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1. 发明授权

US08180454B2 Fitting a neural prosthesis using impedance and electrode height 有权
标题翻译：使用阻抗和电极高度拟合神经假体
公开(公告)号：US08180454B2
公开(公告)日：2012-05-15
申请号：US11607201
申请日：2006-12-01
申请人： Robert J. Greenberg , Ione Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Weiland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
发明人： Robert J. Greenberg , Ione Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Weiland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
IPC分类号： A61N1/18
CPC分类号： A61N1/0543 , A61N1/36046 , A61N1/37247
摘要： The invention is a method of automatically adjusting an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the threshold of perception. Alternatively, electrode height may be measured directly to predict the threshold of perception. Also, impedance measurement may be used to quickly identify defective electrodes and proper electrode placement.
摘要翻译：本发明是一种将电极阵列自动调整为个体对象的神经特征的方法。对电神经刺激的反应因受试者而异。可以使用阻抗测量来预测来自神经组织的电极高度，从而预测感知的阈值。或者，可以直接测量电极高度以预测感知阈值。此外，阻抗测量可用于快速识别有缺陷的电极和适当的电极放置。

2. 发明申请

US20080294223A1 Fitting a Neural Prosthesis Using Impedance and Electrode Height 有权
标题翻译：使用阻抗和电极高度拟合神经假体
公开(公告)号：US20080294223A1
公开(公告)日：2008-11-27
申请号：US11925285
申请日：2007-10-26
申请人： Robert J. Greenberg , Ione Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Weiland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
发明人： Robert J. Greenberg , Ione Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Weiland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
IPC分类号： A61N1/36
CPC分类号： A61N1/0543 , A61N1/36046 , A61N1/37247
摘要： The invention is a method of automatically adjusting an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the threshold of perception. Alternatively, electrode height may be measured directly to predict the threshold of perception. Also, impedance measurement may be used to quickly identify defective electrodes and proper electrode placement.
摘要翻译：本发明是一种将电极阵列自动调整为个体对象的神经特征的方法。对电神经刺激的反应因受试者而异。可以使用阻抗测量来预测来自神经组织的电极高度，从而预测感知的阈值。或者，可以直接测量电极高度以预测感知阈值。此外，阻抗测量可用于快速识别有缺陷的电极和适当的电极放置。

3. 发明授权

US08190267B2 Fitting a neural prosthesis using impedance and electrode height 有权
公开(公告)号：US08190267B2
公开(公告)日：2012-05-29
申请号：US11925285
申请日：2007-10-26
申请人： Robert J. Greenberg , Ione Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Weiland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
发明人： Robert J. Greenberg , Ione Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Weiland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
IPC分类号： A61N1/05
CPC分类号： A61N1/0543 , A61N1/36046 , A61N1/37247
摘要： The invention is a method of automatically adjusting an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the threshold of perception. Alternatively, electrode height may be measured directly to predict the threshold of perception. Also, impedance measurement may be used to quickly identify defective electrodes and proper electrode placement.

4. 发明授权

US09597495B2 Locating a neural prosthesis using impedance and electrode height 有权
公开(公告)号：US09597495B2
公开(公告)日：2017-03-21
申请号：US13452300
申请日：2012-04-20
申请人： Robert J. Greenberg , Jone Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Welland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
发明人： Robert J. Greenberg , Jone Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Welland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
IPC分类号： A61N1/05 , A61N1/36 , A61N1/372
CPC分类号： A61N1/0543 , A61N1/36046 , A61N1/37247
摘要： The invention is a method of identifying a preferred location for an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject and array location to array location. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the preferred location. Alternatively, electrode height may be measured directly to predict the preferred location.

5. 发明申请

US20120203293A1 Locating a Neural Prosthesis using Impedance and Electrode Height 有权
标题翻译：使用阻抗和电极高度定位神经假体
公开(公告)号：US20120203293A1
公开(公告)日：2012-08-09
申请号：US13452300
申请日：2012-04-20
申请人： Robert J. Greenberg , Jone Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Welland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
发明人： Robert J. Greenberg , Jone Fine , Arup Roy , Matthew J. McMahon , Mark S. Humayun , James David Welland , Alan M. Horsager , Dao Min Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
IPC分类号： A61N1/372
CPC分类号： A61N1/0543 , A61N1/36046 , A61N1/37247
摘要： The invention is a method of identifying a preferred location for an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject and array location to array location. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the preferred location. Alternatively, electrode height may be measured directly to predict the preferred location.
摘要翻译：本发明是一种将电极阵列的优选位置识别为个体对象的神经特征的方法。对电神经刺激的反应从主体到主体和阵列位置到阵列位置不同。可以使用阻抗测量来预测来自神经组织的电极高度，从而预测优选的位置。或者，可以直接测量电极高度以预测优选位置。

6. 发明申请

US20070191911A1 Fitting a neural prosthesis using impedance and electrode height 有权
标题翻译：使用阻抗和电极高度拟合神经假体
公开(公告)号：US20070191911A1
公开(公告)日：2007-08-16
申请号：US11607201
申请日：2006-12-01
申请人： Robert Greenberg , Ione Fine , Arup Roy , Matthew McMahon , Mark Humayun , James Weiland , Alan Horsager , Dao Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
发明人： Robert Greenberg , Ione Fine , Arup Roy , Matthew McMahon , Mark Humayun , James Weiland , Alan Horsager , Dao Zhou , Amy Hines , Sumit Yadav , Rongqing Dai
IPC分类号： A61N1/18
CPC分类号： A61N1/0543 , A61N1/36046 , A61N1/37247
摘要： The invention is a method of automatically adjusting an electrode array to the neural characteristics of an individual subject. The response to electrical neural stimulation varies from subject to subject. Measure of impedance may be used to predict the electrode height from the neural tissue and, thereby, predict the threshold of perception. Alternatively, electrode height may be measured directly to predict the threshold of perception. Also, impedance measurement may be used to quickly identify defective electrodes and proper electrode placement.
摘要翻译：本发明是一种将电极阵列自动调整为个体对象的神经特征的方法。对电神经刺激的反应因受试者而异。可以使用阻抗测量来预测来自神经组织的电极高度，从而预测感知的阈值。或者，可以直接测量电极高度以预测感知阈值。此外，阻抗测量可用于快速识别有缺陷的电极和适当的电极放置。

7. 发明申请

US20100147702A1 Process for Cathodic Protection of Electrode Material 有权
标题翻译：电极材料阴极保护工艺
公开(公告)号：US20100147702A1
公开(公告)日：2010-06-17
申请号：US12708358
申请日：2010-02-18
申请人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
发明人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
IPC分类号： C23F13/00
CPC分类号： C23F13/00 , A61N1/05 , A61N1/08 , C23F13/02
摘要： The present invention relates to a process for cathodic protection of electrode or electrode materials wherein negative bias is applied on the electrode. The negative bias is obtained by asymmetric current pulse. The asymmetric current pulse is obtained by performing negative phase with higher amplitude. The asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The asymmetric current pulse is obtained by performing negative phase with higher amplitude and with wider pulse width than that of the anodic phase. The present invention further relates to a process for cathodic protection of electrode or electrode materials, wherein negative bias is applied on the electrode, wherein the negative bias is obtained by asymmetric current pulse, wherein the asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The wider pulse width is obtained by pulse trains.
摘要翻译：本发明涉及对电极或电极材料进行阴极保护的方法，其中负电极施加在电极上。负偏压通过不对称电流脉冲获得。通过执行具有较高振幅的负相来获得非对称电流脉冲。通过执行具有比阳极相宽的脉冲宽度的负相来获得非对称电流脉冲。通过执行具有更高幅度和宽于脉冲宽度的阳极相的负相位获得非对称电流脉冲。本发明还涉及一种用于对电极或电极材料进行阴极保护的方法，其中在电极上施加负偏压，其中通过不对称电流脉冲获得负偏压，其中非对称电流脉冲通过执行具有更宽的负相脉冲宽度大于阳极相。通过脉冲串获得更宽的脉冲宽度。

8. 发明授权

US07691252B2 Process for cathodic protection of electrode materials 有权
标题翻译：电极材料阴极保护工艺
公开(公告)号：US07691252B2
公开(公告)日：2010-04-06
申请号：US11881254
申请日：2007-07-26
申请人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
发明人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
IPC分类号： C23F13/04
CPC分类号： C23F13/00 , A61N1/05 , A61N1/08 , C23F13/02
摘要： The present invention relates to a process for cathodic protection of electrode or electrode materials wherein negative bias is applied on the electrode. the negative bias is obtained by asymmetric current pulse. The asymmetric current pulse is obtained by performing negative phase with higher amplitude. The asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The asymmetric current pulse is obtained by performing negative phase with higher amplitude and with wider pulse width than that of the anodic phase. The present invention further relates to a process for cathodic protection of electrode or electrode materials, wherein negative bias is applied on the electrode, wherein the negative bias is obtained by asymmetric current pulse, wherein the asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The wider pulse width is obtained by pulse trains.
摘要翻译：本发明涉及对电极或电极材料进行阴极保护的方法，其中负电极施加在电极上。负偏压通过不对称电流脉冲获得。通过执行具有较高振幅的负相来获得非对称电流脉冲。通过执行具有比阳极相宽的脉冲宽度的负相来获得非对称电流脉冲。通过执行具有更高幅度和宽于脉冲宽度的阳极相的负相位获得非对称电流脉冲。本发明还涉及一种用于对电极或电极材料进行阴极保护的方法，其中在电极上施加负偏压，其中通过不对称电流脉冲获得负偏压，其中非对称电流脉冲通过执行具有更宽的负相脉冲宽度大于阳极相。通过脉冲串获得更宽的脉冲宽度。

9. 发明申请

US20080283417A1 Process for Cathodic Protection of Electrode Materials 有权
标题翻译：电极材料阴极保护工艺
公开(公告)号：US20080283417A1
公开(公告)日：2008-11-20
申请号：US11924349
申请日：2007-10-25
申请人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
发明人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
IPC分类号： C23F13/00
CPC分类号： C23F13/00 , A61N1/05 , A61N1/08 , C23F13/02
摘要： The present invention relates to a process for cathodic protection of electrode or electrode materials wherein negative bias is applied on the electrode. the negative bias is obtained by asymmetric current pulse. The asymmetric current pulse is obtained by performing negative phase with higher amplitude. The asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The asymmetric current pulse is obtained by performing negative phase with higher amplitude and with wider pulse width than that of the anodic phase. The present invention further relates to a process for cathodic protection of electrode or electrode materials, wherein negative bias is applied on the electrode, wherein the negative bias is obtained by asymmetric current pulse, wherein the asymmetric current pulse is obtained by performing negative phase with wider pulse width than that of the anodic phase. The wider pulse width is obtained by pulse trains.
摘要翻译：本发明涉及对电极或电极材料进行阴极保护的方法，其中负电极施加在电极上。负偏压通过不对称电流脉冲获得。通过执行具有较高振幅的负相来获得非对称电流脉冲。通过执行具有比阳极相宽的脉冲宽度的负相来获得非对称电流脉冲。通过执行具有更高幅度和宽于脉冲宽度的阳极相的负相位获得非对称电流脉冲。本发明还涉及一种用于对电极或电极材料进行阴极保护的方法，其中在电极上施加负偏压，其中通过不对称电流脉冲获得负偏压，其中非对称电流脉冲通过执行具有更宽的负相脉冲宽度大于阳极相。通过脉冲串获得更宽的脉冲宽度。

10. 发明授权

US08034229B2 Process for cathodic protection of electrode material 有权
标题翻译：电极材料阴极保护工艺
公开(公告)号：US08034229B2
公开(公告)日：2011-10-11
申请号：US12708358
申请日：2010-02-18
申请人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
发明人： Dao Min Zhou , Amy Hines , James Singleton Little , Robert J. Greenberg
IPC分类号： C23F13/04
CPC分类号： C23F13/00 , A61N1/05 , A61N1/08 , C23F13/02
摘要： The invention is a process for cathodic protection of electrodes wherein negative bias is applied on the electrode. The negative bias is obtained by asymmetric current pulse, which is obtained by negative phase pulsing with higher amplitude than that of the anodic phase. The asymmetric current pulse is obtained by negative phase pulsing with wider pulse width than that of the anodic phase. The asymmetric current pulse may also be obtained by negative phase pulsing with both higher amplitude and wider pulse width than that of the anodic phase. The invention further relates to a process for cathodic protection of electrodes, wherein negative bias is applied on the electrode, and the negative bias is obtained by asymmetric current pulse, where the asymmetric current pulse is obtained by negative phase pulsing with wider pulse width than that of the anodic phase. The wider pulse width is obtained by pulse trains.
摘要翻译：本发明是用于对电极进行负偏压的电极的阴极保护方法。通过不对称电流脉冲获得负偏压，其通过负相脉冲以比阳极相高的幅度获得。非对称电流脉冲通过脉冲宽度大于阳极相的脉冲宽度相位来获得。也可以通过负相位脉冲获得不对称电流脉冲，同时具有比阳极相更高的幅度和更宽的脉冲宽度。本发明还涉及一种用于对电极进行阴极保护的方法，其中对电极施加负偏压，并且通过不对称电流脉冲获得负偏压，其中通过具有较宽脉冲宽度的负相脉冲获得非对称电流脉冲，的阳极相。通过脉冲串获得更宽的脉冲宽度。

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