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1. 发明授权

US08788242B2 Pattern measurement apparatus 有权
标题翻译：图案测量装置
公开(公告)号：US08788242B2
公开(公告)日：2014-07-22
申请号：US13202504
申请日：2010-02-03
申请人： Ryoichi Matsuoka , Akiyuki Sugiyama , Yasutaka Toyota
发明人： Ryoichi Matsuoka , Akiyuki Sugiyama , Yasutaka Toyota
IPC分类号： G01B15/00 , G06F15/00 , G03F7/20 , G03F1/20 , H01J37/317
CPC分类号： G03F7/70625 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/70633 , H01J37/3174 , H01J2237/1536 , H01J2237/226 , H01J2237/24571 , H01J2237/2809
摘要： It is the object of the present invention to provide a pattern measurement apparatus which suitably evaluates a pattern formed by a double patterning method prior to a transfer using masks or which suitably evaluates a deviation of patterns formed by the double patterning method. To achieve the object, a pattern measurement apparatus is proposed which performs an exposure simulation on data about contour lines obtained by converting the pattern edges of first and mask images formed based on charged-particle beam irradiation of the two masks used for subsequent double exposure and which overlaps two exposure-simulated contour lines based on the coordinate information of design data about the masks. Furthermore, a pattern dimension measuring apparatus is proposed which sets measurement conditions using a charged-particle beam based on the positional information about parts or portions separated for double exposure.
摘要翻译：本发明的目的是提供一种图案测量装置，其适当地评估在使用掩模的转印之前通过双重图案化方法形成的图案，或适当地评估通过双重图案形成方法形成的图案的偏差。为了实现该目的，提出了一种图案测量装置，其对通过转换基于用于后续双曝光的两个掩模的带电粒子束照射形成的第一和掩模图像的图案边缘而获得的关于轮廓线的数据进行曝光模拟，其基于关于掩模的设计数据的坐标信息与两个曝光模拟轮廓线重叠。此外，提出了一种图案尺寸测量装置，其基于关于双重曝光分开的部分的位置信息，使用带电粒子束来设定测量条件。

2. 发明授权

US08445871B2 Pattern measurement apparatus 有权
标题翻译：图案测量装置
公开(公告)号：US08445871B2
公开(公告)日：2013-05-21
申请号：US12763710
申请日：2010-04-20
申请人： Ryoichi Matsuoka , Akihiro Onizawa , Akiyuki Sugiyama , Hidetoshi Morokuma , Yasutaka Toyoda
发明人： Ryoichi Matsuoka , Akihiro Onizawa , Akiyuki Sugiyama , Hidetoshi Morokuma , Yasutaka Toyoda
IPC分类号： H01J37/28 , G01N23/00
CPC分类号： G03F7/70616 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2817
摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.
摘要翻译：在高倍率的测量与广泛的测量之间建立相互兼容性。提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。这里，将识别信息添加到每个片段以区分一个片段和另一个片段。根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。结果，可以实现基于识别信息的SEM图像管理。

3. 发明授权

US07679055B2 Pattern displacement measuring method and pattern measuring device 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US07679055B2
公开(公告)日：2010-03-16
申请号：US11892675
申请日：2007-08-24
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
IPC分类号： G06K9/48 , G06K9/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

4. 发明授权

US08355562B2 Pattern shape evaluation method 有权
标题翻译：图案形状评估方法
公开(公告)号：US08355562B2
公开(公告)日：2013-01-15
申请号：US12192317
申请日：2008-08-15
申请人： Yasutaka Toyoda , Ryoichi Matsuoka , Akiyuki Sugiyama
发明人： Yasutaka Toyoda , Ryoichi Matsuoka , Akiyuki Sugiyama
IPC分类号： G06K9/00
CPC分类号： G06F17/5081 , G06K9/00 , G06K2209/19 , G06T7/0004
摘要： A pattern shape evaluation method and semiconductor inspection system having a unit for extracting contour data of a pattern from an image obtained by photographing a semiconductor pattern, a unit for generating pattern direction data from design data of the semiconductor pattern, and a unit for detecting a defect of a pattern, through comparison between pattern direction data obtained from the contour data and pattern direction data generated from the design data corresponding to a pattern position of the contour data.
摘要翻译：一种图案形状评估方法和半导体检查系统，具有从通过拍摄半导体图案获得的图像中提取图案的轮廓数据的单元，用于从半导体图案的设计数据生成图案方向数据的单元和用于检测半导体图案的单元通过比较从轮廓数据获得的图案方向数据和从对应于轮廓数据的图案位置的设计数据生成的图案方向数据，来对图案的缺陷进行比较。

5. 发明授权

US08019161B2 Method, device and computer program of length measurement 有权
标题翻译：长度测量的方法，设备和计算机程序
公开(公告)号：US08019161B2
公开(公告)日：2011-09-13
申请号：US11717772
申请日：2007-03-14
申请人： Hidetoshi Morokuma , Takumichi Sutani , Ryoichi Matsuoka , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Hidetoshi Morokuma , Takumichi Sutani , Ryoichi Matsuoka , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G06K9/46
CPC分类号： G01N23/2251
摘要： A workpiece size measurement method suitable for length measurement of multilayered circuit elements with increased complexities is disclosed. This method employs a technique for changing measurement conditions in a way pursuant to either an image of workpiece or the situation of a target semiconductor circuit element to be measured when measuring pattern sizes on the workpiece image using design data of the semiconductor circuit element. With such an arrangement, adequate measurement conditions are selectable in accordance with the state of workpiece image and/or the state of a circuit element formed on the workpiece, thereby making it possible to improve the measurement efficiency. A workpiece size measurement apparatus using the technique is also disclosed.
摘要翻译：公开了一种适合于具有增加的复杂度的多层电路元件的长度测量的工件尺寸测量方法。该方法采用在使用半导体电路元件的设计数据测量工件图像上的图案尺寸时，根据工件的图像或待测量的目标半导体电路元件的情况来改变测量条件的技术。通过这样的布置，可以根据工件图像的状态和/或形成在工件上的电路元件的状态来选择适当的测量条件，从而可以提高测量效率。还公开了使用该技术的工件尺寸测量装置。

6. 发明申请

US20110158543A1 SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS 有权
标题翻译：样本尺寸检查/测量方法和样品尺寸检查/测量装置
公开(公告)号：US20110158543A1
公开(公告)日：2011-06-30
申请号：US13041894
申请日：2011-03-07
申请人： Hidetoshi Morokuma , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Yasutaka Toyoda
发明人： Hidetoshi Morokuma , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Yasutaka Toyoda
IPC分类号： G06K9/00
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译：本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。

7. 发明授权

US07518110B2 Pattern measuring method and pattern measuring device 有权
标题翻译：图案测量方法和图案测量装置
公开(公告)号：US07518110B2
公开(公告)日：2009-04-14
申请号：US11359374
申请日：2006-02-23
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G01B9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
摘要翻译：提供了一种图案测量方法和装置，其基于通过扫描电子显微镜等测量的测量点的基准位置，基于从扫描电子显微镜获取的图像上的参考图案的位置信息，并基于通过使用设计数据检测的位置关系，在测量点和形成在与测量点隔离的位置处形成的参考图案之间。

8. 发明申请

US20080224035A1 Pattern displacement measuring method and pattern measuring device 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US20080224035A1
公开(公告)日：2008-09-18
申请号：US11892675
申请日：2007-08-24
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
IPC分类号： G01C9/00 , G01N23/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

9. 发明授权

US08311314B2 Pattern measuring method and pattern measuring device 有权
标题翻译：图案测量方法和图案测量装置
公开(公告)号：US08311314B2
公开(公告)日：2012-11-13
申请号：US12392533
申请日：2009-02-25
申请人： Ryoichi Matsuoka , Akiyuki Sugiyama
发明人： Ryoichi Matsuoka , Akiyuki Sugiyama
IPC分类号： G06K9/00
CPC分类号： G06K9/4609 , G06T7/001 , G06T7/12 , G06T2207/10061 , G06T2207/20192 , G06T2207/30148
摘要： An object of the present invention is to provide a sample measuring method and a sample measuring device suitable for evaluation of inclination of a pattern edge. To achieve the object, a method and a device for forming a plurality of contours of a pattern edge and evaluating the dimension between the contours are proposed below. Forming a plurality of contours allows evaluation of the degree of inclination of an edge portion of a pattern. Further, displaying evaluation values indicative of the degree of the inclination of the edge portion in an in-plane distribution form makes identifying the cause of taper formation easier.
摘要翻译：本发明的目的是提供一种适于评估图案边缘的倾斜度的样品测量方法和样品测量装置。为了实现该目的，下面提出了用于形成图案边缘的多个轮廓并评估轮廓之间的尺寸的方法和装置。形成多个轮廓允许评估图案的边缘部分的倾斜度。此外，以平面内分布形式显示表示边缘部分的倾斜度的评估值使得识别锥形形成的原因更容易。

10. 发明授权

US08173962B2 Pattern displacement measuring method and pattern measuring device 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US08173962B2
公开(公告)日：2012-05-08
申请号：US12708148
申请日：2010-02-18
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
IPC分类号： A61N5/00 , G06K9/00 , G01C25/00 , G01R31/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

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