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1. 发明授权

US07288362B2 Immersion topcoat materials with improved performance 有权
标题翻译：浸渍面漆材料具有改进的性能
公开(公告)号：US07288362B2
公开(公告)日：2007-10-30
申请号：US11063940
申请日：2005-02-23
申请人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
IPC分类号： G03C1/73 , G03C1/825 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译：公开了一种用于施加在光致抗蚀剂材料上的面漆材料。面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。

2. 发明授权

US07855045B2 Immersion topcoat materials with improved performance 有权
标题翻译：浸渍面漆材料具有改进的性能
公开(公告)号：US07855045B2
公开(公告)日：2010-12-21
申请号：US11868320
申请日：2007-10-05
申请人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Dario Gil , William Dinan Hinsberg , Carl Eric Larson , Linda Karin Sundberg , Gregory Michael Wallraff
IPC分类号： G03F7/32 , G03F7/11 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译：公开了一种用于施加在光致抗蚀剂材料上的面漆材料。面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。

3. 发明授权

US08034532B2 High contact angle topcoat material and use thereof in lithography process 失效
标题翻译：高接触角面漆材料及其在光刻工艺中的应用
公开(公告)号：US08034532B2
公开(公告)日：2011-10-11
申请号：US11380744
申请日：2006-04-28
申请人： Robert David Allen , Phillip Joe Brock , Carl E. Larson , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong
发明人： Robert David Allen , Phillip Joe Brock , Carl E. Larson , Ratnam Sooriyakumaran , Linda Karin Sundberg , Hoa D Truong
IPC分类号： G03F7/11 , G03F7/20 , G03F7/30 , G03F7/36 , C08F14/18
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/0752 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.
摘要翻译：公开了一种用于施加在光致抗蚀剂材料上的面漆材料。面漆材料包含酸惰性化合物。面漆材料还包括聚合物或低聚物或保持架结构，其与成像层混合可忽略，并且可溶于碱性显影液。还公开了在基材上形成图案化材料层的方法和包含面漆材料的涂布基材。

4. 发明授权

US06180317B2 Composition for photoimaging 失效
标题翻译：光成像用组合物
公开(公告)号：US06180317B2
公开(公告)日：2001-01-30
申请号：US07793889
申请日：1991-11-18
申请人： Robert David Allen , Richard Allen Day , Donald Herman Glatzel , William Dinan Hinsberg , John Richard Mertz , David John Russell , Gregory Michael Wallraff
发明人： Robert David Allen , Richard Allen Day , Donald Herman Glatzel , William Dinan Hinsberg , John Richard Mertz , David John Russell , Gregory Michael Wallraff
IPC分类号： G03C1725
CPC分类号： G03F7/038
摘要： An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60° C. and about 110° C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.
摘要翻译：提供了一种改进的可光成像的可阳离子聚合的环氧基涂料，适用于各种基材，包括用双氰胺固化的环氧玻璃层压板。该材料包括基本上由约10重量％至约80重量％的多元醇树脂组成的环氧树脂体系，多元醇树脂是分子量为约40,000至130,000的表氯醇和双酚A的缩合产物; 和约35重量％至72重量％的软化点在约60℃至约110℃之间且分子量为约600至2,500之间的溴化双酚A的环氧化缩水甘油醚。任选地，可以向树脂体系中加入第三树脂。向该树脂体系中添加约0.1〜约15重量份/ 100份阳离子光引发剂的树脂，其能够在暴露于光化辐射下引发所述环氧化树脂体系的聚合; 该系统的特征还在于，对于2.0密耳厚的膜，在330至700nm区域中的光的吸光度小于0.1。任选地，可加入光敏剂如苝及其衍生物或蒽及其衍生物。

5. 发明授权

US07820369B2 Method for patterning a low activation energy photoresist 有权
标题翻译：图案化低活化能光致抗蚀剂的方法
公开(公告)号：US07820369B2
公开(公告)日：2010-10-26
申请号：US10729452
申请日：2003-12-04
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
IPC分类号： G03F7/30
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.
摘要翻译：提供了含有缩醛或缩酮键的聚合物及其在平版光刻胶组合物中的用途，特别是在化学放大光致抗蚀剂中。聚合物由至少一种含有缩醛或缩酮键的第一烯属单体制备，其酸催化裂解使聚合物可溶于碱水溶液; 和至少一种第二烯烃单体，其选自（i）含有侧氟化羟烷基RH的烯烃单体，（ii）含有侧氟化烷基磺酰胺基RS的烯烃单体，和（iii）其组合。缩醛或缩酮键可以包含在第一烯属单体中的酸可裂解取代基RCL中。还提供了一种使用含有这些聚合物的光致抗蚀剂组合物来制备图案化基材的方法，其中聚合物在低于约100℃的温度下可溶于碱水溶液，通过酸催化的侧链缩醛或缩酮脱保护保护的羧酸基团。

6. 发明授权

US07193023B2 Low activation energy photoresists 有权
标题翻译：低活化能光刻胶
公开(公告)号：US07193023B2
公开(公告)日：2007-03-20
申请号：US10729169
申请日：2003-12-04
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong , Gregory Michael Wallraff
IPC分类号： C08F112/68
CPC分类号： G03F7/0046 , G03F7/0397
摘要： Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.
摘要翻译：提供了含有缩醛或缩酮键的聚合物及其在平版光刻胶组合物中的用途，特别是在化学放大光致抗蚀剂中。聚合物由至少一种含有缩醛或缩酮键的第一烯属单体制备，其酸催化裂解使聚合物可溶于碱水溶液; 和至少一种第二烯烃单体，其选自（i）含有侧氟化羟烷基R H的烯烃单体，（ii）含有侧氟化烷基磺酰胺基R S的烯属单体， SUP），和（iii）其组合。缩醛或缩酮键可以包含在第一烯烃单体中的酸可裂解取代基R CL中。还提供了一种使用含有这些聚合物的光致抗蚀剂组合物来制备图案化基材的方法，其中聚合物在低于约100℃的温度下可溶于碱水溶液，通过酸催化的侧链缩醛或缩酮脱保护保护的羧酸基团。

7. 发明授权

US06610456B2 Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions 有权
公开(公告)号：US06610456B2
公开(公告)日：2003-08-26
申请号：US09794466
申请日：2001-02-26
申请人： Robert David Allen , Phillip Joe Brock , Hiroshi Ito , Gregory Michael Wallraff
发明人： Robert David Allen , Phillip Joe Brock , Hiroshi Ito , Gregory Michael Wallraff
IPC分类号： G03F7039
CPC分类号： G03F7/0046 , C08F212/14 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/108
摘要： Copolymers prepared by radical polymerization of a fluorine-containing aromatic monomer and an acrylate-based comonomer that may or may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

8. 发明授权

US07910290B2 Photoresist topcoat for a photolithographic process 有权
标题翻译：光刻面漆，用于光刻工艺
公开(公告)号：US07910290B2
公开(公告)日：2011-03-22
申请号：US12128129
申请日：2008-05-28
申请人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
发明人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
IPC分类号： G03F7/20 , G03F7/30 , G03F7/38 , G03F7/40 , G03F7/11
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译：使用面漆组合物形成图像的方法。提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。官能团包括碱水溶性部分。官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

9. 发明申请

US20090011377A1 PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS 有权
标题翻译：用于光刻机工艺的光刻胶贴片
公开(公告)号：US20090011377A1
公开(公告)日：2009-01-08
申请号：US12128129
申请日：2008-05-28
申请人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
发明人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
IPC分类号： G03F7/20
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译：使用面漆组合物形成图像的方法。提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。官能团包括碱水溶性部分。官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

10. 发明授权

US07399581B2 Photoresist topcoat for a photolithographic process 有权
标题翻译：光刻面漆，用于光刻工艺
公开(公告)号：US07399581B2
公开(公告)日：2008-07-15
申请号：US11064871
申请日：2005-02-24
申请人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
发明人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
IPC分类号： G03F7/20 , G03F7/30 , G03F7/09 , G03F7/11
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译：一种组合物，其包含式T m 3的功能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12和Q n M R1，R2，R3其中n等于8,10或12。官能团包括碱水溶性部分。官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

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