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    • 1. 发明申请
    • SEMICONDUCTOR LIGHT-EMITTING DEVICE
    • 半导体发光器件
    • US20100019255A1
    • 2010-01-28
    • US12311916
    • 2008-05-20
    • Sachio KarinoEiji TakaseMakoto OoganeTsuyoshi NagatakeMichiru KamadaHironobu NaruiNobukata Okano
    • Sachio KarinoEiji TakaseMakoto OoganeTsuyoshi NagatakeMichiru KamadaHironobu NaruiNobukata Okano
    • H01L33/00
    • H01S5/227B82Y20/00H01L33/145H01S5/2201H01S5/2222H01S5/2223H01S5/305H01S5/3054H01S5/3072H01S5/3077H01S5/3211H01S5/3432
    • There is provided a semiconductor light-emitting device capable of an attempt to further decrease a leakage current in a current-blocking layer and including (A) a light-emitting portion (20) composed of a first compound semiconductor layer (abbreviated as a layer hereinafter) (21) having a first conductivity type, an active layer (23), and a second layer (22) having a second conductivity type, and (B) a current-blocking layer (40) in contact with the side of the light-emitting portion and composed of a third layer (43) having the first conductivity type and a fourth layer (44) having the second conductivity type, wherein the impurity for imparting the first conductivity type to the first layer (21) includes an impurity in the first layer (21) at a substitution site which is uncompetitive with a substitution site of the impurity in the second layer (22), for imparting the second conductivity type to the second layer (22), and the impurity for imparting the first conductivity type to the third layer (43) includes an impurity in the third layer (43) at a substitution site which is competitive with a substitution site of the impurity in the fourth layer (44), for imparting the second conductivity type to the fourth layer (44).
    • 提供一种半导体发光器件,其能够进一步减小电流阻挡层中的漏电流,并且包括(A)由第一化合物半导体层(简称为层)构成的发光部(20) (21),具有第一导电类型的有源层(23)和具有第二导电类型的第二层(22),和(B)与所述第二导电类型的侧面接触的电流阻挡层(40) 发光部分,并且由具有第一导电类型的第三层(43)和具有第二导电类型的第四层(44)组成,其中用于赋予第一层(21)的第一导电类型的杂质包括杂质 在与第二层(22)中的杂质的取代部位不具竞争力的取代位置处的第一层(21)中,用于将第二导电类型赋予第二层(22),并且用于赋予第一层 导电类型到th 第三层(43)在与第四层(44)中的杂质的取代位置竞争的取代位置处包含在第三层(43)中的杂质,用于将第二导电类型赋予第四层(44) )。