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1. 发明授权

US5940299A System & method for controlling a process-performing apparatus in a semiconductor device-manufacturing process 失效
标题翻译：用于在半导体器件制造工艺中控制处理执行装置的系统和方法
公开(公告)号：US5940299A
公开(公告)日：1999-08-17
申请号：US718673
申请日：1996-09-24
申请人： Sang-koog Choi , Jae-Kyung Lee , Sang-woon Kim
发明人： Sang-koog Choi , Jae-Kyung Lee , Sang-woon Kim
IPC分类号： H01L21/677 , B65G61/00 , G01R31/08 , G05B15/02 , G05B19/418 , G06F11/00 , G06F19/00 , G06G7/66 , G06Q50/00 , G06Q50/04 , H01L21/02 , H01L21/68
CPC分类号： G05B19/41865 , G05B2219/36551 , G05B2219/45031 , Y02P90/14 , Y02P90/20 , Y02P90/22
摘要： A control system of a semiconductor device manufacturing process is disclosed. The system includes a main host computer, host computers connected to the main host computer and process performing apparatuses connected to the host computers. The system checks the integrity of transferred operational instructions between the host computers and process performing apparatuses, in order to prevent errors in the manufacturing process. When the error is detected the system user is notified by audio signals or visual displays.
摘要翻译：公开了一种半导体器件制造工艺的控制系统。该系统包括主主计算机，连接到主主计算机的主计算机和连接到主计算机的处理执行装置。系统检查主计算机和处理执行装置之间传送的操作指令的完整性，以防止制造过程中的错误。当检测到错误时，系统用户被音频信号或视觉显示通知。

2. 发明授权

US5728940A Leakage gas detector for semiconductor device and leakage gas detecting method using the same 失效
标题翻译：用于半导体器件的泄漏气体检测器和使用其的泄漏气体检测方法
公开(公告)号：US5728940A
公开(公告)日：1998-03-17
申请号：US739729
申请日：1996-11-07
申请人： Dae-woo Kim , Jae-kyung Lee , Bon-rip Koo , Sang-woon Kim
发明人： Dae-woo Kim , Jae-kyung Lee , Bon-rip Koo , Sang-woon Kim
IPC分类号： G01M3/04 , G01M3/20 , G01N33/00 , G05B9/02 , H01L21/02 , H01L21/66 , G01M3/18 , G01N31/08
CPC分类号： G01N33/0011 , G01M3/20
摘要： A leakage gas detector for a semiconductor device includes a plurality of inflow apertures into which leakage gas flows. A detector sequentially detects the leakage gas in each of the inflow apertures via a plurality of valves, so as to leak test each of the plurality of inflow apertures for presence of possible leakage gas. Each of the plurality of valves are connected to corresponding of the plurality of inflow apertures to control the suction of the leakage gas into the detector. A controller selectively opens and closes each of the plurality of valves.
摘要翻译：用于半导体器件的泄漏气体检测器包括泄漏气体流入的多个流入孔。检测器通过多个阀顺序地检测每个流入孔中的泄漏气体，以便泄漏测试多个流入孔中的每一个以存在可能的泄漏气体。多个阀中的每一个连接到多个流入孔的对应部分，以控制泄漏气体进入检测器的抽吸。控制器选择性地打开和关闭多个阀中的每一个。

3. 发明授权

US5753046A Vertical diffusion furnace and cap therefor 失效
标题翻译：垂直扩散炉及其盖
公开(公告)号：US5753046A
公开(公告)日：1998-05-19
申请号：US755160
申请日：1996-11-22
申请人： Sang-kook Choi , Sang-woon Kim
发明人： Sang-kook Choi , Sang-woon Kim
IPC分类号： H01L21/22 , C30B31/00 , C30B31/06 , H01L21/00 , H01L21/18 , C23C16/00 , F27B1/00 , F27B1/10
CPC分类号： C30B31/00 , C30B31/06
摘要： A vertical diffusion furnace and a cap therefor are provided to minimize diffusion non-uniformity in a diffusion furnace caused by the positioning of a reaction gas outlet. In the vertical diffusion furnace, a reaction gas outlet is formed in the lower portion of a cap and adapted to extend downward through a flange. Thus, is provided a means to maintain diffusion uniformity in the diffusion furnace to comply with the necessity of processing large diameter wafers needed for highly integrated semiconductor devices. Thereby, a decrease in the rate of productivity for operating such equipment due to its positioning of a reaction gas outlet is prevented.
摘要翻译：提供了一种垂直扩散炉及其盖，以使反应气体出口的定位引起扩散炉中的扩散不均匀性最小化。在垂直扩散炉中，反应气体出口形成在盖的下部，并适于向下延伸穿过凸缘。因此，提供了一种在扩散炉中保持扩散均匀性的手段，以符合处理高度集成半导体器件所需的大直径晶片的必要性。因此，防止了由于其反应气体出口的定位而使这种设备操作的生产率的降低。

4. 发明授权

US5711808A Boat for vertical diffusion furnace 失效
标题翻译：垂直扩散炉船
公开(公告)号：US5711808A
公开(公告)日：1998-01-27
申请号：US755159
申请日：1996-11-25
申请人： Jong-moon Yang , Chung-hwan Kwon , Sang-woon Kim , Choung-bae Park
发明人： Jong-moon Yang , Chung-hwan Kwon , Sang-woon Kim , Choung-bae Park
IPC分类号： H01L21/683 , F27D5/00 , H01L21/22 , C23C16/00
CPC分类号： F27D5/0037
摘要： A boat for a vertical diffusion furnace has an upper disk and a lower disk spaced parallel from each other by a predetermined distance. A pair of first bars, having a plurality of wafer holding slots, face each other along a first center plane extending along a diameter of the upper and lower disks, and connect the upper and lower disks. A pair of second bars also connect the upper and lower disks, and are positioned at a predetermined angle with respect to a second center plane orthogonal to the first center plane. The second bars have a plurality of slots corresponding to the slots of the first bars. A pair of first auxiliary bars are installed adjacent to the pair of first bars to also connect the upper and lower disks. The boat may further have a pair of second auxiliary bars for connecting the upper and lower disks at positions adjacent to the pair of second bars. Also, a pair of horizontal supporting bars connect the first auxiliary bars to the second auxiliary bars. Therefore, thermal deformation of the first bars is markedly reduced, the slip of the wafers out of the slots is prevented, and the life of the boat can be longer.
摘要翻译：用于垂直扩散炉的船具有彼此间隔开预定距离的上盘和下盘。具有多个晶片保持槽的一对第一杆沿着沿着上下盘的直径延伸的第一中心平面彼此面对，并连接上下盘。一对第二杆还连接上下盘，并且相对于与第一中心平面正交的第二中心平面定位成预定角度。第二杆具有对应于第一杆的槽的多个槽。一对第一辅助杆安装在一对第一杆附近，以连接上部和下部盘。船还可以具有一对第二辅助杆，用于在邻近该对第二杆的位置处连接上部和下部盘。此外，一对水平支撑杆将第一辅助杆连接到第二辅助杆。因此，第一棒的热变形显着减小，从而防止了晶片从槽中滑出，并且船的寿命可以更长。

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