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1. 发明授权

US5380370A Method of cleaning reaction tube 失效
标题翻译：反应管清洗方法
公开(公告)号：US5380370A
公开(公告)日：1995-01-10
申请号：US54229
申请日：1993-04-30
申请人： Reiji Niino , Yoshiyuki Fujita , Hideki Lee , Yasuo Imamura , Toshiharu Nishimura , Yuuichi Mikata , Shinji Miyazaki , Takahiko Moriya , Katsuya Okumura
发明人： Reiji Niino , Yoshiyuki Fujita , Hideki Lee , Yasuo Imamura , Toshiharu Nishimura , Yuuichi Mikata , Shinji Miyazaki , Takahiko Moriya , Katsuya Okumura
IPC分类号： B08B9/032 , C23C16/24 , C23C16/40 , C23C16/44 , B08B7/00 , B08B9/00
CPC分类号： C23C16/24 , C23C16/405 , C23C16/4405 , C23C16/4412
摘要： Prior to formation of a polysilicon film on a wafer, a pre-coat film having a thickness of 1 .mu.m and consisting of polysilicon is formed on the inner wall surface of a reaction tube or the surface of a member incorporated in the reaction tube. A polysilicon film is formed on the wafer at a temperature of 450.degree. C. to 650.degree. C. A cleaning gas containing ClF.sub.3 having a concentration of 10 to 50 vol. % is supplied into the reaction tube at a flow rate to an area of an object be cleaned of 750 to 3,500 SCCM/m.sup.2 to remove a polysilicon film deposited on the inner wall surface of the reaction tube or the surface of the member incorporated in the reaction tube by etching using the ClF.sub.3. In this case, the cleaning gas is supplied while a temperature in the reaction tube is kept at a temperature of 450.degree. C. to 650.degree. C. and in a pressure condition set at the kept temperature such that an etching rate of a polysilicon film by the cleaning gas is higher than an etching rate of quartz constituting the reaction tube or the member incorporated in the reaction tube.
摘要翻译：在晶片上形成多晶硅膜之前，在反应管的内壁表面或装在反应管中的部件的表面上形成厚度为1μm，由多晶硅组成的预涂膜。在450℃〜650℃的温度下在晶片上形成多晶硅膜。含有浓度为10〜50体积％的ClF 3的清洗气体。以以750至3,500sccm / m 2的待清洁物体的面积的流量将反应管供给到反应管中以去除沉积在反应管的内壁表面上的多晶硅膜或者包含在反应管中的构件的表面反应管通过使用ClF3进行蚀刻。在这种情况下，在将反应管中的温度保持在450℃至650℃的温度下并在设定为保持的温度的压力条件下供给清洁气体，使得多晶硅膜的蚀刻速率清洗气体高于构成反应管或构成反应管的部件的石英的蚀刻速度。

2. 发明授权

US5637153A Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus 失效
标题翻译：热处理设备中反应管和排气管道系统的清洗方法
公开(公告)号：US5637153A
公开(公告)日：1997-06-10
申请号：US429159
申请日：1995-04-26
申请人： Reiji Niino , Yoshiyuki Fujita , Hideki Lee , Yasuo Imamura , Toshiharu Nishimura , Yuuichi Mikata , Shinji Miyazaki , Takahiko Moriya , Katsuya Okumura , Hitoshi Kato
发明人： Reiji Niino , Yoshiyuki Fujita , Hideki Lee , Yasuo Imamura , Toshiharu Nishimura , Yuuichi Mikata , Shinji Miyazaki , Takahiko Moriya , Katsuya Okumura , Hitoshi Kato
IPC分类号： C23C16/24 , C23C16/40 , C23C16/44 , B08B7/00 , B08B9/00
CPC分类号： C23C16/24 , C23C16/405 , C23C16/4405 , C23C16/4412
摘要： After a polysilicon film is formed on a wafer, a cleaning gas containing ClF.sub.3 at 10 to 50 vol % is supplied into a reaction tube and an exhaust pipe system at a flow rate of 3000 to 3500 SCCM, so as to remove a polysilicon-based film deposited on an inner wall surface of the reaction tube, the surface of a member incorporated in the reaction tube, and an inner wall surface of the exhaust pipe system while the film forming process, by etching using ClF.sub.3. The cleaning gas is supplied while the temperature in the reaction tube is maintained at 450.degree. C. or higher, and in a pressure condition set at the maintained temperature such that an etching rate of the polysilicon-based film by the cleaning gas is higher than an etching rate of silicon which is the material of the reaction tube or the member incorporated in the reaction tube.
摘要翻译：在晶片上形成多晶硅膜之后，将含有10〜50体积％的ClF 3的清洗气体以3000〜3500SCCM的流量供给反应管和排气管系，以除去多晶硅通过使用ClF 3的蚀刻，沉积在反应管的内壁表面上的薄膜，在反应管中结合的构件的表面和排气管系统的内壁表面。在将反应管中的温度保持在450℃以上，在设定为维持温度的压力条件下，通过清洗气体使多晶硅系膜的蚀刻速度高于作为反应管的材料或结合在反应管中的构件的硅的蚀刻速率。

3. 发明授权

US5500388A Heat treatment process for wafers 失效
标题翻译：晶圆热处理工艺
公开(公告)号：US5500388A
公开(公告)日：1996-03-19
申请号：US202457
申请日：1994-02-28
申请人： Reiji Niino , Tomoyuki Ohbu , Hiroaki Ikegawa , Ken Nakao , Yoshiyuki Fujita , Tsutomu Haraoka , Makoto Kobayashi , Naoya Kaneda , Hiroshi Kumada
发明人： Reiji Niino , Tomoyuki Ohbu , Hiroaki Ikegawa , Ken Nakao , Yoshiyuki Fujita , Tsutomu Haraoka , Makoto Kobayashi , Naoya Kaneda , Hiroshi Kumada
IPC分类号： C23C16/46 , H01L21/20 , H01L21/285
CPC分类号： C23C16/463 , C23C16/46 , H01L21/02381 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/0262 , H01L21/28512
摘要： In order to form a film on a surface of a semiconductor wafer, a multiplicity of wafers are individually mounted on ring-shaped mounts of a wafer boat, while the temperature within a reaction tube is set at, e.g., 400.degree. C. under a nitrogen gas atmosphere. After loading the wafer boat into the reaction tube, the temperature within the reaction tube is raised up to, e.g., 620.degree. C. at a rate of, e.g., 100.degree. C./min, and SiH.sub.4 gas is supplied onto the surface of a silicon substrate to form a polysilicon film. After film formation, air is forced to flow along the internal surface of the heating section to forcibly cool the interior of the reaction tube. In the case of forming a metal silicon film using a wafer having a silicon substrate and a metal film formed on the surface of the silicon substrate, the temperature within the reaction tube is set at, e.g. 100.degree. C. for loading the wafers. This suppresses the growth of a natural oxidation film and improves characteristics of a semiconductor device. The same principle may apply to an oxide film formation and an impurity dispersion.
摘要翻译：为了在半导体晶片的表面上形成薄膜，将多个晶片分别安装在晶片舟的环形安装件上，同时将反应管内的温度设定为例如400℃ 氮气气氛。在将晶片舟装载到反应管中之后，以例如100℃/ min的速率将反应管内的温度升高至例如620℃，并将SiH 4气体供应到硅衬底以形成多晶硅膜。成膜后，迫使空气沿加热部的内表面流动，强制冷却反应管的内部。在使用具有硅衬底和形成在硅衬底的表面上的金属膜的晶片形成金属硅膜的情况下，将反应管内的温度设定为例如 100℃，用于装载晶片。这抑制了天然氧化膜的生长，并提高了半导体器件的特性。相同的原理可能适用于氧化膜形成和杂质分散。

4. 发明授权

US07575431B2 Vertical heat processing apparatus and method for using the same 有权
标题翻译：立式热处理装置及其使用方法
公开(公告)号：US07575431B2
公开(公告)日：2009-08-18
申请号：US11822282
申请日：2007-07-03
申请人： Atsushi Endo , Yoshiyuki Fujita , Shinji Miyazaki
发明人： Atsushi Endo , Yoshiyuki Fujita , Shinji Miyazaki
IPC分类号： F27D1/00
CPC分类号： H01L21/67248 , F27B17/0025 , H01L21/67109 , H01L21/67115
摘要： A vertical heat processing apparatus for performing a heat process on a plurality of target substrates all together includes a vertical process container configured to accommodate the target substrates and having a transfer port at a bottom; a holder configured to support the target substrates at intervals in a vertical direction inside the process container; and a heater disposed around the process container, and configured to supply heat rays through a sidewall of the process container, so as to heat an interior of the process container. A thermal buffer member is disposed between the heater and a lower end side of the process container to surround the lower end side, and is configured to decrease transmissibility of the lower end side for heat rays between the heater and target substrates inside the process container.
摘要翻译：一种垂直加热装置，用于对多个目标基板进行热处理，所述垂直加热装置一起包括垂直处理容器，其构造成容纳所述目标基板并且在底部具有转移口; 保持器，被构造成在处理容器内沿垂直方向间隔地支撑目标基板; 以及加热器，其设置在所述处理容器的周围，并且被配置为通过所述处理容器的侧壁提供热射线，以便加热所述处理容器的内部。加热器和处理容器的下端侧之间设置有热缓冲部件，以包围下端侧，并且构造为降低加工器和加工容器内的目标基板之间的热线的下端侧的透射率。

5. 发明申请

US20080008566A1 Vertical heat processing apparatus and method for using the same 有权
标题翻译：立式热处理装置及其使用方法
公开(公告)号：US20080008566A1
公开(公告)日：2008-01-10
申请号：US11822282
申请日：2007-07-03
申请人： Atsushi Endo , Yoshiyuki Fujita , Shinji Miyazaki
发明人： Atsushi Endo , Yoshiyuki Fujita , Shinji Miyazaki
IPC分类号： H01L21/67 , F27D11/12
CPC分类号： H01L21/67248 , F27B17/0025 , H01L21/67109 , H01L21/67115
摘要： A vertical heat processing apparatus for performing a heat process on a plurality of target substrates all together includes a vertical process container configured to accommodate the target substrates and having a transfer port at a bottom; a holder configured to support the target substrates at intervals in a vertical direction inside the process container; and a heater disposed around the process container, and configured to supply heat rays through a sidewall of the process container, so as to heat an interior of the process container. A thermal buffer member is disposed between the heater and a lower end side of the process container to surround the lower end side, and is configured to decrease transmissibility of the lower end side for heat rays between the heater and target substrates inside the process container.
摘要翻译：一种垂直加热装置，用于对多个目标基板进行热处理，所述垂直加热装置一起包括垂直处理容器，其构造成容纳所述目标基板并且在底部具有转移口; 保持器，被构造成在处理容器内沿垂直方向间隔地支撑目标基板; 以及加热器，其设置在所述处理容器的周围，并且被配置为通过所述处理容器的侧壁提供热射线，以便加热所述处理容器的内部。加热器和处理容器的下端侧之间设置有热缓冲部件，以包围下端侧，并且构造为降低加工器和加工容器内的目标基板之间的热线的下端侧的透射率。

6. 发明授权

US06299201B1 Steering wheel 有权
公开(公告)号：US06299201B1
公开(公告)日：2001-10-09
申请号：US09659338
申请日：2000-09-12
申请人： Yoshiyuki Fujita
发明人： Yoshiyuki Fujita
IPC分类号： B60R2116
CPC分类号： B60R21/2037 , B60Q5/003 , B60R16/027 , B60R21/217 , Y10T74/20834
摘要： There is disclosed an automotive steering wheel W1 including a heavy air bag system 30. This air bag system 30 is held by a horn-switching mechanism 40. Although the air bag system 30 is heavy, the operator has a good feel for the operation of the horn-switching mechanism 40. This horn-switching mechanism 40 comprises a stationary member 41, a movable member 48, a switch main body 50, coil springs 55, and a jawed bolt 56. The switch main body 50 comprises a stationary contact 52 mounted on the stationary member 41 and a movable contact 54 mounted on the movable member 48. The coil springs 55 bias the movable member 48 upward. The jawed bolt 56 permits the movable member 48 to be moved toward the stationary member 41 and limits the distance of the movable member 48 from the stationary member 41. At least one of the coil springs 55 is located at a height substantially equal to the height of the resultant center of gravity G of all components biased upward by all the coil springs 55.

7. 发明授权

US6161863A Air bag device 有权
标题翻译：气囊装置
公开(公告)号：US6161863A
公开(公告)日：2000-12-19
申请号：US131508
申请日：1998-08-10
申请人： Yoshiyuki Fujita , Yohei Fukasawa
发明人： Yoshiyuki Fujita , Yohei Fukasawa
IPC分类号： B60Q5/00 , B60R16/02 , B60R16/027 , B60R21/20 , B60R21/203 , B60R21/217 , B60R21/16
CPC分类号： B60Q5/003 , B60R16/027 , B60R21/2037 , B60R21/217
摘要： An air bag device including a pad made of a synthetic resin and a bag holder consisting of metal. The pad includes a top wall that covers an air bag and includes extending doors, which are adapted to be broken when the air bag expands. The top wall also includes a unitary mounting wall extending downwardly from the outer peripheral edge of the top wall. The bag holder includes a bottom wall for holding the air bag and a side wall extending vertically from the outer peripheral edge of the bottom wall. The unitary mounting wall includes mounting holes extending horizontally in the inner side surface above the mounting holes. The side wall includes mounting holes extending therethrough to correspond to the mounting holes of the mounting wall and retaining pawls arranged at a location extending upwardly from the bottom wall. The retaining pawls are capable of being retained on the peripheral edges of the retaining grooves. The pad is held in the bag holder by retaining grooves and by inserting an attachment device into the mounting holes of the unitary mounting wall portion and the side wall to securely fasten the unitary mounting wall and the side wall.
摘要翻译：一种气囊装置，包括由合成树脂制成的垫和由金属构成的袋保持件。垫包括覆盖气囊的顶壁，并且包括延伸的门，适于在气囊膨胀时被破坏。顶壁还包括从顶壁的外周边缘向下延伸的整体安装壁。袋支架包括用于保持气囊的底壁和从底壁的外周边缘垂直延伸的侧壁。整体安装壁包括在安装孔上方的内侧表面水平延伸的安装孔。侧壁包括延伸穿过其中的安装孔，以对应于安装壁的安装孔和布置在从底壁向上延伸的位置处的保持爪。保持爪能够保持在保持槽的周缘上。垫通过保持槽而保持在袋保持器中，并且通过将连接装置插入整体安装壁部分和侧壁的安装孔中，以牢固地固定整体式安装壁和侧壁。

8. 发明授权

US6062592A Steering wheel having air bag module 失效
标题翻译：方向盘有气囊模块
公开(公告)号：US6062592A
公开(公告)日：2000-05-16
申请号：US103619
申请日：1998-06-24
申请人： Kouji Sakurai , Yoshiyuki Fujita
发明人： Kouji Sakurai , Yoshiyuki Fujita
IPC分类号： B62D1/04 , B60Q5/00 , B60R16/02 , B60R16/027 , B60R21/20 , B60R21/203 , H01H13/14 , B60R21/16
CPC分类号： B60R21/2037 , B60Q5/003
摘要： A steering wheel in which a ceiling portion of a pad of an air bag module has adjacent peripheral edges extending along the individual spoke portions of a steering wheel body to be positioned close to a cover layer of the individual spoke portions. Each of the adjacent peripheral portions has a push rib. A bag holder has extensions capable of abutting against the individual push ribs. Movable contacts of the individual switch bodies are individually supported by the extensions under the push ribs. Stationary contacts of the individual switch bodies are individually supported by a stationary plate which is supported in abutment by the individual spoke portion cores in the vicinity of the individual stationary contacts. The steering wheel enables the operation of a horn switch with a reduced operational load when the peripheral edge of the pad of the air bag module is depressed and retains a clear feel of arrival at the bottom. This improves the operational feel of the horn switch.
摘要翻译：一种方向盘，其中安全气囊模块的垫的顶部部分具有沿着方向盘主体的各个轮辐部分延伸的邻近周边边缘，以定位成靠近各个轮辐部分的覆盖层。每个相邻的周边部分具有推动肋。袋保持器具有能够抵靠各个推动肋的延伸部。单个开关体的可移动触点由推力肋下的延伸部分别支撑。各个开关体的固定触点由固定板单独支撑，该固定板在单独的固定触点附近由各个辐条部分芯支承。当气囊模块的垫的外围边缘被压下并且保持清楚的到达底部感觉时，方向盘使得能够操作具有降低的操作负载的喇叭开关。这改善了喇叭开关的操作感觉。

9. 发明授权

US5955131A Method of sandwiching soft and smooth fluid food as a flat shape with uniform thickness 失效
标题翻译：将柔软光滑的流体食品夹在平坦的形状上，均匀厚度的方法
公开(公告)号：US5955131A
公开(公告)日：1999-09-21
申请号：US778660
申请日：1997-01-03
申请人： Yoshiyuki Fujita , Yufuji Kawasaki
发明人： Yoshiyuki Fujita , Yufuji Kawasaki
IPC分类号： A21D13/00 , A23L1/00 , A23L1/39 , A23L1/48
CPC分类号： A21D13/0006 , A21D13/0025 , A21D13/0096 , A23L23/00 , A23L35/00 , A23P20/20
摘要： A method of sandwiching soft, smooth and fluid food between a top half and a bottom half of a bun includes, first, making the food with thermo-coagulable protein that solidifies due to heat is included in the food. The food is then formed into a flat shape having a uniform thickness and a size suitable for sandwiching between the top half and the bottom half of the bun. After applying a coating to the food, it is deep-fried while heating the coating to a light brown so that the food includes a smooth and fluid center portion and a film-like peripheral portion that is coagulated by the thermo-coagulable protein. The food thus deep-fried is sandwiched between the top half and the bottom half of the bun.
摘要翻译：在面包的上半部分和下半部分之间夹着柔软，平滑和流动的食物的方法包括首先使包含在食物中的由热量固化的可凝结的蛋白质的食物制成食物。然后将食物形成具有均匀厚度的平坦形状和适于夹在馒头的上半部和下半部之间的尺寸。在将食物涂布到食物上之后，将该涂层加热至浅棕色，使食物包含光滑的流体中心部分和由可凝固的蛋白质凝结的膜状周边部分。这样油炸的食物夹在馒头的上半部分和下半部分之间。

10. 发明授权

US5152551A Steering wheel having impact absorbing member 失效
标题翻译：具有冲击吸收构件的转向轮
公开(公告)号：US5152551A
公开(公告)日：1992-10-06
申请号：US722152
申请日：1991-06-27
申请人： Katsunobu Sakane , Yoshiyuki Fujita
发明人： Katsunobu Sakane , Yoshiyuki Fujita
IPC分类号： B60Q5/00 , B60R21/05 , B62D1/11
CPC分类号： B62D1/11 , B60Q5/003 , B60R21/05
摘要： A steering wheel disposed in such a manner that an impact energy absorbing member made of sheet metal and having an upper wall portion and side walls extending downward from the two longitudinal end portions of the upper wall is fastened to the upper surface fo a boss portion and a pad is fitted to cover the impact energy absorbing member. The pad is provided with projecting portions made of a rigid synthetic resin, which are brought into contact with the portion adjacent to the two longitudinal ends of the upper wall of the energy absorbing member, formed on the reverse side of the upper wall of the pad. When impact force acts, from a substantially upper portion, on the central portion of the upper wall of the pad, the projecting portions assuredly crush the side walls of the energy absorbing member. As a result, impact energy can be assuredly absorbed.

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