreign object on a substrate includes a lens array for forming an erect image of the object in response to the foreign object being illuminated by a light source, and a sensor array for reading the formed image of the object. The sensor array includes a plurality of pixels, with at least some of the pixels having a dead zone. The lens array and the sensor array are arranged such that the substrate and the photosensing surface of the sensor array are situated at positions separated by substantially the same distance from two conjugate points present when the lens array forms the erect image of the object. The arrangement results in the image being defocused on the sensor array such that a predetermined number of pixels sense the formed image of the object, thus assuring that the foreign object is detected even if the image is projected on a dead zone of a given pixel.
摘要翻译：用于检测基板上的异物的图像读取装置包括：用于响应于由光源照射的异物形成物体的直立图像的透镜阵列和用于读取物体的形成图像的传感器阵列。传感器阵列包括多个像素，其中至少一些像素具有死区。透镜阵列和传感器阵列被布置成使得传感器阵列的基底和感光表面位于与透镜阵列形成物体的直立图像时存在的两个共轭点基本相同的距离处分开的位置。该布置导致图像在传感器阵列上散焦，使得预定数量的像素感测对象的形成图像，从而确保即使图像被投影在给定像素的死区上也检测到异物。

6. 发明授权

US5581348A Surface inspecting device using bisected multi-mode laser beam and system having the same 失效
标题翻译：使用二等分多模激光束的表面检查装置及具有相同功能的系统
公开(公告)号：US5581348A
公开(公告)日：1996-12-03
申请号：US591916
申请日：1996-01-25
申请人： Seiya Miura , Michio Kohno , Takehiko Iwanaga
发明人： Seiya Miura , Michio Kohno , Takehiko Iwanaga
IPC分类号： G01N21/94 , G01N21/95 , G01N21/00 , G02B27/10
CPC分类号： G01N21/94
摘要： A surface state inspecting device includes an illumination system for illuminating a surface to be inspected, with a beam having non-uniform sectional intensity distribution, a uniforming system for substantially uniforming the sectional intensity distribution of the beam, and an inspecting portion for detecting scattered light from the surface to determine the state of the surface.
摘要翻译：表面状态检查装置包括用于照射具有不均匀分布强度分布的光束的被检查表面的照明系统，用于使束的截面强度分布基本均匀化的均匀系统，以及用于检测散射光的检查部从表面来确定表面的状态。

7. 发明申请

US20080036990A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080036990A1
公开(公告)日：2008-02-14
申请号：US11835035
申请日：2007-08-07
申请人： Shinichiro Hirai , Tetsuya Mori , Seiya Miura , Yoshinori Ohsaki
发明人： Shinichiro Hirai , Tetsuya Mori , Seiya Miura , Yoshinori Ohsaki
IPC分类号： G03B27/74
CPC分类号： G03F9/7034 , G03F9/7026 , G03F9/7088
摘要： An exposure apparatus is disclosed. The apparatus comprises an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light which has passed through the mark and the image of the mark formed by the measurement light reflected by the mark.
摘要翻译：公开了一种曝光装置。该装置包括图像传感器，测量光学系统，被配置为引导测量光倾斜地进入投影光学系统，并且进一步将从投影光学系统返回的测量光引导到图像传感器;以及控制单元，被配置为计算表面位置基于来自图像传感器的输出的基板的信息。控制单元基于由穿过标记的测量光形成的原稿台上的标记的图像与由测量光形成的标记的图像之间的间隔来计算基板的表面位置信息被标记所反映。

8. 发明授权

US5963316A Method and apparatus for inspecting a surface state 失效
标题翻译：检查表面状态的方法和装置
公开(公告)号：US5963316A
公开(公告)日：1999-10-05
申请号：US954879
申请日：1997-10-21
申请人： Seiya Miura , Michio Kohno , Nobuhiro Kodachi
发明人： Seiya Miura , Michio Kohno , Nobuhiro Kodachi
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , G03F1/64 , G03F1/84 , H01L21/66
CPC分类号： G03F1/64 , G01N21/94 , G03F1/84
摘要： A method and apparatus for inspecting a surface state are used to examine first and second surfaces, e.g., two surfaces of a glass substrate on which a device pattern is formed, or one surface of a glass substrate and a pellicle for preventing attachment of foreign particles. When the first surface is illuminated from the first surface side while the second surface is illuminated from the second surface side, the first and second surfaces are illuminated with polarized light beams polarized in directions orthogonal to each other, respectively, and reflectively scattered light from the first surface is detected through an analyzer which intercepts the same polarized light as the polarized light illuminating the second surface. The S/N ratio of examination of the first surface is thereby improved.
摘要翻译：用于检查表面状态的方法和装置用于检查第一和第二表面，例如其上形成有器件图案的玻璃基板的两个表面，或用于防止外来颗粒附着的玻璃基板和防护薄膜的一个表面。当从第一表面侧照亮第一表面而从第二表面侧照亮第二表面时，第一表面和第二表面被分别以彼此正交的方向偏振的偏振光照射，并且反射散射来自通过分析器检测第一表面，该分析器拦截与照射第二表面的偏振光相同的偏振光。从而提高了第一表面的检查的S / N比。

9. 发明授权

US5160962A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5160962A
公开(公告)日：1992-11-03
申请号：US642408
申请日：1991-01-17
申请人： Seiya Miura , Akiyoshi Suzuki
发明人： Seiya Miura , Akiyoshi Suzuki
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/70133 , G03F7/70358 , G03F7/70891
摘要： A projection exposure apparatus is disclosed which includes an illumination system with a masking mechanism having an aperture of variable shape, a projection optical system, a photoreceptor disposed adjacent to an image plane of the projection optical system, and an adjuster for adjusting the masking mechanism, wherein the adjuster is contributable to reduce the size of the aperture and to shift the position of the aperture, such that, with the cooperation of the projection optical system, a relatively small light pattern is produced on the image plane and the produced light pattern is displaced along the image plane, and wherein the photoreceptor receives light from the produced light pattern.
摘要翻译：公开了一种投影曝光装置，其包括具有可变形状的孔的掩蔽机构的照明系统，投影光学系统，与投影光学系统的像面相邻设置的感光体，以及用于调整掩蔽机构的调节器，其中调节器有助于减小孔径的尺寸并移动孔的位置，使得通过投影光学系统的配合，在图像平面上产生相对较小的光图案，并且所产生的光图案是沿着图像平面移位，并且其中感光器接收来自所产生的光图案的光。

10. 发明授权

US09188855B2 Imprint apparatus, imprint method, and device manufacturing method 有权
标题翻译：印刷装置，压印方法和装置制造方法
公开(公告)号：US09188855B2
公开(公告)日：2015-11-17
申请号：US13469829
申请日：2012-05-11
申请人： Hironori Maeda , Seiya Miura , Kazuhiko Mishima , Ken Minoda
发明人： Hironori Maeda , Seiya Miura , Kazuhiko Mishima , Ken Minoda
IPC分类号： B29C59/02 , G03F7/00 , G03F9/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7088
摘要： An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.
摘要翻译：一种压印装置，其被配置为通过使用其上形成有图案的模具将图案转印到提供在基板上的压印材料，包括光接收元件，被配置为照亮形成在基板上的标记的检测系统和形成在模具上的标记，以及将形成在基板上的标记和模具上形成的标记反射的光引导到光接收元件，以及中继光学系统。中继光学系统被配置为形成从形成在基板上的标记反射的光和在中继光学系统和检测系统之间形成在模具上的标记的图像。检测系统被配置为将由中继光学系统形成的光引导到光接收元件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式