专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07041391B2 Method for forming thin films 失效
公开(公告)号：US07041391B2
公开(公告)日：2006-05-09
申请号：US10101412
申请日：2002-03-20
申请人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： B32B9/04
CPC分类号： C23C14/081 , C23C14/0057
摘要： The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms.The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.

2. 发明授权

US06472087B1 Antireflection film, optical element with antireflection film, and production method of the antireflection film 有权
标题翻译：防反射膜，抗反射膜用光学元件及防反射膜的制造方法
公开(公告)号：US06472087B1
公开(公告)日：2002-10-29
申请号：US09189789
申请日：1998-11-12
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： B32B900
CPC分类号： G02B1/115
摘要： In order to provide an antireflection film of a wide wavelength bandwidth excellent in environment resistance performance in the ultraviolet wavelength region, the antireflection film is constructed in four-layered, or five-layered, or six-layered structure, using Al2O3 for high-index layers and AlF3 or MgF2 for low-index layers. Vacuum evaporation, sputtering, or CVD is used for formation of the antireflection film.
摘要翻译：为了提供在紫外线波长区域具有优异的耐环境性能的宽波长带宽的抗反射膜，使用Al2O3用于高折射率的四层或五层或六层结构的抗反射膜层和AlF3或MgF2用于低折射率层。使用真空蒸发，溅射或CVD来形成抗反射膜。

3. 发明授权

US06458253B2 Thin film production process and optical device 失效
标题翻译：薄膜生产工艺及光学元件
公开(公告)号：US06458253B2
公开(公告)日：2002-10-01
申请号：US09804266
申请日：2001-03-13
申请人： Kenji Ando , Minoru Otani , Yasuyuki Suzuki , Toshiaki Shingu , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Minoru Otani , Yasuyuki Suzuki , Toshiaki Shingu , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： C23C1434
CPC分类号： C23C14/0057 , C23C14/0694
摘要： A process of producing a thin film is disclosed. The process comprises the steps of providing a vessel; placing a target such that a surface to be sputtered of the target surrounds a discharge space; placing a substrate on a side of an opening of the space such that the substrate faces an anode disposed so as to close another opening of the space surrounded by the target; supplying a sputtering gas and a fluorine-containing gas into the vessel; and supplying a dc power or a power obtained by superimposing pulses with reversing polarities on the dc power, between the target and the anode, wherein a discharge is induced in the discharge space to sputter the target, thereby forming a fluorine-containing thin film on the substrate.
摘要翻译：公开了一种生产薄膜的方法。该方法包括提供容器的步骤; 放置靶，使得要溅射的靶的表面围绕放电空间; 将基板放置在所述空间的开口的一侧，使得所述基板面向设置为闭合由所述目标包围的空间的另一开口的阳极; 向容器内供给溅射气体和含氟气体; 并且通过在目标和阳极之间的直流电力上叠加具有反向极性的脉冲而获得的直流电力或功率，其中在放电空间中引起放电以溅射靶，从而在上面形成含氟薄膜底物。

4. 发明授权

US06383346B2 Method for forming thin films 失效
标题翻译：薄膜形成方法
公开(公告)号：US06383346B2
公开(公告)日：2002-05-07
申请号：US08821435
申请日：1997-03-21
申请人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： C23C1434
CPC分类号： C23C14/081 , C23C14/0057
摘要： The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms. The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.
摘要翻译：本发明提供了一种在含有氟原子的气体中溅射含有铝的靶材的氧化铝膜的形成方法。本发明的氧化铝薄膜在紫外线中几乎没有光吸收和高折射率和真空紫外线区域。

5. 发明授权

US06217719B1 Process for thin film formation by sputtering 有权
标题翻译：通过溅射形成薄膜的工艺
公开(公告)号：US06217719B1
公开(公告)日：2001-04-17
申请号：US09315016
申请日：1999-05-20
申请人： Hidehiro Kanazawa , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro
发明人： Hidehiro Kanazawa , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro
IPC分类号： C23C1434
CPC分类号： C23C14/0057 , C23C14/0084 , C23C14/352
摘要： A process is provided for forming a thin film having refractive index thereof varying continuously or stepwise in a thickness direction. The process comprises sputtering in a vacuum chamber by introducing, during film formation, at least two kinds of gases selected from a nitrogen-containing gas, an oxygen-containing gas, and a fluorine-containing gas with the flow rate ratio of the gases varied continuously or stepwise. This process enables variation of the refractive index in the thickness direction, simply without difficulty.
摘要翻译：提供了一种形成其厚度方向连续或逐步变化的折射率薄膜的方法。该方法包括在真空室中通过在成膜期间引入选自含氮气体，含氧气体和含氟气体中的至少两种气体，其中气体的流量比率变化连续或逐步。该方法使得折射率在厚度方向上变化很简单。

6. 发明授权

US06396626B1 Antireflection film and optical element coated with the antireflection film 有权
标题翻译：防反射膜和涂有抗反射膜的光学元件
公开(公告)号：US06396626B1
公开(公告)日：2002-05-28
申请号：US09654040
申请日：2000-09-01
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： F21V904
CPC分类号： G02B1/115
摘要： The antireflection film of the present invention comprises an alternately multi-layered film of 10 layers formed on a base member and having antireflection characteristics in two wavelength regions including a first wavelength (&lgr;1) of 248 nm and a second wavelength (&lgr;2) of 633 nm as central wavelengths, respectively, the multi-layered film of 10 layers comprising: low-refractive index layers arranged at odd-numbered positions from a side opposite to the base member and having a refractive index of 1.45 to 1.52 at the first wavelength (&lgr;1); and high-refractive index layers arranged at even-numbered positions from the side opposite to the base member and having a refractive index of 1.65 to 1.80 at the first wavelength (&lgr;1), wherein layers arranged at the first, second and third positions from the side opposite to the base member each have an optical thickness ranging from 0.21&lgr;1 to 0.28&lgr;1.
摘要翻译：本发明的抗反射膜包括在基体上形成的具有抗反射特性的10层的交替层叠的膜，其包括248nm的第一波长（lambd1）和633nm的第二波长（lambd2）的两个波长区域作为中心波长的10层的多层膜包括：从与基底构件相反的一侧排列在奇数位置的折射率低的第一波长的折射率为1.45〜1.52的低折射率层（lambd1 ）; 以及高折射率层，其从与所述基底构件相反的一侧布置在偶数位置处，并且在所述第一波长（lambd1）处具有1.65至1.80的折射率，其中从所述第一波长与基底构件相对的一侧的光学厚度各自具有从0.21lambd1到0.28lambd1的光学厚度。

7. 发明授权

US5885712A Anti-reflection film and optical system using the same 失效
标题翻译：防反射膜和使用其的光学系统
公开(公告)号：US5885712A
公开(公告)日：1999-03-23
申请号：US822469
申请日：1997-03-21
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： G02B1/11 , B32B7/02 , C03C17/34 , B32B17/06
CPC分类号： C03C17/3417 , C03C17/3452
摘要： An anti-reflection film is arranged by alternately stacking a plurality of high-refractive index layers containing Al.sub.2 O.sub.3 and a plurality of low-refractive index layers containing SiO.sub.2 on a transparent substrate in turn from the substrate side to the air side, and satisfies:1.45.ltoreq.ns.ltoreq.1.651.60.ltoreq.na.ltoreq.1.850.31.lambda.0.ltoreq.d1.ltoreq.0.42.lambda.00.38.lambda.0.ltoreq.d2.ltoreq.0.45.lambda.00.20.lambda.0.ltoreq.d3.ltoreq.0.31.lambda.00.18.lambda.0.ltoreq.d4.ltoreq.0.28.lambda.00.20.lambda.0.ltoreq.d5.ltoreq.0.30.lambda.00.20.lambda.0.ltoreq.d6.ltoreq.0.30.lambda.0where ns and na are the refractive indices of the low-refractive index layer and the high-refractive index layer for light components falling with the wavelength range from 190 nm to 250 nm, di (unit: nm) is the optical film thickness of the i-th layer when the high- and low-refractive index layers are counted from the substrate side to the air side, and .lambda.0 (nm) is the reference wavelength within the wavelength range from 190 nm to 250 nm.
摘要翻译：通过在透明基板上从基板侧至空气侧交替层叠多个含有Al 2 O 3和多个含有SiO 2的低折射率层的高折射率层，并且满足：1.45 0.30λ0其中ns和na是 di（单位：nm）的波长范围为190nm至250nm的光成分的低折射率层和高折射率层的折射率为di（单位：nm）时的第i层的光学膜厚度，从基板侧向空气侧计数高折射率层和低折射率层，λ0（nm）是在190nm〜250nm的波长范围内的基准波长。

8. 发明授权

US06261696B1 Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element 失效
标题翻译：具有含萤石作为主要成分的基材的光学元件以及光学元件的制造方法和装置
公开(公告)号：US06261696B1
公开(公告)日：2001-07-17
申请号：US08819817
申请日：1997-03-18
申请人： Ryuji Biro , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Hidehiro Kanazawa
发明人： Ryuji Biro , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Hidehiro Kanazawa
IPC分类号： B32B900
CPC分类号： G02B1/115
摘要： A film formation method of forming at least one layered film on a substrate containing fluorite as a main ingredient by using a film formation apparatus which emits electrons or ions, which comprises the step of forming, as a first layered film counted from the side of the substrate, a film having a thickness of 30 nm or less and comprising at least one selected from the group consisting of SiO2, BeO, MgO, and MgF2.
摘要翻译：一种通过使用发射电子或离子的成膜装置，在含有萤石作为主要成分的基材上形成至少一层层状膜的成膜方法，其特征在于，包括以下步骤：形成作为从基板，厚度为30nm以下的膜，并且包括选自由SiO 2，BeO，MgO和MgF 2组成的组中的至少一种。

9. 发明授权

US5661596A Antireflection film and exposure apparatus using the same 失效
标题翻译：防反射膜和使用其的曝光装置
公开(公告)号：US5661596A
公开(公告)日：1997-08-26
申请号：US383356
申请日：1995-02-03
申请人： Ryuji Biro , Kenji Ando , Yasuyuki Suzuki
发明人： Ryuji Biro , Kenji Ando , Yasuyuki Suzuki
IPC分类号： G02B1/11 , G02B5/28 , F21V9/04 , G02B1/10 , G02B5/08
CPC分类号： G02B1/115 , G02B5/283
摘要： This specification discloses antireflection film and an exposure apparatus using the same. The exposure apparatus has an optical system, and antireflection film formed on the refracting surface of the optical system, the antireflection film having a high refractive index layer having Al.sub.2 O.sub.3 or Ta.sub.2 O.sub.5 and a low refractive index layer having SiO.sub.2.
摘要翻译：本说明书公开了防反射膜及使用其的曝光装置。曝光装置具有光学系统和形成在光学系统的折射表面上的抗反射膜，抗反射膜具有具有Al 2 O 3或Ta 2 O 5的高折射率层和具有SiO 2的低折射率层。

10. 发明授权

US5911856A Method for forming thin film 失效
标题翻译：薄膜形成方法
公开(公告)号：US5911856A
公开(公告)日：1999-06-15
申请号：US665770
申请日：1996-06-18
申请人： Yasuyuki Suzuki , Kenji Ando , Ryuji Biro
发明人： Yasuyuki Suzuki , Kenji Ando , Ryuji Biro
IPC分类号： C23C14/00 , C23C14/54 , C23C14/56 , C23C14/34
CPC分类号： C23C14/0042 , C23C14/545 , C23C14/547 , C23C14/568
摘要： In a method for forming a multi-layer optical thin film on a surface of a base material, a multi-layer optical thin film is formed based on thickness setting values for respective layers, an optical characteristic of the thus formed multi-layer optical thin film is measured, thicknesses for the respective layers for a multi-layer optical thin film to have an aimed optical characteristic are obtained based on the thus measured optical characteristic, the thickness setting values are corrected based on the thus obtained film thicknesses for the respective layers, and a next multi-layer optical thin film is formed based on the thus corrected thickness setting values. In another method for forming a thin film by sputtering, a concentration of H.sub.2 O gas in a vacuum chamber or a discharge impedance is measured, and at least one of sputter power, sputter gas partial pressure, and sputter gas flow rate is controlled in accordance with the measurement result so as to keep the sputtering rate constant.
摘要翻译：在基材表面形成多层光学薄膜的方法中，基于各层的厚度设定值形成多层光学薄膜，由此形成的多层光学薄膜的光学特性基于这样测量的光学特性，测量多层光学薄膜的各层具有期望的光学特性的厚度，基于由此得到的各层的膜厚来校正厚度设定值，并且基于由此校正的厚度设定值形成下一个多层光学薄膜。在通过溅射形成薄膜的另一种方法中，测量真空室中的H 2 O气体的浓度或放电阻抗，并且根据溅射功率，溅射气体分压和溅射气体流速来控制溅射功率，溅射气体分压和溅射气体流速中的至少一种测量结果以保持溅射速率恒定。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式