会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Method and apparatus for inspecting a surface state
    • 检查表面状态的方法和装置
    • US5963316A
    • 1999-10-05
    • US954879
    • 1997-10-21
    • Seiya MiuraMichio KohnoNobuhiro Kodachi
    • Seiya MiuraMichio KohnoNobuhiro Kodachi
    • G01B11/30G01N21/88G01N21/94G01N21/956G03F1/64G03F1/84H01L21/66
    • G03F1/64G01N21/94G03F1/84
    • A method and apparatus for inspecting a surface state are used to examine first and second surfaces, e.g., two surfaces of a glass substrate on which a device pattern is formed, or one surface of a glass substrate and a pellicle for preventing attachment of foreign particles. When the first surface is illuminated from the first surface side while the second surface is illuminated from the second surface side, the first and second surfaces are illuminated with polarized light beams polarized in directions orthogonal to each other, respectively, and reflectively scattered light from the first surface is detected through an analyzer which intercepts the same polarized light as the polarized light illuminating the second surface. The S/N ratio of examination of the first surface is thereby improved.
    • 用于检查表面状态的方法和装置用于检查第一和第二表面,例如其上形成有器件图案的玻璃基板的两个表面,或用于防止外来颗粒附着的玻璃基板和防护薄膜的一个表面 。 当从第一表面侧照亮第一表面而从第二表面侧照亮第二表面时,第一表面和第二表面被分别以彼此正交的方向偏振的偏振光照射,并且反射散射来自 通过分析器检测第一表面,该分析器拦截与照射第二表面的偏振光相同的偏振光。 从而提高了第一表面的检查的S / N比。
    • 2. 发明授权
    • Inspecting apparatus having a detection sensitivity controller means
    • 具有检测灵敏度控制装置的检查装置
    • US5105092A
    • 1992-04-14
    • US718909
    • 1991-06-24
    • Katsutoshi NatsuboriNobuhiro KodachiMichio Kohno
    • Katsutoshi NatsuboriNobuhiro KodachiMichio Kohno
    • G01N21/88G01J1/44G01N21/94G01N21/956H01L21/027H01L21/30H01L21/66
    • G01N21/94G01J2001/4453G01N2021/95676G01N21/8851
    • An inspecting apparatus, for inspecting a surface state of an article to be inspected, includes a zone detecting system for detecting a zone which can cause strong scattering of light; a surface state detecting system for detecting the surface state of the article, the surface state detecting system including a light source for projecting an inspecting light beam to the article, a light scanning mechanism for relatively moving the article and the inspecting light beam so that the article is scanned with the inspecting light beam, and a photoelectric converter for detecting light from the article scanned with the inspecting light beam by the light source and the light scanning mechanism; an inspecting device for receiving an output signal from the photoelectric converter and for inspecting the surface state of the article; and a sensitivity controller for controlling the detection sensitivity of the surface state detecting system on the basis of the detection by the zone detecting system, such that when the inspecting light beam scans the zone, the detection sensitivity of the surface state detecting system is relatively reduced.
    • 用于检查被检查物品的表面状态的检查装置包括:区域检测系统,用于检测能够引起强烈散射光的区域; 表面状态检测系统,用于检测物品的表面状态,表面状态检测系统包括用于将检查光束投射到物品的光源,用于使物品和检查光束相对移动的光扫描机构, 用检查光束扫描物品,以及用于通过光源和光扫描机构检测用检查光束扫描的物品的光的光电转换器; 检测装置,用于从光电转换器接收输出信号并检查物品的表面状态; 以及灵敏度控制器,其基于区域检测系统的检测来控制表面状态检测系统的检测灵敏度,使得当检查光束扫描该区域时,表面状态检测系统的检测灵敏度相对降低 。
    • 5. 发明授权
    • Surface inspecting device
    • 表面检测装置
    • US5585916A
    • 1996-12-17
    • US257535
    • 1994-06-09
    • Seiya MiuraMichio Kohno
    • Seiya MiuraMichio Kohno
    • G01N21/21G01N21/88G01N21/94G01N21/95G01N21/956G03F1/84
    • G01N21/21G01N21/9501
    • A surface inspection device and method wherein an illumination system is arranged so that light from a laser diode is transformed into parallel light which is then directed through a half waveplate to a surface of a reticle to be inspected. A detecting system is arranged so that scattered light from a particle on the surface, for example, is collected by a lens array onto a sensor array. The direction of polarization of the parallel light defined by the half waveplate is made substantially parallel to a plane containing optical axes of the illumination system and the detecting system. Thus, even if an error occurs in the angle of incidence of the parallel light upon the reticle, a change in scattered light intensity due to interference between scattered light is kept small to assure accurate discrimination of the particle.
    • 一种表面检查装置和方法,其中照明系统被布置成使得来自激光二极管的光被转换成平行光,然后将平行光引导通过半波片到待检查的掩模版的表面。 检测系统被布置成使得来自表面上的颗粒的散射光例如由透镜阵列收集到传感器阵列上。 由半波片限定的平行光的偏振方向基本上平行于包含照明系统和检测系统的光轴的平面。 因此,即使在光掩模上的平行光的入射角发生错误,由于散射光之间的干涉引起的散射光强度的变化也保持较小,从而确保了颗粒的准确辨别。
    • 7. 发明授权
    • Surface-condition inspection apparatus
    • 表面状态检查装置
    • US5381225A
    • 1995-01-10
    • US199971
    • 1994-02-22
    • Michio Kohno
    • Michio Kohno
    • G01B11/30G01N21/88G01N21/94G01N21/956G03F1/84G01N21/89
    • G01N21/94G01N2021/95676
    • An apparatus for inspecting a surface condition of an object having at least a first surface to be inspected and a second surface to be inspected with a higher detection resolution than the first surface includes a holding mechanism, and first and second inspection systems. The holding mechanism holds the object so as to dispose the second surface at a constant position irrespective of the distance between the first and second surfaces. The first and second inspection systems inspect the first and second surfaces of the object, respectively, and each includes an irradiator producing a condensed light beam to illuminate a surface of the object and a receiver for receiving light from a surface of the object. The first and second inspection systems set the angle subtended by the condensed light beam of the first inspection system to be smaller than the angle subtended by the condensed light beam of the second inspection system.
    • 用于检查具有至少第一待检查表面的物体的表面状况的设备和具有比第一表面更高的检测分辨率的待检查的第二表面的设备包括保持机构以及第一和第二检查系统。 保持机构保持物体,以将第二表面设置在恒定位置,而与第一和第二表面之间的距离无关。 第一和第二检查系统分别检查物体的第一和第二表面,并且每个包括产生聚光的照射器以照射物体的表面的辐射器和用于从物体的表面接收光的接收器。 第一检测系统和第二检查系统将第一检查系统的凝结光束对向的角度设定为小于第二检查系统的聚光束所对向的角度。
    • 9. 发明授权
    • Focus detection in a projection optical system
    • 投影光学系统中的焦点检测
    • US4705940A
    • 1987-11-10
    • US757341
    • 1985-07-22
    • Michio Kohno
    • Michio Kohno
    • H01L21/30G03F7/20G03F7/207G03F9/00H01L21/027G01J1/20
    • G03F9/7026
    • A projection optical system including a projection optical element for projecting a pattern of a mask onto a wafer, wherein astigmatism is corrected with respect to a predetermined region of a field of the projection optical element and wherein the astigmatism is not corrected with respect to another region of the field of the projection optical element. Also provided is a detector for detecting a state of focus of the projection optical element with respect to the wafer, on the basis of the effect of the astigmatism on a light beam from the region of the field of the projection optical element, in which region the astigmatism is not corrected.
    • 一种投影光学系统,包括用于将掩模的图案投影到晶片上的投影光学元件,其中相对于所述投影光学元件的场的预定区域校正散光,并且其中所述像散相对于另一区域不被校正 的投影光学元件的场。 还提供了一种用于基于像散对来自投影光学元件的场的区域的光束的影响来检测投影光学元件相对于晶片的焦点状态的检测器,其中区域 散光没有改正。