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    • 10. 发明申请
    • Integrated electronic circuit incorporating a capacitor
    • 集成电子电路
    • US20070114596A1
    • 2007-05-24
    • US11600584
    • 2006-11-15
    • Philippe CandelierThierry DevoivreEmmanuel JosseSebastien Lefebvre
    • Philippe CandelierThierry DevoivreEmmanuel JosseSebastien Lefebvre
    • H01L29/792
    • H01L27/0207H01L27/112H01L27/11206H01L27/11246
    • A non-volatile memory element includes a transistor for selecting the element and a capacitor for recording a binary value by electrical breakdown of an insulating layer (13) of the capacitor. A structure of the memory element is modified in order to allow a higher degree of integration of the element within an electronic circuit of the MOS type. In addition, the memory element is made more robust with respect to a high electrical voltage (VDD) used for recording the binary value. The transistor includes a drain in the substrate with electric field drift in a longitudinal direction extending towards the capacitor. The electric field drift region for the drain includes a first extension underneath the gate of the transistor opposite the source and a second extension underneath the insulating layer of the capacitor. Doping of the substrate for the electric field drift region is limited to a region substantially corresponding to a distance between the gate and an electrode of the capacitor.
    • 非易失性存储元件包括用于选择元件的晶体管和用于通过电容器的绝缘层(13)的电击穿记录二进制值的电容器。 修改存储元件的结构,以便允许元件在MOS类型的电子电路内更高程度的集成。 此外,存储元件相对于用于记录二进制值的高电压(VDD)更加鲁棒。 该晶体管包括在衬底中的漏极,该漏极沿朝向该电容器延伸的纵向方向具有电场漂移。 用于漏极的电场漂移区域包括与源极相对的晶体管的栅极下面的第一延伸部分和在电容器的绝缘层下方的第二延伸部分。 用于电场漂移区域的衬底的掺杂限于基本上对应于电容器的栅极和电极之间的距离的区域。