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    • 1. 发明授权
    • Substrate replacing method and substrate processing apparatus
    • 基板更换方法和基板处理装置
    • US08663489B2
    • 2014-03-04
    • US12732451
    • 2010-03-26
    • Shigeru IshizawaHiroshi KoizumiTatsuya Ogi
    • Shigeru IshizawaHiroshi KoizumiTatsuya Ogi
    • B44C1/22
    • H01L21/67745H01L21/67748
    • A method for replacing plural substrates to be processed by a substrate processing apparatus which includes a substrate processing chamber, a load lock chamber, and a conveying apparatus including first and second conveying members for conveying the plural substrates into and out from the substrate processing chamber and the load lock chamber. The method includes the steps of a) conveying a first substrate out from the substrate processing chamber with the first conveying member, b) conveying a second substrate into the substrate processing chamber with the second conveying member, c) conveying the second substrate out from the load lock chamber with the second conveying member, and d) conveying the first substrate into the load lock chamber with the first conveying member. The steps c) and d) are performed between step a) and step b).
    • 一种用于替换多个基板的方法,所述基板处理装置包括基板处理室,负载锁定室和输送装置,所述基板处理装置包括用于将多个基板输入和移出基板处理室的第一和第二输送部件, 负载锁定室。 该方法包括以下步骤:a)用第一输送部件从基板处理室输出第一基板,b)用第二输送部件将第二基板输送到基板处理室中,c)将第二基板从 负载锁定室与第二输送构件,以及d)用第一输送构件将第一基板输送到装载锁定室。 在步骤a)和步骤b)之间执行步骤c)和d)。
    • 2. 发明申请
    • SUBSTRATE REPLACING METHOD AND SUBSTRATE PROCESSING APPARATUS
    • 基板更换方法和基板处理装置
    • US20100252532A1
    • 2010-10-07
    • US12732451
    • 2010-03-26
    • SHIGERU ISHIZAWAHiroshi KoizumiTatsuya Ogi
    • SHIGERU ISHIZAWAHiroshi KoizumiTatsuya Ogi
    • C23F1/08C23C16/458C23F1/00C23C16/00
    • H01L21/67745H01L21/67748
    • A method for replacing plural substrates to be processed by a substrate processing apparatus which includes a substrate processing chamber, a load lock chamber, and a conveying apparatus including first and second conveying members for conveying the plural substrates into and out from the substrate processing chamber and the load lock chamber. The method includes the steps of a) conveying a first substrate out from the substrate processing chamber with the first conveying member, b) conveying a second substrate into the substrate processing chamber with the second conveying member, c) conveying the second substrate out from the load lock chamber with the second conveying member, and d) conveying the first substrate into the load lock chamber with the first conveying member. The steps c) and d) are performed between step a) and step b).
    • 一种用于替换多个基板的方法,所述基板处理装置包括基板处理室,负载锁定室和输送装置,所述基板处理装置包括用于将多个基板输入和移出基板处理室的第一和第二输送部件, 负载锁定室。 该方法包括以下步骤:a)用第一输送部件从基板处理室输出第一基板,b)用第二输送部件将第二基板输送到基板处理室中,c)将第二基板从 负载锁定室与第二输送构件,以及d)用第一输送构件将第一基板输送到装载锁定室。 在步骤a)和步骤b)之间执行步骤c)和d)。
    • 3. 发明申请
    • Transfer apparatus for target object
    • 目标对象传送装置
    • US20060291988A1
    • 2006-12-28
    • US11475196
    • 2006-06-27
    • Wataru MachiyamaShigeru IshizawaHiroshi KoizumiTsutomu HirokiKeisuke Kondoh
    • Wataru MachiyamaShigeru IshizawaHiroshi KoizumiTsutomu HirokiKeisuke Kondoh
    • B65G57/02
    • H01L21/67742H01L21/67276H01L21/67745
    • A processing system includes a transfer chamber, a plurality of chambers connected to the transfer chamber, a transfer apparatus disposed in the transfer chamber, and a control section configured to control the transfer apparatus. The transfer apparatus includes a base and transfer arm configured to perform a slide motion and a swing motion, respectively. The control section includes a storage portion and an operational controller. The storage portion stores pattern model data concerning a plurality of motion patterns each indicative of a composite motion of the slide motion and the swing motion, and track model data concerning time-based motion tracks respectively corresponding to the motion patterns. The operational controller is configured to retrieve necessary data from the pattern model data and the track model data and control the transfer apparatus in accordance therewith.
    • 一种处理系统,包括传送室,连接到传送室的多个室,设置在传送室中的传送装置和被配置为控制传送装置的控制部。 传送装置包括分别执行滑动运动和摆动运动的底座和传送臂。 控制部分包括存储部分和操作控制器。 存储部分存储关于多个运动模式的模式模型数据,每个运动模式指示滑动运动和摆动运动的复合运动,以及跟踪分别对应于运动模式的基于时间的运动轨迹的模型数据。 操作控制器被配置为从模式模型数据和轨道模型数据中检索必要的数据,并根据其控制传送装置。
    • 4. 发明授权
    • Transfer apparatus for target object
    • 目标对象传送装置
    • US07286890B2
    • 2007-10-23
    • US11475196
    • 2006-06-27
    • Wataru MachiyamaShigeru IshizawaHiroshi KoizumiTsutomu HirokiKeisuke Kondoh
    • Wataru MachiyamaShigeru IshizawaHiroshi KoizumiTsutomu HirokiKeisuke Kondoh
    • G06F19/00G05B19/18
    • H01L21/67742H01L21/67276H01L21/67745
    • A processing system includes a transfer chamber, a plurality of chambers connected to the transfer chamber, a transfer apparatus disposed in the transfer chamber, and a control section configured to control the transfer apparatus. The transfer apparatus includes a base and transfer arm configured to perform a slide motion and a swing motion, respectively. The control section includes a storage portion and an operational controller. The storage portion stores pattern model data concerning a plurality of motion patterns each indicative of a composite motion of the slide motion and the swing motion, and track model data concerning time-based motion tracks respectively corresponding to the motion patterns. The operational controller is configured to retrieve necessary data from the pattern model data and the track model data and control the transfer apparatus in accordance therewith.
    • 一种处理系统,包括传送室,连接到传送室的多个室,设置在传送室中的传送装置和被配置为控制传送装置的控制部。 传送装置包括分别执行滑动运动和摆动运动的底座和传送臂。 控制部分包括存储部分和操作控制器。 存储部分存储关于多个运动模式的模式模型数据,每个运动模式指示滑动运动和摆动运动的复合运动,以及跟踪分别对应于运动模式的基于时间运动轨迹的模型数据。 操作控制器被配置为从模式模型数据和轨道模型数据中检索必要的数据,并根据其控制传送装置。