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1. 发明申请

US20110111132A1 SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE 审中-公开
标题翻译：用于在管状结构的内表面沉积涂层的系统和方法
公开(公告)号：US20110111132A1
公开(公告)日：2011-05-12
申请号：US12939248
申请日：2010-11-04
申请人： Ronghua Wei , Christopher Rincon , Edward Langa , Narayana S. Cheruvu
发明人： Ronghua Wei , Christopher Rincon , Edward Langa , Narayana S. Cheruvu
IPC分类号： C23C14/02 , B29C71/04
CPC分类号： C23C16/045 , C23C16/26 , H01J37/32596
摘要： A system and method for depositing coatings on an inner surface of a tubular structure includes at least one pump for creating and maintaining a vacuum in the tubular structure, a meshed electrode adapted to be positioned in a center of the tubular structure, and a biased voltage power supply connected to the meshed electrode. The biased voltage power supply is adapted to apply a negative voltage to the meshed electrode such that the negative voltage causes a hollow cathode discharge inside the meshed electrode. The creation of the hollow cathode discharge causes ions to be drawn out of a mesh on the meshed electrode and accelerate onto an inner surface of the tubular structure, thereby coating the inner surface with a desired coating.
摘要翻译：用于在管状结构的内表面上沉积涂层的系统和方法包括至少一个用于在管状结构中产生和保持真空的泵，适于定位在管状结构的中心的网状电极和偏置电压电源连接到网状电极。偏置电压电源适于向网状电极施加负电压，使得负电压在网状电极内部引起空心阴极放电。空心阴极放电的产生导致离子从网状电极上的网状物拉出并加速到管状结构的内表面上，从而以期望的涂层涂覆内表面。

2. 发明授权

US08034459B2 Erosion resistant coatings 有权
标题翻译：耐腐蚀涂层
公开(公告)号：US08034459B2
公开(公告)日：2011-10-11
申请号：US11550718
申请日：2006-10-18
申请人： Ronghua Wei , Edward Langa , James H. Arps , Christopher Rincon
发明人： Ronghua Wei , Edward Langa , James H. Arps , Christopher Rincon
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： C23C14/355 , C23C8/02 , C23C14/0057 , C23C14/06 , C23C14/0641 , Y10T428/249967 , Y10T428/24997 , Y10T428/31667
摘要： The present disclosure relates to a coating and a method of applying such coating that may include nanocrystals of a transition metal compound embedded in an amorphous phase or layered structure of transition metal compounds with an amorphous phase. The transition metal compound may be selected from the group consisting of metal nitrides, metal carbides, metal silicides and combinations thereof. The amorphous matrix may include a ceramic.
摘要翻译：本公开内容涉及涂覆和施加这样的涂层的方法，其可以包括嵌入非晶态的过渡金属化合物的纳米晶体或过渡金属化合物与非晶相的分层结构。过渡金属化合物可以选自金属氮化物，金属碳化物，金属硅化物及其组合。无定形基质可以包括陶瓷。

3. 发明申请

US20090286012A1 Method and Apparatus for High Rate, Uniform Plasma Processing of Three-dimensional Objects 有权
标题翻译：用于三维物体的高速，均匀等离子体处理的方法和装置
公开(公告)号：US20090286012A1
公开(公告)日：2009-11-19
申请号：US12121410
申请日：2008-05-15
申请人： Ronghua Wei , Chris Rincon , Edward Langa
发明人： Ronghua Wei , Chris Rincon , Edward Langa
IPC分类号： B01J19/08
CPC分类号： C23C8/36 , C23C14/48 , C23C16/0272 , C23C16/26 , C23C16/515 , H01J37/32403 , H01J37/32412
摘要： A method of performing plasma immersion ion processing (PIIP), particularly suited for processing three-dimensional objects. One or more such objects are placed in a conductive cage having solid or mesh walls. The cage completely encloses the objects. A voltage is applied to the cage, and the plasma is generated, resulting in the plasma being contained within the cage.
摘要翻译：一种执行等离子体浸没离子处理（PIIP）的方法，特别适用于处理三维物体。一个或多个这样的物体被放置在具有固体或网状壁的导电笼中。笼子完全包围着物体。电压被施加到保持架上，并且产生等离子体，导致等离子体被包含在笼中。

4. 发明授权

US08747631B2 Apparatus and method utilizing a double glow discharge plasma for sputter cleaning 有权
标题翻译：利用双辉光放电等离子体进行溅射清洗的装置和方法
公开(公告)号：US08747631B2
公开(公告)日：2014-06-10
申请号：US12723816
申请日：2010-03-15
申请人： Ronghua Wei , Edward Langa , Sabrina L. Lee
发明人： Ronghua Wei , Edward Langa , Sabrina L. Lee
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00 , C23C14/02 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： C23C14/022 , C23C14/046 , C23C14/35 , H01J37/3405
摘要： The present disclosure relates to an apparatus and method utilizing double glow discharge for sputter cleaning of a selected surface. The surface may include the inner surface of a hollow substrate such as a tube which inner surface may then be coated via magnetron sputter deposition.
摘要翻译：本公开涉及利用双辉光放电来对所选择的表面进行溅射清洗的装置和方法。表面可以包括诸如管的中空衬底的内表面，然后可以通过磁控溅射沉积涂覆内表面。

5. 发明申请

US20060251917A1 Method for magnetron sputter deposition 有权
标题翻译：磁控溅射沉积方法
公开(公告)号：US20060251917A1
公开(公告)日：2006-11-09
申请号：US11397878
申请日：2006-04-04
申请人： Kuang-Tsan Chiang , Ronghua Wei , Edward Langa
发明人： Kuang-Tsan Chiang , Ronghua Wei , Edward Langa
IPC分类号： C23C14/32 , B32B15/20
CPC分类号： C23C14/046 , C23C14/165 , C23C14/225 , C23C14/352 , C23C14/355 , H01J37/3405 , Y10T428/12903
摘要： A method for depositing a nanostructured coating comprising chromium or a copper-chromium mixture on a workpiece. The workpiece may comprise a hollowed structure such as a rocket or jet engine combustion chamber liner. The method comprises providing a magnetron and an external sputter target material comprising chromium or a copper-chromium composite and effecting a magnetron sputter deposition to deposit a substantially uniform nanostructured coating comprising said sputter target material on said workpiece. The method may include plasma enhancement wherein a filament is utilized to produce a plasma that effects an ion bombardment on the workpiece during the magnetron sputter deposition process. The invention also includes the nanostructured coatings deposited by these methods and workpieces coated thereby.
摘要翻译：一种在工件上沉积包含铬或铜 - 铬混合物的纳米结构涂层的方法。工件可以包括中空结构，例如火箭或喷气式发动机燃烧室衬套。该方法包括提供磁控管和包含铬或铜 - 铬复合材料的外部溅射靶材料，并进行磁控溅射沉积，以将包含所述溅射靶材料的基本均匀的纳米结构涂层沉积在所述工件上。该方法可以包括等离子体增强，其中使用丝来产生在磁控溅射沉积工艺期间对工件进行离子轰击的等离子体。本发明还包括通过这些方法沉积的纳米结构涂层和由此涂覆的工件。

6. 发明授权

US08252388B2 Method and apparatus for high rate, uniform plasma processing of three-dimensional objects 有权
标题翻译：三维物体高速，均匀等离子体处理的方法和装置
公开(公告)号：US08252388B2
公开(公告)日：2012-08-28
申请号：US12121410
申请日：2008-05-15
申请人： Ronghua Wei , Chris Rincon , Edward Langa
发明人： Ronghua Wei , Chris Rincon , Edward Langa
IPC分类号： B01J19/08
CPC分类号： C23C8/36 , C23C14/48 , C23C16/0272 , C23C16/26 , C23C16/515 , H01J37/32403 , H01J37/32412
摘要： A method of performing plasma immersion ion processing (PIIP), particularly suited for processing three-dimensional objects. One or more such objects are placed in a conductive cage having solid or mesh walls. The cage completely encloses the objects. A voltage is applied to the cage, and the plasma is generated, resulting in the plasma being contained within the cage.
摘要翻译：一种执行等离子体浸没离子处理（PIIP）的方法，特别适用于处理三维物体。一个或多个这样的物体被放置在具有固体或网状壁的导电笼中。笼子完全包围着物体。电压被施加到保持架上，并且产生等离子体，导致等离子体被包含在笼中。

7. 发明授权

US07790003B2 Method for magnetron sputter deposition 有权
标题翻译：磁控溅射沉积方法
公开(公告)号：US07790003B2
公开(公告)日：2010-09-07
申请号：US11397878
申请日：2006-04-04
申请人： Kuang-Tsan Kenneth Chiang , Ronghua Wei , Edward Langa
发明人： Kuang-Tsan Kenneth Chiang , Ronghua Wei , Edward Langa
IPC分类号： C23C14/35
CPC分类号： C23C14/046 , C23C14/165 , C23C14/225 , C23C14/352 , C23C14/355 , H01J37/3405 , Y10T428/12903
摘要： A method for depositing a nanostructured coating comprising chromium or a copper-chromium mixture on a workpiece. The workpiece may comprise a hollowed structure such as a rocket or jet engine combustion chamber liner. The method comprises providing a magnetron and an external sputter target material comprising chromium or a copper-chromium composite and effecting a magnetron sputter deposition to deposit a substantially uniform nanostructured coating comprising said sputter target material on said workpiece. The method may include plasma enhancement wherein a filament is utilized to produce a plasma that effects an ion bombardment on the workpiece during the magnetron sputter deposition process. The invention also includes the nanostructured coatings deposited by these methods and workpieces coated thereby.
摘要翻译：一种在工件上沉积包含铬或铜 - 铬混合物的纳米结构涂层的方法。工件可以包括中空结构，例如火箭或喷气式发动机燃烧室衬套。该方法包括提供磁控管和包含铬或铜 - 铬复合材料的外部溅射靶材料，并进行磁控溅射沉积，以将包含所述溅射靶材料的基本均匀的纳米结构涂层沉积在所述工件上。该方法可以包括等离子体增强，其中使用丝来产生在磁控溅射沉积工艺期间对工件进行离子轰击的等离子体。本发明还包括通过这些方法沉积的纳米结构涂层和由此涂覆的工件。

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