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1. 发明申请

US20100237540A1 METHOD OF DESIGNING A TEMPLATE PATTERN, METHOD OF MANUFACTURING A TEMPLATE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 有权
标题翻译：设计模式图案的方法，制造模板的方法和制造半导体器件的方法
公开(公告)号：US20100237540A1
公开(公告)日：2010-09-23
申请号：US12725202
申请日：2010-03-16
申请人： Ryoichi INANAMI , Hiroshi Tokue , Ikuo Yoneda
发明人： Ryoichi INANAMI , Hiroshi Tokue , Ikuo Yoneda
IPC分类号： B29C59/02 , G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.
摘要翻译：一种设计用于压印光刻的模板图案的方法，包括基于模板的设计图案的数据，生成要形成在模板的第一和第二区域之间的第三区域中的虚拟模板图案的数据，生成虚拟模板图案，使得将表示第三区域的表面积与第三区域的面积的比率的第三表面积比设定为小于表示第一区域的表面积的比率的第一表面积比相对于第一区域的面积大于表示第二区域的表面积与第二区域的面积的比率的第二表面积比。

2. 发明申请

US20130014360A1 STAGE APPARATUS AND PROCESS APPARATUS 有权
标题翻译：阶段装置和处理装置
公开(公告)号：US20130014360A1
公开(公告)日：2013-01-17
申请号：US13428530
申请日：2012-03-23
申请人： Ryoichi INANAMI , Shinichi ITO , Hiroshi KOIZUMI , Akihiro KOJIMA
发明人： Ryoichi INANAMI , Shinichi ITO , Hiroshi KOIZUMI , Akihiro KOJIMA
IPC分类号： H01L21/683
CPC分类号： H01L21/6875 , H01L21/6715 , H01L21/67288 , H01L21/6833 , H01L21/6838 , Y10T29/41
摘要： According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
摘要翻译：根据一个实施例，舞台装置包括高度控制单元，包括各自独立地向上/向下驱动的高度控制元件，测量单元，其将衬底的上表面划分为区域，并且测量每个的高度地区。控制单元被配置为通过基于数据值来控制每个高度控制元件的高度来独立地设置每个区域的高度，使用测量单元确定上表面中的每个区域的高度基板处于允许范围内，并且通过高度控制元件再次将该区域的高度设定在允许范围之外。

3. 发明申请

US20090206280A1 CHARGED-BEAM EXPOSURE APPARATUS HAVING AN IMPROVED ALIGNMENT PRECISION AND EXPOSURE METHOD 审中-公开
标题翻译：具有改进的对准精度和曝光方法的充电束曝光装置
公开(公告)号：US20090206280A1
公开(公告)日：2009-08-20
申请号：US12363123
申请日：2009-01-30
申请人： Takeshi KOSHIBA , Tetsuro NAKASUGI , Ryoichi INANAMI , Takumi OTA , Hiroyuki MIZUNO
发明人： Takeshi KOSHIBA , Tetsuro NAKASUGI , Ryoichi INANAMI , Takumi OTA , Hiroyuki MIZUNO
IPC分类号： A61N5/00 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： The first charged-beam optical system, which is one of the charged-beam optical systems, detects first marks provided on the chips formed in the wafer. The positions of the chips made in the wafer are calculated from position data about the first marks detected. The charged-beam optical systems detect the second mark provided on a stage. The position of the beam generated by each charged-beam optical system is adjusted in accordance with position data about the second mark detected. The charged-beam optical systems are used in accordance with the positions of the chips, to thereby draw a pattern.
摘要翻译：作为带电光束光学系统之一的第一带电束光学系统检测在晶片上形成的芯片上提供的第一标记。根据关于检测到的第一标记的位置数据计算在晶片中制造的芯片的位置。带电光束光学系统检测在舞台上提供的第二标记。根据检测到的第二标记的位置数据来调整由每个带电束光学系统产生的光束的位置。根据芯片的位置使用带电束光学系统，从而绘制图案。

4. 发明申请

US20110065027A1 FLARE CORRECTION METHOD, METHOD FOR MANUFACTURING MASK FOR LITHOGRAPHY, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：瓦楞校正方法，制造掩模掩模的方法以及制造半导体器件的方法
公开(公告)号：US20110065027A1
公开(公告)日：2011-03-17
申请号：US12868779
申请日：2010-08-26
申请人： Ryoichi INANAMI , Suigen Kyoh
发明人： Ryoichi INANAMI , Suigen Kyoh
IPC分类号： G03F1/00 , G03F7/20 , G06F17/50
CPC分类号： G03F7/70941 , G03F1/70 , G03F7/70558
摘要： In one embodiment, a flare correction method is disclosed. The method can acquire a flare point spread function. The method can calculate a pattern density distribution in a first region of the mask, the distance from the pattern being equal to or shorter than a predetermined value in the first region. The method can calculate pattern coverage in a second region of the mask, the distance from the pattern being longer than the predetermined value. The method can calculate a first flare distribution with respect to the pattern by performing convolution integration between the flare point spread function corresponding to the first region and the pattern density distribution. The method can calculate a flare value corresponding to the second region by multiplying a value of integral of the flare point spread function corresponding to the second region by the pattern coverage. The method can calculate a second flare distribution by adding the flare value to the first flare distribution. In addition, the method can correct the pattern based on the second flare distribution.
摘要翻译：在一个实施例中，公开了一种闪光校正方法。该方法可以获得耀斑点扩散函数。该方法可以计算掩模的第一区域中的图案密度分布，在图案的距离等于或小于第一区域中的预定值。该方法可以计算掩模的第二区域中的图案覆盖，距离图案的距离长于预定值。该方法可以通过执行与第一区域相对应的闪点扩展函数与图案密度分布之间的卷积积分来计算相对于图案的第一耀斑分布。该方法可以通过将对应于第二区域的闪点扩散函数的积分值乘以图案覆盖来计算与第二区域相对应的耀斑值。该方法可以通过向第一个耀斑分布添加耀斑值来计算第二个耀斑分布。此外，该方法可以基于第二个耀斑分布来校正模式。

5. 发明申请

US20090305152A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD 有权
标题翻译：半导体器件制造方法
公开(公告)号：US20090305152A1
公开(公告)日：2009-12-10
申请号：US12478408
申请日：2009-06-04
申请人： Ryoichi INANAMI , Shinji Mikami , Hirofumi Inoue
发明人： Ryoichi INANAMI , Shinji Mikami , Hirofumi Inoue
IPC分类号： G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the first resist pattern, and forming a second resist pattern on the semiconductor substrate by using an imprinter, and then, forming a second pattern on the semiconductor substrate by the use of the second resist pattern. The forming the first pattern, the first pattern smaller than a design pattern corresponding to the design data for forming a plurality of patterns on a semiconductor substrate being formed.
摘要翻译：半导体器件制造方法在半导体衬底上形成第一抗蚀剂图案，然后通过使用第一抗蚀剂图案在半导体衬底上形成第一图案，并通过使用打印机在半导体衬底上形成第二抗蚀剂图案，然后通过使用第二抗蚀剂图案在半导体衬底上形成第二图案。形成第一图案，第一图案小于与形成在半导体衬底上形成多个图案的设计数据相对应的设计图案。

6. 发明申请

US20120129279A1 IMPRINTING METHOD, IMPRINTING APPARATUS AND MEDIUM 审中-公开
标题翻译：印刷方法，印刷装置和介质
公开(公告)号：US20120129279A1
公开(公告)日：2012-05-24
申请号：US13230197
申请日：2011-09-12
申请人： Yasuo MATSUOKA , Takumi OTA , Ryoichi INANAMI
发明人： Yasuo MATSUOKA , Takumi OTA , Ryoichi INANAMI
IPC分类号： H01L21/66 , B05C9/14 , B05C9/12 , B05C11/02 , B05C11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, there is provided an imprinting method for applying a first hardening resin material on a substrate to be processed and transferring a pattern of a semiconductor integrated circuit formed on a template onto the substrate to be processed on which the first hardening resin material is applied, wherein a second hardening resin material with higher separability than the first hardening resin material is applied on at least part of the outer periphery of an area in which the pattern is formed by one transferring.
摘要翻译：根据一个实施例，提供一种压印方法，用于将第一硬化树脂材料施加到待加工的基板上，并将形成在模板上的半导体集成电路的图案转印到待加工的基板上，在该基板上第一硬化树脂材料其中通过一次转印在其形成图案的区域的外周的至少一部分上施加具有比第一硬化树脂材料更高的分离性的第二硬化树脂材料。

7. 发明申请

US20100021826A1 REFLECTIVE MASK, MANUFACTURING METHOD FOR REFLECTIVE MASK, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE 失效
标题翻译：反射掩模，反射掩模的制造方法和半导体器件的制造方法
公开(公告)号：US20100021826A1
公开(公告)日：2010-01-28
申请号：US12490910
申请日：2009-06-24
申请人： Ryoichi INANAMI , Yumi NAKAJIMA , Masamitsu ITOH
发明人： Ryoichi INANAMI , Yumi NAKAJIMA , Masamitsu ITOH
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/24
摘要： A reflective mask comprising: a reflective layer that is arranged on a surface on a side on which EUV light is irradiated and reflects the EUV light; a buffer layer containing Cr that is arranged on a side of the reflective layer on which the EUV light is irradiated and covers an entire surface of the reflective layer; and a non-reflective layer that is arranged on a side of the buffer layer on which the EUV light is irradiated and in which an absorber that absorbs the irradiated EUV light is arranged in a position corresponding to a mask pattern to be reduced and transferred onto a wafer.
摘要翻译：一种反射掩模，包括：反射层，其被布置在其上照射有EUV光的一侧的表面上并且反射所述EUV光; 包含Cr的缓冲层，其布置在其上照射有EUV光的反射层的一侧并覆盖反射层的整个表面; 以及布置在其上照射有EUV光的缓冲层侧的非反射层，并且其中吸收被照射的EUV光的吸收体被布置在与要被还原并转移到其上的掩模图案相对应的位置晶圆。

8. 发明申请

US20130077066A1 PATTERN FORMING APPARATUS 审中-公开
标题翻译：图案形成装置
公开(公告)号：US20130077066A1
公开(公告)日：2013-03-28
申请号：US13428519
申请日：2012-03-23
申请人： Ryoichi INANAMI , Tetsuro Nakasugi
发明人： Ryoichi INANAMI , Tetsuro Nakasugi
IPC分类号： G03B27/74
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a pattern forming apparatus includes a stage provided under a lower surface of a substrate, a probe provided above an upper surface of the substrate, a drive unit which drives at least one of the stage and the probe, a monitor/lithography unit connected to the probe, and a control unit which controls the drive unit and the monitor/lithography unit. The control unit is configured to change a relative position between the probe and the substrate, and form a first pattern in an area direct above a second pattern after detecting the first pattern in the substrate by the probe.
摘要翻译：根据一个实施例，图案形成装置包括设置在基板的下表面下方的台，设置在基板的上表面上方的探针，驱动台和探针中的至少一个的驱动单元，监视器/ 连接到探针的光刻单元，以及控制驱动单元和监视器/光刻单元的控制单元。控制单元被配置为改变探针和衬底之间的相对位置，并且在通过探针检测到衬底中的第一图案之后，在直接在第二图案之上的区域中形成第一图案。

9. 发明申请

US20120049417A1 IMPRINT APPARATUS AND IMPRINT METHOD 审中-公开
标题翻译： IMPRINT设备和印刷方法
公开(公告)号：US20120049417A1
公开(公告)日：2012-03-01
申请号：US13197383
申请日：2011-08-03
申请人： Ryoichi INANAMI
发明人： Ryoichi INANAMI
IPC分类号： B29C35/08 , B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to an embodiment, an imprint apparatus includes a template holder, a space adjusting unit, a relative position control unit and a curing unit. The template holder holds a plurality of templates in an arrayed form, each of the templates has a shape of a pattern to be transferred to a substrate to be processed. The space adjusting unit adjusts a space between the templates to a desired value. The relative position control unit controls relative positions of the templates and the substrate to be processed to bring the templates into contact with a resist on the substrate to be processed. The curing unit cures the resist while the templates are in contact with the resist.
摘要翻译：根据实施例，压印装置包括模板保持器，空间调节单元，相对位置控制单元和固化单元。模板保持器以阵列形式保持多个模板，每个模板具有要转移到待处理基板的图案的形状。空间调整单元将模板之间的空间调整到期望值。相对位置控制单元控制模板和要处理的基板的相对位置，以使模板与要处理的基板上的抗蚀剂接触。固化单元固化抗蚀剂，同时模板与抗蚀剂接触。

10. 发明申请

US20100308485A1 PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD 审中-公开
标题翻译：图案形成装置和图案形成方法
公开(公告)号：US20100308485A1
公开(公告)日：2010-12-09
申请号：US12728527
申请日：2010-03-22
申请人： Ryoichi INANAMI , Syunji Araki , Takuya Kono
发明人： Ryoichi INANAMI , Syunji Araki , Takuya Kono
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： A pattern is formed by an imprint technique, without decreases in throughput and alignment precision. A pattern forming apparatus includes a substrate holder that holds a substrate to be processed, a template holder that holds a template, a first position measuring device that measures the position of the substrate held by the substrate holder, a second position measuring device that measures the position of the template held by the template holder, and a control device that aligns the substrate with the template, based on transfer position information, calculates misalignments of the substrate and the template caused by a demolding procedure, based on the results of the measurement carried out by the first position measuring device and the second position measuring device, calculates a relative misalignment between the substrate and the template, based on the misalignments of the substrate and the template, and corrects the transfer position information, using the relative misalignment.
摘要翻译：通过压印技术形成图案，而不降低生产量和对准精度。图案形成装置包括保持待处理基板的基板保持件，保持模板的模板保持器，测量由基板保持器保持的基板的位置的第一位置测量装置，由模板保持器保持的模板的位置和基于转印位置信息将基板与模板对准的控制装置基于所进行的测量结果计算由脱模过程引起的基板和模板的不对准通过第一位置测量装置和第二位置测量装置，基于基板和模板的不对准来计算基板和模板之间的相对未对准，并且使用相对的未对准来校正转印位置信息。

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