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    • 3. 发明申请
    • Semiconductor structure with electrically isolated sidewall electrodes and method for fabricating the structure
    • 具有电隔离侧壁电极的半导体结构和用于制造该结构的方法
    • US20050062138A1
    • 2005-03-24
    • US10668136
    • 2003-09-22
    • Kirt Williams
    • Kirt Williams
    • B81B3/00H01L29/40H02N1/00
    • H02N1/004B81B3/0018B81B2201/038
    • A semiconductor structure with electrically isolated sidewall electrodes on one or more sides of the structure and a method for fabricating the structure are disclosed. The electrically isolated sidewall electrodes are composed of silicon-based conductive material, e.g., doped polysilicon, which allows the electrodes to be formed on one or more sides of the semiconductor structure by using stop-on-oxide deep reactive-ion etching (DRIE). The electrically isolated sidewall electrodes allow the semiconductor structure to generate electrostatic forces between a side surface of the semiconductor structure and a side surface of a similar semiconductor structure. Thus, the semiconductor structure may be used as a part of an electrostatic actuator in a microelectromechanical system (MEMS) device.
    • 公开了一种在该结构的一侧或多侧上具有电隔离的侧壁电极的半导体结构以及用于制造该结构的方法。 电隔离的侧壁电极由硅基导电材料(例如掺杂多晶硅)组成,其允许通过使用停止氧化物深反应离子蚀刻(DRIE)在半导体结构的一侧或多侧上形成电极, 。 电隔离的侧壁电极允许半导体结构在半导体结构的侧表面和类似的半导体结构的侧表面之间产生静电力。 因此,半导体结构可以用作微机电系统(MEMS)装置中的静电致动器的一部分。