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1. 发明申请

US20100202654A1 PATTERN MEASUREMENT APPARATUS 有权
标题翻译：图案测量装置
公开(公告)号：US20100202654A1
公开(公告)日：2010-08-12
申请号：US12763710
申请日：2010-04-20
申请人： Ryoichi MATSUOKA , Akihiro Onizawa , Akiyuki Sugiyama , Hidetoshi Morokuma , Yasutaka Toyoda
发明人： Ryoichi MATSUOKA , Akihiro Onizawa , Akiyuki Sugiyama , Hidetoshi Morokuma , Yasutaka Toyoda
IPC分类号： G06K9/00
CPC分类号： G03F7/70616 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2817
摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.
摘要翻译：在高倍率的测量与广泛的测量之间建立相互兼容性。提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。这里，将识别信息添加到每个片段以区分一个片段和另一个片段。根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。结果，可以实现基于识别信息的SEM图像管理。

2. 发明申请

US20090039263A1 PATTERN MEASUREMENT APPARATUS 有权
标题翻译：图案测量装置
公开(公告)号：US20090039263A1
公开(公告)日：2009-02-12
申请号：US12188791
申请日：2008-08-08
申请人： Ryoichi MATSUOKA , Akihiro Onizawa , Akiyuki Sugiyama , Hidetoshi Morokuma , Yasutaka Toyoda
发明人： Ryoichi MATSUOKA , Akihiro Onizawa , Akiyuki Sugiyama , Hidetoshi Morokuma , Yasutaka Toyoda
IPC分类号： G01N23/00
CPC分类号： G03F7/70616 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2817
摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.
摘要翻译：在高倍率的测量与广泛的测量之间建立相互兼容性。提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。这里，将识别信息添加到每个片段以区分一个片段和另一个片段。根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。结果，可以实现基于识别信息的SEM图像管理。

3. 发明申请

US20090200465A1 PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE 审中-公开
标题翻译：图形测量方法和图案测量装置
公开(公告)号：US20090200465A1
公开(公告)日：2009-08-13
申请号：US12423197
申请日：2009-04-14
申请人： Takumichi SUTANI , Ryoichi MATSUOKA , Hidetoshi MOROKUMA , Hitoshi KOMURO , Akiyuki SUGIYAMA
发明人： Takumichi SUTANI , Ryoichi MATSUOKA , Hidetoshi MOROKUMA , Hitoshi KOMURO , Akiyuki SUGIYAMA
IPC分类号： G21K7/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
摘要翻译：提供了一种图案测量方法和装置，其基于通过扫描电子显微镜等测量的测量点的基准位置，基于从扫描电子显微镜获取的图像上的参考图案的位置信息，并基于通过使用设计数据检测的位置关系，在测量点和形成在与测量点隔离的位置处形成的参考图案之间。

4. 发明申请

US20100140472A1 PATTERN DISPLACEMENT MEASURING METHOD AND PATTERN MEASURING DEVICE 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US20100140472A1
公开(公告)日：2010-06-10
申请号：US12708148
申请日：2010-02-18
申请人： Takumichi SUTANI , Ryoichi MATSUOKA , Hidetoshi MOROKUMA , Akiyuki SUGIYAMA , Hiroyuki SHINDO
发明人： Takumichi SUTANI , Ryoichi MATSUOKA , Hidetoshi MOROKUMA , Akiyuki SUGIYAMA , Hiroyuki SHINDO
IPC分类号： G06K9/48 , G01N23/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

5. 发明申请

US20120099781A1 METHOD AND APPARATUS OF PATTERN INSPECTION AND SEMICONDUCTOR INSPECTION SYSTEM USING THE SAME 有权
标题翻译：使用该图案的图案检查和半导体检测系统的方法和装置
公开(公告)号：US20120099781A1
公开(公告)日：2012-04-26
申请号：US13344409
申请日：2012-01-05
申请人： Yasutaka TOYODA , Akiyuki SUGIYAMA , Ryoichi MATSUOKA , Takumichi SUTANI , Hidemitsu NAYA
发明人： Yasutaka TOYODA , Akiyuki SUGIYAMA , Ryoichi MATSUOKA , Takumichi SUTANI , Hidemitsu NAYA
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T2207/30148 , H01J2237/221 , H01J2237/2817
摘要： A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
摘要翻译：例如，可以在扫描型电子显微镜系统中设置图案检查装置。当在SEM图像中包含多层图案时，该装置通过使用与图案相对应的多个层的设计数据，根据每层分离图案。因此，该装置可以仅使用要检查的目标层的图案，不同层的图案检查或层之间的位置偏移的检测来实现检查。

6. 发明申请

US20090052765A1 PATTERN SHAPE EVALUATION METHOD, PATTERN SHAPE EVALUATION DEVICE, PATTERN SHAPE EVALUATING DATA GENERATION DEVICE AND SEMICONDUCTOR SHAPE EVALUATION SYSTEM USING THE SAME 有权
标题翻译：图案形状评估方法，图案形状评估装置，图案形状评估数据生成装置和使用其的半导体形状评估系统
公开(公告)号：US20090052765A1
公开(公告)日：2009-02-26
申请号：US12192317
申请日：2008-08-15
申请人： Yasutaka TOYODA , Ryoichi MATSUOKA , Akiyuki SUGIYAMA
发明人： Yasutaka TOYODA , Ryoichi MATSUOKA , Akiyuki SUGIYAMA
IPC分类号： G06K9/00
CPC分类号： G06F17/5081 , G06K9/00 , G06K2209/19 , G06T7/0004
摘要： A pattern shape evaluation method and semiconductor inspection system having a unit for extracting contour data of a pattern from an image obtained by photographing a semiconductor pattern, a unit for generating pattern direction data from design data of the semiconductor pattern, and a unit for detecting a defect of a pattern, through comparison between pattern direction data obtained from the contour data and pattern direction data generated from the design data corresponding to a pattern position of the contour data.
摘要翻译：一种图案形状评估方法和半导体检查系统，具有从通过拍摄半导体图案获得的图像中提取图案的轮廓数据的单元，用于从半导体图案的设计数据生成图案方向数据的单元和用于检测半导体图案的单元通过比较从轮廓数据获得的图案方向数据和从对应于轮廓数据的图案位置的设计数据生成的图案方向数据，来对图案的缺陷进行比较。

7. 发明申请

US20100138801A1 System and Method for Detecting a Defect 审中-公开
标题翻译：检测缺陷的系统和方法
公开(公告)号：US20100138801A1
公开(公告)日：2010-06-03
申请号：US12698201
申请日：2010-02-02
申请人： Ryoichi MATSUOKA , Hidetoshi Morokuma , Takumichi Sutani
发明人： Ryoichi MATSUOKA , Hidetoshi Morokuma , Takumichi Sutani
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G01R31/303
摘要： A system and a method for detecting a defect, capable of extracting a defect occurring depending on finishing accuracy required for circuit operation are provided. The system includes a timing analyzer for extracting a critical path in which a high accuracy is required for a signal transmission operation as compared with other portions based on circuit design data, a critical path extractor for comparing the circuit design data with layout design data on a pattern and for extracting graphical data including the critical path extracted by the timing analyzer, an inspection recipe creator for deciding a portion to be inspected, based on coordinate information on the graphical data including the critical path extracted by the critical path extractor, and an SEM defect review apparatus for acquiring an image of the decided portion to be inspected on a wafer according to an inspection recipe created by the inspection recipe creator.
摘要翻译：提供一种用于检测缺陷的系统和方法，其能够提取根据电路操作所需的精加工精度而发生的缺陷。该系统包括用于提取与其他部分相比基于电路设计数据而与信号传输操作相比需要高精度的关键路径的定时分析器，用于将电路设计数据与布局设计数据进行比较的关键路径提取器基于关于包括由关键路径提取器提取的关键路径的图形数据的坐标信息，以及扫描电子显微镜（SEM）来提取包括由定时分析器提取的关键路径的图形数据，用于决定待检查部分的检查配方生成器缺陷检查装置，用于根据由检查配方创建者创建的检查配方在晶片上获取所确定的待检查部分的图像。

8. 发明申请

US20090232385A1 PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE 有权
标题翻译：图形测量方法和图案测量装置
公开(公告)号：US20090232385A1
公开(公告)日：2009-09-17
申请号：US12392533
申请日：2009-02-25
申请人： Ryoichi MATSUOKA , Akiyuki Sugiyama
发明人： Ryoichi MATSUOKA , Akiyuki Sugiyama
IPC分类号： G06K9/48 , G06T7/00
CPC分类号： G06K9/4609 , G06T7/001 , G06T7/12 , G06T2207/10061 , G06T2207/20192 , G06T2207/30148
摘要： An object of the present invention is to provide a sample measuring method and a sample measuring device suitable for evaluation of inclination of a pattern edge. To achieve the object, a method and a device for forming a plurality of contours of a pattern edge and evaluating the dimension between the contours are proposed below. Forming a plurality of contours allows evaluation of the degree of inclination of an edge portion of a pattern. Further, displaying evaluation values indicative of the degree of the inclination of the edge portion in an in-plane distribution form makes identifying the cause of taper formation easier.
摘要翻译：本发明的目的是提供一种适于评估图案边缘的倾斜度的样品测量方法和样品测量装置。为了实现该目的，下面提出了用于形成图案边缘的多个轮廓并评估轮廓之间的尺寸的方法和装置。形成多个轮廓允许评估图案的边缘部分的倾斜度。此外，以平面内分布形式显示表示边缘部分的倾斜度的评估值使得识别锥形形成的原因更容易。

9. 发明申请

US20090202139A1 PATTERN GENERATING APPARATUS AND PATTERN SHAPE EVALUATING APPARATUS 有权
标题翻译：图案生成装置和图案形状评估装置
公开(公告)号：US20090202139A1
公开(公告)日：2009-08-13
申请号：US12366196
申请日：2009-02-05
申请人： Yasutaka TOYODA , Hideo SAKAI , Ryoichi MATSUOKA
发明人： Yasutaka TOYODA , Hideo SAKAI , Ryoichi MATSUOKA
IPC分类号： G06K9/00
CPC分类号： G06K9/00 , G01R31/31813 , G06K9/6255 , G06T7/001 , G06T2207/30141
摘要： Although there has been a method for evaluating pattern shapes of electronic devices by using, as a reference pattern, design data or a non-defective pattern, the conventional method has a problem that the pattern shape cannot be evaluated with high accuracy because of the difficulty in defining an exact shape suitable for the manufacturing conditions of the electronic devices. The present invention provides a shape evaluation method for circuit patterns of electronic devices, the method including a means for generating contour distribution data of at least two circuit patterns from contour data sets on the circuit patterns; a means for generating a reference pattern used for the pattern shape evaluation, from the contour distribution data; and a means for evaluating the pattern shape by comparing each evaluation target pattern with the reference pattern.
摘要翻译：尽管通过使用设计数据或无缺陷图案作为参考图案来评估电子设备的图案形状的方法，但是由于难度而存在不能高精度地评估图案形状的问题在定义适合于电子设备的制造条件的精确形状时。本发明提供一种电子设备的电路图案的形状评估方法，该方法包括一种用于从电路图形上的轮廓数据集生成至少两个电路图案的轮廓分布数据的装置; 从轮廓分布数据生成用于图案形状评估的参考图案的装置; 以及用于通过将每个评估对象图案与参考图案进行比较来评估图案形状的装置。

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