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1. 发明申请

US20060182605A1 Method for transferring and loading a reticle 有权
标题翻译：传送和加载掩模版的方法
公开(公告)号：US20060182605A1
公开(公告)日：2006-08-17
申请号：US11337439
申请日：2006-01-24
申请人： Glenn Friedman , Peter Kochersperger , Joseph Laganza
发明人： Glenn Friedman , Peter Kochersperger , Joseph Laganza
IPC分类号： B66C1/00
CPC分类号： G03F9/7011 , G03F7/70741
摘要： An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.
摘要翻译：将掩模版传送和加载到接收站（例如，掩模版曝光阶段）上的装置和方法。首先从存储设备中取出掩模版，其末端执行器具有联接到安装板的标线板。安装板将末端执行器连接到机械手臂。掩模版在离线对准站的平面外位置对齐。对准方式符合接收站的对准要求。在离线对准站经过对准后将掩模版安装在标线板上。然后将掩模版从离线对准站传送到接收站，同时保持在离线对准站处的先前对准。该装置进一步提供所安装的掩模版的刚性，以确保符合接收站处的对准要求。

2. 发明授权

US07004715B2 Apparatus for transferring and loading a reticle with a robotic reticle end-effector 失效
标题翻译：用于用机器人掩模版末端执行器传送和加载掩模版的装置
公开(公告)号：US07004715B2
公开(公告)日：2006-02-28
申请号：US10040375
申请日：2002-01-09
申请人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
发明人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
IPC分类号： B66C1/00
CPC分类号： G03F9/7011 , G03F7/70741
摘要： An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.
摘要翻译：将掩模版传送和加载到接收站（例如，掩模版曝光阶段）上的装置和方法。首先从存储设备取出掩模版，其末端执行器具有联接到安装板的标线板。安装板将末端执行器连接到机械手臂。掩模版在离线对准站的平面外位置对齐。对准方式符合接收站的对准要求。在离线对准站经过对准后将掩模版安装在标线板上。然后将掩模版从离线对准站传送到接收站，同时保持在离线对准站处的先前对准。该装置进一步提供所安装的掩模版的刚性，以确保符合接收站处的对准要求。

3. 发明授权

US07278817B2 Method for transferring and loading a reticle 有权
标题翻译：传送和加载掩模版的方法
公开(公告)号：US07278817B2
公开(公告)日：2007-10-09
申请号：US11337439
申请日：2006-01-24
申请人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
发明人： Glenn M. Friedman , Peter Kochersperger , Joseph Laganza
IPC分类号： B66C1/00
CPC分类号： G03F9/7011 , G03F7/70741
摘要： An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.
摘要翻译：将掩模版传送和加载到接收站（例如，掩模版曝光阶段）上的装置和方法。首先从存储设备中取出掩模版，其末端执行器具有联接到安装板的标线板。安装板将末端执行器连接到机械手臂。掩模版在离线对准站的平面外位置对齐。对准方式符合接收站的对准要求。在离线对准站经过对准后将掩模版安装在标线板上。然后将掩模版从离线对准站传送到接收站，同时保持在离线对准站处的先前对准。该装置进一步提供所安装的掩模版的刚性，以确保符合接收站处的对准要求。

4. 发明授权

US07786607B2 Overlay correction by reducing wafer slipping after alignment 有权
标题翻译：在对准后减少晶片滑动来进行叠加校正
公开(公告)号：US07786607B2
公开(公告)日：2010-08-31
申请号：US10780877
申请日：2004-02-19
申请人： Peter Kochersperger
发明人： Peter Kochersperger
IPC分类号： H01L23/544
CPC分类号： H01L21/67259 , G03F7/707 , G03F7/70875 , H01L21/67092 , H01L21/67103 , H01L21/682
摘要： A method and apparatus for correcting overlay errors in a lithography system. During lithographic exposure, features being exposed on the wafer need to overlay existing features on the wafer. Overlay is a critical performance parameter of lithography tools. The wafer is locally heated during exposure. Thermal expansion causes stress between the wafer and the wafer table, which will cause the wafer to slip if it exceeds the local frictional force. To increase the amount of expansion allowed before slipping occurs, the wafer chuck is uniformly expanded after the wafer has been loaded. This creates an initial stress between the wafer and the wafer table. As the wafer expands due to heating during exposure, the expansion first acts to relieve the initial stress before causing an opposite stress from thermal expansion. The wafer may be also be heated prior to attachment to the wafer chuck, creating the initial stress as the wafer cools.
摘要翻译：一种用于校正光刻系统中的重叠误差的方法和装置。在光刻曝光期间，暴露在晶片上的特征需要覆盖晶片上的现有特征。叠加是光刻工具的关键性能参数。曝光期间晶片局部加热。热膨胀导致晶片和晶片台之间的应力，如果晶片超过局部摩擦力，晶片就会导致晶片滑动。为了增加在滑动发生之前允许的膨胀量，晶片卡盘在晶片装载之后均匀地膨胀。这在晶片和晶片台之间产生初始应力。当晶片在曝光期间由于加热而膨胀时，膨胀首先起作用以在引起来自热膨胀的相反应力之前减轻初始应力。晶片也可以在连接到晶片卡盘之前被加热，当晶片冷却时产生初始应力。

5. 发明授权

US07414701B2 Method and systems for total focus deviation adjustments on maskless lithography systems 有权
标题翻译：无掩模光刻系统的全焦点偏差调整方法和系统
公开(公告)号：US07414701B2
公开(公告)日：2008-08-19
申请号：US10677242
申请日：2003-10-03
申请人： Peter Kochersperger
发明人： Peter Kochersperger
IPC分类号： G03B27/52 , G02B26/00
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： A method and system for correcting optical aberrations in a maskless lithography system. Adjusters move individual spatial light modulators (SLMs) in an SLM array so that the surface of the SLM array deviates from a flat plane. The deviation compensates for aberrations in the lithography system, such as total focus deviation. In an embodiment, an individual SLM can be tilted, bent, and/or have its elevation changed. Multiple SLMs in the SLM array can move in different ways depending on the compensation to be made. The adjusters can be either actively or passively controlled. The method may be performed only during initial setup of the maskless lithography system, periodically as needed for maintenance of the lithography system, or prior to each exposure in the lithography system.
摘要翻译：一种用于校正无掩模光刻系统中的光学像差的方法和系统。调整器将单个空间光调制器（SLM）移动到SLM阵列中，以使SLM阵列的表面偏离平面。偏差补偿光刻系统中的像差，如总焦距偏差。在一个实施例中，单个SLM可以倾斜，弯曲和/或其高度改变。根据要进行的补偿，SLM阵列中的多个SLM可以以不同的方式移动。调节器可以是主动的或被动的控制。该方法可以仅在无掩模光刻系统的初始设置期间周期性地执行以维持光刻系统的需要，或者在光刻系统中的每次曝光之前执行。

6. 发明申请

US20070153348A1 Optical element damping systems 有权
标题翻译：光学元件阻尼系统
公开(公告)号：US20070153348A1
公开(公告)日：2007-07-05
申请号：US11634931
申请日：2006-12-07
申请人： Stephen Roux , Peter Kochersperger , Justin Kreuzer
发明人： Stephen Roux , Peter Kochersperger , Justin Kreuzer
IPC分类号： G02B26/08
CPC分类号： G02B7/00 , G03F7/70825 , G03F7/709
摘要： The present invention is directed to optical element damping systems. In particular, an eddy current damper is disclosed. The eddy current damper includes a rod, a series of conducting plates coupled to the rod, and layers of magnets. The alternating layers have alternating magnetic fields. When an optical element moves, the optical element will exert a force on the rod. The rod causes the conducting plates to move relative to the alternating layers of magnets to generate eddy currents within each of the conducting plates, such that the eddy currents damp the motion of an optical element. In an alternative embodiment, an eddy current damper motion amplifier is used to provide additional mechanical advantage that significantly increases the damping provided by the eddy current damper. Eddy current dampers are provided within conventional scanning lithography devices and optical maskless lithography devices to improve performance by stabilizing optical element motion.
摘要翻译：本发明涉及光学元件阻尼系统。特别地，公开了涡流阻尼器。涡流阻尼器包括杆，连接到杆的一系列导电板和磁体层。交替层具有交变磁场。当光学元件移动时，光学元件将在杆上施加力。杆导致导电板相对于交替的磁体层移动，以在每个导电板内产生涡电流，使得涡流抑制光学元件的运动。在替代实施例中，使用涡流阻尼器运动放大器提供额外的机械优点，显着增加由涡流阻尼器提供的阻尼。在常规扫描光刻设备和光学无掩模光刻设备中提供涡流阻尼器，以通过稳定光学元件运动来提高性能。

7. 发明申请

US20060272394A1 High resolution gas gauge proximity sensor 有权
标题翻译：高分辨率气量计接近传感器
公开(公告)号：US20060272394A1
公开(公告)日：2006-12-07
申请号：US11396908
申请日：2006-04-04
申请人： Frederick Carter , Peter Kochersperger
发明人： Frederick Carter , Peter Kochersperger
IPC分类号： G01B13/08
CPC分类号： G01L19/0092 , G01B13/02 , G03F9/7057
摘要： In a gas gauge, effects due to changes in the local environment are reduced by causing a measurement nozzle and a reference nozzle to react as if they were co-located, or located at approximately the same position. This is achieved by venting the reference nozzle in very close proximity to the measurement nozzle. A reference chamber surrounding the reference plate and reference nozzle is vented at approximately the same location as the measurement nozzle. In an embodiment for use in a vacuum environment, the measurement nozzle is surrounded with an annular ring. The measurement annular ring is connected to an annular ring around the reference nozzle, which acts to co-locate the reference nozzle and the measurement nozzle. To avoid choked flow, another annular ring or rings may be placed around the measurement annular ring.
摘要翻译：在气量计中，通过使测量喷嘴和参考喷嘴如同它们位于同一位置或位于大致相同的位置而反应而导致由于局部环境变化引起的影响。这是通过使参考喷嘴非常靠近测量喷嘴进行排气来实现的。围绕参考板和参考喷嘴的参考室在与测量喷嘴大致相同的位置处排出。在用于真空环境的实施例中，测量喷嘴被环形环包围。测量环形环连接到围绕参考喷嘴的环形圈，其用于使参考喷嘴和测量喷嘴共同定位。为了避免窒息的流动，可以在测量环形圈周围放置另一个环形环。

8. 发明申请

US20070186621A1 Pressure sensor 有权
标题翻译：压力传感器
公开(公告)号：US20070186621A1
公开(公告)日：2007-08-16
申请号：US11646612
申请日：2006-12-28
申请人： Peter Kochersperger , Joseph Lyons , James Walsh , Rajan Mali
发明人： Peter Kochersperger , Joseph Lyons , James Walsh , Rajan Mali
IPC分类号： G01B13/08
CPC分类号： G01B13/12
摘要： A choked-flow orifice gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the gas gauge proximity sensor of the present invention replaces the use of a mass flow controller with a choked flow orifice. The use of a choked flow orifice provides for reduced equipment cost and improved system reliability. A gas supply forces gas into the proximity sensor. The gas is forced through the choked flow orifice to achieve sonic conditions at which time the mass flow rate becomes largely independent of pressure variations. The flow of gas proceeds from the choked flow orifice into a sensor channel system. A mass flow sensor within the sensor channel system monitors flow rates to detect measurement standoffs that can be used to initiate a control action.
摘要翻译：公开了一种用于感测参考表面间隔和测量表面间隔之间的差异的扼流流量孔式气体计量计接近传感器。与现有的接近传感器不同，本发明的气体计量接近传感器替代了具有扼流流量孔口的质量流量控制器的使用。使用扼流流量孔口可以降低设备成本并提高系统的可靠性。气体供应迫使气体进入接近传感器。气体被迫通过扼流流量孔，以实现声音条件，此时质量流量变得很大程度上与压力变化无关。气流从阻塞流动孔进入传感器通道系统。传感器通道系统内的质量流量传感器监测流量，以检测可用于启动控制动作的测量间隔。

9. 发明授权

US4778332A Wafer flip apparatus 失效
标题翻译：晶圆翻转装置
公开(公告)号：US4778332A
公开(公告)日：1988-10-18
申请号：US12537
申请日：1987-02-09
申请人： William Byers , Peter Kochersperger
发明人： William Byers , Peter Kochersperger
IPC分类号： H01L21/677 , B65G49/07 , B65H5/18 , H01L21/683 , B66C1/00
CPC分类号： H01L21/6838 , Y10S414/136 , Y10S414/141
摘要： Apparatus is disclosed for automatically transferring a semiconductor wafer between a horizontal and a vertical plane, beginning and ending in precisely located positions. A wafer support arm is carried by a transfer member which also includes a motor for rotating the support arm between a "start" position and an intermediate position in a horizontal plane. Another motor is provided for rotating the transfer member to position the support arm in a vertical plane. The wafer support arm is then returned to its original position relative to the transfer member, thus establishing a "finish" position in the vertical plane.

10. 发明授权

US4750857A Wafer cassette transfer mechanism 失效
标题翻译：晶圆盒传送机构
公开(公告)号：US4750857A
公开(公告)日：1988-06-14
申请号：US859586
申请日：1986-05-05
申请人： Peter Kochersperger
发明人： Peter Kochersperger
IPC分类号： B65G47/52 , H01L21/677 , B65G65/00
CPC分类号： H01L21/67781 , Y10S414/139 , Y10S414/14
摘要： A wafer cassette transfer mechanism is disclosed which transfers a wafer cassette from a transfer arm to an elevator. The elevator moves vertically, up or down, so as to move the wafer cassette to a second transfer arm. The second transfer arm can then move the wafer cassette to after processing equipment.

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