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1. 发明申请

US20060109448A1 Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle 有权
公开(公告)号：US20060109448A1
公开(公告)日：2006-05-25
申请号：US10995077
申请日：2004-11-23
申请人： Richard Bruls , Joseph Laganza , Tammo Uitterdijk , Herman Boom
发明人： Richard Bruls , Joseph Laganza , Tammo Uitterdijk , Herman Boom
IPC分类号： G03B27/62
CPC分类号： G03F1/64 , Y10T156/10
摘要： A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding the pellicle and the reticle are held in the same way and in the same orientation as during control of the pellicle and use of the reticle in the lithographic apparatus, respectively.

2. 发明授权

US07278817B2 Method for transferring and loading a reticle 有权
标题翻译：传送和加载掩模版的方法
公开(公告)号：US07278817B2
公开(公告)日：2007-10-09
申请号：US11337439
申请日：2006-01-24
申请人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
发明人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
IPC分类号： B66C1/00
CPC分类号： G03F9/7011 , G03F7/70741
摘要： An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.
摘要翻译：将掩模版传送和加载到接收站（例如，掩模版曝光阶段）上的装置和方法。首先从存储设备中取出掩模版，其末端执行器具有联接到安装板的标线板。安装板将末端执行器连接到机械手臂。掩模版在离线对准站的平面外位置对齐。对准方式符合接收站的对准要求。在离线对准站经过对准后将掩模版安装在标线板上。然后将掩模版从离线对准站传送到接收站，同时保持在离线对准站处的先前对准。该装置进一步提供所安装的掩模版的刚性，以确保符合接收站处的对准要求。

3. 发明授权

US06847434B2 Method and apparatus for a pellicle frame with porous filtering inserts 失效
标题翻译：具有多孔过滤插入物的防护薄膜框架的方法和装置
公开(公告)号：US06847434B2
公开(公告)日：2005-01-25
申请号：US10314419
申请日：2002-12-09
申请人： Joseph Laganza , Jorge Ivaldi , Florence Luo
发明人： Joseph Laganza , Jorge Ivaldi , Florence Luo
IPC分类号： G03F1/14 , G03F7/20 , G03B27/62 , G03B27/42 , G03B27/52 , G03F9/00
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
摘要翻译：一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。掩模版和防护薄膜之间的框架保持被清除的光学间隙。框架限定第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。框架的至少一个边缘具有穿过其中的开口。多孔烧结材料通过框架的边缘填充每个开口。

4. 发明授权

US07173689B2 Method and system for a pellicle frame with heightened bonding surfaces 失效
标题翻译：防护薄膜组件框架的方法和系统具有更高的粘结面
公开(公告)号：US07173689B2
公开(公告)日：2007-02-06
申请号：US10986077
申请日：2004-11-12
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B27/32 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

5. 发明授权

US07004715B2 Apparatus for transferring and loading a reticle with a robotic reticle end-effector 失效
标题翻译：用于用机器人掩模版末端执行器传送和加载掩模版的装置
公开(公告)号：US07004715B2
公开(公告)日：2006-02-28
申请号：US10040375
申请日：2002-01-09
申请人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
发明人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
IPC分类号： B66C1/00
CPC分类号： G03F9/7011 , G03F7/70741
摘要： An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.
摘要翻译：将掩模版传送和加载到接收站（例如，掩模版曝光阶段）上的装置和方法。首先从存储设备取出掩模版，其末端执行器具有联接到安装板的标线板。安装板将末端执行器连接到机械手臂。掩模版在离线对准站的平面外位置对齐。对准方式符合接收站的对准要求。在离线对准站经过对准后将掩模版安装在标线板上。然后将掩模版从离线对准站传送到接收站，同时保持在离线对准站处的先前对准。该装置进一步提供所安装的掩模版的刚性，以确保符合接收站处的对准要求。

6. 发明申请

US20060182605A1 Method for transferring and loading a reticle 有权
标题翻译：传送和加载掩模版的方法
公开(公告)号：US20060182605A1
公开(公告)日：2006-08-17
申请号：US11337439
申请日：2006-01-24
申请人： Glenn Friedman , Peter Kochersperger , Joseph Laganza
发明人： Glenn Friedman , Peter Kochersperger , Joseph Laganza
IPC分类号： B66C1/00
CPC分类号： G03F9/7011 , G03F7/70741
摘要： An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.
摘要翻译：将掩模版传送和加载到接收站（例如，掩模版曝光阶段）上的装置和方法。首先从存储设备中取出掩模版，其末端执行器具有联接到安装板的标线板。安装板将末端执行器连接到机械手臂。掩模版在离线对准站的平面外位置对齐。对准方式符合接收站的对准要求。在离线对准站经过对准后将掩模版安装在标线板上。然后将掩模版从离线对准站传送到接收站，同时保持在离线对准站处的先前对准。该装置进一步提供所安装的掩模版的刚性，以确保符合接收站处的对准要求。

7. 发明申请

US20050151955A1 Method and apparatus for a reticle with purged pellicle-to-reticle gap 审中-公开
标题翻译：具有被清除的防护薄膜到标线间隙的掩模版的方法和装置
公开(公告)号：US20050151955A1
公开(公告)日：2005-07-14
申请号：US11034053
申请日：2005-01-13
申请人： Joseph Laganza , Jorge Ivaldi , Florence Luo
发明人： Joseph Laganza , Jorge Ivaldi , Florence Luo
IPC分类号： G03F1/14 , G03F7/20 , G03B27/62
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
摘要翻译：一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。掩模版和防护薄膜之间的框架保持被清除的光学间隙。框架限定第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。框架的至少一个边缘具有穿过其中的开口。多孔烧结材料通过框架的边缘填充每个开口。

8. 发明授权

US5727685A Reticle container with corner holding 失效
标题翻译：具有角落保持的掩模容器
公开(公告)号：US5727685A
公开(公告)日：1998-03-17
申请号：US686085
申请日：1996-07-24
申请人： Joseph Laganza , Hoon-Yeng Yap , Teodorico A. Cruz , Erik Magnussen , Craig S. Dunning
发明人： Joseph Laganza , Hoon-Yeng Yap , Teodorico A. Cruz , Erik Magnussen , Craig S. Dunning
IPC分类号： B65D85/86 , G03F1/66 , G03F7/20 , H01L21/027 , H01L21/673 , E65D73/02
CPC分类号： H01L21/67353 , G03F1/66 , G03F7/70691 , H01L21/67359 , H01L21/67369 , H01L21/67373 , H01L21/67383
摘要： A cassette or box for containing and holding a planar substrate such as a reticle having a clamp bar coupled to corner supports by a spring or flexure and a linkage. A clamp bar is pivotally attached to bottom corner supports and a spring or flexure and linked to a top corner support, such that movement of the load bar causes the corner supports to pivot away from a reticle being held only at the corners. An elevation bar is also used to preposition the reticle in one direction. The present invention greatly facilitates the positioning and handling of a reticle as used in photolithography to manufacture semiconductor devices. Additionally, the present invention greatly reduces particulate contamination.
摘要翻译：用于容纳和保持平面基板（例如光罩）的盒或盒，其具有通过弹簧或挠曲件连接到角支撑件上的夹紧杆和连杆。夹杆可枢转地附接到底角支撑件和弹簧或挠曲件并且连接到顶角支撑件，使得负载杆的移动使角支撑件远离仅保持在拐角处的掩模版枢转。升降条也用于在一个方向上插入光罩。本发明极大地方便了光刻技术中用于制造半导体器件的掩模版的定位和处理。另外，本发明大大减少了颗粒污染。

9. 发明授权

US07339653B2 System for a pellicle frame with heightened bonding surfaces 失效
标题翻译：防护薄膜组件系统，具有更高的粘结面
公开(公告)号：US07339653B2
公开(公告)日：2008-03-04
申请号：US11671647
申请日：2007-02-06
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B27/62 , G03B27/32 , G03B27/58
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

10. 发明申请

US20070127000A1 Method and System for a Pellicle Frame with Heightened Bonding Surfaces 失效
标题翻译：具有更高粘合面的防护薄膜框架的方法和系统
公开(公告)号：US20070127000A1
公开(公告)日：2007-06-07
申请号：US11671647
申请日：2007-02-06
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B27/52
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

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