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1. 发明授权

US08754139B2 Polyamide membranes with fluoroalcohol functionality 有权
标题翻译：具有氟代醇功能的聚酰胺膜
公开(公告)号：US08754139B2
公开(公告)日：2014-06-17
申请号：US12390127
申请日：2009-02-20
申请人： Robert David Allen , Na Young-Hye , Ratnam Sooriyakumaran , Masaki Fujiwara , Kazuhiro Yamanaka
发明人： Robert David Allen , Na Young-Hye , Ratnam Sooriyakumaran , Masaki Fujiwara , Kazuhiro Yamanaka
IPC分类号： C08J5/20
CPC分类号： C08G69/28 , B01D61/025 , B01D61/027 , B01D67/0006 , B01D69/02 , B01D69/125 , B01D71/56 , B01D2323/40 , B01D2325/30 , C08G69/26 , C08G69/42 , Y02A20/131
摘要： A polymeric membrane includes an active layer on a support. The active layer includes a polymer with a backbone, and the backbone has attached thereto at least one fluoroalcohol moiety.
摘要翻译：聚合物膜包括载体上的活性层。活性层包括具有主链的聚合物，并且主链已连接至少一个氟代醇部分。

2. 发明授权

US08727135B2 Composite filtration membranes and methods of preparation thereof 有权
标题翻译：复合过滤膜及其制备方法
公开(公告)号：US08727135B2
公开(公告)日：2014-05-20
申请号：US12873361
申请日：2010-09-01
申请人： Joy Cheng , Ratnam Sooriyakumaran , Ankit Vora
发明人： Joy Cheng , Ratnam Sooriyakumaran , Ankit Vora
IPC分类号： B01D39/00 , B01D39/14 , C08L75/00 , B01D67/00 , B05D5/00 , B29C44/04
CPC分类号： B01D71/40 , B01D2325/48 , C08F8/00 , C08F220/14 , C08F220/20 , C08F220/28 , C08F2810/20
摘要： A composition comprises a crosslinked poly(meth)acrylate comprising two or more poly(meth)acrylate backbones covalently linked to a bridging group, the backbones comprising i) respective first repeat units, each of which comprises a first side chain ester moiety comprising a hydrophilic poly(alkylene oxide) chain segment, ii) respective second repeat units, each of which comprises a second side chain ester moiety directly linked to the bridging group through a linking group selected from the group consisting of carbamate groups, urea groups, and thiocarbamate groups, and iii) respective third repeat units, each of which comprises a hydrophobic side chain moiety not directly linked to any bridging group. Composite filtration membranes having a selective layer that comprises the composition exhibit useful anti-fouling and/or salt rejection characteristics.
摘要翻译：共聚物包含共价连接到桥连基团的两个或多个聚（甲基）丙烯酸酯主链的交联的聚（甲基）丙烯酸酯，所述主链包含i）各自的第一重复单元，每个第一重复单元包含第一侧链酯部分，其包含亲水聚（环氧烷）链段，ii）各自的第二重复单元，每个第二重复单元包含通过选自氨基甲酸酯基团，脲基团和硫代氨基甲酸酯基团的连接基团与桥连基团直接连接的第二侧链酯部分，和iii）各自的第三重复单元，其各自包含不直接连接到任何桥连基团的疏水侧链部分。具有包含该组合物的选择层的复合过滤膜表现出有用的防污和/或拒盐特性。

3. 发明授权

US08709536B2 Composite filtration membranes and methods of preparation thereof 有权
标题翻译：复合过滤膜及其制备方法
公开(公告)号：US08709536B2
公开(公告)日：2014-04-29
申请号：US12873376
申请日：2010-09-01
申请人： Young-Hye Na , Alshakim Nelson , Ratnam Sooriyakumaran , Ankit Vora
发明人： Young-Hye Na , Alshakim Nelson , Ratnam Sooriyakumaran , Ankit Vora
IPC分类号： B05D5/00 , B29C65/00 , B01D67/00 , B01D29/00 , B01D39/00
CPC分类号： B01D71/56 , B01D69/125 , B01D71/40 , B01D71/44 , B01D71/68 , B01D2325/48
摘要： A method comprises disposing, on a porous support membrane, an aqueous mixture comprising a crosslinkable polymer comprising a poly(meth)acrylate and/or poly(meth)acrylamide backbone, thereby forming an initial film layer, wherein the crosslinkable polymer comprises a side chain nucleophilic amine group capable of interfacially reacting with a multi-functional acid halide crosslinking agent to form a crosslinked polymer; contacting the initial film layer with a mixture comprising i) the multi-functional acid halide crosslinking agent, ii) an optional accelerator, and iii) an organic solvent, the organic solvent being a non-solvent for the crosslinkable polymer; and allowing the crosslinkable polymer to interfacially react with the crosslinking agent, thereby forming a composite filtration membrane comprising an anti-fouling selective layer comprising the crosslinked polymer.
摘要翻译：一种方法包括在多孔支撑膜上设置含有包含聚（甲基）丙烯酸酯和/或聚（甲基）丙烯酰胺主链的可交联聚合物的含水混合物，由此形成初始膜层，其中可交联聚合物包含侧链能够与多功能酰卤交联剂进行界面反应以形成交联聚合物的亲核胺基团; 使初始膜层与包含i）多功能酰卤交联剂，ii）任选的促进剂和iii）有机溶剂的混合物接触，所述有机溶剂是用于可交联聚合物的非溶剂; 并且允许可交联聚合物与交联剂界面反应，从而形成包含含有交联聚合物的防污选择层的复合过滤膜。

4. 发明授权

US08470516B2 Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles 失效
标题翻译：通过使用化学扩增的电子束光刻形成浮雕图案的方法和衍生制品
公开(公告)号：US08470516B2
公开(公告)日：2013-06-25
申请号：US12542821
申请日：2009-08-18
申请人： Robert D. Allen , Luisa Bozano , Phillip Brock , Qinghuang Lin , Alshakim Nelson , Ratnam Sooriyakumaran
发明人： Robert D. Allen , Luisa Bozano , Phillip Brock , Qinghuang Lin , Alshakim Nelson , Ratnam Sooriyakumaran
IPC分类号： G03F7/00 , G03F7/26
CPC分类号： G03F7/038 , G03F7/0757 , G03F7/2059 , G03F7/40
摘要： A method of generating a relief pattern comprises disposing a resist composition on a substrate to form a film, the resist composition comprising a first silsesquioxane polymer of the formula (1): a second silsesquioxane polymer of the formula (2): and a photosensitive acid generator; patternwise exposing the film by e-beam lithography; heating the exposed film to effect crosslinking of the first polymer and second polymer in the exposed area; and developing the exposed film to form a negative relief pattern.
摘要翻译：产生浮雕图案的方法包括将抗蚀剂组合物设置在基底上以形成膜，抗蚀剂组合物包含式（1）的第一倍半硅氧烷聚合物：式（2）的第二倍半硅氧烷聚合物：和光敏酸发电机; 通过电子束光刻对图案进行图案曝光; 加热暴露的膜以在暴露的区域中实现第一聚合物和第二聚合物的交联; 并将曝光的胶片显影形成负浮雕图案。

5. 发明授权

US08168366B2 Low activation energy photoresist composition and process for its use 有权
标题翻译：低活化能光刻胶组合物及其使用方法
公开(公告)号：US08168366B2
公开(公告)日：2012-05-01
申请号：US12253072
申请日：2008-10-16
申请人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D Truong
发明人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D Truong
IPC分类号： G03F7/004 , G03F7/30 , C08F24/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/60 , G03F7/0046 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.
摘要翻译：本发明涉及一种辐射敏感光刻胶组合物。组合物包含包含至少两种单体的聚合物。第一单体具有酸可裂解的叔酯基。第二单体是酸性单体。聚合物的酸可裂解酯基具有惊人的低活化能，这导致光刻工艺中抗蚀剂图像的改善。

6. 发明申请

US20120048798A1 COMPOSITE FILTRATION MEMBRANES AND METHODS OF PREPARATION THEREOF 有权
标题翻译：复合过滤膜及其制备方法
公开(公告)号：US20120048798A1
公开(公告)日：2012-03-01
申请号：US12873361
申请日：2010-09-01
申请人： Joy Cheng , Ratnam Sooriyakumaran , Ankit Vora
发明人： Joy Cheng , Ratnam Sooriyakumaran , Ankit Vora
IPC分类号： B01D69/12 , B05D5/00 , B05D3/02 , C08F20/10
CPC分类号： B01D71/40 , B01D2325/48 , C08F8/00 , C08F220/14 , C08F220/20 , C08F220/28 , C08F2810/20
摘要： A composition comprises a crosslinked poly(meth)acrylate comprising two or more poly(meth)acrylate backbones covalently linked to a bridging group, the backbones comprising i) respective first repeat units, each of which comprises a first side chain ester moiety comprising a hydrophilic poly(alkylene oxide) chain segment, ii) respective second repeat units, each of which comprises a second side chain ester moiety directly linked to the bridging group through a linking group selected from the group consisting of carbamate groups, urea groups, and thiocarbamate groups, and iii) respective third repeat units, each of which comprises a hydrophobic side chain moiety not directly linked to any bridging group. Composite filtration membranes having a selective layer that comprises the composition exhibit useful anti-fouling and/or salt rejection characteristics.
摘要翻译：共聚物包含共价连接到桥连基团的两个或多个聚（甲基）丙烯酸酯主链的交联的聚（甲基）丙烯酸酯，所述主链包含i）各自的第一重复单元，每个第一重复单元包含第一侧链酯部分，其包含亲水聚（环氧烷）链段，ii）各自的第二重复单元，每个第二重复单元包含通过选自氨基甲酸酯基团，脲基团和硫代氨基甲酸酯基团的连接基团与桥连基团直接连接的第二侧链酯部分，和iii）各自的第三重复单元，其各自包含不直接连接到任何桥连基团的疏水侧链部分。具有包含该组合物的选择层的复合过滤膜表现出有用的防污和/或拒盐特性。

7. 发明授权

US08029971B2 Photopatternable dielectric materials for BEOL applications and methods for use 有权
标题翻译：用于BEOL应用的光图案介电材料和使用方法
公开(公告)号：US08029971B2
公开(公告)日：2011-10-04
申请号：US12047435
申请日：2008-03-13
申请人： Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Ratnam Sooriyakumaran
发明人： Robert D. Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert D. Miller , Alshakim Nelson , Ratnam Sooriyakumaran
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/40 , G03F7/38
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0046 , G03F7/40 , Y10S430/106 , Y10S430/115 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Compositions, a method, and a photopatternable blend. The compositions include a blend of a first and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a substituted silsesquioxane polymer. The second polymer is configured to undergo chemical crosslinking with the first polymer, the second polymer, or a combination thereof, upon exposure to light, thermal energy, or a combination thereof. The compositions include a photosensitive acid generator. The method includes forming a film. The film is patternwise imaged, and at least one region is exposed to radiation. After the imaging, the film is baked, wherein at least one exposed region is rendered substantially soluble. After the baking, the film is developed, wherein a relief pattern remains. The relief pattern is exposed to radiation. The relief pattern is baked. The relief pattern is cured. A chemically amplified positive-tone photopatternable blend is also described.
摘要翻译：组合，一种方法和一种光图案化混合物。组合物包括第一和第二聚合物的共混物。第一聚合物是取代的倍半硅氧烷共聚物。第二聚合物是取代的倍半硅氧烷聚合物。第二聚合物被配置为在暴露于光，热能或其组合时与第一聚合物，第二聚合物或其组合进行化学交联。组合物包括光敏酸产生剂。该方法包括形成膜。膜被图案化成像，并且至少一个区域暴露于辐射。在成像之后，烘烤该膜，其中至少一个曝光区域呈现基本上可溶的。烘烤后，显影膜，其中保留有浮雕图案。浮雕图案暴露于辐射。浮雕图案被烘烤。浮雕图案被修复。还描述了化学放大的正色调可光图案化混合物。

8. 发明授权

US08026293B2 Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials 有权
标题翻译：基于多面体低聚倍半硅氧烷的压印材料和使用多面体低聚倍半硅氧烷的压印材料的压印工艺
公开(公告)号：US08026293B2
公开(公告)日：2011-09-27
申请号：US12053893
申请日：2008-03-24
申请人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Robert David Allen , Richard Anthony DiPietro , Geraud Jean-Michel Dubois , Mark Whitney Hart , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： C08F283/12
CPC分类号： B05D3/067 , C09D183/04 , C09D183/06 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/311 , H01L21/3122 , H01L21/31695 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , H05K3/1258
摘要： A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.
摘要翻译：通过压印基于倍半硅氧烷的可聚合组合物形成低介电对比度结构的方法。所述印记组合物包括：一个或多个多面体倍半硅氧烷低聚物，其各自具有一个或多个可聚合基团，其中所述一个或多个可聚合基团中的每一个与所述一个或多个多面体倍半硅氧烷低聚物的不同硅原子结合; 和一种或多种可聚合稀释剂，所述稀释剂占组合物的至少50重量％。

9. 发明申请

US20110136928A1 POLY-OXYCARBOSILANE COMPOSITIONS FOR USE IN IMPRINT LITHOGRAPHY 有权
标题翻译：聚氧化亚锡组合物用于印刷胶版印刷
公开(公告)号：US20110136928A1
公开(公告)日：2011-06-09
申请号：US13026168
申请日：2011-02-11
申请人： Richard Anthony Dipietro , Geraud Jean-Michel Dubois , Robert Dennis Miller , Ratnam Sooriyakumaran
发明人： Richard Anthony Dipietro , Geraud Jean-Michel Dubois , Robert Dennis Miller , Ratnam Sooriyakumaran
IPC分类号： C08J3/28 , C08L83/16
CPC分类号： G03F7/0757 , B82Y10/00 , B82Y40/00 , C08G77/50 , C09D183/14 , G03F7/0002 , H01L21/76807 , H01L21/76817 , H01L21/7682 , H01L2221/1047
摘要： The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.
摘要翻译：本发明涉及包含聚 - 氧碳硅烷的组合物以及在步骤和闪光压印光刻中使用该组合物的方法。压印组合物包含聚氧碳硅烷聚合物，硅烷醇，反应引发剂和任选的孔产生剂。

10. 发明授权

US07910290B2 Photoresist topcoat for a photolithographic process 有权
标题翻译：光刻面漆，用于光刻工艺
公开(公告)号：US07910290B2
公开(公告)日：2011-03-22
申请号：US12128129
申请日：2008-05-28
申请人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
发明人： Robert David Allen , Ratnam Sooriyakumaran , Linda Karin Sundberg
IPC分类号： G03F7/20 , G03F7/30 , G03F7/38 , G03F7/40 , G03F7/11
CPC分类号： C08G77/04 , C08G77/045 , G03F7/0752 , G03F7/11 , G03F7/2041
摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
摘要翻译：使用面漆组合物形成图像的方法。提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。官能团包括碱水溶性部分。官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

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