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1. 发明申请

US20110212546A1 UV ABSORPTION BASED MONITOR AND CONTROL OF CHLORIDE GAS STREAM 有权
标题翻译：紫外线吸收监测和氯化物气流控制
公开(公告)号：US20110212546A1
公开(公告)日：2011-09-01
申请号：US13060639
申请日：2009-07-21
申请人： Ronald Thomas Bertram Jr. , Chantal Arena , Christiaan J. Werkhoven , Michael Albert Tischler , Vasil Vorsa , Andrew D. Johnson
发明人： Ronald Thomas Bertram Jr. , Chantal Arena , Christiaan J. Werkhoven , Michael Albert Tischler , Vasil Vorsa , Andrew D. Johnson
IPC分类号： H01L21/66
CPC分类号： C23C16/52 , C23C16/301 , C30B25/165 , C30B29/403
摘要： A semiconductor growth system includes a chamber and a source of electromagnetic radiation. A detector is arranged to detect absorption of radiation from the source by a chloride- based chemical of the reaction chamber. A control system controls the operation of the chamber in response to the absorption of radiation by the chloride-based chemical. The control system controls the operation of the chamber by adjusting a parameter of the reaction chamber.
摘要翻译：半导体生长系统包括室和电磁辐射源。检测器被布置成通过反应室的基于氯化物的化学物质来检测来自源的辐射的吸收。控制系统响应于基于氯化物的化学品对辐射的吸收来控制室的操作。控制系统通过调节反应室的参数来控制室的操作。

2. 发明授权

US08431419B2 UV absorption based monitor and control of chloride gas stream 有权
标题翻译：基于紫外吸收的监测和控制氯化物气流
公开(公告)号：US08431419B2
公开(公告)日：2013-04-30
申请号：US13060639
申请日：2009-07-21
申请人： Ronald Thomas Bertram, Jr. , Chantal Arena , Christiaan J. Werkhoven , Michael Albert Tischler , Vasil Vorsa , Andrew D. Johnson
发明人： Ronald Thomas Bertram, Jr. , Chantal Arena , Christiaan J. Werkhoven , Michael Albert Tischler , Vasil Vorsa , Andrew D. Johnson
IPC分类号： H01L21/00
CPC分类号： C23C16/52 , C23C16/301 , C30B25/165 , C30B29/403
摘要： A semiconductor growth system includes a chamber and a source of electromagnetic radiation. A detector is arranged to detect absorption of radiation from the source by a chloride- based chemical of the reaction chamber. A control system controls the operation of the chamber in response to the absorption of radiation by the chloride-based chemical. The control system controls the operation of the chamber by adjusting a parameter of the reaction chamber.
摘要翻译：半导体生长系统包括室和电磁辐射源。检测器被布置成通过反应室的基于氯化物的化学物质来检测来自源的辐射的吸收。控制系统响应于基于氯化物的化学品对辐射的吸收来控制室的操作。控制系统通过调节反应室的参数来控制室的操作。

3. 发明申请

US20100180913A1 METHODS FOR IN-SITU CHAMBER CLEANING PROCESS FOR HIGH VOLUME MANUFACTURE OF SEMICONDUCTOR MATERIALS 审中-公开
标题翻译：用于半导体材料高容量制造的现场清洁工艺的方法
公开(公告)号：US20100180913A1
公开(公告)日：2010-07-22
申请号：US12602740
申请日：2008-12-05
申请人： Chantal Arena , Christiaan J. Werkhoven , Ronald Thomas Bertram, JR. , Andrew D. Johnson , Vasil Vorsa , Robert Gordon Ridgeway , Peter J. Maroulis
发明人： Chantal Arena , Christiaan J. Werkhoven , Ronald Thomas Bertram, JR. , Andrew D. Johnson , Vasil Vorsa , Robert Gordon Ridgeway , Peter J. Maroulis
IPC分类号： C23G1/00 , B05C11/00
CPC分类号： C23C16/4405 , C23C16/52 , C23C16/54
摘要： The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and apparatus for in-situ removal of undesired deposits in the interiors of reactor chambers, for example, on chamber walls and elsewhere. The invention provides methods according to which cleaning steps are integrated and incorporated into a high-throughput growth process. Preferably, the times when growth should be suspended and cleaning commenced and when cleaning should be terminated and growth resumed are automatically determined based on sensor inputs. The invention also provides reactor chamber systems for the efficient performance of the integrated cleaning/growth methods of this invention.
摘要翻译：本发明涉及半导体加工设备和方法的领域，并且特别地提供了用于在反应器室的内部例如在室壁和其它地方原位去除不想要的沉积物的方法和装置。本发明提供了一种方法，根据该方法，清洁步骤被整合并结合到高通量生长过程中。优选地，基于传感器输入自动确定生长应该停止和清洁开始的时间，并且清洁应当终止并且恢复生长。本发明还提供了用于有效执行本发明的综合清洁/生长方法的反应器室系统。

4. 发明授权

US5986075A Process for the production of diazonium compounds with a low content of sodium ions 有权
标题翻译：生产钠离子含量低的重氮化合物的方法
公开(公告)号：US5986075A
公开(公告)日：1999-11-16
申请号：US234449
申请日：1999-01-20
申请人： John C. DuBose , Andrew D. Johnson , Samuel Shaun Murphree , Edzard Tholema , Helmut Hoffmann , Wolfgang Zarges , Wolfgang Frank , Bettina Burkhardt
发明人： John C. DuBose , Andrew D. Johnson , Samuel Shaun Murphree , Edzard Tholema , Helmut Hoffmann , Wolfgang Zarges , Wolfgang Frank , Bettina Burkhardt
IPC分类号： C07C245/20 , C07C245/02 , C07C303/44 , C07C309/46 , C07D277/66 , C07D417/12 , C09B29/045 , C09B29/36 , C09B29/52 , C09B67/54 , C09D11/00 , D06P1/02 , C07C245/12 , C09B41/00
CPC分类号： C07D417/12 , C07C303/44 , C07D277/66 , C09B67/0096 , C09D11/328
摘要： The present invention relates to a process for desalting aqueous suspensions containing an organic diazonium compound and electrolytes containing Na ions, in which the aqueous suspension is passed through a semipermeable membrane.
摘要翻译：本发明涉及含有有机重氮化合物和含有Na离子的电解质的含水悬浮液脱盐的方法，其中水悬浮液通过半透膜。

5. 发明申请

US20140039374A1 Clog Detection in a Flow Control System 审中-公开
标题翻译：流量控制系统中的堵塞检测
公开(公告)号：US20140039374A1
公开(公告)日：2014-02-06
申请号：US13565953
申请日：2012-08-03
申请人： Cesario P. Dos Santos , Andrew D. Johnson
发明人： Cesario P. Dos Santos , Andrew D. Johnson
IPC分类号： A61F9/00 , A61M1/00
CPC分类号： A61B3/16 , A61F9/00781
摘要： Disclosed herein are an apparatus, a system, and a method to monitor drainage from a first region of a patient to a second region. The apparatus comprises pressure sensors configured to measure the pressures of the first and second regions, a flow system to regulate drainage of fluid from the first region to the second region, a memory having a stored pressure drop across the flow system; and a processor associated with the memory and configured to compare the first pressure, the second pressure, and the stored pressure drop threshold and selectively generate control signals based on the comparisons. In some instances, the apparatus further comprises an alarm, and the processor is configured to generate the control signals that trip the alarm when a pressure drop exceeds the stored pressure drop threshold.
摘要翻译：本文公开了一种监测从患者的第一区域到第二区域的引流的装置，系统和方法。该装置包括被配置成测量第一和第二区域的压力的压力传感器，用于调节流体从第一区域到第二区域的排水的流动系统;存储器，其跨过流动系统具有存储的压降; 以及与所述存储器相关联并且被配置为比较所述第一压力，所述第二压力和所存储的压降阈值并且基于所述比较选择性地生成控制信号的处理器。在一些情况下，该装置还包括报警器，并且处理器被配置为产生当压力降超过存储的压降阈值时跳闸报警的控制信号。

6. 发明申请

US20100167947A1 Polymorphisms in Genes Affecting Ace-Related Disorders and Uses Thereof 有权
标题翻译：影响Ace相关疾病基因的多态性及其用途
公开(公告)号：US20100167947A1
公开(公告)日：2010-07-01
申请号：US12598265
申请日：2008-04-30
申请人： Wolfgang Sadee , Andrew D. Johnson , Danxin Wang , Audrey C. Papp
发明人： Wolfgang Sadee , Andrew D. Johnson , Danxin Wang , Audrey C. Papp
IPC分类号： C40B30/04 , C12Q1/68 , C40B40/06
CPC分类号： C12Q1/6883 , C12Q2600/106 , C12Q2600/154 , C12Q2600/156 , C12Q2600/158 , C12Q2600/16 , C12Q2600/172 , C12Q2535/131
摘要： A method for predicting a subject's risk factors for ACE-related disorders includes detecting the allelic status of one or more polymorphisms in a nucleic acid sample of the subject.
摘要翻译：用于预测受试者ACE相关疾病的危险因素的方法包括检测受试者的核酸样品中一种或多种多态性的等位基因状态。

7. 发明授权

US5479727A Moisture removal and passivation of surfaces 失效
标题翻译：水分去除和表面钝化
公开(公告)号：US5479727A
公开(公告)日：1996-01-02
申请号：US329029
申请日：1994-10-25
申请人： Stephen M. Fine , Andrew D. Johnson , John G. Langan
发明人： Stephen M. Fine , Andrew D. Johnson , John G. Langan
IPC分类号： F26B7/00 , F26B19/00 , F26B21/14 , F26B3/00
CPC分类号： F26B21/14
摘要： The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of moisture, wherein the moisture removal and passivation is enhanced using an agent of the formula: R.sub.a SiX.sub.b Y.sub.c Z.sub.d where a =1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable. The moisture removal and passivation is conducted at less than 65.degree. C. and at least ambient pressure.
摘要翻译：本发明是从表面除去水分的方法，例如用于在电子元件制造设备中传输高纯度气体的金属导管，以及这种金属表面的钝化以阻止水分的再吸收，其中除湿和钝化是使用下式的试剂增强：RaSiXbYcZd其中a = 1-3; b，c和d分别为0-3和a + b + c + d = 4; R是一个或多个有机基团; 并且X，Y或Z中的至少一个与硅键合，其易于水解。除湿和钝化在低于65℃和至少环境压力下进行。

8. 发明授权

US09012143B2 Polymorphisms in genes affecting ace-related disorders and uses thereof 有权
标题翻译：影响ace相关疾病的基因的多态性及其用途
公开(公告)号：US09012143B2
公开(公告)日：2015-04-21
申请号：US12598265
申请日：2008-04-30
申请人： Wolfgang Sadee , Andrew D. Johnson , Danxin Wang , Audrey C. Papp
发明人： Wolfgang Sadee , Andrew D. Johnson , Danxin Wang , Audrey C. Papp
IPC分类号： C12Q1/68
CPC分类号： C12Q1/6883 , C12Q2600/106 , C12Q2600/154 , C12Q2600/156 , C12Q2600/158 , C12Q2600/16 , C12Q2600/172 , C12Q2535/131
摘要： A method for predicting a subject's risk factors for ACE-related disorders includes detecting the allelic status of one or more polymorphisms in a nucleic acid sample of the subject.
摘要翻译：用于预测受试者ACE相关疾病的危险因素的方法包括检测受试者的核酸样品中一种或多种多态性的等位基因状态。

9. 发明申请

US20090240510A1 Balanced Scorecard Method for Determining an Impact on a Business Service Caused by Degraded Operation of an IT System Component 审中-公开
标题翻译：用于确定IT系统组件降级操作对业务服务的影响的平衡记分卡方法
公开(公告)号：US20090240510A1
公开(公告)日：2009-09-24
申请号：US12050339
申请日：2008-03-18
申请人： Lloyd B. Hopkins , Colin Griffiths , Andrew D. Johnson , Jonathan D. Miles , Paul Bosomworth , Grant Glading
发明人： Lloyd B. Hopkins , Colin Griffiths , Andrew D. Johnson , Jonathan D. Miles , Paul Bosomworth , Grant Glading
IPC分类号： G06Q10/00
CPC分类号： G06Q10/06
摘要： A “balanced scorecard” method is disclosed for determining degrees of impact on business service elements (BSE's) caused by degradations of configuration items (CI's) in an underlying IT system. The formulas are used by an Impact Calculation Engine (ICE) of a Business Services Management (BSM) system. They provide enhanced accuracy by accounting for “service aspects” of alerts (using categories such as performance, availability, security, end user, capacity, and financial) and/or degrees of CI degradation (in some embodiments using OSI Standards). The method eliminates manual assignment of degrees of impact. Preferred embodiments convert alerts to a common alert format, determine a separate degree of impact for each service aspect, and use default formulas when custom formulas are not provided. Some embodiments use a service subscription wizard to at least partly automate the assignment of CI-to-BSE relationships. Different balanced scorecards can apply to the same BSE at different times, dates, usage levels, etc.
摘要翻译：公开了一种“平衡记分卡”方法，用于确定由底层IT系统中配置项（CI）的降级引起的对业务服务元素（BSE）的影响程度。公式由业务服务管理（BSM）系统的影响计算引擎（ICE）使用。它们通过考虑警报的“服务方面”（使用诸如性能，可用性，安全性，最终用户，容量和财务等）和/或CI降级程度（在使用OSI标准的一些实施例中）来提供更高的准确性。该方法消除了手动分配影响程度。优选实施例将警报转换为公共警报格式，确定对每个服务方面的单独影响程度，并且在不提供自定义公式时使用默认公式。一些实施例使用服务订阅向导来至少部分地自动化CI到BSE关系的分配。不同的平衡记分卡可以在不同的时间，日期，使用等级等适用于同一BSE。

10. 发明授权

US06204174B1 Method for high rate deposition of tungsten 失效
标题翻译：高速沉积钨的方法
公开(公告)号：US06204174B1
公开(公告)日：2001-03-20
申请号：US08977831
申请日：1997-11-25
申请人： Alexander D. Glew , Andrew D. Johnson , Ravi Rajagopalan , Steve Ghanayem
发明人： Alexander D. Glew , Andrew D. Johnson , Ravi Rajagopalan , Steve Ghanayem
IPC分类号： H01L2144
CPC分类号： H01L21/28568 , C23C16/14 , C23C16/52 , H01L21/76877
摘要： A method and apparatus to control the deposition rate of a refractory metal film in a semiconductor fabrication process by controlling a quantity of ethylene present. The method includes placing a substrate in a deposition zone, of a semiconductor process chamber, flowing, into the deposition zone, a process gas including a refractory metal source, an inert carrier gas, and a hydrocarbon. Typically, the refractory metal source is tungsten hexafluoride, WF6, and the inert gas is argon, Ar. The ethylene may be premixed with either the argon or the tungsten hexafluoride to form a homogenous mixture. However, an in situ mixing apparatus may also be employed.
摘要翻译：通过控制存在的乙烯量来控制半导体制造工艺中难熔金属膜的沉积速率的方法和装置。该方法包括将衬底放置在半导体处理室的沉积区中，流入沉积区，包括难熔金属源，惰性载气和烃的工艺气体。通常，难熔金属源是六氟化钨，WF 6，惰性气体是氩，Ar。乙烯可以与氩气或六氟化钨预混合以形成均匀的混合物。然而，也可以使用原位混合装置。

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