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    • 3. 发明申请
    • TRANSISTOR LAYOUT CONFIGURATION FOR TIGHT-PITCHED MEMORY ARRAY LINES
    • 用于紧凑的内存阵列的晶体管布局配置
    • US20060221758A1
    • 2006-10-05
    • US11420787
    • 2006-05-29
    • Christopher PettiRoy ScheuerleinTanmay KumarAbhijit Bandyopadhyay
    • Christopher PettiRoy ScheuerleinTanmay KumarAbhijit Bandyopadhyay
    • G11C8/00
    • G11C8/14G11C5/02G11C5/063G11C8/08H01L27/0207H01L27/0688H01L27/10894H01L27/10897
    • A multi-headed word line driver circuit incorporates bent-gate transistors to reduce the pitch otherwise achievable for interfacing to tightly-pitched array lines. In certain exemplary embodiments, a three-dimensional memory array includes multiple memory blocks and array lines traversing horizontally across at least one memory block. Vertical active area stripes are disposed beneath a first memory block, and a respective plurality of bent-gate electrodes intersects each respective active area stripe to define individual source/drain regions. Every other source/drain region is coupled to a bias node for the active area stripe, and remaining source/drain regions are respectively coupled to a respective array line associated with the first memory block, thereby forming a respective first driver transistor for the respective array line. In certain embodiments, a respective plurality of complementary array line driver circuits is disposed on each side of a connection area between adjacent memory blocks, and each such driver circuit is responsive to a single driver input node.
    • 多头字线驱动电路包括弯栅晶体管,以减少为了与紧密排列的阵列线连接而实现的间距。 在某些示例性实施例中,三维存储器阵列包括穿过至少一个存储器块水平横越的多个存储器块和阵列线。 垂直有源区条纹设置在第一存储块下方,并且相应的多个弯曲栅电极与每个相应的有源区条纹相交以限定各个源/漏区。 每个其它源极/漏极区域耦合到用于有源区域条纹的偏置节点,并且剩余的源极/漏极区域分别耦合到与第一存储器模块相关联的相应阵列线,从而形成用于相应阵列的相应的第一驱动器晶体管 线。 在某些实施例中,相应的多个互补阵列线驱动器电路设置在相邻存储块之间的连接区域的每一侧上,并且每个这样的驱动器电路响应于单个驱动器输入节点。
    • 10. 发明申请
    • Reversible resistivity-switching metal oxide or nitride layer with added metal
    • 具有添加金属的可逆电阻率开关金属氧化物或氮化物层
    • US20070114508A1
    • 2007-05-24
    • US11287452
    • 2005-11-23
    • S. HernerTanmay Kumar
    • S. HernerTanmay Kumar
    • H01L29/02H01L47/00
    • H01L45/145H01L27/2409H01L27/2463H01L45/04H01L45/1233H01L45/146H01L45/1625H01L45/165H01L45/1658H01L45/1675
    • A layer of resistivity-switching metal oxide or nitride can attain at least two stable resistivity states. Such a layer may be used in a state-change element in a nonvolatile memory cell, storing its data state, for example a “0” or a “1”, in this resistivity state. Including additional metal atoms in a layer of such a resistivity-switching metal oxide or nitride compound decreases the current required to cause switching between resistivity states, reducing power requirements for an array of memory cells storing data in the resistivity state of such a layer. In various embodiments a memory cell may include a layer of resistivity-switching metal oxide or nitride compound with added metal formed in series with another element, such as a diode or a transistor.
    • 电阻率切换金属氧化物或氮化物层可达到至少两个稳定的电阻率状态。 这种层可以用在非易失性存储单元中的状态变化元件中,在该电阻率状态下存储其数据状态,例如“0”或“1”。 在这种电阻率切换金属氧化物或氮化物化合物的层中包括额外的金属原子降低了在电阻率状态之间导致切换所需的电流,从而降低了存储在这种层的电阻率状态下的数据的存储单元阵列的功率需求。 在各种实施例中,存储器单元可以包括电阻率切换金属氧化物或具有与另一元件(例如二极管或晶体管)串联形成的附加金属的氮化物化合物层。