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1. 发明授权

US06847434B2 Method and apparatus for a pellicle frame with porous filtering inserts 失效
标题翻译：具有多孔过滤插入物的防护薄膜框架的方法和装置
公开(公告)号：US06847434B2
公开(公告)日：2005-01-25
申请号：US10314419
申请日：2002-12-09
申请人： Joseph Laganza , Jorge Ivaldi , Florence Luo
发明人： Joseph Laganza , Jorge Ivaldi , Florence Luo
IPC分类号： G03F1/14 , G03F7/20 , G03B27/62 , G03B27/42 , G03B27/52 , G03F9/00
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
摘要翻译：一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。掩模版和防护薄膜之间的框架保持被清除的光学间隙。框架限定第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。框架的至少一个边缘具有穿过其中的开口。多孔烧结材料通过框架的边缘填充每个开口。

2. 发明申请

US20050151955A1 Method and apparatus for a reticle with purged pellicle-to-reticle gap 审中-公开
标题翻译：具有被清除的防护薄膜到标线间隙的掩模版的方法和装置
公开(公告)号：US20050151955A1
公开(公告)日：2005-07-14
申请号：US11034053
申请日：2005-01-13
申请人： Joseph Laganza , Jorge Ivaldi , Florence Luo
发明人： Joseph Laganza , Jorge Ivaldi , Florence Luo
IPC分类号： G03F1/14 , G03F7/20 , G03B27/62
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
摘要翻译：一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。掩模版和防护薄膜之间的框架保持被清除的光学间隙。框架限定第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。框架的至少一个边缘具有穿过其中的开口。多孔烧结材料通过框架的边缘填充每个开口。

3. 发明授权

US07619718B2 Method and system for active purging of pellicle volumes 失效
标题翻译：主要吹扫防护薄膜的方法和系统
公开(公告)号：US07619718B2
公开(公告)日：2009-11-17
申请号：US10679324
申请日：2003-10-07
申请人： Florence Luo , Herman Vogel , George H Harrold , Nicolaas ten Kate
发明人： Florence Luo , Herman Vogel , George H Harrold , Nicolaas ten Kate
IPC分类号： G03B27/62
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： The present invention provides methods and systems for fast purging of pellicle volumes. A purge device has a base which is enclosed in a controlled environment filled with purge gas. The base has a cavity formed on a surface therein. The cavity receives a reticle-pellicle assembly including a pellicle surface and an enclosed pellicle volume. A first region within the cavity can be formed to hold purging gas at a high pressure. A gap region is formed below the pellicle within the cavity. A displacement force on the pellicle due to a pressure difference between purging gas in the enclosed volume and purging gas in the gap region is kept within a tolerance range of the pellicle. According to further embodiments, a purge device is provided that includes a flow barrier (e.g., non-contacting and/or contacting barriers). A pressure balancing plate and/or flow resistant plates are provided in a purge device.
摘要翻译：本发明提供用于快速吹扫防护薄膜体积的方法和系统。净化装置具有封闭在充满吹扫气体的受控环境中的基部。底座具有形成在其中的表面上的空腔。空腔容纳包括防护薄膜表面和封闭防护薄膜体积的掩模版防护薄膜组件。可以形成腔内的第一区域以保持高压下的清洗气体。间隙区域形成在空腔内的防护薄膜下方。由于封闭容积中的吹扫气体与间隙区域中的净化气体之间的压力差，防护薄膜上的位移力保持在防护薄膜的容许范围内。根据另外的实施例，提供了包括流动屏障（例如，非接触和/或接触屏障）的清洗装置。在净化装置中设置压力平衡板和/或防流动板。

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