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    • 2. 发明授权
    • Method for producing a semiconductor
    • 半导体制造方法
    • US06270685B1
    • 2001-08-07
    • US09436358
    • 1999-11-09
    • Seiichiro IshioKenichi Ao
    • Seiichiro IshioKenichi Ao
    • C23F100
    • B81C1/0042G01P15/0802G01P15/123G01P2015/084H01L21/0334
    • In a method for producing a semiconductor dynamic sensor, an anisotropic etching mask is formed on a (100) crystal orientation silicon substrate with a main portion and form-compensation portions formed at the corners of the main portion. Each of the form-compensation portions has a rectangular shape with a long side and a short side. Further, one of the long and short sides of the etching mask stretches in the direction of the silicon substrate, and the other side stretches in the direction of the silicon substrate. As a result, the silicon substrate can be etched into a predetermined shape without making large corner-undercut portions on a nonetched portion corresponding to the main portion of the mask.
    • 在制造半导体动态传感器的方法中,在主要部分的(100)晶体取向硅衬底上形成各向异性蚀刻掩模,并且形成在主要部分的角部处的形状补偿部分。 每个形状补偿部分具有长边和短边的矩形形状。 此外,蚀刻掩模的长边和短边之一在硅衬底的<011>方向上延伸,另一侧在硅衬底的<0(超芯(1)} 1>方向上延伸。 结果,可以将硅衬底蚀刻成预定形状,而不会在对应于掩模的主要部分的非蚀刻部分上形成大的拐角切口部分。
    • 8. 发明授权
    • Diaphragm-type semiconductor pressure sensor
    • 隔膜型半导体压力传感器
    • US06789431B2
    • 2004-09-14
    • US10428133
    • 2003-05-02
    • Seiichiro Ishio
    • Seiichiro Ishio
    • G01L900
    • G01L9/0054
    • A diaphragm-type semiconductor pressure sensor includes a substantially rectangular (110) semiconductor substrate, which has four sides, an active surface of (110) crystallographic face orientation, and a back surface, which is opposite to the active surface, of (110) crystallographic face orientation. Each of the surfaces is surrounded by the four sides. Each of the four sides is at an angle of substantially 45 degrees with a crystallographic axis of orientation that is substantially parallel to the active surface. The substrate includes a diaphragm in the active surface. The diaphragm has been formed by forming a recess in the back surface. The diaphragm includes a gauge resistor. A pressure is detected on the basis of the variation in the resistance of the gauge resistor.
    • 一种隔膜式半导体压力传感器,包括:(110)具有四边的(110)结晶面取向的有源面和与该有源面相反的背面的大致矩形(110)半导体衬底, 晶体面取向。 每个表面都被四面包围。 四个边中的每一个都是基本上平行于活性表面的大致45度的晶体轴<110>取向的角度。 基板包括活动表面中的隔膜。 隔膜通过在后表面形成凹部而形成。 隔膜包括量规电阻。 基于量规电阻器的电阻的变化来检测压力。
    • 9. 发明授权
    • Dynamic sensor having capacitance varying according to dynamic force applied thereto
    • 具有根据施加到其上的动态力而变化的电容的动态传感器
    • US06694814B2
    • 2004-02-24
    • US10029025
    • 2001-12-28
    • Seiichiro Ishio
    • Seiichiro Ishio
    • G01P15125
    • B81B3/0008B81B2201/0235G01P15/125G01P2015/0814
    • A dynamic sensor includes stationary electrodes and movable electrodes facing each other and forming a capacitance therebetween. The capacitance changes in accordance with a dynamic force such as acceleration imposed on the sensor. Plural projections are formed on the stationary electrodes to avoid or suppress electrode sticking between the movable electrodes and the stationary electrodes due to an excessive impact imposed on the sensor. The projections are formed to have various heights so that higher projections first hit the movable electrodes and thereby protect lower projections. Even after the higher projections are destroyed by the excessive impact, the lower projections remain intact and serve to prevent the electrode sticking by the excessive impact which may occur later.
    • 动态传感器包括固定电极和彼此面对并在其间形成电容的可动电极。 电容根据传感器施加的加速度等动力而变化。 在固定电极上形成多个突起,以避免或抑制由于施加在传感器上的过度冲击而导致的可动电极和固定电极之间的电极粘附。 突起形成为具有各种高度,使得较高的突起首先撞击可动电极,从而保护较低的突起。 即使在较高的投影被过度的冲击破坏之后,较低的投影仍然保持不变,并且用于防止由于稍后可能发生的过度的冲击而导致的电极粘附。
    • 10. 发明申请
    • Current sensor having hall element
    • 电流传感器具有霍尔元件
    • US20060284611A1
    • 2006-12-21
    • US11448810
    • 2006-06-08
    • Seiichiro Ishio
    • Seiichiro Ishio
    • G01R33/07
    • G01R15/202
    • A current sensor includes: a current path; a semiconductor substrate; and a Hall element on the substrate. The Hall element detects a magnetic flux in a magnetic field caused by a detection object current. The Hall element generates a Hall voltage corresponding to the magnetic flux when a driving current flowing in a direction perpendicular to the semiconductor substrate is supplied to the Hall element, and when the magnetic flux having a component parallel to the semiconductor substrate affects the Hall element. The current path is disposed on the semiconductor substrate. The current path is electrically isolated from the Hall element.
    • 电流传感器包括:电流路径; 半导体衬底; 和基板上的霍尔元件。 霍尔元件检测由检测对象电流引起的磁场中的磁通量。 当向垂直于半导体衬底的方向流动的驱动电流被提供给霍尔元件时,霍尔元件产生与磁通相对应的霍尔电压,并且当具有与半导体衬底平行的分量的磁通量会影响霍尔元件。 电流路径设置在半导体衬底上。 电流路径与霍尔元件电隔离。