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1. 发明授权

US07041391B2 Method for forming thin films 失效
公开(公告)号：US07041391B2
公开(公告)日：2006-05-09
申请号：US10101412
申请日：2002-03-20
申请人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： B32B9/04
CPC分类号： C23C14/081 , C23C14/0057
摘要： The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms.The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.

2. 发明授权

US06472087B1 Antireflection film, optical element with antireflection film, and production method of the antireflection film 有权
标题翻译：防反射膜，抗反射膜用光学元件及防反射膜的制造方法
公开(公告)号：US06472087B1
公开(公告)日：2002-10-29
申请号：US09189789
申请日：1998-11-12
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： B32B900
CPC分类号： G02B1/115
摘要： In order to provide an antireflection film of a wide wavelength bandwidth excellent in environment resistance performance in the ultraviolet wavelength region, the antireflection film is constructed in four-layered, or five-layered, or six-layered structure, using Al2O3 for high-index layers and AlF3 or MgF2 for low-index layers. Vacuum evaporation, sputtering, or CVD is used for formation of the antireflection film.
摘要翻译：为了提供在紫外线波长区域具有优异的耐环境性能的宽波长带宽的抗反射膜，使用Al2O3用于高折射率的四层或五层或六层结构的抗反射膜层和AlF3或MgF2用于低折射率层。使用真空蒸发，溅射或CVD来形成抗反射膜。

3. 发明授权

US06458253B2 Thin film production process and optical device 失效
标题翻译：薄膜生产工艺及光学元件
公开(公告)号：US06458253B2
公开(公告)日：2002-10-01
申请号：US09804266
申请日：2001-03-13
申请人： Kenji Ando , Minoru Otani , Yasuyuki Suzuki , Toshiaki Shingu , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Minoru Otani , Yasuyuki Suzuki , Toshiaki Shingu , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： C23C1434
CPC分类号： C23C14/0057 , C23C14/0694
摘要： A process of producing a thin film is disclosed. The process comprises the steps of providing a vessel; placing a target such that a surface to be sputtered of the target surrounds a discharge space; placing a substrate on a side of an opening of the space such that the substrate faces an anode disposed so as to close another opening of the space surrounded by the target; supplying a sputtering gas and a fluorine-containing gas into the vessel; and supplying a dc power or a power obtained by superimposing pulses with reversing polarities on the dc power, between the target and the anode, wherein a discharge is induced in the discharge space to sputter the target, thereby forming a fluorine-containing thin film on the substrate.
摘要翻译：公开了一种生产薄膜的方法。该方法包括提供容器的步骤; 放置靶，使得要溅射的靶的表面围绕放电空间; 将基板放置在所述空间的开口的一侧，使得所述基板面向设置为闭合由所述目标包围的空间的另一开口的阳极; 向容器内供给溅射气体和含氟气体; 并且通过在目标和阳极之间的直流电力上叠加具有反向极性的脉冲而获得的直流电力或功率，其中在放电空间中引起放电以溅射靶，从而在上面形成含氟薄膜底物。

4. 发明授权

US06383346B2 Method for forming thin films 失效
标题翻译：薄膜形成方法
公开(公告)号：US06383346B2
公开(公告)日：2002-05-07
申请号：US08821435
申请日：1997-03-21
申请人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： C23C1434
CPC分类号： C23C14/081 , C23C14/0057
摘要： The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms. The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.
摘要翻译：本发明提供了一种在含有氟原子的气体中溅射含有铝的靶材的氧化铝膜的形成方法。本发明的氧化铝薄膜在紫外线中几乎没有光吸收和高折射率和真空紫外线区域。

5. 发明授权

US06217719B1 Process for thin film formation by sputtering 有权
标题翻译：通过溅射形成薄膜的工艺
公开(公告)号：US06217719B1
公开(公告)日：2001-04-17
申请号：US09315016
申请日：1999-05-20
申请人： Hidehiro Kanazawa , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro
发明人： Hidehiro Kanazawa , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro
IPC分类号： C23C1434
CPC分类号： C23C14/0057 , C23C14/0084 , C23C14/352
摘要： A process is provided for forming a thin film having refractive index thereof varying continuously or stepwise in a thickness direction. The process comprises sputtering in a vacuum chamber by introducing, during film formation, at least two kinds of gases selected from a nitrogen-containing gas, an oxygen-containing gas, and a fluorine-containing gas with the flow rate ratio of the gases varied continuously or stepwise. This process enables variation of the refractive index in the thickness direction, simply without difficulty.
摘要翻译：提供了一种形成其厚度方向连续或逐步变化的折射率薄膜的方法。该方法包括在真空室中通过在成膜期间引入选自含氮气体，含氧气体和含氟气体中的至少两种气体，其中气体的流量比率变化连续或逐步。该方法使得折射率在厚度方向上变化很简单。

6. 发明授权

US06396626B1 Antireflection film and optical element coated with the antireflection film 有权
标题翻译：防反射膜和涂有抗反射膜的光学元件
公开(公告)号：US06396626B1
公开(公告)日：2002-05-28
申请号：US09654040
申请日：2000-09-01
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： F21V904
CPC分类号： G02B1/115
摘要： The antireflection film of the present invention comprises an alternately multi-layered film of 10 layers formed on a base member and having antireflection characteristics in two wavelength regions including a first wavelength (&lgr;1) of 248 nm and a second wavelength (&lgr;2) of 633 nm as central wavelengths, respectively, the multi-layered film of 10 layers comprising: low-refractive index layers arranged at odd-numbered positions from a side opposite to the base member and having a refractive index of 1.45 to 1.52 at the first wavelength (&lgr;1); and high-refractive index layers arranged at even-numbered positions from the side opposite to the base member and having a refractive index of 1.65 to 1.80 at the first wavelength (&lgr;1), wherein layers arranged at the first, second and third positions from the side opposite to the base member each have an optical thickness ranging from 0.21&lgr;1 to 0.28&lgr;1.
摘要翻译：本发明的抗反射膜包括在基体上形成的具有抗反射特性的10层的交替层叠的膜，其包括248nm的第一波长（lambd1）和633nm的第二波长（lambd2）的两个波长区域作为中心波长的10层的多层膜包括：从与基底构件相反的一侧排列在奇数位置的折射率低的第一波长的折射率为1.45〜1.52的低折射率层（lambd1 ）; 以及高折射率层，其从与所述基底构件相反的一侧布置在偶数位置处，并且在所述第一波长（lambd1）处具有1.65至1.80的折射率，其中从所述第一波长与基底构件相对的一侧的光学厚度各自具有从0.21lambd1到0.28lambd1的光学厚度。

7. 发明授权

US5885712A Anti-reflection film and optical system using the same 失效
标题翻译：防反射膜和使用其的光学系统
公开(公告)号：US5885712A
公开(公告)日：1999-03-23
申请号：US822469
申请日：1997-03-21
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： G02B1/11 , B32B7/02 , C03C17/34 , B32B17/06
CPC分类号： C03C17/3417 , C03C17/3452
摘要： An anti-reflection film is arranged by alternately stacking a plurality of high-refractive index layers containing Al.sub.2 O.sub.3 and a plurality of low-refractive index layers containing SiO.sub.2 on a transparent substrate in turn from the substrate side to the air side, and satisfies:1.45.ltoreq.ns.ltoreq.1.651.60.ltoreq.na.ltoreq.1.850.31.lambda.0.ltoreq.d1.ltoreq.0.42.lambda.00.38.lambda.0.ltoreq.d2.ltoreq.0.45.lambda.00.20.lambda.0.ltoreq.d3.ltoreq.0.31.lambda.00.18.lambda.0.ltoreq.d4.ltoreq.0.28.lambda.00.20.lambda.0.ltoreq.d5.ltoreq.0.30.lambda.00.20.lambda.0.ltoreq.d6.ltoreq.0.30.lambda.0where ns and na are the refractive indices of the low-refractive index layer and the high-refractive index layer for light components falling with the wavelength range from 190 nm to 250 nm, di (unit: nm) is the optical film thickness of the i-th layer when the high- and low-refractive index layers are counted from the substrate side to the air side, and .lambda.0 (nm) is the reference wavelength within the wavelength range from 190 nm to 250 nm.
摘要翻译：通过在透明基板上从基板侧至空气侧交替层叠多个含有Al 2 O 3和多个含有SiO 2的低折射率层的高折射率层，并且满足：1.45 0.30λ0其中ns和na是 di（单位：nm）的波长范围为190nm至250nm的光成分的低折射率层和高折射率层的折射率为di（单位：nm）时的第i层的光学膜厚度，从基板侧向空气侧计数高折射率层和低折射率层，λ0（nm）是在190nm〜250nm的波长范围内的基准波长。

8. 发明授权

US06261696B1 Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element 失效
标题翻译：具有含萤石作为主要成分的基材的光学元件以及光学元件的制造方法和装置
公开(公告)号：US06261696B1
公开(公告)日：2001-07-17
申请号：US08819817
申请日：1997-03-18
申请人： Ryuji Biro , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Hidehiro Kanazawa
发明人： Ryuji Biro , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Hidehiro Kanazawa
IPC分类号： B32B900
CPC分类号： G02B1/115
摘要： A film formation method of forming at least one layered film on a substrate containing fluorite as a main ingredient by using a film formation apparatus which emits electrons or ions, which comprises the step of forming, as a first layered film counted from the side of the substrate, a film having a thickness of 30 nm or less and comprising at least one selected from the group consisting of SiO2, BeO, MgO, and MgF2.
摘要翻译：一种通过使用发射电子或离子的成膜装置，在含有萤石作为主要成分的基材上形成至少一层层状膜的成膜方法，其特征在于，包括以下步骤：形成作为从基板，厚度为30nm以下的膜，并且包括选自由SiO 2，BeO，MgO和MgF 2组成的组中的至少一种。

9. 发明申请

US20090148695A1 OPTICAL ELEMENT FOR X-RAY 审中-公开
标题翻译：用于X射线的光学元件
公开(公告)号：US20090148695A1
公开(公告)日：2009-06-11
申请号：US12326504
申请日：2008-12-02
申请人： Takayuki Miura , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Seiken Matsumoto , Kyoko Nagata , Shumpei Tatsumi , Shinji Fukui
发明人： Takayuki Miura , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Seiken Matsumoto , Kyoko Nagata , Shumpei Tatsumi , Shinji Fukui
IPC分类号： B32B5/00
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/067 , Y10T428/26
摘要： An optical element for X-ray includes a substrate, a first multilayer film having a reflection property with respect to light in a soft X-ray wavelength range, and a second multilayer film, disposed between the substrate and the first multilayer film, for reducing film stress of the first multilayer film. The second multilayer film has a periodic structure having a unit period film thickness which is 90% or more and less than 110% of a two or more integral multiple of 7 nm.
摘要翻译：用于X射线的光学元件包括基板，具有相对于软X射线波长范围内的光的反射特性的第一多层膜和设置在基板和第一多层膜之间的第二多层膜，用于还原第一层多层薄膜的薄膜应力。第二多层膜具有单位周期膜厚度为7nm以上2倍以上的整数倍的90％以上且小于110％的周期性结构。

10. 发明申请

US20090252977A1 MULTILAYER FILM REFLECTOR 审中-公开
标题翻译：多层膜反射器
公开(公告)号：US20090252977A1
公开(公告)日：2009-10-08
申请号：US12416544
申请日：2009-04-01
申请人： Seiken Matsumoto , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kyoko Nagata
发明人： Seiken Matsumoto , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kyoko Nagata
IPC分类号： B32B15/04
CPC分类号： B82Y10/00 , G02B5/0891 , G21K1/062 , G21K2201/067
摘要： A stress distribution resulting from variation in in-plane film quality of a stress relaxation layer and a reflective layer is eliminated. A reflective layer is stacked on a substrate via a stress relaxation layer. The stress relaxation layer has a stress relaxation portion having a uniform film thickness distribution to cancel the internal stress of the reflective layer, and a stress distribution eliminating portion with a film thickness distribution approximated to a second order even function. The stress is substantially proportional to the film thickness. Thus, formation of a given film thickness distribution allows the stress distribution to be controlled. However, changing the film thickness distribution based on a design value may degrade the optical characteristics. Thus, the film thickness distribution of the stress distribution eliminating portion, which serves to eliminate the stress distribution, is approximated to the second order even function. This enables aberration associated with the film thickness distribution to be reduced by adjusting an optical system.
摘要翻译：消除了由应力松弛层和反射层的面内膜质量的变化引起的应力分布。反射层通过应力松弛层堆叠在基板上。应力缓和层具有均匀的薄膜厚度分布的应力松弛部，以抵消反射层的内部应力，以及具有近似于二次偶次函数的膜厚分布的应力分布消除部。应力基本上与膜厚成正比。因此，形成给定的膜厚度分布允许控制应力分布。然而，基于设计值改变膜厚度分布可能降低光学特性。因此，用于消除应力分布的应力分布消除部分的膜厚度分布近似于二阶偶函数。通过调整光学系统，能够降低与膜厚分布有关的像差。

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